| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 06/01/2005 | CN1622707A Method of manufacturing organic electro luminescence panel, manufacturing apparatus of organic electro luminescence panel, and organic electro luminescence panel |
| 06/01/2005 | CN1622357A Method and device for preparing large area superconducting film adopting pulse laser deposition process |
| 06/01/2005 | CN1621563A Method for ceramic treatment of metal surface |
| 06/01/2005 | CN1621559A Magnetron sputtering target capable of improving the availability of target materials |
| 06/01/2005 | CN1621558A 溅射靶及光信息记录介质及其制造方法 Sputtering target and the optical information recording medium and its manufacturing method |
| 06/01/2005 | CN1621557A Thermal barrier coating suitable for nickel-based high-temperature alloy with high Mo content |
| 06/01/2005 | CN1621556A High sintering -resistant thermal barrier coating with high thermal stability and low thermal conductivity |
| 06/01/2005 | CN1621555A Mask and container and manufacturing apparatus |
| 06/01/2005 | CN1204289C Vapor-deposited coating device for vacuum vapor-deposited coating apparatus |
| 06/01/2005 | CN1204288C Vaporizing body |
| 06/01/2005 | CN1204287C Method for coating foil comprised of nickel or nickel alloy |
| 05/31/2005 | US6900580 Self-oriented bundles of carbon nanotubes and method of making same |
| 05/31/2005 | US6900434 Method and device for separating ion mass, and ion doping device |
| 05/31/2005 | US6900122 Low-temperature grown high-quality ultra-thin praseodymium gate dielectrics |
| 05/31/2005 | US6899979 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
| 05/31/2005 | US6899964 Magnetic recording medium and method for manufacturing the same |
| 05/31/2005 | US6899954 Glass overcoated with intermetallic; vapor deposition, sputtering |
| 05/31/2005 | US6899953 Shippable heat-treatable sputter coated article and zinc cathode sputtering target containing low amounts of tin |
| 05/31/2005 | US6899918 Method for manufacturing electrode for lithium secondary battery |
| 05/31/2005 | US6899828 Composite coatings |
| 05/31/2005 | US6899799 Providing a sputtering gas into a chamber at a pressure below 20 mTorr, applying radio frequency to a coil to ionize the sputtering gas to form a plasma, sputtering a target to sputter target material toward a workpiece |
| 05/31/2005 | US6899798 Reusable ceramic-comprising component which includes a scrificial surface layer |
| 05/31/2005 | US6899796 Two-step method of filling copper into a high-aspect ratio via or dual-damascene structure; first, sputtering copper into a hole in the dielectric at less than 100 degrees C, filling 1/3 of the hole; second, completely filling the hole |
| 05/31/2005 | US6899795 Sputter surface symmetrical with respect to a central axis and a carrier which is rotatable about a substrate carrier axis; The central axis and the substrate carrier axis are oblique with respect to one another. |
| 05/26/2005 | WO2005048284A2 Rotating sputtering magnetron |
| 05/26/2005 | WO2005047559A1 Method of producing endosseous implants or medical prostheses by means of ionic implantation, and endosseous implant or medical prosthesis thus produced |
| 05/26/2005 | WO2005047558A2 Process for manufacturing devices which require a non evaporable getter material for their working |
| 05/26/2005 | WO2005047369A2 Fine particle hard molded bodies for abrasion-resistant polymer matrices |
| 05/26/2005 | WO2005047202A2 Method for application of a thermal barrier coating and resultant structure thereof |
| 05/26/2005 | WO2005026299A3 Lubricated part having partial hard coating allowing reduced amounts of antiwear additive |
| 05/26/2005 | WO2004108983A3 Method for producing a low nickel content surface on nitinol |
| 05/26/2005 | WO2004076705A3 Reactive physical vapor deposition with sequential reactive gas injection |
| 05/26/2005 | WO2003100119A8 Method and device for plasma treatment of work pieces |
| 05/26/2005 | US20050112889 Semiconductor device manufacturing method and manufacturing line thereof |
| 05/26/2005 | US20050112412 Thermal barrier coating |
| 05/26/2005 | US20050112377 suitable as the core material for particularly silent low-loss transformers; including an electrically insulating coating made of an amorphous carbon-hydrogen network |
| 05/26/2005 | US20050112333 Method and apparatus for forming high surface area material films and membranes |
| 05/26/2005 | US20050112295 Method to produce microlayer thermostable materials |
| 05/26/2005 | US20050112019 Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
| 05/26/2005 | US20050110830 Ejection device, manufacturing device of color filter substrate, manufacturing device of electro-luminescent display device, manufacturing device of plasma display device, and ejection method |
| 05/26/2005 | US20050110101 Semiconductor apparatus and method of manufacturing the semiconductor apparatus |
| 05/26/2005 | US20050109743 Semiconductor thin film forming system |
| 05/26/2005 | US20050109616 Sputtering apparatus |
| 05/26/2005 | US20050109609 Filling support with palladium by electroless plating |
| 05/26/2005 | US20050109608 Method of improving thermal stability for cobalt salicide |
| 05/26/2005 | US20050109607 Combined coating process comprising magnetic field-assisted, high-power, pulsed cathode sputtering and an unbalanced magnetron |
| 05/26/2005 | US20050109606 Composite barrier films and method |
| 05/26/2005 | US20050109392 Sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride, a copper indium gallium diselenide absorber layer is co-sputtered from an electroconductive targets using dual cylindrical rotary magnetron technology |
| 05/26/2005 | US20050109282 Method for manufacturing diamond coatings |
| 05/26/2005 | US20050109281 Process for coating a substrate, and apparatus for carrying out the process |
| 05/26/2005 | US20050109273 Organic EL display device and method for fabricating the same |
| 05/26/2005 | CA2546238A1 Method of producing endosseous implants or medical prostheses by means of ion implantation, and endosseous implant or medical prosthesis thus obtained |
| 05/25/2005 | EP1533396A2 Method for repairing coated components using NiAl bond coats |
| 05/25/2005 | EP1532292A1 Atomic deposition layer methods |
| 05/25/2005 | EP1532288A2 A hybrid beam deposition system and methods for fabricating zno films, p-type zno films, and zno-based ii-vi compound semiconductor devices |
| 05/25/2005 | EP1532286A1 Component protected against corrosion and method for the production thereof and device for carrying out said method |
| 05/25/2005 | EP1531974A1 A cutting member having a superlattice coating |
| 05/25/2005 | EP1346007B1 Multiple source deposition process |
| 05/25/2005 | EP0989914A4 Multilayer metalized composite on polymer film product and process |
| 05/25/2005 | EP0906636B1 Highly tetrahedral amorphous carbon films and methods and ion-beam source for their production |
| 05/25/2005 | DE19816739B4 Vorrichtung zum Beladen und Entladen eines Prozeßreaktors mit Gegenständen, vorzugsweise Wafern Device for loading and unloading a reactor process with articles, preferably wafers |
| 05/25/2005 | DE10351330A1 Verfahren und Vorrichtung zur Versorgung mindestens einer Bearbeitungsstation für ein Werkstück Method and apparatus for supplying at least one processing station for a workpiece, |
| 05/25/2005 | DE10350967A1 Korrosionsbeständiges, keramisches Material für die Verdampfung von Metallen, insbesondere Aluminium, Verfahren zur Herstellung eines solchen Materials und Verdampfer aus einem solchen Material A corrosion resistant ceramic material for the evaporation of metals, in particular aluminum, to processes for producing such material and of such a material vaporizer |
| 05/25/2005 | DE10348734A1 Verfahren und System zum selektiven Beschichten von Metalloberflächen Method and system for selective coating of metal surfaces |
| 05/25/2005 | CN1620722A Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 05/25/2005 | CN1620712A Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 05/25/2005 | CN1620693A Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target |
| 05/25/2005 | CN1620692A Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using |
| 05/25/2005 | CN1620521A Linear or planar type evaporator for the controllable film thickness profile |
| 05/25/2005 | CN1620336A Member having photocatalytic function and method for manufacture thereof |
| 05/25/2005 | CN1620203A Mask, display, organic electroluminescent display and mfg. method thereof |
| 05/25/2005 | CN1619754A MgO pellet for protective layer of plasma display panel, and plasma display panel using the same |
| 05/25/2005 | CN1619011A Ionized physical vapor deposition apparatus using helical self-resonant coil |
| 05/25/2005 | CN1619010A Bi reverse barrel target combined base sheet biaxial rotated film plating device |
| 05/25/2005 | CN1619009A Take-up vacuum deposition method and take-up vacuum deposition apparatus |
| 05/25/2005 | CN1619008A Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 05/25/2005 | CN1203729C Method for mfg. field luminescence display device |
| 05/25/2005 | CN1203532C Method for electroplating dielectric articles |
| 05/25/2005 | CN1203527C High dielectric coefficient gate dielectric material hafnium aluminate film and preparing method thereof |
| 05/25/2005 | CN1203208C Power supply unit for sputtering device |
| 05/25/2005 | CN1203207C Method for coating foil comprised of nickel or nickel alloy |
| 05/25/2005 | CN1203206C Surface treatment method |
| 05/24/2005 | US6897560 Ultraviolet-transparent conductive film and process for producing the same |
| 05/24/2005 | US6897551 Support for microelectronic, microoptoelectronic or micromechanical devices |
| 05/24/2005 | US6897457 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus |
| 05/24/2005 | US6897174 Composite metal oxide compound; ferroelectricity, piezoelectricity, thermoelectricity |
| 05/24/2005 | US6897164 Aperture masks for circuit fabrication |
| 05/24/2005 | US6896938 Vapor deposition |
| 05/24/2005 | US6896773 High deposition rate sputtering |
| 05/24/2005 | US6896748 Grain structure is about 99 percent recrystallized; sputter target's face has a grain orientation ratio of about 10 percent each of (111), (200), (220) and (311); grain size of less than about 10 mu m for improving sputter target arcing |
| 05/24/2005 | US6895700 Pressing iron soleplate having a hardened and coated surface |
| 05/19/2005 | WO2005045968A2 Method of forming thin-film electrodes |
| 05/19/2005 | WO2005045893A2 Method of forming non-oxide thin films using negative sputter ion beam source |
| 05/19/2005 | WO2005045891A2 Method and apparatus for measuring and monitoring coatings |
| 05/19/2005 | WO2005045094A1 A tape-manufacturing system having extended operational capabilities |
| 05/19/2005 | WO2005045093A1 Apparatus and method for the vacuum metallization of textile materials and the like |
| 05/19/2005 | WO2005045092A2 Elongate vacuum system for coating one or both sides of a flat substrate |
| 05/19/2005 | WO2005045091A2 Vacuum coating system for coating elongate substrates |
| 05/19/2005 | WO2005045090A1 Tantalum sputtering target |
| 05/19/2005 | WO2005044317A2 Method and device for supplying at least one machining station for a workpiece |