Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
07/2001
07/24/2001US6265747 Semiconductor device having OHMIC connection that utilizes peak impurity concentration region
07/24/2001US6265746 Highly resistive interconnects
07/24/2001US6265745 Method for producing insulated gate thin film semiconductor device
07/24/2001US6265744 Semiconductor device having a trench structure and method for manufacturing the same
07/24/2001US6265741 Trench capacitor with epi buried layer
07/24/2001US6265739 Non-volatile semiconductor memory device and its manufacturing method
07/24/2001US6265738 Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures
07/24/2001US6265735 Semiconductor device and manufacturing method thereof
07/24/2001US6265731 Ohmic contacts for p-type wide bandgap II-VI semiconductor materials
07/24/2001US6265730 Thin-film transistor and method of producing the same
07/24/2001US6265728 Compound semiconductor device and method for controlling characteristics of the same
07/24/2001US6265727 Solar blind photodiode having an active region with a larger bandgap than one or both if its surrounding doped regions
07/24/2001US6265329 Quantum deposition distribution control
07/24/2001US6265327 Method for forming an insulating film on semiconductor substrate surface and apparatus for carrying out the method
07/24/2001US6265293 CMOS transistors fabricated in optimized RTA scheme
07/24/2001US6265290 Method for fabricating a thin film transistor and a substrate and thin film transistor manufactured using the same
07/24/2001US6265279 Method for fabricating a trench capacitor
07/24/2001US6265277 Method for making a bipolar transistor for the protection of an integrated circuit against electrostatic discharges
07/24/2001US6265276 Structure and fabrication of bipolar transistor
07/24/2001US6265275 Method of selectively doping the intrinsic collector of a vertical bipolar transistor with epitaxial base
07/24/2001US6265269 Method for fabricating a concave bottom oxide in a trench
07/24/2001US6265268 High temperature oxide deposition process for fabricating an ONO floating-gate electrode in a two bit EEPROM device
07/24/2001US6265265 Flash memory cell and fabricating method thereof
07/24/2001US6265259 Method to fabricate deep sub-μm CMOSFETs
07/24/2001US6265249 Method of manufacturing thin film transistors
07/24/2001US6265247 Thin-film transistor and manufacturing method for improved contact hole
07/24/2001US6265243 Process for fabricating organic circuits
07/24/2001US6265238 Electrostatic capacitive sensor and method for manufacturing the same
07/24/2001US6265234 Alignment system for a spherical device
07/24/2001US6264167 Semiconductor device
07/24/2001CA2055665C Field effect transistor
07/19/2001WO2001052398A1 Charge pump circuit
07/19/2001WO2001052326A1 Virtual-ground, split-gate flash memory cell arrangements
07/19/2001WO2001052314A1 Drive transistor with folded gate
07/19/2001WO2001052313A1 Top gate thin-film transistor and method of producing the same
07/19/2001WO2001052306A2 Trench insulated-gate bipolar transistor with improved safe-operating-area
07/19/2001WO2001052271A1 Dielectric material and process for producing the same, and semiconductor device made therewith and process for producing the same
07/19/2001WO2001051931A2 Accelerometer
07/19/2001WO2001006542A3 Method for producing a vertical semiconductor transistor component element and a vertical semiconductor transistor component
07/19/2001WO2000072360A3 Junction insulated lateral mosfet for high/low side switches
07/19/2001WO2000070654A3 Low-resistance vdmos semiconductor component
07/19/2001WO2000044031A3 Power transistor arrangement exhibiting a high level of electric strength
07/19/2001WO2000033354A9 High-efficiency heterostructure thermionic coolers
07/19/2001US20010008799 Forming a stacked semiconductor layer and conductive layer, after forming second conductive layer, by using the same mask providing separation between drain and source electrodes of transistor and connecting pixel electrode to source
07/19/2001US20010008796 Phosphorus atom containing gas such as phosphine is added to the reactive gas to carry out tungsten silicide deposition; enhanced yields without forming voids in the electrode and/or wiring
07/19/2001US20010008791 High temperature pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on sapphire substrates
07/19/2001US20010008788 Double diffused Metal on Semiconductor (DMOS); steps of trench formation completed prior to removal of the patterned trench mask so dopant does not leach out of the p-body since the mask serves as barrier, preventing leakage current
07/19/2001US20010008786 NOR type; floating gates and a common source line, and drains; a region overlapping one of the drains and one of the floating gates in a memory cell is larger than a region overlapping the common source and one of the floating gates
07/19/2001US20010008781 Thin film transistor (TFT); forming polycrystalline silicon and having an off-set area or a lightly doped drain (LDD) structure
07/19/2001US20010008434 Liquid crystal display and method of manufacture
07/19/2001US20010008302 Semiconductor device
07/19/2001US20010008298 Semiconductor device and method of manufacturing same
07/19/2001US20010008295 Semiconductor device and manufacturing method thereof
07/19/2001US20010008294 MOS transistor and fabrication method thereof
07/19/2001US20010008293 MIS transistor and manufacturing method thereof
07/19/2001US20010008291 Semiconductor device and method for manufacturing the same
07/19/2001US20010008288 Semiconductor integrated circuit device having memory cells
07/19/2001US20010008284 Silicon-germanium BiCMOS on SOI
07/19/2001DE10101900A1 Semiconductor component used in integrated circuits comprises zones of various conductivity types, an insulating film, a gate electrode and main electrodes
07/19/2001DE10101568A1 Semiconductor device used as a transistor of the trench-gate type comprises a semiconductor substrate with a trench formed in the main surface and an insulating film arranged on an inner wall of the trench
07/19/2001DE10100194A1 Semiconductor-on-insulator field effect transistor comprises a silicon-germanium layer between an electrically insulating layer and a silicon active layer
07/19/2001DE10060584A1 Bipolar transistor comprises used for high frequency operations a silicon layer, a silicon epitaxial layer of first type, a silicon-germanium epitaxial layer and a silicon epitaxial layer of second type
07/19/2001DE10046945A1 Production of a non-volatile storage device comprises forming trench insulations on a substrate, forming source and drain regions between neighboring insulations
07/19/2001DE10009345C1 Field effect transistor device with trench-shaped gate electrode
07/19/2001CA2397089A1 Accelerometer
07/18/2001EP1116279A1 Semiconductor device
07/18/2001EP1116278A1 Bipolar transistor and method for producing same
07/18/2001EP1116277A1 Connection arrangement for a semiconductor device and method of manufacturing same
07/18/2001EP1116276A1 Semiconductor element with field-forming areas
07/18/2001EP1116275A1 Non-volatile semiconductor memory device
07/18/2001EP1116274A1 Electronic switching device with at least two semiconductor components
07/18/2001EP1116273A1 Semiconductor device comprising a high-voltage circuit element
07/18/2001EP1116270A1 Integrated circuit comprising vertical transistors, and a method for the production thereof
07/18/2001EP1116269A1 Complementary bipolar/cmos epitaxial structure and process
07/18/2001EP1116267A1 Process for making high perf0rmance mosfet with an inverted t-shaped gate electrode
07/18/2001EP1116264A1 Device and method for etching spacers formed upon an integrated circuit gate conductor
07/18/2001EP1116263A2 Method for producing an ohmic contact
07/18/2001EP1116256A1 Vacuum field-effect device and fabrication process therefor
07/18/2001EP1116236A1 Method of making flexibly partitioned metal line segments for a simultaneous operation flash memory device with a flexible bank partition architecture
07/18/2001EP1116038A1 Formation of a bridge in a micro-device
07/18/2001EP1116008A2 Formation of suspended beams using soi substrates, and application to the fabrication of a vibrating gyrometer
07/18/2001EP1115921A2 Method for producing an amorphous or polycrystalline layer on an insulating region
07/18/2001EP1115649A1 Micromechanical component with sealed membrane openings
07/18/2001EP0805985B1 Micromechanical component
07/18/2001CN1304551A Self-aligned methods of fabricating silicon carbide power devices by implantation and lateral diffusions
07/18/2001CN1304547A Method for producing thin film semiconductor device
07/18/2001CN1304546A Method of fabricating silicon carbide power device by controlled annealing
07/18/2001CN1304181A Transistor in nanometer channel and its integrated circuit
07/18/2001CN1304180A Power semiconductor device
07/18/2001CN1304179A Nonvolatile semiconductor storage device
07/18/2001CN1304169A Method of forming silicon-germanium base zone of heterojunction bipolar transistor
07/18/2001CN1304055A Film transistor array panel for liquid crystal display device
07/17/2001US6262926 Nonvolatile semiconductor memory device
07/17/2001US6262917 Structure of a flash memory device
07/17/2001US6262589 TFT array inspection method and device
07/17/2001US6262472 Bipolar transistor compatible with CMOS utilizing tilted ion implanted base
07/17/2001US6262470 Trench-type insulated gate bipolar transistor and method for making the same
07/17/2001US6262469 Capacitor for use in a capacitor divider that has a floating gate transistor as a corresponding capacitor
07/17/2001US6262466 Lateral semiconductor structure for forming a temperature-compensated voltage limitation
07/17/2001US6262462 Enhanced dielectric constant gate insulator