Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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02/03/2005 | US20050025975 Gear |
02/03/2005 | US20050025959 Hard pellicle and fabrication thereof |
02/03/2005 | US20050025887 Hydrogen sulfide injection method for phosphor deposition |
02/03/2005 | US20050024795 Electrical lead structures for magnetoresistive sensors for magnetic heads and fabrication method therefor |
02/03/2005 | US20050024745 Coating for forming a high definition aperture |
02/03/2005 | US20050023627 Lanthanide doped TiOx dielectric films by plasma oxidation |
02/03/2005 | US20050023579 Semiconductor Device and method of fabricating the same |
02/03/2005 | US20050023135 Vacuum treatment system and process for manufacturing workpieces |
02/03/2005 | US20050023134 Producing a thin layer of a metal or metal alloy with plasma, ionic beam deposition or cathodic deposition |
02/03/2005 | US20050023133 The rate at which material particles are sputtered from the target and deposited on the wafer is controllable in response to power supplied to the target; maintaining a desired deposition rate maintains the wafer temperature below the critical temperature. |
02/03/2005 | US20050023132 Sensor including a source element that projects an energy beam onto the target surface; and detectors in a linear array and that detect reflection of the beam from the sputtering surface |
02/03/2005 | US20050023131 Method and apparatus for forming fluoride thin film |
02/03/2005 | US20050023130 Reactive sputtering method |
02/03/2005 | US20050023129 of high density exhibiting excellent uniformity, while causing minimal damage to underlying layer; silicon nitride; indium tin oxide |
02/03/2005 | US20050022747 Apparatus for synthesis of layers, coatings or films |
02/03/2005 | US20050022743 Evaporation container and vapor deposition apparatus |
02/03/2005 | DE202004011153U1 Coating curved substrates, e.g. head lamp surfaces with patterned optical layers, provides coating in one area but not in another, adjacent area |
02/03/2005 | DE10327897A1 Verfahren zur Herstellung glatter Indium-Zinn-Oxidschichten auf Substraten sowie Substratbeschichtung aus Indium-Zinn-Oxid A process for producing smooth indium tin oxide coatings on substrates and substrate coating of indium tin oxide |
02/02/2005 | EP1503113A2 Gear |
02/02/2005 | EP1502694A2 Nozzle for cutting or welding |
02/02/2005 | EP1502295A1 Method of making transistors |
02/02/2005 | EP1502293A2 Method for the production of structured layers on substrates |
02/02/2005 | EP1501960A2 Physical vapor deposition components and methods of formation |
02/02/2005 | EP1501759A1 Method for the production of a metal oxide powder or a semiconductor oxide powder, oxide powder, solid body, and the use thereof |
02/02/2005 | EP1501671A2 Silver alloy thin film reflector and transparent electrical conductor |
02/02/2005 | EP1402082B1 Apparatus for vacuum vaporization |
02/02/2005 | EP1033068B1 Plasma processing apparatus having rotating magnets |
02/02/2005 | CN2675685Y Evaporation film plating machine with radio-frequency plasma polymerization |
02/02/2005 | CN2675684Y Jacket type multiple arc vacuum ionic plating apparatus |
02/02/2005 | CN1575518A Integration of barrier layer and seed layer |
02/02/2005 | CN1575350A Method and apparatus of producing uniform isotropic stresses in a sputtered film |
02/02/2005 | CN1575349A Device and method for vacuum deposition, and organic electroluminescent element provided by the device and the method |
02/02/2005 | CN1575323A Pigment having metallic lustre |
02/02/2005 | CN1575219A Metallized cutlery and tableware |
02/02/2005 | CN1575058A Deposition mask, method for manufacturing display unit using it, and display unit |
02/02/2005 | CN1574232A Vacuum chamber for vacuum processing device |
02/02/2005 | CN1573064A Engine piston-pin sliding structure |
02/02/2005 | CN1572905A A method of forming a nanocomposite coating |
02/02/2005 | CN1572901A Multistation coating device and method for plasma coating |
02/02/2005 | CN1572900A Sputter source, sputtering device, and sputtering method |
02/02/2005 | CN1572899A Method for producing smooth indium-tin-oxide layers on substrates and a substrate coating of indium-tin-oxide |
02/02/2005 | CN1572898A Non-evaporable getter multilayer deposits obtained by cathodic deposition and process for their manufacturing |
02/02/2005 | CN1572897A Method and apparatus for manufacturing a thin film, thin-film laminate, and electronic parts |
02/02/2005 | CN1572724A Nitrogen-containing carbonaceous material and process for production thereof |
02/02/2005 | CN1572400A Hard coating for cutting tool |
02/02/2005 | CN1188015C Method for depositing aluminium-lithium alloy cathode onto organic light emitting element |
02/02/2005 | CN1188014C Method for mag. electroluminescence display and appts. for forming film |
02/02/2005 | CN1187771C Silver base conductive cold preventive welding film and preparing method thereof |
02/02/2005 | CN1187472C Equipment and method for forming deposit membrane |
02/02/2005 | CN1187471C Process for producing conductive cloth |
02/02/2005 | CN1187470C Crucible type evaporator source used for organic electrofluorescence type film plating machines |
02/02/2005 | CN1187469C Tool having protective layer system |
02/01/2005 | US6849908 Semiconductor device and method of manufacturing the same |
02/01/2005 | US6849857 Beam processing apparatus |
02/01/2005 | US6849832 Evaporation apparatus |
02/01/2005 | US6849555 Wafer processing apparatus and wafer processing method using the same |
02/01/2005 | US6849344 Having integral incorporation of a platinum group metal or alloy thereof directly or indirectly attached to a minor surface portion of article |
02/01/2005 | US6849321 Surfaces with gradients in surface topography |
02/01/2005 | US6849299 Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating |
02/01/2005 | US6849165 Combined high frequency/direct current sputtering of an ITO target to form a transparent film with particularly low resistance and a small surface roughness; process gas is supplemented by an argon/hydrogen mixture |
02/01/2005 | US6849151 Monitoring substrate processing by detecting reflectively diffracted light |
02/01/2005 | US6849139 Methods of forming copper-containing sputtering targets |
02/01/2005 | US6848608 Bonding a backing plate to targets in recesses in a top surface of a casement and removing the casement to retrieve said sputtering targets. |
01/27/2005 | WO2005008688A1 Process for producing oxide superconductive wire |
01/27/2005 | WO2005007924A1 Sputtering target constructions |
01/27/2005 | WO2005007923A1 Ag BASE SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME |
01/27/2005 | WO2005007920A2 Sputtering target assembly having low conductivity backing plate and method of making same |
01/27/2005 | WO2005007918A2 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape |
01/27/2005 | WO2005007728A1 Continuous surface-treating apparatus for three-dimensional shape of polymer and continuous surface-treating method thereof |
01/27/2005 | WO2004106580B1 Mask retaining device |
01/27/2005 | WO2004099458A3 METHODS FOR MAKING LOW SILICON CONTENT Ni-Si SPUTTERING TARGETS AND TARGETS MADE THEREBY |
01/27/2005 | WO2004097909A3 Method and apparatus for deep trench silicon etch |
01/27/2005 | WO2004092438B1 Segmented sputtering target and method/apparatus for using same |
01/27/2005 | WO2004092430A3 Composition for making metal matrix composites |
01/27/2005 | WO2004076706A3 A method of forming sputtering target assembly and assemblies made therefrom |
01/27/2005 | WO2004068148A3 Method of and apparatus for measurement and control of a gas cluster ion beam |
01/27/2005 | WO2004042111A3 Lock arrangement for a substrate coating installation |
01/27/2005 | WO2004032184B1 Low temperature salicide forming materials and sputtering targets formed therefrom |
01/27/2005 | WO2004027898A3 Anode compositions having an elastomeric binder and an adhesion promoter |
01/27/2005 | WO2003063200A3 Method for improving the adhesion of a coating |
01/27/2005 | US20050020444 forming a photocatalytic material such as titanium oxide in an amorphous state by sputtering or other methods, and then heat-treating |
01/27/2005 | US20050020062 Substrate with multiple conductive layers and methods for making and using same |
01/27/2005 | US20050020017 Lanthanide oxide / hafnium oxide dielectric layers |
01/27/2005 | US20050019968 Deposition mask, manufacturing method thereof, display unit, manufacturing method thereof, and electronic apparatus including display unit |
01/27/2005 | US20050019617 Overcoating polymer with metal oxide composite |
01/27/2005 | US20050019615 Biaxially textured composite substrates |
01/27/2005 | US20050019613 High wear resistant hard film |
01/27/2005 | US20050019579 Carbon material and process of manufacturing |
01/27/2005 | US20050019503 Plasma enhanced chemical vapor deposition of a silicon dioxide film impervious to water vapor; improved permselectivity while retaining a predetermined thickness; food, medicine and electronics packaging materials |
01/27/2005 | US20050019242 Nanostructure; electroconductivity; solid supttering target |
01/27/2005 | US20050019203 Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrate |
01/27/2005 | US20050019026 Delivery systems for efficient vaporization of precursor source material |
01/27/2005 | US20050018036 Biological laser printing via indirect photon-biomaterial interactions |
01/27/2005 | US20050017269 Ferroelectric memory device |
01/27/2005 | US20050016843 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
01/27/2005 | US20050016842 Fixture for electro-chemical machining |
01/27/2005 | US20050016838 Ion source apparatus and cleaning optimized method thereof |
01/27/2005 | US20050016837 Controlling heat treatment , pulsation; power flux generated by particle emission; process control |
01/27/2005 | US20050016836 Single layer CoTbAg thin films for heat assisted magnetic recording |
01/27/2005 | US20050016835 multilayer laminate; sputtering silica onto exterior surface of glass sheets, then reflective and dielectric layers; one step sputtering |