Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2005
06/30/2005US20050142376 Vapor deposition film having structured layers of a variety of diverse metals, metal compositions, alloys or insulators on one or both sides of a carrier material
06/30/2005US20050142290 Substrate support adapter system
06/30/2005US20050142289 Polysulfide thermal vapour source for thin sulfide film deposition
06/30/2005US20050142021 Refractory metal and alloy refining by laser forming and melting
06/30/2005US20050141797 Rolling sliding member and rolling apparatus
06/30/2005US20050141170 Thin-film laminated body, thin-film cell, capacitor, and method and equipment for manufacturing thin-film laminated body
06/30/2005US20050139948 Integration of barrier layer and seed layer
06/30/2005US20050139467 Sputtering device
06/30/2005US20050138874 Overcoating glass of sputtered transition metal oxide; removed by washing with mild acetic acid or mild base
06/30/2005DE19851579B4 Metallisierter Kunststoff und Verfahren zu dessen Herstellung Metallized plastic and process for its preparation
06/30/2005DE19503178B4 Verfahren und Vorrichtung zur Herstellung einer lötbaren Metallisierungsschicht auf einer nichtlötbaren Oberfläche Method and apparatus for producing a solderable metallization layer on a surface nichtlötbaren
06/30/2005DE10355683A1 Vakuumschleusenanordnung The vacuum lock arrangement
06/30/2005DE10355682A1 Trägeranordnung Carrier assembly
06/30/2005DE10355679A1 Substratträger-Adapter-System Substrate carrier adapter system
06/30/2005DE10355678A1 Vakuumsystem Vacuum system
06/30/2005DE10354090A1 Shielded ribbon cable for electrical applications comprises electrical conductors arranged in a casing as insulator made from extruded plastic, and a screen formed as a vaporized layer made from an electrically conducting material
06/30/2005DE10353756A1 Schichtmaterial Layer material
06/30/2005DE10126038B4 Verfahren zur Herstellung eigenspannungsfreier reflektierender optischer Schichtsysteme auf Substraten Process for the preparation of internal stress-free reflective optical coating systems on substrates
06/29/2005EP1548148A1 Iron silicide sputtering target and method for production thereof
06/29/2005EP1548147A1 Thin film formation method
06/29/2005EP1548146A1 Method of coating a cutting tool
06/29/2005EP1548139A1 Ultra-low carbon stainless steel
06/29/2005EP1547974A1 Iron silicide powder and method for production thereof
06/29/2005EP1547647A1 Implantable electrical lead wire
06/29/2005EP1547448A1 Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
06/29/2005EP1547124A1 Device for the treatment of a web-type material in a plasma-assisted process
06/29/2005EP1546771A1 Reducing the susceptibility of titanium nitride optical layers to crack
06/29/2005EP1546432A1 High throughput deposition apparatus
06/29/2005EP1546431A1 Composite material
06/29/2005EP1546430A1 Method, equipment, and material for creating a surface on a metal
06/29/2005EP1546055A1 Heat treatable low-e coated articles and methods of making same by sputtering ag in oxygen inclusive atmosphere
06/29/2005EP1546053A1 Layer system comprising a titanium-aluminium-oxide layer
06/29/2005EP1545379A1 Dental braces and methods for coating
06/29/2005EP1490528B1 Rotating tubular cathode
06/29/2005EP1016121B1 Vapour deposition coating apparatus
06/29/2005EP1007762B1 Method and apparatus for detecting the endpoint of a chamber cleaning
06/29/2005CN2706479Y Bisurface sputtering vacuum winding continuous film plating equipment
06/29/2005CN2706478Y Winding type aluminium-zinc aluminium vacuum film plating machine
06/29/2005CN2706477Y Optical film plating device
06/29/2005CN1633522A Surface treatment for improved hardness and corrosion resistance
06/29/2005CN1633518A Aperture masks for circuit fabrication
06/29/2005CN1633517A In-line deposition processes for circuit fabrication
06/29/2005CN1633516A Tin oxide powder for ITO sputtering target, manufacturing method of said powder, sintered body sputtering target for ITO film deposition, and manufacturing method of said target
06/29/2005CN1633515A Aperture masks for circuit fabrication
06/29/2005CN1633511A High-purity spongy titanium material and its production method
06/29/2005CN1633477A Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
06/29/2005CN1632965A Method for preparing aeolotropic magneto resistor permalloy thin film
06/29/2005CN1632168A Composite processing method for increasing corrosion resistance for magnesium alloys
06/29/2005CN1632163A Vacuum filming configuration process control method
06/29/2005CN1632162A Automatic detection method in vacuum coating process
06/29/2005CN1632161A Temperature control device for collimator in physical vapour deposition system
06/29/2005CN1632160A Arc evaporator, method for driving arc evaporator, and ion plating apparatus
06/29/2005CN1631601A Friction stir welding using a superabrasive tool
06/29/2005CN1208811C Method for preparing p-type zinc oxide film
06/29/2005CN1208498C Chromium oxide coating preparing process
06/29/2005CN1208497C Process for preparing nanometer metallic particles dispersion oxide optical thin film
06/29/2005CN1208496C Method for preparing boron target
06/29/2005CN1208495C Sputtering target and its preparing method
06/29/2005CN1208494C Differentially-pumped material processing system
06/28/2005US6912031 Optical and electro-optical apparatus comprising crystal layers joined to electrodes and electroconductive adjustment films; visual aids
06/28/2005US6911779 Magnetic mirror plasma source
06/28/2005US6911671 Device for depositing patterned layers in OLED displays
06/28/2005US6911280 Chemical protection of a lithium surface
06/28/2005US6911163 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescene device
06/28/2005US6911129 Combinatorial synthesis of material chips
06/28/2005US6911125 Thin film producing method and light bulb having such thin film
06/28/2005US6911124 Bombarding tantalum nitride (TaN) layer with voltage forming alpha-tantalum; sputtering; microelectronics; miniaturization; semiconductors
06/28/2005US6911123 Facing-targets-type sputtering apparatus and method
06/28/2005US6911094 Evaporation apparatus
06/23/2005WO2005056871A1 Method of preparing a metal-silicone rubber composite
06/23/2005WO2005056870A1 Ti OXIDE FILM EXHIBITING PHOTOCATALYTIC ACTIVITY UPON VISIBLE LIGHT IRRADIATION AND PROCESS FOR PRODUCING THE SAME
06/23/2005WO2005056869A1 A method for manufacturing diamond coatings
06/23/2005WO2005056868A1 Method of metallizing a silicone rubber substrate
06/23/2005WO2005056849A1 Silver alloy with excellent reflectance-maintaining characteristics
06/23/2005WO2005043613A9 Substrate holder
06/23/2005WO2005024848A3 Optical thin film and mirror using the same
06/23/2005WO2005004314A3 Dual magnetrong sputtering apparatus utilizing control means for delivering balanced power
06/23/2005US20050137084 Graded photocatalytic coatings
06/23/2005US20050136694 Method and apparatus for forming thin film
06/23/2005US20050136691 Method and apparatus for depositing dielectric films
06/23/2005US20050136668 Mask, method for manufacturing a mask, method for manufacturing an organic electroluminescence device, organic electroluminescence device, and electronic apparatus
06/23/2005US20050136656 Process for depositing composite coating on a surface
06/23/2005US20050136290 Shutter plate disposed between substrate support and cathode, defining an aperture for selective transmission of sputtered articles from the cathode on the basis of a non-perpendicular trajectory angle relative to a plane of the substrate support
06/23/2005US20050136179 Subjecting a work piece having a metal covered with a thin protective overcoat to a hydrophobic environment; andexposing thin protective overcoat to UV light while in said hydrophobic environment
06/23/2005US20050133731 Radiation image storage panel
06/23/2005US20050133366 Cathode for vacuum sputtering treatment machine
06/23/2005US20050133365 Mechanism for varying the spacing between sputter magnetron and target
06/23/2005US20050133362 Transferable micro spring structure
06/23/2005US20050133361 Compensation of spacing between magnetron and sputter target
06/23/2005US20050133125 cooling copper or alloys, then defroming to introduce strains, then recrystallizing and finishing at a low temperature to improve sputter uniformity and reducing sputter target arcing
06/23/2005US20050132960 Small volume environmental chamber and multi-chamber processing apparatus comprising same
06/23/2005US20050132717 Gas turbine part provided with a protective coating, and a method of making a protective coating on a superalloy metal substrate
06/23/2005DE10355036A1 Verfahren zur Herstellung einer Schutzschicht, Schutzschicht und Bauteil mit einer solchen Schutzschicht A method for producing a protective layer, protective layer and member having such a protective layer
06/23/2005DE10019045B4 Verfahren zum Herstellen von Viellagensystemen A process for producing multilayer systems
06/23/2005DE10008829B4 Verfahren zum Entfernen von adsorbierten Molekülen aus einer Kammer A method for removing adsorbed molecules from a chamber
06/22/2005EP1544319A2 Deposition mask
06/22/2005EP1544168A1 Method for producing nanoparticles
06/22/2005EP1543176A1 A method for depositing multilayer coatings
06/22/2005EP1543175A1 High peak power plasma pulsed supply with arc handling
06/22/2005EP1542866A2 Flexible electrically conductive film