Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2005
08/03/2005CN1648279A Vacuum evaporation plating machine
08/03/2005CN1648278A Vacuum evaporation plating machine
08/03/2005CN1213163C Sputting film-plating apparatus and vacuum surface treating device
08/03/2005CN1213162C Vapour deposition method and use of choke state in continuous vapour deposition method
08/03/2005CN1213161C 包装材料 Packaging Materials
08/02/2005US6924454 mixing tubes using a superhard material, i.e. PCD (polycrystalline diamond) or electrically conductive PCBN (polycrystalline cubic boron nitride), in high pressure abrasive water jet systems and methods for producing same
08/02/2005US6924231 Single wafer processing method and system for processing semiconductor
08/02/2005US6924230 Method for forming a conductive layer
08/02/2005US6924164 Method of continuous processing of thin-film batteries and like devices
08/02/2005US6924040 Ceramic containing hafnia, germanium oxide on metallic substrate
08/02/2005US6924004 generating aerosol cloud of particles, accelerating the particles into the expansion chamber, creating a collimated beam by passing partilcles through the aerodynamic focusing lenses and into a deposition chamber, then impacting with substrate
08/02/2005US6924002 comprises nickel/aluminum based intermetallics; for promoting heat transfer
08/02/2005US6923891 FCVA (Filtered Cathodic Vacuum Arc) generates a filtered ion beam and forms a conformal metal coating, even in high aspect ratio visa and trenches; filtered beam of ionised metallic ions under a pulsed, modulalated electrical bias
08/02/2005US6923868 Installation for electron-ray coatication of coatings
08/02/2005US6923867 Substrate processing apparatus and method for manufacturing semiconductor device
08/02/2005US6923859 Apparatus for manufacturing GaN substrate and manufacturing method thereof
08/02/2005US6923692 Electrical connectors incorporating low friction coatings and methods for making them
07/2005
07/28/2005WO2005068681A2 Cleaning tantalum-containing deposits from process chamber components
07/28/2005WO2005068680A2 Melting and vaporizing apparatus and method
07/28/2005WO2005067423A2 Disposition source using pellets for making oleds
07/28/2005WO2005026408A3 Methods of treating components of a deposition apparatus to form particle traps, and such components having particle traps thereon
07/28/2005WO2004079764A3 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
07/28/2005US20050165472 Radiopaque coating for biomedical devices
07/28/2005US20050164424 Silison film for thin film transistors
07/28/2005US20050164028 not encumbered with noble gas inclusions and is a deposition product from a noble-gas-free getter metal alloy plasma; high take-up capacity for residual gases and permits a high number of pumping cycles before the volume is filled with reactive residual gases; alloy of titanium, zirconium and vanadium
07/28/2005US20050164018 Silicon oxide or silicon oxynitride layers on substrates; high barrier property and better transparency; used as a wrapping material for foods, drugs, a packaging material for electronic devices
07/28/2005US20050164016 Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates
07/28/2005US20050164005 Carbon material produced by heating a carbonaceous material embedded in a mixture of boron nitride and an oxide of boron under nitrogen at one atmosphere pressure; oxidation resistance for weeks at high temperature enabling use as aluminum evaporative boats and the like
07/28/2005US20050162043 Piezoelectric device, liquid jet head, and methods for manufacturing the same, and thin film forming apparatus
07/28/2005US20050161867 Gasifier structure
07/28/2005US20050161831 Method of manufacturing semiconductor device having through hole with adhesion layer thereon
07/28/2005US20050161818 Semiconductor manufacturing apparatus for modifying in-film stress of thin films, and product formed thereby
07/28/2005US20050161678 Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
07/28/2005US20050161630 Uniform mixture of a dielectric material and a ferromagnetic material which is present in the composite at a volume fraction below the conductive percolation threshold of the composite; composite is (partially) transparent to electromagnetic radiation; making on industrial scale, can be locally tuned
07/28/2005US20050161616 Method and apparatus for simultaneously depositing and observing materials on a target
07/28/2005US20050161322 Replaceable target sidewall insert with texturing
07/28/2005US20050161319 Manufacturing method for optical recording medium, and manufacturing device thereof
07/28/2005US20050160979 Method and apparatus for applying a polycrystalline film to a substrate
07/28/2005DE10359508A1 Verfahren und Vorrichtung zum Magnetronsputtern Method and apparatus for magnetron sputtering
07/28/2005DE102004014147A1 Thin plates of dielectric and/or semiconductor material are formed by thermally vaporising the material and then condensing it on a liquid metal film
07/27/2005EP1557883A1 Soi wafer and method for manufacturing soi wafer
07/27/2005EP1557863A2 Antistatic film, spacer using it and picture display unit
07/27/2005EP1557857A1 Plasma display panel, method for producing same and material for protective layer of such plasma display panel
07/27/2005EP1557480A2 Process and dispositive for manufacturing a catalytique layer
07/27/2005EP1557479A1 Substrate having multilayer film and method for manufacturing the same
07/27/2005EP1556902A2 Manufacturing apparatus and method for large-scale production of thin-film solar cells
07/27/2005EP1556526A2 Method of forming a sputtering target assembly and assembly made therefrom
07/27/2005EP1556525A2 Transparent conductive film for flat panel displays
07/27/2005EP1395689B1 Pt-co based sputtering targets
07/27/2005CN1647276A Method for coating metal surfaces and substrate having a coated metal surface as protection for copying process and elements concerned
07/27/2005CN1647261A Method for connecting substrates and composite element
07/27/2005CN1647258A Method for the production of structured layers on substrates
07/27/2005CN1647252A Window type probe, plasma monitoring device, and plasma processing device
07/27/2005CN1647244A Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
07/27/2005CN1647238A Faraday shields and plasma wafer processing
07/27/2005CN1647180A Method of delivering substrates to a film forming device for disk-like substrates, substrate delivering mechanism and mask used in such method, and disk-like recording medium producing method using su
07/27/2005CN1646994A Attenuated embedded phase shift photomask blanks
07/27/2005CN1646725A Device and method for forming thin-film, and method of manufacturing electronic component using the device
07/27/2005CN1646724A Replacement unit and replacement method for substrate in thin-film forming device
07/27/2005CN1646723A Spattering device, method of forming thin film by spattering, and method of manufacturing disk-like recording medium using the device
07/27/2005CN1646722A Method for coating metal surfaces and substrate having a coated metal surface
07/27/2005CN1646721A Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby
07/27/2005CN1646720A Thermal insulation layer system
07/27/2005CN1646418A Method for producing a product having a structured surface
07/27/2005CN1644755A Method of reducing stress in coatings produced by physical vapour deposition
07/27/2005CN1644752A Method for substituting yellow brass piece vacuum ion plating for electroplating
07/27/2005CN1644751A Nanometer crystal CoZnO ultraviolet luminous thin-membrane and production thereof
07/27/2005CN1644608A Acrylate coating methods
07/27/2005CN1644496A Ceramics and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
07/27/2005CN1212086C Personal ornament having white coating film and mfg. method thereof
07/26/2005US6922325 Electrostatic attraction mechanism, surface processing method and surface processing device
07/26/2005US6921741 Superconducting articles
07/26/2005US6921728 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
07/26/2005US6921579 Temporary protective covers
07/26/2005US6921470 Method of forming metal blanks for sputtering targets
07/26/2005US6921465 Uisnf silicon carbide surfaces; sputtering overcoating by controlling concentration; variations in electric power sources
07/26/2005US6921464 Method of manufacturing a thin film battery
07/26/2005US6920853 Variable valve timing control device
07/21/2005WO2005067025A1 Method of forming wiring structure and semiconductor device
07/21/2005WO2005066987A1 Self-healing liquid contact switch
07/21/2005WO2005066387A1 Method for cleaning film-forming apparatuses
07/21/2005WO2005066385A1 Ion implantation system and ion implantation system
07/21/2005WO2005066384A1 Wear-resistant layer and component comprising a wear-resistant layer
07/21/2005WO2005066382A1 Semifinished product made of a fiber-reinforced composite material and method for the production thereof
07/21/2005WO2005066266A1 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum
07/21/2005WO2005049699A3 Applications of a coating material
07/21/2005WO2005045092A3 Elongate vacuum system for coating one or both sides of a flat substrate
07/21/2005WO2005043623A3 Method for forming a dielectric on a metallic layer and capacitor assembly
07/21/2005WO2004052785B1 High purity nickel/vanadium sputtering components; and methods of making sputtering components
07/21/2005US20050159835 Device for and method of creating a model for determining relationship between process and quality
07/21/2005US20050159808 Method for sputtering TiNi shape-memory alloys
07/21/2005US20050158973 Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
07/21/2005US20050158914 Process for manufacturing microelectronic, microoptoelectronic or micromechanical devices
07/21/2005US20050158607 Ultra-low loadings of Au for stainless steel bipolar plates
07/21/2005US20050158575 Method for forming thin film on synthetic resin and multilayer film
07/21/2005US20050156315 Titanium alloy sputtering targets are reactively sputtered in nitrogen-comprising sputtering gas atmosphere to from titanium alloy nitride film; noncolumnar grain structure, low electrical resistivity, high chemical stability, and barrier layer properties comparable or exceeding those of tantalum nitride
07/21/2005US20050156302 System for manufacturing microelectronic, microoptoelectronic or micromechanical devices
07/21/2005US20050155856 Tantalum sputtering target and method for preparation thereof
07/21/2005US20050155855 Vacuum sputtering cathode
07/21/2005US20050155695 Shippable heat-treatable sputter coated article and method of making same