Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2004
07/06/2004US6759005 Blended, canned and subjected to hot isostatic press consolidation.
07/06/2004US6758950 Controlled magnetron shape for uniformly sputtered thin film
07/06/2004US6758949 Magnetically confined metal plasma sputter source with magnetic control of ion and neutral densities
07/06/2004US6758948 Method and apparatus for depositing films
07/06/2004US6758920 Copper, silver alloy
07/06/2004US6758915 Grain oriented electromagnetic steel sheet exhibiting extremely small watt loss and method for producing the same
07/06/2004US6758907 Device for coating bottles and bodies for transporting bottles
07/06/2004US6758662 Die for die compacting of powdered material
07/06/2004CA2215223C Surface coating of insulating materials, the procedure for making it, and its application to shieldings for insulated housings
07/06/2004CA2117069C Process and apparatus for surface hardening of refractory metal workpieces
07/06/2004CA2081503C Metallized film structure and method
07/01/2004WO2004055873A1 Thin film forming apparatus
07/01/2004WO2004055872A2 Columnar structured material and method of manufacturing the same
07/01/2004WO2004055233A1 Transparent conductive film and film forming method therefor
07/01/2004WO2004055232A2 Method of synthesising and growing nanorods from a metal carbide on a substrate, substrates thus obtained and applications thereof
07/01/2004WO2004055231A2 Composite sputter target and phosphor deposition method
07/01/2004WO2004054893A1 Packaging material
07/01/2004WO2004035854A3 Method and apparatus for processing substrates
07/01/2004WO2004033748A3 Method to recover spent components of a sputter target
07/01/2004WO2004001817A9 Transfer chamber for vacuum processing system
07/01/2004US20040127697 arylisothiocyanate compounds useful for activating alcohol-containing macromolecules, for example polyethyleneglycols and cellulose, for covalent linkage to amino-groups of biomolecules such as antibodies, enzymes, and proteins
07/01/2004US20040127064 Production method for composite oxide thin film and device therefor and composite oxide film produced thereby
07/01/2004US20040127038 Transparent oxide semiconductor thin film transistors
07/01/2004US20040126649 Simple procedure for growing highly-ordered nanofibers by self-catalytic growth
07/01/2004US20040126614 Fluoride-containing coating and coated member
07/01/2004US20040126608 Electronic device, method of manufacture of the same, and sputtering target
07/01/2004US20040126502 spraying a powder including AlN grains covered with a layer of an oxide precursor onto a support at a high temperature and at a high speed, yielding an oxide forming a liquid phase around the AlN grains during spraying
07/01/2004US20040126492 using a nickel-aluminum family cathode having a tapered outer surface comprising a body tapered along a longitudinal axis thereof and a ring having a tapered inner surface at which the tapered outer surface of the body is received.
07/01/2004US20040125023 Wave-transmitting cover, and method for producing it
07/01/2004US20040124080 Vacuum arc vapor deposition apparatus
07/01/2004US20040123980 Heat exchange foam
07/01/2004US20040123952 FPD fabricating apparatus
07/01/2004US20040123923 Aircraft engine; diffusion coating
07/01/2004US20040123920 Vapor deposition of metal oxide by reduction, electrolysis of solid solution
07/01/2004US20040123804 Fabrication system and manufacturing method of light emitting device
07/01/2004US20040123802 Method and system for making p-type transparent conductive films
07/01/2004US20040123799 Flexible frame for mounting a deposition mask
07/01/2004CA2508523A1 Composite sputter target and phosphor deposition method
06/2004
06/30/2004EP1434298A2 Solid electrolyte and all-solid battery using the same
06/30/2004EP1434278A1 Apparatus and method for manufacturing silicon nanodot film for light emission
06/30/2004EP1433873A2 Heating crucible and deposition apparatus using the same
06/30/2004EP1433872A1 Method for forming resin film and method for manufacturing electronic parts
06/30/2004EP1433524A1 An organic material evaporation source
06/30/2004EP1433207A2 A process for large-scale production of cdte/cds thin film solar cells
06/30/2004EP1433202A2 Integration of barrier layer and seed layer
06/30/2004EP1433193A2 Flat magnetron sputter apparatus
06/30/2004EP1432510A1 Substrate having catalyst compositions on surfaces of opposite sides and method for producing the same
06/30/2004EP1021246B1 Catalyst for membrane electrode assembly and method of making
06/30/2004EP0795106B1 Antireflection coating for a temperature sensitive substrate
06/30/2004CN1508615A Electronic device and its making method, spattering target
06/30/2004CN1155998C Thin slice resistance measurer and electronic part mfg. method
06/30/2004CN1155735C Method and device for applying porous coatings and cathode film of electrolytic condenser
06/30/2004CN1155734C Process and apparatus for preparing porous metal by combined physical gas-phase deposition techinque
06/30/2004CN1155450C Method employing UV laser pulses of varied energy density to form blind vias in multilayered targets
06/29/2004US6756322 Method for evenly coating semiconductor laser end faces and frame used in the method
06/29/2004US6756320 Gallium/gadolinium/arsenic oxides having low defect and current leakage; field effect transistors
06/29/2004US6756285 Multilayer structure with controlled internal stresses and making same
06/29/2004US6756161 Film essentially of a moxcynz compound where m is chromium, molybdenum, tungsten, and/or tantalum
06/29/2004US6756160 Tunable optics transmission; lithography wavelengths; attenuation phase shifting
06/29/2004US6756137 Production of layers of titanium oxide, titanium and lanthanum oxide under reduced pressure; spectacle lens, a lens for optical instruments, an optical component for laser technology, a beam splitter, interference mirror, etc.
06/29/2004US6756131 Comprising, in addition to ni, 0.1 to 12% by weight of co, 10 to 30% by weight of cr, 4 to 15% by weight of al, 0.1 to 5% by weight of y, and 0.5 to 10% by weight of re. the high temperature corrosion resistant alloy composition has an
06/29/2004US6756082 Thermal barrier coating resistant to sintering
06/29/2004US6756081 Annular cross-section; detachable target holder with screw fitting
06/29/2004US6755948 Titanium target for sputtering
06/29/2004US6755945 Sealing substrate within an enclosure; applying voltage; process control
06/29/2004US6755944 Ion beam deposition targets having an interlocking interface and a replaceable insert
06/24/2004WO2004054325A1 Light-emitting device, manufacturing apparatus, film-forming method, and cleaning method
06/24/2004WO2004053861A1 Silver alloy for reflective film of optical recording medium
06/24/2004WO2004053186A1 Sensor for monitoring material deposition and method of monitoring material deposition
06/24/2004WO2004052785A2 High purity nickel/vanadium sputtering components; and methods of making sputtering components
06/24/2004WO2004052642A1 CONDUCTIVE SHEET HAVING CONDUCTIVE LAYER ON Si-CONTAINING LAYER
06/24/2004WO2004032184A3 Low temperature salicide forming materials and sputtering targets formed therefrom
06/24/2004WO2004012220A3 Methods and apparatus for monitoring plasma parameters in plasma doping systems
06/24/2004US20040121147 Hard film, wear-resistant object and method of manufacturing wear-resistant object
06/24/2004US20040121146 Composite barrier films and method
06/24/2004US20040121069 lithography; accurately matching up the defect location; focused ion beam systems
06/24/2004US20040119131 Physical vapor deposition on targets comprising Ti and Zr; and methods of use
06/24/2004US20040119006 Neutral particle beam processing apparatus
06/24/2004US20040118697 Metal deposition process with pre-cleaning before electrochemical deposition
06/24/2004US20040118679 Target and manufacturing method thereof
06/24/2004US20040118678 Magnetron sputtering systems including anodic gas distribution systems
06/24/2004US20040118675 Method for deteriming a critical size of an inclusion in aluminum or aluminum alloy sputtering target
06/24/2004US20040118521 Coil and coil support for generating a plasma
06/24/2004US20040118452 Apparatus and method for emitting cesium vapor
06/24/2004US20040118349 Vapor deposition shield for optical fibers
06/24/2004US20040118347 Process and apparatus for plasma activated depositions in a vacuum
06/24/2004US20040118343 Vacuum chamber load lock purging method and apparatus
06/24/2004DE10347521A1 Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens A process for producing multi-layer structure and device for implementing the method
06/24/2004DE10337456A1 Material or component for vehicles, telecommunications, household appliances, bathroom fittings, kitchen fittings, medical appliances, and jewelry has a metal coating applied by direct metallization on the surface
06/24/2004DE10258116A1 Tempering device for coating a substrate strip with a superconducting material has an impinging opening provided in a thermal screen to introduce a material to the substrate strip
06/24/2004DE10256850A1 Verfahren und Aufdampfung von Verbindung(en) auf einen Träger A method and vapor deposition of the compound (s) on a support
06/24/2004DE10256832A1 Sicherheitsfolie und Verfahren zur Herstellung derselben Security film and method for manufacturing the same
06/24/2004CA2507618A1 Sensor for monitoring material deposition and method of monitoring material deposition
06/23/2004EP1432014A2 vacuum chamber purging method and apparatus
06/23/2004EP1431416A1 Protective Ti-Al-Cr-N coating
06/23/2004EP1431414A1 Sputtering target and transparent electroconductive film
06/23/2004EP1430512A2 Selfhealing flexible photonic composites for light sources
06/23/2004EP1430476A1 Magnetic thin film disks with a nonuniform composition
06/23/2004EP1430332A1 Optical coatings and associated methods
06/23/2004CN1507371A Metal bis-triflimide compounds and methods for synthesis of metal bis-triflimide compounds