Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2005
02/03/2005US20050025975 Gear
02/03/2005US20050025959 Hard pellicle and fabrication thereof
02/03/2005US20050025887 Hydrogen sulfide injection method for phosphor deposition
02/03/2005US20050024795 Electrical lead structures for magnetoresistive sensors for magnetic heads and fabrication method therefor
02/03/2005US20050024745 Coating for forming a high definition aperture
02/03/2005US20050023627 Lanthanide doped TiOx dielectric films by plasma oxidation
02/03/2005US20050023579 Semiconductor Device and method of fabricating the same
02/03/2005US20050023135 Vacuum treatment system and process for manufacturing workpieces
02/03/2005US20050023134 Producing a thin layer of a metal or metal alloy with plasma, ionic beam deposition or cathodic deposition
02/03/2005US20050023133 The rate at which material particles are sputtered from the target and deposited on the wafer is controllable in response to power supplied to the target; maintaining a desired deposition rate maintains the wafer temperature below the critical temperature.
02/03/2005US20050023132 Sensor including a source element that projects an energy beam onto the target surface; and detectors in a linear array and that detect reflection of the beam from the sputtering surface
02/03/2005US20050023131 Method and apparatus for forming fluoride thin film
02/03/2005US20050023130 Reactive sputtering method
02/03/2005US20050023129 of high density exhibiting excellent uniformity, while causing minimal damage to underlying layer; silicon nitride; indium tin oxide
02/03/2005US20050022747 Apparatus for synthesis of layers, coatings or films
02/03/2005US20050022743 Evaporation container and vapor deposition apparatus
02/03/2005DE202004011153U1 Coating curved substrates, e.g. head lamp surfaces with patterned optical layers, provides coating in one area but not in another, adjacent area
02/03/2005DE10327897A1 Verfahren zur Herstellung glatter Indium-Zinn-Oxidschichten auf Substraten sowie Substratbeschichtung aus Indium-Zinn-Oxid A process for producing smooth indium tin oxide coatings on substrates and substrate coating of indium tin oxide
02/02/2005EP1503113A2 Gear
02/02/2005EP1502694A2 Nozzle for cutting or welding
02/02/2005EP1502295A1 Method of making transistors
02/02/2005EP1502293A2 Method for the production of structured layers on substrates
02/02/2005EP1501960A2 Physical vapor deposition components and methods of formation
02/02/2005EP1501759A1 Method for the production of a metal oxide powder or a semiconductor oxide powder, oxide powder, solid body, and the use thereof
02/02/2005EP1501671A2 Silver alloy thin film reflector and transparent electrical conductor
02/02/2005EP1402082B1 Apparatus for vacuum vaporization
02/02/2005EP1033068B1 Plasma processing apparatus having rotating magnets
02/02/2005CN2675685Y Evaporation film plating machine with radio-frequency plasma polymerization
02/02/2005CN2675684Y Jacket type multiple arc vacuum ionic plating apparatus
02/02/2005CN1575518A Integration of barrier layer and seed layer
02/02/2005CN1575350A Method and apparatus of producing uniform isotropic stresses in a sputtered film
02/02/2005CN1575349A Device and method for vacuum deposition, and organic electroluminescent element provided by the device and the method
02/02/2005CN1575323A Pigment having metallic lustre
02/02/2005CN1575219A Metallized cutlery and tableware
02/02/2005CN1575058A Deposition mask, method for manufacturing display unit using it, and display unit
02/02/2005CN1574232A Vacuum chamber for vacuum processing device
02/02/2005CN1573064A Engine piston-pin sliding structure
02/02/2005CN1572905A A method of forming a nanocomposite coating
02/02/2005CN1572901A Multistation coating device and method for plasma coating
02/02/2005CN1572900A Sputter source, sputtering device, and sputtering method
02/02/2005CN1572899A Method for producing smooth indium-tin-oxide layers on substrates and a substrate coating of indium-tin-oxide
02/02/2005CN1572898A Non-evaporable getter multilayer deposits obtained by cathodic deposition and process for their manufacturing
02/02/2005CN1572897A Method and apparatus for manufacturing a thin film, thin-film laminate, and electronic parts
02/02/2005CN1572724A Nitrogen-containing carbonaceous material and process for production thereof
02/02/2005CN1572400A Hard coating for cutting tool
02/02/2005CN1188015C Method for depositing aluminium-lithium alloy cathode onto organic light emitting element
02/02/2005CN1188014C Method for mag. electroluminescence display and appts. for forming film
02/02/2005CN1187771C Silver base conductive cold preventive welding film and preparing method thereof
02/02/2005CN1187472C Equipment and method for forming deposit membrane
02/02/2005CN1187471C Process for producing conductive cloth
02/02/2005CN1187470C Crucible type evaporator source used for organic electrofluorescence type film plating machines
02/02/2005CN1187469C Tool having protective layer system
02/01/2005US6849908 Semiconductor device and method of manufacturing the same
02/01/2005US6849857 Beam processing apparatus
02/01/2005US6849832 Evaporation apparatus
02/01/2005US6849555 Wafer processing apparatus and wafer processing method using the same
02/01/2005US6849344 Having integral incorporation of a platinum group metal or alloy thereof directly or indirectly attached to a minor surface portion of article
02/01/2005US6849321 Surfaces with gradients in surface topography
02/01/2005US6849299 Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating
02/01/2005US6849165 Combined high frequency/direct current sputtering of an ITO target to form a transparent film with particularly low resistance and a small surface roughness; process gas is supplemented by an argon/hydrogen mixture
02/01/2005US6849151 Monitoring substrate processing by detecting reflectively diffracted light
02/01/2005US6849139 Methods of forming copper-containing sputtering targets
02/01/2005US6848608 Bonding a backing plate to targets in recesses in a top surface of a casement and removing the casement to retrieve said sputtering targets.
01/2005
01/27/2005WO2005008688A1 Process for producing oxide superconductive wire
01/27/2005WO2005007924A1 Sputtering target constructions
01/27/2005WO2005007923A1 Ag BASE SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME
01/27/2005WO2005007920A2 Sputtering target assembly having low conductivity backing plate and method of making same
01/27/2005WO2005007918A2 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape
01/27/2005WO2005007728A1 Continuous surface-treating apparatus for three-dimensional shape of polymer and continuous surface-treating method thereof
01/27/2005WO2004106580B1 Mask retaining device
01/27/2005WO2004099458A3 METHODS FOR MAKING LOW SILICON CONTENT Ni-Si SPUTTERING TARGETS AND TARGETS MADE THEREBY
01/27/2005WO2004097909A3 Method and apparatus for deep trench silicon etch
01/27/2005WO2004092438B1 Segmented sputtering target and method/apparatus for using same
01/27/2005WO2004092430A3 Composition for making metal matrix composites
01/27/2005WO2004076706A3 A method of forming sputtering target assembly and assemblies made therefrom
01/27/2005WO2004068148A3 Method of and apparatus for measurement and control of a gas cluster ion beam
01/27/2005WO2004042111A3 Lock arrangement for a substrate coating installation
01/27/2005WO2004032184B1 Low temperature salicide forming materials and sputtering targets formed therefrom
01/27/2005WO2004027898A3 Anode compositions having an elastomeric binder and an adhesion promoter
01/27/2005WO2003063200A3 Method for improving the adhesion of a coating
01/27/2005US20050020444 forming a photocatalytic material such as titanium oxide in an amorphous state by sputtering or other methods, and then heat-treating
01/27/2005US20050020062 Substrate with multiple conductive layers and methods for making and using same
01/27/2005US20050020017 Lanthanide oxide / hafnium oxide dielectric layers
01/27/2005US20050019968 Deposition mask, manufacturing method thereof, display unit, manufacturing method thereof, and electronic apparatus including display unit
01/27/2005US20050019617 Overcoating polymer with metal oxide composite
01/27/2005US20050019615 Biaxially textured composite substrates
01/27/2005US20050019613 High wear resistant hard film
01/27/2005US20050019579 Carbon material and process of manufacturing
01/27/2005US20050019503 Plasma enhanced chemical vapor deposition of a silicon dioxide film impervious to water vapor; improved permselectivity while retaining a predetermined thickness; food, medicine and electronics packaging materials
01/27/2005US20050019242 Nanostructure; electroconductivity; solid supttering target
01/27/2005US20050019203 Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrate
01/27/2005US20050019026 Delivery systems for efficient vaporization of precursor source material
01/27/2005US20050018036 Biological laser printing via indirect photon-biomaterial interactions
01/27/2005US20050017269 Ferroelectric memory device
01/27/2005US20050016843 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
01/27/2005US20050016842 Fixture for electro-chemical machining
01/27/2005US20050016838 Ion source apparatus and cleaning optimized method thereof
01/27/2005US20050016837 Controlling heat treatment , pulsation; power flux generated by particle emission; process control
01/27/2005US20050016836 Single layer CoTbAg thin films for heat assisted magnetic recording
01/27/2005US20050016835 multilayer laminate; sputtering silica onto exterior surface of glass sheets, then reflective and dielectric layers; one step sputtering