Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2005
04/27/2005CN1609269A Vacuum processing chamber for planar rectangular in particular square substrate
04/27/2005CN1609268A Process for treating milling cutter used for printed circuit board by ion implantation technology
04/27/2005CN1609267A Method for processing milling cutter used for printed circuit board by ion implantation technology
04/27/2005CN1609266A Process for treating drilling bit used for printed circuit board by ion implantation technology
04/27/2005CN1609265A Metal ion implantation machine
04/27/2005CN1609264A Automatic changing-over device for correcting baffle plate in vacuum coating film machine
04/27/2005CN1609263A Process for obtaining thermostable microlaminated materials
04/27/2005CN1609262A Magnesium vapour-deposition material
04/27/2005CN1609259A Cleaning and refurbishing chamber components having metal coatings
04/27/2005CN1199301C Amorphous electrode compsns.
04/27/2005CN1199287C Reduced diffusion of mobile specie from metal oxide ceramic
04/27/2005CN1199236C Method and apparatus for thermally processing wafers
04/27/2005CN1199223C System and method for cleaning ion source in course of using
04/27/2005CN1198965C Article having coating thereon
04/27/2005CN1198962C Coated article
04/27/2005CN1198961C Article having decorative and protective multi-layer coating
04/27/2005CN1198955C Connection base sheet for double discs and operation method
04/27/2005CN1198954C Clamp of contactless fixture mode for cavity surface evaporating coating of semiconductor laser
04/27/2005CN1198692C Multilayer metalized composite on polymer film product and producing process thereof
04/26/2005US6884739 Lanthanide doped TiOx dielectric films by plasma oxidation
04/26/2005US6884718 Semiconductor manufacturing process and apparatus for modifying in-film stress of thin films, and product formed thereby
04/26/2005US6884699 Process and unit for production of polycrystalline silicon film
04/26/2005US6884527 For subsequent deposition of high-temperature superconducting thick films with high Jc's and Ic's; a layer of metal phosphate on the substrate surface and a layer of an oriented cubic oxide having a rock-salt-like structure covering it
04/26/2005US6884516 Internal member for plasma-treating vessel and method of producing the same
04/26/2005US6884500 Component comprising submicron hollow spaces
04/26/2005US6884499 Nanolayered coated cutting tool and method for making the same
04/26/2005US6884497 PVD-coated cutting tool insert
04/26/2005US6884496 Method for increasing compression stress or reducing internal tension stress of a CVD, PCVD or PVD layer and cutting insert for machining
04/26/2005US6884476 Masking superalloy surface without obstructing internal passageways with a ceramic forming a noncracking, nonreactive, heat-resistant (>1400 degrees F.) protective coating; physical vapor deposition; gas turbine blades
04/26/2005US6884475 Chemical vapor deposition method for depositing a high k dielectric film
04/26/2005US6884465 Vapor depositing a dielectric film on a substrate by an atomic layer deposition comprising alternately providing a gaseous metal compound and an oxygen source other than water to the reaction chamber at a temperature <190 degrees C.
04/26/2005US6884458 Controlling parylene deposition thickness, by measuring thermal response from the thermoconductive path between heater and thermometer
04/26/2005US6884329 Plasma sputtering, two step processes performed at a low temperature, and a high temperature, electrodeposition, manufacturing semiconductor integrated circuits
04/26/2005US6884327 Forming a tapered waveguide, comprising: depositing a core layer over a substrate with a shadow mask; and patterning the core layer
04/26/2005US6884319 Susceptor of apparatus for manufacturing semiconductor device
04/26/2005US6884299 Deposition apparatus for organic light-emitting devices
04/26/2005US6884139 Organic EL display device and method for fabricating the same using shadow mask
04/26/2005CA2130544C Cemented carbide with binder phase enriched surface zone
04/21/2005WO2005036601A2 Wafer characteristics via reflectomeytry and wafer processing apparatus and method
04/21/2005WO2005035834A2 Vacuum deposition of dielectric coatings on volatile material
04/21/2005WO2005035822A1 Apparatus and process for high rate deposition of rutile titanium dioxide
04/21/2005WO2005035821A1 Film deposition apparatus having hole-like rotary filter plate for capturing fine particles, and film deposition method
04/21/2005WO2005035820A1 Vapour deposition method
04/21/2005WO2005035809A1 HIGH-PURITY Ni-V ALLOY, TARGET THEREFROM, HIGH-PURITY Ni-V ALLOY THIN FILM AND PROCESS FOR PRODUCING HIGH-PURITY Ni-V ALLOY
04/21/2005WO2004097064A3 Methods and devices for reduction of tension in thin layers
04/21/2005US20050085152 Organic electroluminescence element and production method thereof
04/21/2005US20050085095 Sintered object of silicon monoxide and method for producing the same
04/21/2005US20050084987 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
04/21/2005US20050084799 Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target
04/21/2005US20050084705 Protective layer for a body, and process and arrangement for producing protective layers
04/21/2005US20050084672 Implantable electrical lead wire
04/21/2005US20050084654 Component for vacuum apparatus, production method thereof and apparatus using the same
04/21/2005US20050084626 Method of forming inorganic alignment film, inorganic alignment film, substrate for electronic device, liquid crystal panel and electronic apparatus
04/21/2005US20050084624 Method for forming oriented film, oriented film, substrate for electronic device, liquid crystal panel, and electronic device
04/21/2005US20050084611 coating a colloidal dispersion on substrates, then drying to form a layer of colloidal beads, forming films comprising metals and/or metal compounds on the surfaces of the beads and removing the beads to form cavities
04/21/2005US20050084379 Compressor blade root for engine blades of aircraft engines
04/21/2005US20050082982 MgO pellet for protective layer of plasma display panel, and plasma display panel using the same
04/21/2005US20050082482 Process monitoring using infrared optical diagnostics
04/21/2005US20050082343 Brazing; soldering; pressing bodies against foil; controlling pressure
04/21/2005US20050082258 Methods of treating non-sputtered regions of PVD target constructions to form particle traps
04/21/2005US20050082166 Cathode structure for vacuum sputtering machine
04/21/2005US20050082162 Information recording medium, method of manufacturing the same, and sputtering target
04/21/2005US20050082161 Rapid cycle time gas burster
04/21/2005US20050081791 Vacuum treatment installation for flat rectangular or square substrates
04/21/2005US20050081790 Film deposition device
04/20/2005EP1524682A1 Component for vacuum apparatus, production method thereof and apparatus using the same
04/20/2005EP1524330A1 Sputter target having modified surface texture
04/20/2005EP1524329A1 Modular device for surface coating
04/20/2005EP1524327A1 Layer comprising intracrystalline inclusions
04/20/2005EP1524215A1 Vacuum processing chamber for planar rectangular in particular square substrate
04/20/2005EP1523771A2 Method for transferring an electrically active thin layer
04/20/2005EP1523761A1 Transfer chamber for vacuum processing system
04/20/2005EP1523757A2 Cathode for vacuum sputtering treatment machine
04/20/2005EP1523585A2 Loading and unloading device for a coating unit
04/20/2005EP1523584A1 FABRICATION OF B/C/N/O/Si DOPED SPUTTERING TARGETS
04/20/2005EP1060501B1 Method and apparatus for predicting plasma-process surface profiles
04/20/2005CN2693788Y Magnetron sputtering target
04/20/2005CN2693787Y Bias voltage energizing device
04/20/2005CN1608306A Magnetron sputtering device
04/20/2005CN1608141A Refurbishing spent sputtering targets
04/20/2005CN1607875A Display device and method for manufacturing same
04/20/2005CN1607868A Mask frame assembly for depositing a thin layer of an electroluminescent device and method for depositing a thin layer
04/20/2005CN1607265A Process for preparation of high-temperature protecting coating by vacuum arc deposition
04/20/2005CN1607264A Method for preparing aluminum-silicon-yttrium diffusion alloying coating
04/20/2005CN1607054A High purity metal Mo coarse powder and sintered sputtering target produced by thereof
04/20/2005CN1198483C Luminous element with hygroscopic film and process for preparing hygroscopic film
04/20/2005CN1198153C Method for producing anti-reflective film-coated plastic, lens, and anti-reflective film-coated plastic lens
04/20/2005CN1197998C Process for applying protective and decorative coating on article
04/20/2005CN1197996C Article having coating
04/20/2005CN1197995C Article having decorative and protective coating
04/20/2005CN1197991C Pre-sputter method for raising rate of utilization of sputter target
04/20/2005CN1197990C Alloy target material for conduction film and its preparation method
04/20/2005CN1197989C Electrode for plasma polymerization treatment equipment
04/20/2005CN1197900C Resin case hardening process, case hardened resin and productive equipment and resin substrate
04/20/2005CN1197702C Aerogel substrate and method for preparing the same
04/20/2005CA2485402A1 Implantable electrical lead wire
04/19/2005US6881969 Electron beam treatment device
04/19/2005US6881673 Integrated deposition process for copper metallization
04/19/2005US6881534 Method of forming mask, method of forming patterned thin film, and method of fabricating micro device
04/19/2005US6881504 Multilayer; magnetic layer with nonmagnetic interface