Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2004
08/10/2004CA2171535C Method of manufacturing a composite material with lamellar interphase between reinforcing fibres and matrix, and material obtained
08/05/2004WO2004066376A1 Dielectric film forming method
08/05/2004WO2004066360A2 Apparatus and methods for ionized deposition of a film or thin layer
08/05/2004WO2004066339A1 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
08/05/2004WO2004066338A1 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
08/05/2004WO2004066337A1 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
08/05/2004WO2004066315A2 Benzoxazinone and quinazolinone derivatives
08/05/2004WO2004065656A1 Ito thin film, film-forming method of same, transparent conductive film and touch panel
08/05/2004WO2004065331A1 Surface hardened carbon material and process of manufacturing
08/05/2004WO2004065046A2 Brittle material sputtering target assembly and method of making same
08/05/2004WO2004057053A3 Methods for producing coated metal wire
08/05/2004WO2004050937A3 Method for coating piston rings for internal combustion engines
08/05/2004US20040151991 Photolithography mask repair
08/05/2004US20040151949 Magnetic recording medium and method for manufacturing same
08/05/2004US20040151942 Overcoating substrate by sputtering; using zirconium, zinc, indium alloy
08/05/2004US20040151939 Reactive multilayer foil with conductive and nonconductive final products
08/05/2004US20040151911 Ion gun deposition and alignment for liquid-crystal applications
08/05/2004US20040150696 Pressurization; plasma sputtering
08/05/2004US20040149959 Conductive flakes manufactured by combined sputtering and vapor deposition
08/05/2004US20040149813 Method of making reactive multilayer foil
08/05/2004US20040149576 High-power ion sputtering magnetron
08/05/2004US20040149575 System for unbalanced magnetron sputtering with AC power
08/05/2004US20040149574 Penning discharge plasma source
08/05/2004US20040149567 Composite sputter target and phosphor deposition method
08/05/2004US20040149566 Method for reactive sputtering deposition
08/05/2004US20040149565 Method for manufacturing a workpiece using a magnetron sputter source
08/05/2004US20040149373 Method of bonding a first body to a second body
08/05/2004US20040149372 Method of connecting semiconductor or microelectronic device to a substrate
08/05/2004US20040149273 Internal combustion engine
08/05/2004US20040149208 Particle control device and particle control method for vacuum processing apparatus
08/05/2004DE19833718B4 Verfahren zur Verringerung der Partikelabgabe und Partikelaufnahme einer Waferauflage A method for reducing the particle charge and particle absorption of a wafer support
08/05/2004DE19801424B4 Wärmedämmstoff für hohe Temperaturen und seine Verwendung Heat insulation material for high temperature and its use
08/05/2004DE19751785B4 Verfahren zum Behandeln eines Halbleiter-Wafers A method for treating a semiconductor wafer
08/05/2004DE10303428A1 Plasma-activated layer deposition process by cathodic sputtering according to the magnetron principle for producing thin layers of metals and metal alloys comprises reducing the absolute value of the magnetic field strength
08/05/2004DE10297024T5 Dünnschichtausbildungsverfahren und Dünnschichtausbildungseinrichtung Thin film forming method and thin film training institute
08/05/2004DE10216711B4 Verfahren zur Herstellung eines als Blende dienenden dünnen Metallfilms mit einer durchgehenden Öffnung mit einem ultrakleinen Durchmesser und Verfahren zur Herstellung eines Metallfilms mit den sich darin befindenden Öffnungen A method for producing a diaphragm serving as the thin metal film with a continuous opening with an ultra-small diameter, and process for producing a metal film with the apertures located therein
08/05/2004DE10154229B4 Einrichtung für die Regelung einer Plasmaimpedanz Means for controlling a plasma impedance
08/05/2004DE10053733B4 Verfahren zur Kristallisation einer Dünnschicht aus Lithium-Übergangsmetall-Oxid A method for crystallization of a thin film of lithium transition metal oxide
08/05/2004CA2511180A1 A process for the production of porous inorganic materials or a matrix material containing nanoparticles
08/04/2004EP1443127A1 Method for coating large-area substrates
08/04/2004EP1443126A1 Silicon monoxide vapor deposition material and method for preparation thereof
08/04/2004EP1442793A1 Photocatalyst element, method and device for preparing the same
08/04/2004EP1442788A2 Screening inorganic materials for catalysis
08/04/2004EP1442154A1 Method for producing a continuous coating at the surface of a component
08/04/2004EP1442153A1 Gcib processing to improve interconnection vias and improved interconnection via
08/04/2004EP1336188B1 Extraction and deceleration of low energy beam with low beam divergence
08/04/2004EP1325167B1 Sputtertarget
08/04/2004EP0977907B1 Combination antiabrasion layer
08/04/2004CN1518399A Precision mask for film forming and its manufacturing method, electroluminescence device and manufacturing method
08/04/2004CN1518037A Anode and magnetron with the anode
08/04/2004CN1160480C Apparatus for simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
08/04/2004CN1160478C Vacuum film growth apparatus
08/04/2004CN1160477C Hall type ion auxiliary evaporation source
08/03/2004US6770889 Method of controlling electrostatic lens and ion implantation apparatus
08/03/2004US6770562 Film formation apparatus and film formation method
08/03/2004US6770358 Titanium or zirconium boride substrate; high strength, chemical resistance, electroconductivity
08/03/2004US6770333 Electron beam vapor deposit an ingot of yttria-stabilized zirconia on first article, by heating, melting and evaporating, and heat transfer to deposit on the second article
08/03/2004US6770178 Cathodic arc disposable sting shielding
08/03/2004US6770176 Apparatus and method for fracture absorption layer
08/03/2004US6770175 Apparatus for and method of forming electrode for lithium secondary cell
08/03/2004US6770154 Sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate
08/03/2004US6770117 Ion implantation and wet bench systems utilizing exhaust gas recirculation
08/03/2004CA2289039C Packaging material
07/2004
07/29/2004WO2004064169A1 Structurally gradient material and functional element including the same
07/29/2004WO2004064114A2 Powder metallurgy sputtering targets and methods of producing same
07/29/2004WO2004063420A1 Nickel alloy sputtering target
07/29/2004WO2004063419A1 Resistance-heated vaporizer boat
07/29/2004WO2004063399A1 Suface hardened stainless steel with improved wear resistance and low static friction properties
07/29/2004WO2004062907A1 Si LAMINATED BODY HAVING Si LAYER FORMED ON SUBSTRATE SHEET
07/29/2004US20040147736 Activated polyethylene glycol compounds
07/29/2004US20040146748 Differentially resputtering with nonuniform voltage bias to modulate platinum content of magnetic film
07/29/2004US20040146721 Multilayer; interior dielectrics, infrared reflecting layers, silver layers, another dielectrics; controlling crystallization during tempering
07/29/2004US20040146645 Mutlialyer automobile laminate; glazing unit; pair of glass sheets; sputter coating; silver film and dielectric
07/29/2004US20040146642 Process for making angstrom scale and high aspect functional platelets
07/29/2004US20040146639 Preparation of radiation image storage panel
07/29/2004US20040144643 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles
07/29/2004US20040144639 Nitriding silicon surface of wafer with nitrogen plasma; overcoating with nickel; annealing
07/29/2004US20040144638 Device for measuring the profile of a metal film sputter deposition target, and system and method employing same
07/29/2004US20040144321 Method of designing a thermal physical vapor deposition system
07/29/2004US20040144320 Method for cleaning reaction container and film deposition system
07/29/2004US20040144318 Device for ceramic-type coating of a substrate
07/29/2004US20040144317 Mask used for layer formation and process of making the mask
07/29/2004US20040144316 Apparatus for processing a substrate
07/29/2004US20040144204 Airu spattering target and method for preparation thereof
07/29/2004DE19832299B4 Verfahren zur Verbesserung des Korrosionsschutzes von Seltenerddauermagneten A process for improving the corrosion protection of Seltenerddauermagneten
07/29/2004DE10392142T5 Sputtertarget aus einer Silberlegierung und Verfahren zur Herstellung desselben A sputtering target made of a silver alloy and method of manufacturing the same
07/29/2004DE10303971A1 Production of a luminescent layer on a substrate in a vaporizing device with rotating substrate holder used for vaporization of needle image for mammography plates comprises using a substrate eccentrically arranged on the substrate holder
07/29/2004DE10256909B3 Verfahren zur Herstellung einer Chalkogenid-Halbleiterschicht mit optischer in-situ-Prozesskontrolle und Vorrichtung zur Verfahrensdurchführung A process for producing a chalcogenide semiconductor layer with optical in-situ process control and device for process operation
07/28/2004EP1441572A1 Precision mask for deposition and a method for manufacturing the same, an electroluminescence display and a method for manufacturing the same, and electronic equipment
07/28/2004EP1441378A2 Anode and magnetron therewith
07/28/2004EP1441239A1 Transparent laminate, method for producing the same, and plasma display panel
07/28/2004EP1441038A1 Sintered body and film forming method using the same
07/28/2004EP1440775A1 Amorphous diamond coating of blades
07/28/2004EP1440178A1 Apparatus for vacuum deposition, specifically for metallizing plastic film
07/28/2004EP1366203A4 Refractory metal plates with uniform texture and methods of making the same
07/28/2004EP1362132A4 Rejuvenation of refractory metal products
07/28/2004CN1516895A Barrier enhancement process for copper interconnects
07/28/2004CN1516888A Magnetron atomisation source
07/28/2004CN1516826A Ion-beam deposition process for mfg. attenuated phase shift photomask blanks
07/28/2004CN1516282A 电子电路 Electronic circuit