Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2005
04/19/2005US6881498 Surface process involving isotropic superfinishing
04/19/2005US6881475 Amorphous carbon coated tool and fabrication method thereof
04/19/2005US6881446 Production of endless plastic hollow profiles, in particular tubes, comprises several production stages for the plastic tube and a coating stage for a metal coating. A reduced pressure is provided in the coating stage, whereby the metal
04/19/2005US6881445 Forming thin films on substrates using a porous carrier
04/19/2005US6881311 Facing-targets-type sputtering apparatus
04/19/2005US6881305 Heated and cooled vacuum chamber shield
04/19/2005US6881276 Detecting the endpoint of a chamber cleaning
04/19/2005US6881271 Fixing member for evaporation apparatus
04/19/2005US6881270 Electrode arrangement
04/19/2005US6880264 Vacuum processing apparatus and operating method therefor
04/19/2005US6880234 Method for thin film NTC thermistor
04/19/2005CA2360617C Composition for vapor deposition, method for forming antireflection film using it, and optical element with antireflection film
04/14/2005WO2005034190A2 Heat treatable coated article with niobium zirconium inclusive ir refelecting layer and method of making same
04/14/2005WO2005033360A1 Polysulfide thermal vapour source for thin sulfide film deposition
04/14/2005WO2005033356A1 Anti-corrosive engine oil system components
04/14/2005WO2005033355A1 High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide
04/14/2005WO2005033354A1 Homogeneous mixtures of organic materials
04/14/2005WO2005033351A2 Protection of metallic surfaces against thermally-induced wrinkling (rumpling) in particular in gas turbines
04/14/2005WO2005021824A3 Process for the production of strongly adherent coatings
04/14/2005WO2005001157A3 Device and method for coating roll substrates in vacuum
04/14/2005WO2004091501A3 Process for measuring the skin surface of an examined person
04/14/2005WO2004075624A3 System and methods for achieving signaling
04/14/2005US20050079418 Substrate may be rigid or flexible, cathode is lithium transition metal oxide, electrolyte is lithium phosphorus oxynitride; chemical vapor deposition, electron beam evaporation through flexible, adjustable shadow mask
04/14/2005US20050079370 Nano-multilayered structures, components and associated methods of manufacture
04/14/2005US20050079297 Method for forming inorganic oriented film, inorganic oriented film, substrate for electronic device, liquid crystal panel, and electronic device
04/14/2005US20050079284 Method of applying an optical coating to an article surface
04/14/2005US20050079281 Vaccum deposition of dielectric coatings on volatile material
04/14/2005US20050079278 patterned coating of non-polymeric compounds (aluminum (8-hydroxyquinoline)) on a substrate; high quality, high throughput
04/14/2005US20050078248 Method of forming inorganic alignment film, inorganic alignment film, substrate for electronic device, liquid crystal panel and electronic apparatus
04/14/2005US20050077811 Field emission device and method of fabricating same
04/14/2005US20050077519 Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate gate dielectrics
04/14/2005US20050077478 Process for manufacturing radiation image storage panel
04/14/2005US20050076825 Method of synthesizing a compound of the formula mn+1axn5 film of the compound and its use
04/14/2005DE10342398A1 Schutzschicht für einen Körper sowie Verfahren und Anordnung zur Herstellung von Schutzschichten Protective layer for a body as well as methods and apparatus for the production of protective layers
04/14/2005DE10341914A1 Device for producing thin layers of coating components/elements, alloys or compounds on a substrate comprises a cylindrical pot, a cylindrical tube, a substrate heater, a lid, a radiation shield, and a source for the coating components
04/14/2005DE10325410B4 Verfahren zur Herstellung einer nickelarmen Oberfläche auf Nitinol A process for preparing a low-nickel surface on Nitinol
04/14/2005CA2540592A1 Polysulfide thermal vapour source for thin sulfide film deposition
04/13/2005EP1523002A2 Information recording medium, method of manufacturing the same, and sputtering target
04/13/2005EP1522609A2 Conductive sheet having a metal layer on at least one portion of an insulating substrate, product using the same, and manufacturing method thereof
04/13/2005EP1522607A1 Method for fabricating a coated superalloy stabilized against the formation of secondary reaction zone
04/13/2005EP1522606A1 Method for coating strip-shaped material with black aluminium oxide
04/13/2005EP1522603A1 Method for coating an object and object
04/13/2005EP1522533A1 Target destined for electron beam evaporation, its process of manufacture, a thermal barrier layer obtained using the target and a workpiece comprising such a layer.
04/13/2005EP1522403A2 Gas barrier film
04/13/2005EP1399945B1 Magnetron atomisation source
04/13/2005EP1264005A4 Plasma polymerization system and method for plasma polymerization
04/13/2005CN1606795A Magnet array in conjunction with rotating magnetron for plasma sputtering
04/13/2005CN1606793A Device for treating objects by plasma deposition
04/13/2005CN1606705A Film forming device, and production method for optical member
04/13/2005CN1606633A Method for connecting magnetic substance target to backing plate, and magnetic substance target
04/13/2005CN1606400A Conductive sheet, product using the same, and manufacturing method thereof
04/13/2005CN1606080A Information recording medium, method of manufacturing the same, and sputtering target
04/13/2005CN1605888A Process for preparing optical element with anti-reflect film
04/13/2005CN1605654A Method for magnetron sputtering preparation of (HAú½Zro#-[2]ú½Y#-[2]O#-[3])/Ti#-[6]Al#-[4]V bio-based composites endosteal implant
04/13/2005CN1605653A Sputtering apparatus
04/13/2005CN1605652A Vacuum thermal evaporation film-forming method using strong electric field
04/13/2005CN1605460A Nano-multilayered structures, components and associated methods of manufacture
04/13/2005CN1197134C Low relative permittivity SiOx film, production method, semiconductor device using the same
04/13/2005CN1197125C Method for producing thermal plate and semi-conductor device
04/13/2005CN1196806C Manufacture of tubular targets
04/13/2005CN1196556C Cutting knife tool with carbonitride layer
04/12/2005US6879107 Plasma display panel and fabrication method of the same
04/12/2005US6879043 Silicon, barrier layer of titanium nitride rich in titanium, high melting metal film layer
04/12/2005US6878640 Method for fabricating silicon targets
04/12/2005US6878459 For use in hard disks, floppy disks, and magnetic tapes
04/12/2005US6878450 Composite element and method for preparation thereof
04/12/2005US6878418 Depositing a first layer; applying a mask over first layer; activating second portion of first layer; removing mask; depositing a lubricant onto first layer
04/12/2005US6878417 Molecules adsorb at surfaces in patterns and then the surface is imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid
04/12/2005US6878415 Reacting a doped surface layer to form a dielectric film, a metal film or a silicide film having a thickness of 50 angstroms or less.
04/12/2005US6878404 Using a first voltage to ion beam deposit a first portion of the layer and a second higher voltage to deposit a second portion of the layer over the first portion
04/12/2005US6878250 Sputtering targets formed from cast materials
04/12/2005US6878249 High frequency sputtering device
04/12/2005US6878248 Method of manufacturing an object in a vacuum recipient
04/12/2005US6878243 Before coating the first side, a permanent protective layer is sputter deposited to the second side; then substrate is turned to apply a system of layers to the first side by sputter deposition
04/12/2005US6878242 A plurality of different layers are sputter-deposited, one after the other, using the same sputtering target as the target rotates. The thicknesses of the different layers can be controlled
04/12/2005US6878241 Method of forming deposited film
04/12/2005US6878240 Sputtering substrate; reducing edge photoresist masking
04/12/2005US6878218 High strength gear and method of producing the same
04/12/2005US6878211 Supporting structure for a ceramic susceptor
04/12/2005US6878210 Surface-treating holder having tubular structure and method using the same
04/12/2005US6878208 Mask for vacuum deposition and organic EL display manufactured by using the same
04/12/2005US6878207 Gas gate for isolating regions of differing gaseous pressure
04/07/2005WO2005031043A1 Method and facility for the production of a layer-like part
04/07/2005WO2005031042A2 Method and facility for the production of a band on a substrate band
04/07/2005WO2005031031A1 Metal thin film chip production method and metal thin film chip production device
04/07/2005WO2005031030A2 Method for plasma treating a surface
04/07/2005WO2005031029A1 Method for forming thin film and substrate-holding device
04/07/2005WO2005031028A1 Sputtering target and process for producing si oxide film therewith
04/07/2005WO2005031027A2 Container for evaporation of emtal and method for manufacture thereof
04/07/2005WO2005031016A1 Silver alloy, sputtering target material thereof, and thin film thereof
04/07/2005WO2005006350A3 Apparatus for consecutive deposition of high-temperature superconducting (hts) buffer layers
04/07/2005WO2004106582A3 Physical vapor deposition of titanium-based films
04/07/2005WO2004042111B1 Lock arrangement for a substrate coating installation
04/07/2005WO2004016560A8 Flexible electrically conductive film
04/07/2005WO2004015496A3 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams
04/07/2005WO2003100859A9 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies and corresponding component
04/07/2005US20050073047 Conductive sheet having metal layer formed on at least a portion of surface of insulating substrate, product using the same, and manufacturing method thereof
04/07/2005US20050072669 Deposition apparatus, deposition method, optical element, and optical system
04/07/2005US20050072668 Sputter target having modified surface texture
04/07/2005US20050072664 utility in the manufacture of disk-shaped magnetic and magneto-optical data/information storage and retrieval media