Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2005
03/17/2005US20050056969 Forming homogeneous mixtures of organic materials for physical vapor deposition using a solvent
03/17/2005US20050056968 Forming homogeneous mixtures of organic materials for physical vapor deposition using wet mixing
03/17/2005US20050056960 Forming homogeneous mixtures of organic materials for physical vapor deposition using melting
03/17/2005US20050056958 Forming homogeneous mixtures of organic materials for physical vapor deposition using dry mixing
03/17/2005US20050056798 Process and apparatus for producing evaporated phosphor sheets and an evaporated phosphor sheet produced by means of such process and apparatus
03/17/2005US20050056565 Tray for batching, storing and transporting small parts, especially tools and method for using it
03/17/2005US20050056536 Multi-step magnetron sputtering process
03/17/2005US20050056535 Apparatus for low temperature semiconductor fabrication
03/17/2005US20050056534 Back-biased face target sputtering
03/17/2005DE10339046A1 Vorrichtung zum Elysiersenken Apparatus for Elysiersenken
03/17/2005DE10337492A1 Alloy for wear resistant tools for the mechanical treatment of cellulose fibers contains chromium and manganese, carbon, vanadium and molybdenum, silicon, niobium, nickel, phosphorus and sulfur, and a balance of iron
03/17/2005DE10336422A1 Vorrichtung zur Kathodenzerstäubung Apparatus for sputtering
03/16/2005EP1514918A1 Method of cleaning chamber of vacuum evaporation apparatus for production of organic el element
03/16/2005EP1514851A1 Protective coating for a body as well as process and plant unit for preparing protective coatings
03/16/2005EP1513963A1 Target and method of diffusion bonding target to backing plate
03/16/2005CN2685350Y Heat catalyzer for producing thin film
03/16/2005CN1596323A Porous getter devices with reduced particle loss and method for manufacturing same
03/16/2005CN1596322A Process for making angstrom scale and high aspect functional platelets
03/16/2005CN1595263A Forming method of inorganic orientation film, inorganic orientation film, substrate used for electronic device
03/16/2005CN1594650A Vacuum deposition equipment
03/16/2005CN1594649A Metal ion source
03/16/2005CN1594648A Process for preparing silicon carbide film by magnetron sputtering method
03/16/2005CN1594647A Deposition method for solar spectrum selective absorption coating
03/16/2005CN1594646A Hydrophobic and ultraviolet radiation proof transparent film and preparation thereof
03/16/2005CN1594645A Product with antibacterial and wearresistant surface
03/16/2005CN1594644A Preparation method for TiOxNy highly effective solar photo-thermal conversion film
03/15/2005US6867837 Liquid crystal device and manufacturing method
03/15/2005US6867422 Apparatus for ion implantation
03/15/2005US6867149 Growth of multi-component alloy films with controlled graded chemical composition on sub-nanometer scale
03/15/2005US6866958 Ultra-low loadings of Au for stainless steel bipolar plates
03/15/2005US6866921 Chromium-containing cemented carbide body having a surface zone of binder enrichment
03/15/2005US6866889 Method and means for drill production
03/15/2005US6866886 Method of coating the interior surface of hollow objects with a diffusion coating
03/15/2005US6866753 Magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil
03/15/2005US6866752 Method of forming ultra thin film devices by vacuum arc vapor deposition
03/15/2005US6866720 Orgnic electroluminescence
03/15/2005CA2354961C Optical element having antireflection film
03/15/2005CA2130870C Method for highly dispersed deposition of catalytic materials on a particulate substrate and apparatus for implementing the method
03/13/2005CA2479698A1 Protective layer for a body, and process and arrangement for producing protective layers
03/10/2005WO2005022643A1 Thermal stability for silver metallization
03/10/2005WO2005022562A1 Superconducting film and method of manufacturing the same
03/10/2005WO2005021828A2 Copper-containing pvd targets and methods for their manufacture
03/10/2005WO2005021827A2 Coated bore cutting tools
03/10/2005WO2005021826A2 Titanium foil metallization product and process
03/10/2005WO2005021825A2 Method of coating the interior surface of hollow objects
03/10/2005WO2005021824A2 Process for the production of strongly adherent coatings
03/10/2005WO2005021211A1 Method & apparatus for holding a work piece in a particle bed
03/10/2005WO2005021173A1 Method of cleaning substrate processing chamber components having textured surfaces
03/10/2005US20050053845 Attenuating phase shift mask blank and photomask
03/10/2005US20050053799 Thermal barrier coating utilizing a dispersion strengthened metallic bond coat
03/10/2005US20050053764 Multilayer; gaps between layers containing apertures
03/10/2005US20050053542 Vapor depositing metallorganic layer of iron or molybdenum phthalocyanine on unmasked substrate portion; removing deposition mask of silicon dioxide or alumina; oxidation to form growth catalyst; exposing to carbon precursor of methane, ethane, propane, ethylene, propylene or carbon dioxide; pyrolysis
03/10/2005US20050051737 Radiation image conversion panel and production method thereof
03/10/2005US20050051607 Nanostructured soldered or brazed joints made with reactive multilayer foils
03/10/2005US20050051606 Method of manufacturing an extended life sputter target assembly and product thereof
03/10/2005US20050051516 Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
03/10/2005US20050051424 Sputtering using an unbalanced magnetron
03/10/2005US20050051423 Method for controlling plasma density or the distribution thereof
03/10/2005US20050051421 Sputtering a beam of second particles between the contamination source and the micro-component, at least a part of which second particles has an opposite polarity from that of the first particles, so as to drag the first particles away from the micro-component to a collecting element
03/10/2005US20050051097 Covering assembly for crucible used for evaporation of raw materials
03/10/2005DE10196150T5 Magnetron-Sputtern Magnetron sputtering,
03/09/2005EP1512768A1 Method for forming organic thin film
03/09/2005EP1512733A2 Radiation image conversion panel and production method thereof
03/09/2005EP1511879A1 Fabrication of ductile intermetallic sputtering targets
03/09/2005EP1511878A2 Targets with high pass-through-flux for magnetic material sputtering, method of manufacture and hard disk obtainable thereof
03/09/2005EP1511877A1 Sputter method or device for the production of natural voltage optimized coatings
03/09/2005EP1511876A2 Sputtering cathode adapter
03/09/2005EP1511875A2 Method and device for incorporating a compound in the pores of a porous material and uses thereof
03/09/2005EP1451384B1 Coating method and coating
03/09/2005CN2683626Y Apparatus for preparing nano-structured material by magnetic control arc process
03/09/2005CN1592798A Cleaning gas for semiconductor production equipment and cleaning method using the gas
03/09/2005CN1592797A Copper sputtering targets and methods of forming copper sputtering targets
03/09/2005CN1591136A Inorganic orientation film forming method, inorganic orientation film, substrate for electronic device, liquid crystal panel and electronic apparatus
03/09/2005CN1591135A Orientation film forming method, orientation film, substrate for electronic device, liquid crystal panel
03/09/2005CN1591134A Inorganic orientation film and its forming method, substrate for electronic device, liquid crystal panel
03/09/2005CN1590581A Evaporation source for evaporating an organic electroluminescent layer
03/09/2005CN1590580A Antiferromagnetic film and magneto-resistance effect element formed by using the same
03/09/2005CN1590579A Method of film plating and label forming on tool simultaneously
03/09/2005CN1590086A Process for producing transparent conductive laminate
03/09/2005CN1192691C Process for integrating metal electrodes to diamond stock
03/09/2005CN1192417C Method and apparatus for supercritical processing of multiple workpieces
03/09/2005CN1191936C Droplet deposition apparatus and mfg. method thereof
03/08/2005US6865071 Electrolytic capacitors and method for making them
03/08/2005US6865065 Semiconductor processing chamber substrate holder method and structure
03/08/2005US6864521 Method to control silver concentration in a resistance variable memory element
03/08/2005US6864494 Semiconductor processing apparatus having a moving member and a force compensator therefor
03/08/2005US6864201 Preparation and screening of crystalline zeolite and hydrothermally-synthesized materials
03/08/2005US6864042 Patterning longitudinal magnetic recording media with ion implantation
03/08/2005US6863992 Composite reactive multilayer foil
03/08/2005US6863965 Optical component
03/08/2005US6863937 Method of operating an electron beam physical vapor deposition apparatus
03/08/2005US6863927 Method for vapor phase aluminiding of a gas turbine blade partially masked with a masking enclosure
03/08/2005US6863851 Process for making angstrom scale and high aspect functional platelets
03/08/2005US6863789 Direct current sputtering; resonance network
03/08/2005US6863786 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology
03/08/2005US6863785 Sputtering apparatus and sputter film deposition method
03/08/2005US6863750 Having a purity of at least about 99.99% and an average grain size of about <150 microns; reducing a niobium compound in a container/agitator of a metal with less or the same vapor pressure at the melting point of niobium; sputtering target
03/08/2005US6863736 Shaft cooling mechanisms
03/08/2005US6863699 Sputter deposition of lithium phosphorous oxynitride material
03/08/2005US6863398 Method and coating system for coating substrates for optical components