Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
06/2001
06/14/2001US20010003477 Liquid crystal display apparatus and TFT panel
06/14/2001US20010003446 Liquid crystal display device
06/14/2001US20010003378 Semiconductor device and manufacturing method therefor
06/14/2001US20010003368 Open drain input/output structure and manufacturing method thereof in semiconductor device
06/14/2001US20010003367 Trenched dmos device with low gate charges
06/14/2001US20010003366 Semiconductor device, nonvolatile semiconductor storage apparatus using the device, and manufacuture method of the device
06/14/2001US20010003364 Semiconductor and fabrication method thereof
06/13/2001EP1107317A1 Memory device
06/13/2001EP1107304A2 Article comprising a dielectric material of Zr-Ge-Ti-O or Hf-Ge-Ti-O and method of making the same
06/13/2001EP1107294A2 Method for making diaphragm-based sensors and apparatus constructed therewith
06/13/2001EP1105918A2 Field-effect semiconductor devices
06/13/2001EP1105880A1 Method and apparatus for providing an embedded flash-eeprom technology
06/13/2001EP1105742A1 Method for measuring two-dimensional potential distribution in cmos semiconductor components
06/13/2001EP1105344A1 Micromechanical sensor and corresponding production method
06/13/2001DE19959707A1 Mikromechanische Struktur, insbesondere für einen Beschleunigungssensor Micromechanical structure, in particular for an acceleration sensor
06/13/2001DE19958694A1 Steuerbares Halbleiterschaltelement Controllable semiconductor switching element
06/13/2001DE19958151A1 Lateral high voltage semiconductor element used as a DMOS transistor has semiconductor regions on a semiconductor layer of a semiconductor substrate
06/13/2001DE19957540A1 Verfahren zum Herstellen eines Feldeffekttransistors mit Anti-Punch-Through-Implantationsgebiet A method of manufacturing a field effect transistor with non-punch-through implant region
06/13/2001DE19945433A1 Verfahren zur Fertigung von Speicher- und Logiktransistoren A process for the production of memory and logic transistors
06/13/2001CN1299519A Method for babricating and electrically addressable silicon-on-sapphire light valve
06/13/2001CN1299515A Ultra-high resolution liquid crystal display on silicon-on-happhire
06/13/2001CN1299152A Electro-acoustic transducer and its mfg. method, and electro-acoustic transducing using same
06/13/2001CN1299073A Liquid crystal display device and TFT panel
06/12/2001USRE37228 Method of fabricating semiconductor device
06/12/2001US6246973 Modeling method of MOSFET
06/12/2001US6246708 Semiconductor laser with associated electronic components integrally formed therewith
06/12/2001US6246612 Methods of erasing a memory device and a method of programming a memory device for low-voltage and low-power applications
06/12/2001US6246607 Methods of programming nonvolatile memory cells by floating drain or source regions associated therewith
06/12/2001US6246606 Memory using insulator traps
06/12/2001US6246605 Static RAM with improved memory cell pattern
06/12/2001US6246460 Active matrix liquid crystal display devices
06/12/2001US6246458 Method for manufacturing liquid crystal display
06/12/2001US6246453 Electro-optical device
06/12/2001US6246387 Semiconductor display device
06/12/2001US6246119 Structure of a dual damascene
06/12/2001US6246104 Semiconductor device and method for manufacturing the same
06/12/2001US6246103 Bipolar junction transistor with tunneling current through the gate of a field effect transistor as base current
06/12/2001US6246101 Isolation structure and semiconductor device including the isolation structure
06/12/2001US6246096 Totally self-aligned transistor with tungsten gate
06/12/2001US6246095 System and method for forming a uniform thin gate oxide layer
06/12/2001US6246093 Hybrid surface/buried-channel MOSFET
06/12/2001US6246092 High breakdown voltage MOS semiconductor apparatus
06/12/2001US6246091 Lateral MOSFET having a barrier between the source/drain regions and the channel
06/12/2001US6246090 Power trench transistor device source region formation using silicon spacer
06/12/2001US6246089 P-channel EEPROM devices
06/12/2001US6246085 Semiconductor device having a through-hole of a two-level structure
06/12/2001US6246082 Semiconductor memory device with less characteristic deterioration of dielectric thin film
06/12/2001US6246080 Semiconductor device having bent gate electrode and process for production thereof
06/12/2001US6246079 SCR circuit with a high trigger current
06/12/2001US6246077 Semiconductor device
06/12/2001US6246076 Layered dielectric on silicon carbide semiconductor structures
06/12/2001US6246073 Semiconductor device and method for producing the same
06/12/2001US6246071 Zirconia-containing transparent and conducting oxides
06/12/2001US6246070 Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same
06/12/2001US6245689 Annealing silicon wafer substrate in a heated gaseous nitric oxide ambient, evacuation of gas and annealing substrate in a different oxidizing gas ambient to yield a silicon oxynitride diffusion barrier having a gradient nitrogen concentration
06/12/2001US6245687 Precision wide band gap semiconductor etching
06/12/2001US6245652 Method of forming ultra thin gate dielectric for high performance semiconductor devices
06/12/2001US6245649 Method for forming a retrograde impurity profile
06/12/2001US6245630 Spherical shaped semiconductor integrated circuit
06/12/2001US6245628 Method of manufacturing a resistor in a semiconductor device
06/12/2001US6245621 Semiconductor device manufacturing method
06/12/2001US6245619 Disposable-spacer damascene-gate process for SUB 0.05 μm MOS devices
06/12/2001US6245618 Mosfet with localized amorphous region with retrograde implantation
06/12/2001US6245616 Method of forming oxynitride gate dielectric
06/12/2001US6245615 Method and apparatus on (110) surfaces of silicon structures with conduction in the <110> direction
06/12/2001US6245614 Method of manufacturing a split-gate flash memory cell with polysilicon spacers
06/12/2001US6245609 High voltage transistor using P+ buried layer
06/12/2001US6245607 Buried channel quasi-unipolar transistor
06/12/2001US6245606 Forming a temporary aluminum thin film on heated, clean, atomically flat silicon surface of semiconductor integrated circuit, uniformly oxidizing aluminum in an ozone atmosphere to form a thin gate dielectric film
06/12/2001US6245605 Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing
06/12/2001US6245603 Manufacturing method for semiconductor device
06/12/2001US6245602 Top gate self-aligned polysilicon TFT and a method for its production
06/12/2001US6245508 Hybridizing dna of first length to capture probes at site, hybridizing dna of second length to capture probes at another site, observing fluorescent signals as potential is reversed, detecting sites which dehybridize at a potential
06/12/2001US6245451 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
06/12/2001US6244112 Acceleration sensor and process for the production thereof
06/07/2001WO2001041217A1 Low power integrated circuit with decoupling capacitors
06/07/2001WO2001041206A2 Manufacture of trench-gate semiconductor devices
06/07/2001WO2001041205A1 Method for producing a bipolar transistor and method for producing an integrated circuit arrangement with such a bipolar transistor
06/07/2001WO2001041201A1 Process for fabricating a uniform gate oxide of a vertical transistor
06/07/2001WO2001041200A1 Nitrided re-oxidised polysilicon gate to improve hot carrier performance
06/07/2001WO2001041199A1 Integrated memory cell and method of fabrication
06/07/2001WO2001041194A2 Semiconductor circuit arrangement and a method for producing same
06/07/2001WO2001041187A2 Semiconductor circuit arrangement and a method for producing same
06/07/2001WO2001040856A1 Active matrix substrate for liquid crystal display and method of manufacture for making the same
06/07/2001WO2001033619A8 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide
06/07/2001WO2001017025A3 Semi-conductor component as a delaying device and use thereof.
06/07/2001WO1999008284A3 Novel multi-state memory
06/07/2001US20010003061 Manufacture and cleaning of a semiconductor
06/07/2001US20010003056 Semiconductor device and method for fabricating the same
06/07/2001US20010003050 Method of fabricating semiconductor device
06/07/2001US20010003049 Method and mold for manufacturing semiconductor device, semiconductor device, and method for mounting the device
06/07/2001US20010002857 Transmission type liquid crystal display having an organic interlayer elements film between pixel electrodes and switching
06/07/2001US20010002847 Charge transfer device and method of driving the charge transfer device
06/07/2001US20010002720 Semiconductor device using a shallow trench isolation
06/07/2001US20010002717 Protection device and protection method for semiconductor device
06/07/2001US20010002712 Semiconductor memory with floating gate type fet
06/07/2001US20010002709 Process to produce ultrathin crystalline silicon nitride on Si (111 ) for advanced gate dielectrics
06/07/2001US20010002707 Apparatus and method for simulating MOSFET
06/07/2001US20010002706 Semiconductor device
06/07/2001US20010002705 Semiconductor configuration with an Ohmic contact-connection and method for contacting a semiconductor configuration