Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2005
06/22/2005EP1360476B1 Automated control of metal thickness during film deposition
06/22/2005CN1630928A Thin film producing method and light bulb having such thin film
06/22/2005CN1630439A Separate type mask device for manufacturing OLED display
06/22/2005CN1630438A Mask, method for manufacturing a mask, method for manufacturing an organic electroluminescence device, organic electroluminescence device, and electronic apparatus
06/22/2005CN1207450C Process for preparing crystal film for components to emit blue light
06/22/2005CN1207435C Surface treatment holder and holding frame, and method and equipment therefor
06/22/2005CN1207434C Surface treatment source
06/22/2005CN1207433C Vacuum electric arc automatic arc-striking method and apparatus
06/22/2005CN1207432C Ito溅射靶 Ito sputtering target
06/22/2005CN1207427C Large-area sedimentation devices for preparing film by ultrasonic atomizing effect
06/22/2005CN1207095C Method for preparing TiO2 nano photocatalytic stainless steel and titanium fibre thread-line
06/21/2005US6909839 Delivery systems for efficient vaporization of precursor source material
06/21/2005US6909086 Neutral particle beam processing apparatus
06/21/2005US6908679 Heat treatable coated article with niobium zirconium inclusive IR reflecting layer and method of making same
06/21/2005US6908666 Transparent conductive laminate and process of producing the same
06/21/2005US6908588 Process for manufacturing an evaporation source
06/21/2005US6908517 Physical vapor deposition target
06/21/2005US6908516 Light or reactive elements and monophase alpha '- matrix magnesium- and aluminum-based alloys with superior engineering properties, for the latter being based on a homogeneous solute distribution or a corrosion resistant and
06/21/2005US6907924 Thermally conductive chuck for vacuum processor
06/21/2005CA2344216C Aluminium-titanium alloy with high specular reflectivity, reflecting coatings comprising same and mirrors and parts comprising said coating
06/21/2005CA2174507C A method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode
06/16/2005WO2005054540A1 A layered structure
06/16/2005WO2005054539A1 A layered structure
06/16/2005WO2005053887A1 Surface-coated cutting tool
06/16/2005WO2005033351A3 Protection of metallic surfaces against thermally-induced wrinkling (rumpling) in particular in gas turbines
06/16/2005WO2005021827A3 Coated bore cutting tools
06/16/2005WO2004114355A3 Method and design for sputter target attachment to a backing plate
06/16/2005WO2004092088A3 Methods of making crystalline titania coatings
06/16/2005WO2004091501B1 Process for measuring the skin surface of an examined person
06/16/2005WO2004052785A3 High purity nickel/vanadium sputtering components; and methods of making sputtering components
06/16/2005WO2001090434A3 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
06/16/2005US20050130422 Method for patterning films
06/16/2005US20050130356 Method of manufacturing organic electro luminescence panel, manufacturing apparatus of organic electro luminescence panel, and organic electro luminescence panel
06/16/2005US20050130032 Thin film battery and method of manufacture
06/16/2005US20050129986 a tungsten carbide based cemented carbide substrate, a titanium carbonitride based cermet substrate, or a cubic boron nitride based sintered substrate; and a hard coating layer of a nitride compound containing aluminum and titanium, formed on a surface of the substrate using a physical vapor deposition
06/16/2005US20050129972 Thermal barrier coating system method of manufacturing the same
06/16/2005US20050129934 Scratch resistant coated glass article resistant fluoride-based etchant(s)
06/16/2005US20050129900 Forming an AgPd alloy thin film using a sputtering target, with the target material a thin film, that is a reflecting film, constituting an optical recording medium is formed and the optical recording medium containing the reflecting film as a constituent is produced
06/16/2005US20050129863 Multilayer; zinc stannate dielectric film, infrared reflective layer; metal primers; protective coatings; chemical resistance; durability
06/16/2005US20050129860 Method and apparatus for preparing thin resin film
06/16/2005US20050129848 Patterned deposition source unit and method of depositing thin film using the same
06/16/2005US20050127036 Method of cleaning a reaction chamber
06/16/2005US20050126904 Includes a chamber, a target back plate, a wafer base, a target and a mobile magnetron device; asymmetric deposition
06/16/2005US20050126903 Method for formation of titanium nitride films
06/16/2005US20050126585 Method of removing residual contaminants from an environment
06/16/2005US20050126497 Platform assembly and method
06/16/2005US20050126495 Deposited-film forming apparatus
06/16/2005US20050126494 Process and apparatus for depositing a ceramic coating
06/16/2005US20050126493 Linear or planar type evaporator for the controllable film thickness profile
06/16/2005US20050126492 useful for improving image quality and water resistance of dye based ink images
06/16/2005US20050126486 Chemical vapor deposition; during the stabilizer feeding stage, a stabilizer for the organometallic complex is fed in a gaseous state during normal operation of the vaporizer, but the stabilizer feeding stage is executed when the vaporizer is not vaporizing the organometallic complex
06/16/2005US20050126226 Mechanism to mold glass lenses using an implanted precision glass molding tool
06/16/2005DE202005006309U1 Modular design vacuum coating unit including a housing, vacuum pumps and a coating device generally useful for vacuum deposition of coatings and giving quicker and more efficient evacuation of the compartments
06/16/2005DE10352516A1 Process for depositing thin layers on an organic substrate used in the production of flat displays comprises feeding a carrier gas into a gas flow sputtering source , and feeding the gas stream produced onto the substrate being coated
06/16/2005DE10352143A1 Längserstreckte Vakuumanlage zur ein- oder beidseitigen Beschichtung flacher Substrate Elongate vacuum system for single or double-sided coating of flat substrates
06/16/2005DE10350648A1 Transponder Transponder
06/16/2005DE10150809B4 Substrathalter Substrate holder
06/16/2005DE10114306B4 Kompositschicht, Verfahren zur Herstellung einer Kompositschicht und deren Verwendung Composite, method for producing a composite layer, and their use
06/15/2005EP1542293A2 Organic electro-luminance device and method for fabricating the same
06/15/2005EP1541714A1 Method for repairing components using environmental bond coatings and resultant repaired components
06/15/2005EP1541708A1 Tantalum sputtering target and method for preparation thereof
06/15/2005EP1541707A1 METHOD FOR PREPARING ALUMNA COATING FILM HAVING a-TYPE CRYSTAL STRUCTURE AS PRIMARY STRUCTURE
06/15/2005EP1541706A1 Masking mechanism for film-forming device
06/15/2005EP1540665A2 Photolithography mask repair
06/15/2005EP1540047A1 Oh and h resistant silicon material
06/15/2005EP1540032A2 Thin film deposition apparatus
06/15/2005EP1540031A2 Monolithic sputtering target assembly
06/15/2005EP1540030A1 Non-planar sputter targets having crystallographic orientations promoting uniform deposition
06/15/2005EP1072054B1 Retaining ring and target and method for producing same
06/15/2005EP1055013A4 Cathode arc vapor deposition
06/15/2005EP0842046B1 Hybrid polymer film
06/15/2005EP0840676B1 Adhesiveless flexible laminate and process for making adhesiveless flexible laminate
06/15/2005CN1628185A Non-stoichiometric Niox ceramic target
06/15/2005CN1627870A Organic electro-luminance device and method for fabricating the same
06/15/2005CN1206703C Process for growing P-type ZnO crystal film by real-time doping nitrogen
06/15/2005CN1206386C Ion implanted composite coating film apparatus
06/15/2005CN1206385C Electrode fixig device of macromolecular membrane continuous evaporating-plating equipment by utilizing plasma
06/14/2005US6906453 Method and apparatus for simultaneously depositing and observing materials on a target
06/14/2005US6906295 Scratch, corrosion amd heat resistant; colorfast; suitable for salty and acidic foods; alternating layers of chromium nitride alone and with titanium and aluminum
06/14/2005US6906008 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
06/14/2005US6905965 Reactive preclean prior to metallization for sub-quarter micron application
06/14/2005US6905962 Method of depositing a layer
06/14/2005US6905947 Monatomic boron ion source and method
06/14/2005US6905738 Positioning source of laser energy in a spaced relation to the target substrate; positioning receiving substrate in a spaced relation to target substrate; exposing target substrate to the laser energy for deposition
06/14/2005US6905736 Focusing ion beams; vapor deposition using organometallic compound
06/14/2005US6905582 Configurable vacuum system and method
06/14/2005US6905578 Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
06/14/2005US6905107 Inflatable slit/gate valve
06/14/2005US6904699 Vacuum processing apparatus and operating method therefor
06/14/2005CA2271990C Process and device for forming a coating on a substrate by cathode sputtering
06/14/2005CA2120680C Metallic article possessing a brightly colored surface of low reflectivity and process for producing such surface
06/09/2005WO2005052979A2 Plasma source with segmented magnetron cathode
06/09/2005WO2005052212A1 Method for producing a protective coating, protective coating and component provided with a coating of this type
06/09/2005WO2005051651A1 Gas barrier film
06/09/2005WO2005051525A1 Permeation barrier coating or layer with modulated properties and methods of making the same
06/09/2005WO2005025394A3 Easy-to-clean cooking surface and electric household appliance comprising same
06/09/2005WO2005014875A3 Nano-structure and process of production thereof
06/09/2005WO2004099460B1 Method for producing galvanically enhanced moulded elements optionally lighted by transparency,made of thermoplastic,thermosetting plastic,elastomer or silicone, as well as moulded elements optionally lighted by transparency made of thermoplastic,thermosetting plastic,elastomer or silicone with galvanically enhanced surface
06/09/2005WO2004024452A3 PROCESS FOR MAKING DENSE MIXED METAL Si3N4 TARGETS
06/09/2005US20050124175 Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate gate dielectrics