Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2005
07/13/2005CN1210433C Mask plate for line shape mask of vacuum vapour plating
07/13/2005CN1210428C Unidirectional silicon steel sheet of ultra low iron loss and method for production thereof
07/12/2005US6916704 Multiple deposition of metal layers for the fabrication of an upper capacitor electrode of a trench capacitor
07/12/2005US6916561 Thermal barrier coatings with lower porosity for improved impact and erosion resistance
07/12/2005US6916542 Coated articles having a protective coating and cathode targets for making the coated articles
07/12/2005US6916527 Resin moldings
07/12/2005US6916526 Biaxially oriented polypropylene metallized film for packaging
07/12/2005US6916407 Method for high frequency sputtering dielectric target in a vacuum chamber with high frequency gas discharge; for coating optical storage disks
07/12/2005CA2341608C Method for vacuum deposit on a curved substrate
07/12/2005CA2214546C Method and apparatus for the high rate automated manufacture of thin films
07/07/2005WO2005061758A1 Transfer system
07/07/2005WO2005061755A1 A stainless steel strip coated with a decorative layer
07/07/2005WO2005061754A1 Method and apparatus for manufacturing a functional layer consisting of at least two components
07/07/2005WO2005061753A1 Compensation of spacing between magnetron and sputter target
07/07/2005WO2005061752A2 Method for patterning films
07/07/2005WO2005061751A1 Piston ring and method for the production thereof
07/07/2005WO2005061404A2 Scratch resistant coated glass article resistant to fluoride-based etchant(s)
07/07/2005WO2005061132A1 Method and device for cleaning at least one process chamber used for coating at least one substrate
07/07/2005WO2005060651A2 Protective layer for optical coatings with enhanced corrosion and scratch resistance
07/07/2005WO2005040452B1 Sluice system for a vacuum facility
07/07/2005WO2005026043A3 Methods for providing thin hydrogen separation membranes and associated uses
07/07/2005WO2005021828A3 Copper-containing pvd targets and methods for their manufacture
07/07/2005WO2005010953A3 Boride thin films on silicon
07/07/2005WO2005005333A3 Heat treatable coated article with dual layer overcoat
07/07/2005US20050148200 Film forming apparatus, substrate for forming oxide thin film and production method thereof
07/07/2005US20050148150 Memory element and its method of formation
07/07/2005US20050147852 Chemical and corrosion resist protective coatings; multilayer composite comprising a metal alloy undercoatings, yttrium oxide overcoatings which was formed by spraying under depressurization
07/07/2005US20050147835 Biaxially oriented polypropylene high barrier metallized film for packaging
07/07/2005US20050147767 Method for coating a support with a material
07/07/2005US20050147753 Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum
07/07/2005US20050147742 Control of particle generation from such components due to thermal changes or cycling in semiconductor manufacture to prevent defects; cladding a layer of higher thermoconductivity such as copper unto a low thermoconductive base layer such as stainless steel in contact with a heat sink
07/07/2005US20050147150 Thermography test method and apparatus for bonding evaluation in sputtering targets
07/07/2005US20050146683 Optical component and coating system for coating substrates for optical components
07/07/2005US20050146036 Method of forming a metal silicide layer on non-planar-topography polysilicon
07/07/2005US20050145907 Method to sputter deposit metal on a ferroelectric polymer
07/07/2005US20050145866 Method and apparatus for forming thin film of organic electroluminescent device
07/07/2005US20050145847 Electronic circuit
07/07/2005US20050145479 Using reactive magnetron sputtering to form wear resistance nitride layer with reduced compressive residual stress, preferably based on Al and/or Si and/or Cr, onto cutting tools for machining by chip removal
07/07/2005US20050145478 Two dimensional magnetron scanning for flat panel sputtering
07/07/2005US20050145477 Device for targeted application of deposition material to a substrate
07/07/2005US20050145335 Installation for the vacuum treatment in particular of substrates
07/07/2005US20050145179 Accessory member for dispensers of alkali metals
07/07/2005US20050145175 Method for making zone-bonded lubricant layer for magnetic hard discs
07/07/2005US20050144982 Glass molding tool
07/07/2005DE202005004589U1 Mobile electrostatic substrate holder including a dielectric and made from very high purity materials and layers, useful in electronics and semiconductor technology
07/07/2005DE10392235T5 Vorrichtung zur Plasmabearbeitung The plasma processing apparatus
07/07/2005DE10356900A1 Process and assembly to die-cut packaging material e.g. cardboard, crystalline panel or pinhole structure to a pre-determined depth
07/07/2005DE10352144A1 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten Vacuum coating plant for coating elongate substrates
07/07/2005DE10122070B4 Kathodenzerstäubungskammer zum Aufbringen von Material auf der Oberfläche einer in der Kammer befindlichen Halbleiterscheibe Sputtering chamber for depositing material on the surface of an in-chamber semiconductor wafer
07/07/2005CA2550446A1 Protective layer for optical coatings with enhanced corrosion and scratch resistance
07/06/2005EP1550744A1 Thermal barrier coatings with lower porosity for improved impact and erosion resistance
07/06/2005EP1550743A2 Thermal barrier coatings having lower layer for improved adherence to bond coat
07/06/2005EP1550737A1 Thermal barrier coatings with improved impact and erosion resistance
07/06/2005EP1550645A2 Ceramic compositions for thermal barrier coatings stabilized in the cubic crystalline phase
07/06/2005EP1550644A1 Ceramic compositions useful in thermal barrier coatings having reduced thermal conductivity
07/06/2005EP1550643A2 Ceramic compositions for low conductivity thermal barrier coatings
07/06/2005EP1550642A2 Ceramic compositions useful for thermal barrier coatings having reduced thermal conductivity
07/06/2005EP1549779A2 Method to recover spent components of a sputter target
07/06/2005EP1549248A2 High strength vacuum deposited nitionol alloy films, medical thin film graft materials and method of making same
07/06/2005CN2707774Y Heating device for vacuum coating machine
07/06/2005CN1636078A Method and device for manufacturing semiconductor or insulator/metallic laminar composite cluster
07/06/2005CN1636077A Method and device for coating a substrate
07/06/2005CN1636076A Magnetron negative ion sputter source
07/06/2005CN1635177A Apparatus for inner surface modification by plasma source ion implantation
07/06/2005CN1635176A Process for fabricating magnetic direct current magnetron sputtering cobalt target material
07/06/2005CN1635175A Process for preparing TiNiPd shape memory alloy free film
07/06/2005CN1209953C Preparing method for surface electromagnetic screening membrane layer in plastic handset shell
07/06/2005CN1209681C Mask for making display panel
07/06/2005CN1209491C Method and special apparatus for modifying inner surface of tubular workpiece
07/06/2005CN1209490C ZnS-SiO2 sputtering target and optical recording medium having ZnS-SiO2 protective film for phase change type optical disk formed by using said target
07/06/2005CN1209489C Zinc-tin alloy sputtering target
07/06/2005CN1209488C Heating temperature controller for preparation of film and using method thereof
07/06/2005CN1209487C Device and method for treating dry surface
07/06/2005CN1209486C SiC/TiN superhard nano multi-layer film and manufacturing process thereof
07/06/2005CN1209485C Thin film depositing devices
07/05/2005US6914675 Ellipsometric method and control device for making a thin-layered component
07/05/2005US6914012 Article comprising an oxide layer on a GaAs-based semiconductor structure and method of forming same
07/05/2005US6913998 Vapor-deposited porous films for energy conversion
07/05/2005US6913843 73-93 wt % WC, 4-12 wt % binder phase, and Group IVB and/or VB cubic carbide phase with a binder phase enriched surface zone free of cubic carbide phase; cutting tool inserts with good edge strength and thermal shock resistance
07/05/2005US6913811 Photocatalytic colored member and method of manufacturing the same
07/05/2005US6913808 Barrier film having high colorless transparency and method
07/05/2005US6913795 Method of making tetrahedral amorphous carbon film including fluorine atoms
07/05/2005US6913675 Two types of film forming mechanisms in the same chamber
06/2005
06/30/2005WO2005059199A1 Thin-film deposition apparatus and thin-film deposition method
06/30/2005WO2005059198A1 Aluminum base target and process for producing the same
06/30/2005WO2005059197A2 Method and device for magnetron sputtering
06/30/2005WO2005043965A3 Method for production of a transponder
06/30/2005WO2005041324A3 In-line deposition processes for thin film battery fabrication
06/30/2005WO2005024093A8 A stainless steel strip coated with aluminium
06/30/2005WO2005024089A3 Composite wires for vapour deposition
06/30/2005WO2005011080A3 Apparatus for and method of cooling and positioning a translating substrate tape for use with a continuous vapor deposition process
06/30/2005WO2005007918A3 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape
06/30/2005WO2005006351A3 Apparatus for and method of continuous hts tape buffer layer deposition using large scale ion beam assisted deposition
06/30/2005WO2004095544A3 Substrate with multiple conductive layers and methods for making and using same
06/30/2005WO2004087415A3 Method of making coated articles and coated articles made thereby
06/30/2005US20050142463 Thin films; sputtering target in vacuum; multilayer construction; crhromium nitride; chromium carbide and chromium oxynitride overcoating transparent substrate; photolithography
06/30/2005US20050142395 Ceramic compositions useful in thermal barrier coatings having reduced thermal conductivity
06/30/2005US20050142394 Thermal barrier coatings with lower porosity for improved impact and erosion resistance
06/30/2005US20050142393 Ceramic of zirconia stabilized in the cubic crystalline phase with three metal oxides (e.g. yttria, ytterbia, hafnia or tantalum oxide); physical vapor deposition onto metal substrate exposed to high temperatures
06/30/2005US20050142392 zirconia and stabilizer with three metal oxides (yttria, lanthana and ytterbia); physical vapor deposition onto metal substrate exposed to high temperatures; columnar microstructure