| Patents for C09G 1 - Polishing compositions (7,846) |
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| 06/22/2011 | CN102101981A Polishing solution used for planarization of dielectric material |
| 06/22/2011 | CN102101980A Chemically mechanical polishing slurry |
| 06/22/2011 | CN102101979A Chemical mechanical polishing solution |
| 06/22/2011 | CN102101978A Chemical-mechanical polishing solution |
| 06/22/2011 | CN102101977A Chemically mechanical polishing slurry |
| 06/22/2011 | CN102101976A Chemical mechanical polishing solution |
| 06/21/2011 | US7964005 Copper CMP slurry composition |
| 06/16/2011 | WO2011069345A1 Chemical-mechanical polishing slurry and use thereof |
| 06/16/2011 | WO2011069344A1 Chemical-mechanical polishing liquid |
| 06/16/2011 | WO2011069343A1 Chemical-mechanical polishing liquid for polishing tantalum barrier |
| 06/15/2011 | EP2331650A1 Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
| 06/15/2011 | EP2331649A2 Methods and compositions for polishing silicon-containing substrates |
| 06/15/2011 | CN102099430A Finishing glaze for decorative texturing medium |
| 06/15/2011 | CN102093820A Silicon wafer chemical and mechanical polishing composition with high stability |
| 06/15/2011 | CN102093819A Polishing composition for fine polishing of silicon wafer |
| 06/15/2011 | CN102093818A Chemical mechanical polishing slurry and application thereof |
| 06/15/2011 | CN102093817A Chemical mechanical polishing liquid for polishing tantalum barrier |
| 06/15/2011 | CN102093816A Chemical mechanical polishing liquid |
| 06/15/2011 | CN101642893B Precise polishing method of stainless steel substrate |
| 06/15/2011 | CN101372560B Grinding medium for chemico-mechanical polishing and preparation thereof |
| 06/09/2011 | US20110132227 Nano gel wax |
| 06/09/2011 | DE102009042852B3 Blasting unit for removing materials and for cleaning and dulling workpiece surfaces or abrasive additive in e.g. compressed air system during workpiece cutting process, has recycling fragments from picture tubes of TV sets and monitors |
| 06/08/2011 | EP2329520A1 Cmp method |
| 06/08/2011 | EP2329519A1 Abrasive compositions for chemical mechanical polishing and methods for using same |
| 06/08/2011 | EP2328986A2 Finishing glaze for decorative texturing medium |
| 06/08/2011 | CN101537599B Chemical mechanical polishing method |
| 06/08/2011 | CN101108467B Glass substrate for magnetic disk, its production method and magnetic disk |
| 06/07/2011 | US7955517 Polishing fluid composition |
| 06/04/2011 | CA2721999A1 Nano gel wax |
| 06/03/2011 | WO2011064735A1 Process for removing bulk material layer from substrate and chemical mechanical polishing agent suitable for this process |
| 06/03/2011 | WO2011064734A1 Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
| 06/01/2011 | CN102079951A Household multifunctional polishing agent |
| 06/01/2011 | CN102079950A Preparation method of monodisperse rare earth polishing powder |
| 06/01/2011 | CN101362925B Compound polishing powder for polishing optical elements, preparation method and polishing technology |
| 05/31/2011 | US7951717 Dhemical mechanical polishing; using mixture of water, amphoteric surfactants, anionic surfactant, complexign agents, resin particles and tetramethylammonium hydroxide |
| 05/26/2011 | WO2011060616A1 Chemical-mechanical polishing liquid and use thereof |
| 05/26/2011 | US20110123464 Stabilization of body-care and household products |
| 05/25/2011 | EP2325271A1 Aqueous coating composition |
| 05/25/2011 | EP2061853B1 Concentrated abrasive slurry compositions, methods of production, and methods of use thereof |
| 05/25/2011 | CN102070989A Metal chemical and mechanical polishing slurry |
| 05/25/2011 | CN101333418B CMP polishing compound and method for polishing substrate |
| 05/24/2011 | CA2528079C Wood product and method therefor |
| 05/24/2011 | CA2521517C Methods for machining ceramics |
| 05/19/2011 | WO2011058503A1 A chemical mechanical polishing (cmp) composition comprising inorganic particles and polymer particles |
| 05/19/2011 | DE102010051045A1 Zusammensetzung zum chemisch-mechanischen Polieren und damit zusammenhängende Verfahren A composition for chemical mechanical polishing and related method |
| 05/19/2011 | DE102009046849A1 Aqueous dispersion used in polishing silicon dioxide layers comprising cerium oxide and silicon dioxide is obtainable by mixing cerium oxide and silicon dioxide while stirring, and then dispersing at a specific shear rate |
| 05/18/2011 | EP2321378A1 Chemical-mechanical polishing compositions and methods of making and using the same |
| 05/18/2011 | CN102061134A Polishing solvent for floor maintenance and preparation method thereof |
| 05/18/2011 | CN102061133A Polishing composition for film coating pretreatment of fine glass substrate |
| 05/18/2011 | CN102061132A Chemical mechanical polishing composition and methods relating thereto |
| 05/18/2011 | CN102061131A Polishing liquid for reducing microscratch of surfaces of silicon wafers and preparation and use method thereof |
| 05/18/2011 | CN101648360B Ceramic tile polishing method |
| 05/17/2011 | US7942945 CMP slurry for polymeric interlayer dielectric planarization |
| 05/12/2011 | WO2011054193A1 Chemical-mechanical polishing liquid |
| 05/12/2011 | US20110107680 Method for preparing cerium carbonate |
| 05/11/2011 | CN102051129A Chemical mechanical polishing solution |
| 05/11/2011 | CN102051128A Chemical mechanical polishing solution |
| 05/11/2011 | CN102051127A Chemical mechanical polishing solution |
| 05/11/2011 | CN102051126A Polishing solution for tungsten chemical mechanical polishing |
| 05/11/2011 | CN102051125A Chemical mechanical polishing (CMP) solution |
| 05/04/2011 | CN102046743A Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| 05/04/2011 | CN102044409A Method for carrying out chemically mechanical polishing (CMP) on insulating medium |
| 05/04/2011 | CN102038334A Method for processing surface of highlight edge copper cladding aluminum buckle cover and complete buckle |
| 04/27/2011 | CN102031065A Abrasive-free chemical mechanical polishing compositions |
| 04/27/2011 | CN102031064A Silicon wafer chemical machinery polishing solution with special buffer system |
| 04/27/2011 | CN102031063A Rare earth polishing powder and production method thereof |
| 04/27/2011 | CN101186784B 抛光组合物 The polishing composition |
| 04/26/2011 | US7932313 Aqueous compositions with polyvalent metal ions and dispersed polymers |
| 04/21/2011 | WO2011008631A3 Protective coating compositions |
| 04/20/2011 | CN102020923A Method for preparing surface chemical mechanical polishing liquid for indium antimonide material |
| 04/19/2011 | CA2467806C Method for polishing a substrate surface |
| 04/13/2011 | CN102010670A Preparation method of high-concentration Ti barrier layer surface chemically-mechanical polishing solution |
| 04/13/2011 | CN102010669A Method for preparing CMP (Chemically Mechanical Polishing) solution for sapphire substrate material |
| 04/13/2011 | CN102010668A Method for preparing chemically mechanical polishing (CMP) solution for KTiOPO4 crystal |
| 04/13/2011 | CN102010667A Method for preparing aluminum wiring polishing solution of VLSI (Very Large-Scale Integration) circuit |
| 04/13/2011 | CN102010666A Method for preparing chemical mechanical polishing solution for silicon substrate of ultra large scale integrated circuit |
| 04/13/2011 | CN102010665A Method for preparing polishing solution of tungsten plug in multilayer wiring of ultralarge-scale integrated circuit |
| 04/13/2011 | CN102010664A Method for preparing CMP (Chemical Mechanical Polishing) polishing solution of hard disc indium phosphide substrate |
| 04/13/2011 | CN102010663A Method for preparing chemical mechanical polishing solution of silicon dioxide dielectric |
| 04/13/2011 | CN102010662A Preparation method of ceramic-glass polishing solution |
| 04/13/2011 | CN102010661A Method for preparing chemical and mechanical polishing liquid in ULSI (Ultra Large Scale Integrated) copper surface high-precision machining process |
| 04/13/2011 | CN102010660A Preparation method of chemical mechanical tantalum polishing solution |
| 04/13/2011 | CN102010659A Preparation method of polishing solution for grinding and polishing lithium niobate optical chips |
| 04/13/2011 | CN102010658A Preparation method of chemical and mechanical polishing liquid of tungsten-molybdenum alloy material |
| 04/06/2011 | CN1982401B Cmp abrasive and method for polishing substrate |
| 04/06/2011 | CN101602185B Multi-grade chemical mechanical polishing method of silicon carbide single-crystal surface |
| 04/06/2011 | CN101184817B Polymer restrainer for improving flatness |
| 03/30/2011 | CN101996923A Method for forming shallow trench isolation structure |
| 03/30/2011 | CN101993663A Polishing wax for cleaning floor |
| 03/30/2011 | CN101993662A Preparation method of cerium-based polishing powder suspension |
| 03/30/2011 | CN101993661A Grinding liquid for processing surface curvature radiuses of sapphires and preparation method |
| 03/30/2011 | CN101475180B Purification method of ultra-pure silicon dioxide sol |
| 03/23/2011 | EP2297264A2 A painted surface treating composition, a painted surface treating method and a painted surface patching method |
| 03/23/2011 | EP2297263A2 Stable, high rate silicon slurry |
| 03/23/2011 | CN1966548B Polishing medium for chemical-mechanical polishing, and method of polishing substrate member |
| 03/23/2011 | CN1944496B Polishing slurry, method of producing same, and method of polishing substrate |
| 03/23/2011 | CN101987428A Chemical and mechanical grinding method |
| 03/23/2011 | CN101597066B Preparation method of silica solution seed crystal |
| 03/23/2011 | CN101284952B Abrasive grain CeO2 for chemical and mechanical buffing and method for preparing same |
| 03/16/2011 | EP2293876A1 Ethylene-tetrafluoroethylene phosphate composition |