Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2005
01/18/2005US6843883 Vacuum processing apparatus and method for producing an object to be processed
01/18/2005US6843556 System for producing patterned deposition from compressed fluid in a dual controlled deposition chamber
01/13/2005WO2005004314A2 Dual magnetrong sputtering apparatus utilizing control means for delivering balanced power
01/13/2005WO2005004189A2 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith
01/13/2005WO2005003402A2 Hydrogen sulfide injection method for phosphor deposition
01/13/2005WO2005003049A1 Concentration-modulated coatings
01/13/2005WO2004035855A3 Method of producing a high density pattern of isolated clusters
01/13/2005WO2003097894A3 Sputtering cathode adapter
01/13/2005US20050009451 Blasting apparatus
01/13/2005US20050009334 Method of producing multilayer interconnection structure
01/13/2005US20050008937 Nickel alloy target of carthodic sputtering device
01/13/2005US20050008883 Reflective Ag alloy film for reflectors and reflector provided with the same
01/13/2005US20050008871 surface treatment with release agents; activation with plasma
01/13/2005US20050008834 Hillock-free aluminum layer and method of forming the same
01/13/2005US20050008778 Evaporation onto flexible substrate; controlling shape of pattern; battery electrode
01/13/2005US20050008775 Method of forming dielectric optical thin film
01/13/2005US20050008559 Nitrogen-containing carbonaceous material and process for production thereof
01/13/2005US20050008352 Substrate processing method
01/13/2005US20050006768 Vapor deposition of a amorphous, solidified dielectric overcoating substrate using pulsed dirert current
01/13/2005US20050006599 Production of nanocrystal beams
01/13/2005US20050006232 [ionized physical vapor deposition process and apparatus thereof]
01/13/2005US20050006231 cathodic polarization; vapor deposition; bottom-up filling of trenches/vias within sidewalls to avoid production of seams/voids; for production of integrated circuits
01/13/2005US20050006230 Semiconductor processing system
01/13/2005US20050006227 Ion milling in batch mode; orientation control of each slider with an array of MEMS devices based on ion angle and relative etch rate
01/13/2005US20050006226 System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
01/13/2005US20050006225 Apparatus and method to deposit magnesium oxide film on a large area
01/13/2005US20050006223 Sputter deposition masking and methods
01/13/2005US20050006222 Self-ionized and inductively-coupled plasma for sputtering and resputtering
01/13/2005US20050006220 Ionizing a gas; supplying electricity field to activation
01/13/2005US20050005860 Vacuum evaporator
01/13/2005US20050005857 Device and method for vacuum deposition, and organic electroluminescent element provided by the device and the method
01/13/2005US20050005852 Multiple axis tumbler coating apparatus
01/13/2005US20050005850 Method of fabricating an EL display device, and apparatus for forming a thin film
01/13/2005US20050005848 Apparatus for forming a film and an electroluminescence device
01/13/2005US20050005846 High throughput continuous pulsed laser deposition process and apparatus
01/13/2005CA2528839A1 Hydrogen sulfide injection method for phosphor deposition
01/12/2005EP1496731A1 Fast production method for printed board
01/12/2005EP1496136A1 Vacuum Evaporator
01/12/2005EP1496135A1 Spattering device, method of forming thin film by spattering, and method of manufacturing disk-like recording medium using the device
01/12/2005EP1496134A1 Vapor deposition apparatus.
01/12/2005EP1496133A1 Assembly for crucible used for evaporation of raw materials.
01/12/2005EP1496130A1 High purity tantalum for producing sputter targets
01/12/2005EP1495501A2 Hermetic encapsulation of organic electro-optical elements
01/12/2005EP1495493A2 Method for producing a copy protection for an electronic circuit
01/12/2005EP1495491A2 Method for connecting substrates and composite element
01/12/2005EP1495489A2 Methods for the formation of thin film layers using short-time thermal processes
01/12/2005EP1495155A1 Low contamination components for semiconductor processing apparatus and methods for making components
01/12/2005EP1495154A1 Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby
01/12/2005EP1495153A1 Method for coating metal surfaces and substrate having a coated metal surface
01/12/2005EP1495152A2 Coating installation
01/12/2005EP1494965A2 Method for producing a product having a structured surface
01/12/2005EP1448366A4 Forming thin films on substrates using a porous carrier
01/12/2005EP0995214B1 Method and apparatus for neutralising space charge in an ion beam
01/12/2005CN2670377Y Surface modifier in double magnetic assistant piping workpiece
01/12/2005CN1565043A Extraction and deceleration of low energy beam with low beam divergence
01/12/2005CN1564876A Thin metal oxide film and process for producing the same
01/12/2005CN1564336A Preparing high giant magnetic resistance effect nano multiplayer membrane on silicon-based chip by sputtering process and its prepn. method
01/12/2005CN1563476A Flexible clamp in use for filming face of cavity of semiconductor laser
01/12/2005CN1562843A Titanium nitride based self-cleaned coated glass in low radiation, and preparation
01/12/2005CN1562842A Structured multilayered films coated glass and production method
01/12/2005CN1184666C DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention
01/12/2005CN1184347C Method and apparatus for mfg. thin film
01/12/2005CA2473332A1 Method for coating and/or partial extrusion-coating of flexible, elongated products
01/11/2005US6841942 Plasma source with reliable ignition
01/11/2005US6841789 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
01/11/2005US6841490 Semiconductor substrate, SOI substrate and manufacturing method therefor
01/11/2005US6841485 Method of manufacturing semiconductor device and manufacturing line thereof
01/11/2005US6841202 Device and method for the vacuum plasma processing of objects
01/11/2005US6841200 Transferring a processed substrate from environment to a substrate holder disposed in the chamber, moving a cooling plate to contact the processed substrate, venting the chamber, and removing the processed substrate
01/11/2005US6841082 Method of manufacturing Er-doped silicon nano-dot array and laser ablation appparatus used therein
01/11/2005US6841051 High-power ion sputtering magnetron
01/11/2005US6841050 Small planetary magnetron
01/11/2005US6841049 Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
01/11/2005US6841048 Coating apparatus for disk-shaped workpieces
01/11/2005US6841045 Sputtering in a hydrogen sulphide atmosphere from a single source formulation so as to deposit on a substrate; formulation of targets of the single source has a relative increase in concentration of elements of phosphor
01/11/2005US6841044 Chemically-enhanced physical vapor deposition
01/11/2005US6840431 Methods of bonding two aluminum-comprising masses to one another
01/11/2005US6840427 Method of manufacturing sputter targets with internal cooling channels
01/11/2005CA2306786C Multilayer metalized composite on polymer film product and process
01/06/2005WO2005002020A2 Apparatus for high-throughput ion beam assisted deposition (ibad)
01/06/2005WO2005001925A1 Vacuum processing device operating method
01/06/2005WO2005001918A1 Traps for particle entrapment in deposition chambers
01/06/2005WO2005001157A2 Device and method for coating roll substrates in vacuum
01/06/2005WO2005001156A2 Sputtering source for ionized physical vapor deposition of metals
01/06/2005WO2005001155A1 Sintered parts consisting of zinc oxide
01/06/2005WO2005001154A1 Multinary deposition film production stabilizing device and method, and tool with multinary deposition film
01/06/2005WO2005001153A1 Production device for multiple-system film and coating tool for multiple-system film
01/06/2005WO2005000947A1 Composite material
01/06/2005WO2005000759A2 Dielectric-layer-coated substrate and installation for production thereof
01/06/2005WO2005000758A2 Dielectric-layer-coated substrate and installation for production thereof
01/06/2005WO2004077519A3 Dielectric barrier layer films
01/06/2005WO2004061153A3 Magnetron sputtering systems including anodic gas distribution systems
01/06/2005WO2004048636A3 Method of cleaning a coated process chamber component
01/06/2005WO2004033742B1 Pvd target and method of treating target
01/06/2005WO2004027684B1 Photolithography mask repair
01/06/2005WO2004025696A3 Active matrix backplane for controlling controlled elements and method of manufacture thereof
01/06/2005US20050004576 System for securing sutures, grafts and soft tissue to bone and periosteum
01/06/2005US20050003672 Method and apparatus for smoothing surfaces on an atomic scale
01/06/2005US20050003241 Method to increase wear resistance of a tool or other machine component
01/06/2005US20050003240 Wear and corrosion resistance; chemical resistance