Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
05/1996
05/09/1996WO1996013861A1 High resolution active matrix lcd cell design
05/09/1996WO1996013860A1 Ferroelectric memory
05/09/1996WO1996013857A1 Stable high voltage semiconductor device structure
05/09/1996DE4439569A1 Silicon bipolar transistor with PNP structure
05/09/1996DE4439012A1 Bidirectional thyristor for high voltage blocking
05/09/1996CA2204136A1 Silicon-on-insulator device with floating collector
05/08/1996EP0710989A2 Field-effect transistor and method of producing same
05/08/1996EP0710988A2 Manufacturing method for semiconductor devices controlled by field effect
05/08/1996EP0710984A1 Method of fabricating monolithic multifunction integrated circuit devices
05/08/1996EP0710843A1 Capacitive acceleration sensor
05/08/1996EP0710826A2 High pressure sensor structure and method
05/08/1996EP0710399A1 Process for fabricating semiconductor devices having arsenic emitters
05/08/1996EP0710357A1 Dielectrically isolated resonant microsensors
05/08/1996CN1122165A Arangement for recovery of threshold voltage shift of noncrystalline siliceous film transistor device
05/07/1996US5515319 Non-volatile memory cell and level shifter
05/07/1996US5515318 Method of evaluating the gate oxide of non-volatile EPROM, EEPROM and flash-EEPROM memories
05/07/1996US5515226 Integrated circuit incorporating a system of protection against electrostatic discharges
05/07/1996US5514949 Current mirror with at least one PNP-transistor
05/07/1996US5514904 Semiconductor device with monocrystalline gate insulating film
05/07/1996US5514903 Compound semiconductor single-crystalline substrate for liquid phase epitaxial growth
05/07/1996US5514902 First and second implantation layer include a material selected from nitrogen, fluorine, argon, oxygen and carbon; source and drain regions are of p-conductivity
05/07/1996US5514898 Semiconductor device with a piezoresistive pressure sensor
05/07/1996US5514896 Nonvolatile semiconductor memory device
05/07/1996US5514894 Protection circuit device for a semiconductor integrated circuit device
05/07/1996US5514891 N-type HIGFET and method
05/07/1996US5514890 Electrically erasable programmable memory device with improved erase and write operation
05/07/1996US5514889 Non-volatile semiconductor memory device and method for manufacturing the same
05/07/1996US5514886 Image sensor with improved output region for superior charge transfer characteristics
05/07/1996US5514883 Field effect transistor
05/07/1996US5514882 Bistable four layer device memory cell and method for storing and retrieving binary information
05/07/1996US5514880 Field effect thin-film transistor for an SRAM with reduced standby current
05/07/1996US5514879 Gate insulated field effect transistors and method of manufacturing the same
05/07/1996US5514876 Multi-terminal resonant tunneling transistor
05/07/1996US5514621 Method of etching polysilicon using a thin oxide mask formed on the polysilicon while doping
05/07/1996US5514620 Method of producing PN junction device
05/07/1996US5514619 Method of producing a laser device
05/07/1996US5514614 Method for producing quantization functional device utilizing a resonance tunneling effect
05/07/1996US5514612 Method of making a semiconductor device with integrated RC network and schottky diode
05/07/1996US5514611 Method of manufacturing a semiconductor memory device having a read-only memory cell
05/07/1996US5514608 Method of making lightly-doped drain DMOS with improved breakdown characteristics
05/07/1996US5514607 Method of manufacturing a semiconductor memory device
05/07/1996US5514606 Formation of stable source, drain and gate contacts while eliminating critical processing steps
05/07/1996US5514604 Vertical channel silicon carbide metal-oxide-semiconductor field effect transistor with self-aligned gate for microwave and power applications, and method of making
05/02/1996WO1996013067A1 Method of, and apparatus for, producing thin film transistor
05/02/1996WO1996013064A1 Process for producing a read-only storage cell arrangement with vertical mos transistors
05/02/1996WO1996012935A1 Expansion gauge for measuring the expansion of single-crystalline semiconductor material
05/02/1996WO1996007300A3 Manufacture of electronic devices comprising thin-film circuitry
05/02/1996DE4438641A1 Power solid state switch of semiconductor switch type
05/02/1996DE4438318A1 CCD with improved quality and reduced defects
05/02/1996DE4437581A1 Verfahren zur Herstellung einer Festwertspeicherzellenanordnung mit vertikalen MOS-Transistoren A method of manufacturing a read-only memory cell arrangement with vertical MOS transistors,
05/02/1996DE19540174A1 Semiconductor sensor for physical parameter measurement
05/02/1996DE19540120A1 Capacitive acceleration sensor for motor vehicle anti-lock brake system
05/02/1996DE19539541A1 Lateral trench MISFET for e.g. integrated control circuit of motor or liquid crystal display
05/01/1996EP0709900A2 Porous silicon trench and capacitor structures
05/01/1996EP0709899A2 Semiconductor diode with electron injector
05/01/1996EP0709898A2 Semiconductor diode and method of fabricating the same
05/01/1996EP0709897A1 Semiconductor device
05/01/1996EP0709896A1 High-frequency lateral PNP transistor
05/01/1996EP0709895A2 A quantum effect device
05/01/1996EP0709894A1 High-frequency bipolar transistor structure, and related manufacturing process
05/01/1996EP0709891A1 Logic level controllable thyristor
05/01/1996EP0709889A2 Structure to protect against below ground current injection
05/01/1996EP0709880A2 Method of forming raised source/drain regions in an integrated circuit
05/01/1996EP0709718A2 Liquid crystal display apparatus and production method thereof
05/01/1996EP0708987A2 Semiconductor device provided with an organic semiconductor material
05/01/1996EP0708984A1 Multilayer buffer structure including ii-vi compounds on a silicon substrate
05/01/1996EP0708983A1 Chemical vapor deposition process for fabricating layered superlattice materials
05/01/1996EP0708980A1 High-frequency wireless communication system on a single ultrathin silicon on sapphire chip
05/01/1996EP0568692B1 Power fet with shielded channels
05/01/1996CN1121643A Process for manufacturing a semiconductor wafer, a semiconductor wafer, process for manufacturing a semiconductor integrated...
05/01/1996CN1121617A Active matrix display and electrooptical device
04/1996
04/30/1996US5512776 Interdigitated IMPATT devices
04/30/1996US5512774 Dielectrically isolated substrate and semiconductor device using the same
04/30/1996US5512773 Switching element with memory provided with Schottky tunnelling barrier
04/30/1996US5512772 Semiconductor device having bipolar transistor and MOS transistor
04/30/1996US5512771 MOS type semiconductor device having a low concentration impurity diffusion region
04/30/1996US5512770 MOSFET device structure three spaced-apart deep boron implanted channel regions aligned with gate electrode of NMOSFET device
04/30/1996US5512769 High breakdown voltage semiconductor device and method of fabricating the same
04/30/1996US5512764 Coupled-quantum-well field-effect resonant tunneling transistor for multi-valued logic/memory applications
04/30/1996US5512762 Quantum device with plural stable states
04/30/1996US5512519 Method of forming a silicon insulating layer in a semiconductor device
04/30/1996US5512518 Method of manufacture of multilayer dielectric on a III-V substrate
04/30/1996US5512517 Self-aligned gate sidewall spacer in a corrugated FET and method of making same
04/30/1996US5512516 Contact structure for connecting an electrode to a semiconductor device and a method of forming the same
04/30/1996US5512506 Lightly doped drain profile optimization with high energy implants
04/30/1996US5512504 Method of making a memory array with field oxide islands eliminated
04/30/1996US5512502 Manufacturing method for semiconductor integrated circuit device
04/30/1996US5512501 Method of manufacturing a semiconductor device having an SOI structure
04/30/1996US5512500 Method of fabricating semiconductor device
04/30/1996US5512499 Method of making symmetrical and asymmetrical MESFETS
04/30/1996US5512496 Method of making collector-up bipolar transistor having improved emitter injection efficiency
04/30/1996US5512495 Method of manufacturing extended drain resurf lateral DMOS devices
04/30/1996US5512494 Method for manufacturing a thin film transistor having a forward staggered structure
04/25/1996WO1996012346A2 A protected switch
04/25/1996WO1996012302A1 Permeable base transistor and process for the preparation thereof
04/25/1996DE4437306A1 Dehnungsmesser zur Messung der Dehnung einkristallinen Halbleitermaterials Strain gauge for measuring strain monocrystalline semiconductor material
04/25/1996DE19539178A1 Halbleiterbeschleunigungssensor und Prüfverfahren für diesen Semiconductor acceleration sensor and test methods for these
04/25/1996DE19538805A1 Semiconductor component with group III=V connection layer for e.g. double heterostructure laser
04/24/1996EP0708516A1 Electrostatic discharge protection device for integrated circuit
04/24/1996EP0708515A1 Protective circuit for protecting load against excessive input voltage