Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2005
03/08/2005US6863397 Optical element and eyeglass lens
03/08/2005US6863018 Ion plating device and ion plating method
03/08/2005CA2109375C Method for making bright trim articles
03/03/2005WO2005020277A2 Electron beam enhanced large area deposition system
03/03/2005WO2005020222A1 Reflection film optical recording medium and silver alloy sputtering target for forming reflection film
03/03/2005WO2005019495A2 Control system for a sputtering system
03/03/2005WO2005019494A1 Method and apparatus for treating sputtering target to reduce burn-in time
03/03/2005WO2005019493A2 Target/backing plate constructions, and methods of forming them
03/03/2005WO2005019492A1 Ito sputtering target
03/03/2005WO2005019125A2 Coated article with silicon nitride inclusive layer adjacent glass
03/03/2005WO2004074538A8 Foodware with multilayer stick resistant ceramic coating and method of making
03/03/2005WO2004017352A3 Method for vapor-depositing a substrate with a needle-shaped x-ray fluorescent material, and x-ray fluorescent material
03/03/2005US20050048876 Fabricating and cleaning chamber components having textured surfaces
03/03/2005US20050048802 Biased pulse DC reactive sputtering of oxide films
03/03/2005US20050048775 Depositing a tantalum film
03/03/2005US20050048197 Process for manufacture of radiation image storage panel
03/03/2005US20050045475 Sputtering apparatus
03/03/2005US20050045472 Stable discharge; forming hard wear resistant overcoating
03/03/2005US20050045471 Process for producing transparent conductive laminate
03/03/2005US20050045470 Varied thickness corresponding to stepped portions for superior utilization; quality liquid crystal displays
03/03/2005US20050045469 Titanium foil metallization product and process
03/03/2005US20050045468 Method for depositing a thin film adhesion layer
03/03/2005US20050045223 Fabricating thin films for solid state storage devices without annealing; low cost, efficient energy conversion
03/03/2005US20050045107 Plasma processing apparatus, protecting layer therefor and installation of protecting layer
03/03/2005US20050045106 Electrostatic chuck having a low level of particle generation and method of fabricating same
03/03/2005US20050045101 Thin-film deposition system
03/03/2005US20050045065 Polycrystalline pellets with a MgO purity of at least 99.0%, a relative density of at least 90.0%, and a gasification component content of 0.01-200 ppm; even when vapor deposition is conducted using electron beam deposition, almost no splash occurs,
03/02/2005EP1510594A2 Low-friction sliding member and low-friction sliding mechanism using same
03/02/2005EP1510593A1 Process for coating a component, component and powder
03/02/2005EP1510592A1 Method for coating an object and object
03/02/2005EP1509634A1 Surface treatment system, surface treatment method and product produced by surface treatment method
03/02/2005EP1509633A1 Apparatus and method for high rate uniform coating, including non-line of sight
03/02/2005EP1509632A2 Method for surface treatment of a doctor blade element
03/02/2005EP1509481A2 Coated articles having a protective coating and cathode targets for making the coated articles
03/02/2005EP1105908B1 Ion beam generation apparatus
03/02/2005CN2682087Y Roll-down type double cathode plane magnetron sputtering metallic film resistant film plating device
03/02/2005CN1589492A Apparatus for manufacturing organic electro-luminescent devices for mass production
03/02/2005CN1589336A Vacuum-coating facility for coating web material
03/02/2005CN1588623A Method or growing N-Al co-blended p type ZnO transistor film by two step method
03/02/2005CN1587438A Low temperature insert layer in gallium nitride film grown through hydride gas phase epitaxy
03/02/2005CN1587437A Sputtering machine table and its sputtering carrying table
03/02/2005CN1587436A Magnetically controlled sputtering coating clamp and its using method
03/02/2005CN1587435A Ti-Al-O-N hard composite coatingand its preparing method
03/02/2005CN1587434A TiN/SiO2 nano multilayer membrane and its preparing method
03/02/2005CN1191655C Method for preparing lithium ion solid electrolyte film with high deposition rate
03/02/2005CN1191654C Method for preparing lithium ion solid electrolyte film with large area
03/02/2005CN1191592C Preparing method for Electrically conducting transparent film
03/02/2005CN1191577C Method for preparing optical recording medium and preparing appts. therefor
03/02/2005CN1191388C Method for controlling a collimated sputtering source and sputtering system
03/02/2005CN1191387C Coating of chromium nitride having wear resistance properties with gradient component
03/02/2005CN1191386C Zinc-aluminium vacuum evaporation coating machine
03/02/2005CN1191145C Friction stir welding of metal matrix composites, ferrous alloys, non-ferrous alloys and superalloys using superabrasive tool
03/02/2005CN1191144C Super abrasive tool an method for friction stir welding
03/01/2005US6861643 Generating a highly directional and highly dense neutral particle beam from a high-density plasma by neutralizing an ion beam generated by the ion extracting portion; etching of electrical thin films; semiconductors
03/01/2005US6861642 Neutral particle beam processing apparatus
03/01/2005US6861614 S system for the formation of a silicon thin film and a semiconductor-insulating film interface
03/01/2005US6861358 Deposition mask and method of preparing the same
03/01/2005US6861130 Sintered polycrystalline gallium nitride and its production
03/01/2005US6861105 Vaporizing chromium hexacaronyl then introducing chromium formed into vapor deposition apparatus; comprises chromium metal-/oxide-/nitride-/ and/or carbide- layer
03/01/2005US6861089 Method of inhibiting production of projections in metal deposited-film
03/01/2005US6861030 Method of manufacturing high purity zirconium and hafnium
03/01/2005US6860977 Method for manufacturing a workpiece using a magnetron sputter source
03/01/2005US6860975 Barrier layer and method of depositing a barrier layer
03/01/2005US6860974 For forming metal oxide films for use as back reflecting layers in semiconductors
03/01/2005US6860973 Device for the regulation of a plasma impedance
03/01/2005US6860965 High throughput architecture for semiconductor processing
03/01/2005US6860075 Device for surface treatment and/or coating and/or producing construction elements, in particular, flat construction elements of glass, glass alloys or metals, by a continuous process
02/2005
02/24/2005WO2005016839A2 Coated article with silicon oxynitride adjacent glass
02/24/2005WO2004106581A3 Transparent conductive oxides
02/24/2005WO2004097063A3 Method for producing silicon oxide film and method for producing optical multilayer film
02/24/2005WO2004092439A3 Method for the production of metal-polymer nanocomposites
02/24/2005WO2004055872A3 Columnar structured material and method of manufacturing the same
02/24/2005WO2003079420A8 Evaporation source for deposition process and insulation fixing plate, and heating wire winding plate and method for fixing heating wire
02/24/2005US20050042959 Anti-static fabric
02/24/2005US20050042863 Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof
02/24/2005US20050042377 Soaking or dipping wood product with sodium silicate solution; then dehydration; forming water insoluble glass protective coating
02/24/2005US20050042376 Controlled sulfur species deposition process
02/24/2005US20050042365 In-line deposition processes for circuit fabrication
02/24/2005US20050041710 Semiconductor laser and method for manufacturing the same
02/24/2005US20050040794 Control system for a sputtering system
02/24/2005US20050040759 Electroluminescent display device, method for manufacturing the same, and electronic equipment
02/24/2005US20050040037 Electron beam enhanced large area deposition system
02/24/2005US20050040034 Coating method and coating
02/24/2005US20050040033 Method of metal sputtering for integrated circuit metal routing
02/24/2005US20050040032 Developing the photoresist layer using a reduced light intensity, by blocks the light beam with a patterned semi-blocked layer, forming different groove depths on optical disks
02/24/2005US20050040031 Ion beam generator has a shield positioned between the ion source and the substrate, for blocking the impurities from impinging the substrate, outside the envelope of the etching beam; spacecraft, semiconductors
02/24/2005US20050040030 Method of treating sputtering target to reduce burn-in time and sputtering target thereof and apparatus thereof
02/24/2005US20050039684 Evaporation source for evaporating an organic electroluminescent layer
02/24/2005US20050039679 Particulate reduction using temperature-controlled chamber shield
02/24/2005US20050039674 Atomic layer deposition method
02/24/2005US20050039425 Semiconductor manufacturing facility utilizing exhaust recirculation
02/24/2005DE10330401B3 Verfahren und Vorrichtung zum bereichsweisen Auftragen von Trennmitteln Method and apparatus for area-wise application of release agents
02/24/2005DE102004030248A1 Reflektierender AG-Legierungsfilm für Reflektoren und Reflektor, welcher mit demselben versehen ist Reflective AG alloy film for reflectors and reflector, which is provided with the same
02/23/2005EP1508674A1 Tappet for internal combustion engine
02/23/2005EP1508395A2 Electrochemical machining device
02/23/2005EP1507894A1 Coating device comprising a conveying device
02/23/2005EP1507893A1 Method and device for the plasma treatment of workpieces
02/23/2005EP1507891A1 Method and device for the plasma treatment of work pieces
02/23/2005EP1507890A1 Method and device for plasma treating workpieces
02/23/2005EP1507889A1 Method and device for plasma treating workpieces