Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
02/2002
02/14/2002US20020018149 Liquid crystal display panel and method of manufactuing the same
02/14/2002US20020017827 Pulsed electron jump generator
02/14/2002US20020017703 Complementary bipolar transistors and manufacturing methods thereof
02/14/2002US20020017697 Semiconductor device and manufacturing method thereof
02/14/2002US20020017696 Semiconductor device with schottky electrode having high schottky barrier
02/14/2002US20020017693 Moscap design for improved reliability
02/14/2002US20020017692 Non-volatile semiconductor memory device having memory cell array suitable for high density and high integration
02/14/2002US20020017691 Semiconductor device having gate electrode and method of fabricating the same
02/14/2002US20020017689 Semiconductor device and method of manufacturing same
02/14/2002US20020017687 Semiconductor device and method for forming the same
02/14/2002US20020017684 Transistor with integrated photodetector for conductivity modulation
02/14/2002US20020017683 High voltage semiconductor device having high breakdown voltage isolation region
02/14/2002US20020017682 Semiconductor device
02/14/2002US20020017681 Semiconductor device and method of manufacture
02/14/2002US20020017680 Non-volatile memory device and fabrication method
02/14/2002US20020017679 Semiconductor device including nonvolatile semiconductor memory devices
02/14/2002US20020017677 Semiconductor device having laminated gate structure and method for manufacturing the semiconductor device
02/14/2002US20020017669 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
02/14/2002US20020017667 Ferroelectric memory and method of fabricating the same
02/14/2002US20020017665 Thin film transistor and method of manufacturing the same
02/14/2002US20020017664 Protective layer for integrated circuits and method for the manufacturing thereof
02/14/2002US20020017662 Manufacturing methods for defect removable semiconductor devices
02/14/2002US20020017659 Semiconductor memory device and manufacturing method thereof
02/14/2002US20020017658 Process for forming amorphous titanium silicon nitride on substrate
02/14/2002US20020017654 Protection device with a silicon-controlled rectifier
02/14/2002US20020017649 Method for producing insulated gate thin film semiconductor device
02/14/2002US20020017648 Semiconductor device
02/14/2002US20020017645 Electro-optical device
02/14/2002US20020017644 Buried channel strained silicon FET using a supply layer created through ion implantation
02/14/2002US20020017643 Display device and method of driving the same
02/14/2002US20020017642 Semiconductor substrate, field effect transistor, method of forming SiGe layer and method of forming strained Si layer using same, and method of manufacturing field effect transistor
02/14/2002US20020017177 Method for sawing wafers employing multiple indexing techniques for multiple die dimensions
02/14/2002US20020017134 Inertia sensor and method of fabricating the same
02/14/2002US20020017133 Surface/bulk micromachined single-crystalline silicon micro-gyroscope
02/14/2002US20020017132 Micro-machining
02/14/2002EP1145286A3 Method for structuring a metalliferous layer
02/14/2002DE10134558A1 Semiconductor sensor for dynamic parameters, has restricted Q factor for flexible elements
02/14/2002DE10134444A1 Semiconductor device for reducing junction leakage current and narrow width effect comprises channel stop impurity region self-aligned by spacer and locally formed only at lower portion of isolation region
02/14/2002DE10121551A1 Reverse conducting thyristor for making an antiparallel connection between a gate-controlled turn-off switch or GCS thyristor and a diode has an isolating area between the diode and a GTO thyristor with a semiconductor substrate.
02/14/2002DE10113967A1 Leistungsmodul Power module
02/14/2002DE10048196A1 Production of a III-V compound semiconductor based on gallium nitride comprises forming the semiconductor stacked structure on a substrate, etching, forming a first electrode, tempering, and forming a second electrode
02/14/2002DE10039327A1 Elektronisches Bauelement und Herstellungsverfahren für elektronisches Bauelement Electronic device and manufacturing method of electronic component
02/14/2002DE10036911A1 Multi-Bit-Speicherzelle und Verfahren zur Herstellung Multi-bit memory cell and method for producing
02/14/2002DE10036208A1 Current control semiconductor device has current within lateral channel region controlled via at least one depletion zone
02/14/2002DE10026911A1 Verfahren zur Herstellung einer halbleitenden Nanostruktur und Aggregat davon A process for producing a semiconducting nanostructure and aggregate thereof
02/14/2002DE10026553A1 Heterostructure FET consists of a silicon/silicon-germanium heterostructure layer arrangement with a gate contact zone formed as a pn- or np-diode contact made of semiconductor material
02/13/2002EP1179859A2 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device
02/13/2002EP1179853A1 High breakdown voltage semiconductor device
02/13/2002EP1179850A2 A semiconductor memory and its production process
02/13/2002EP1179837A2 Transistor structure comprising doped zirconia, or zirconia-like dielectic film
02/13/2002EP1179620A1 Silicon carbide and method of manufacturing the same
02/13/2002EP1179381A2 Surface treatment apparatus
02/13/2002EP1179218A1 Semiconductor device and method of manufacturing same
02/13/2002CN1336010A Layered dielectric on silicon carbide semiconductor structures
02/13/2002CN1335649A Bidirectional triggered diode for semiconductor
02/13/2002CN1335648A MOS field effect tube (FEI) for reducing source-drain interelectrode resistance and its producing method
02/13/2002CN1335646A Surface adhered diode array and its manufacture
02/13/2002CN1079165C Method for forming impurity junction regions of semiconductor device
02/12/2002US6347053 Nonviolatile memory device having improved threshold voltages in erasing and programming operations
02/12/2002US6346978 SOI TFT array substrate for LCD projection display
02/12/2002US6346840 Electronic device for controlling the “bouncing” in electronic circuits integrated on semiconductor substrate
02/12/2002US6346740 Semiconductor device
02/12/2002US6346735 Semiconductor sensor structure and method of manufacturing the same
02/12/2002US6346731 Semiconductor apparatus having conductive thin films
02/12/2002US6346730 Liquid crystal display device having a pixel TFT formed in a display region and a drive circuit formed in the periphery of the display region on the same substrate
02/12/2002US6346729 Pseudo silicon on insulator MOSFET device
02/12/2002US6346728 Plural transistor device with multi-finger structure
02/12/2002US6346727 Semiconductor device having optimized two-dimensional array of double diffused MOS field effect transistors
02/12/2002US6346726 Low voltage MOSFET power device having a minimum figure of merit
02/12/2002US6346720 Layered group III-V compound semiconductor, method of manufacturing the same, and light emitting element
02/12/2002US6346718 Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same
02/12/2002US6346717 Semiconductor device, substrate for electro-optical device, electro-optical device, electronic device and projection display
02/12/2002US6346487 Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer
02/12/2002US6346486 Transistor device and method of forming the same
02/12/2002US6346467 Method of making tungsten gate MOS transistor and memory cell by encapsulating
02/12/2002US6346465 Semiconductor device with silicide contact structure and fabrication method thereof
02/12/2002US6346464 Manufacturing method of semiconductor device
02/12/2002US6346463 Method for forming a semiconductor device with a tailored well profile
02/12/2002US6346462 Method of fabricating a thin film transistor
02/12/2002US6346453 Planarizing polycrystalline silicon layer to expose mesa; etching to expose
02/12/2002US6346452 Method for controlling an N-type dopant concentration depth profile in bipolar transistor epitaxial layers
02/12/2002US6346451 Laterial thin-film silicon-on-insulator (SOI) device having a gate electrode and a field plate electrode
02/12/2002US6346450 Process for manufacturing MIS transistor with self-aligned metal grid
02/12/2002US6346448 Method of manufacturing a semiconductor device
02/12/2002US6346447 Shallow-implant elevated source/drain doping from a sidewall dopant source
02/12/2002US6346446 Methods of forming features of integrated circuits using modified buried layers
02/12/2002US6346444 Power semiconductor device using semi-insulating polycrystalline silicon and fabrication method thereof
02/12/2002US6346443 Non-volatile semiconductor memory device
02/12/2002US6346441 Method of fabricating flash memory cell using two tilt implantation steps
02/12/2002US6346439 Semiconductor transistor devices and methods for forming semiconductor transistor devices
02/12/2002US6346438 Method of manufacturing a semiconductor device
02/12/2002US6346437 Single crystal TFT from continuous transition metal delivery method
02/12/2002US6346436 Quantum thin line producing method and semiconductor device
02/12/2002US6346424 Process for producing high-epsilon dielectric layer or ferroelectric layer
02/12/2002CA2126649C Method and circuit arrangement for measuring the depletion layer temperature of a gto (gate turn-off) thyristor
02/07/2002WO2002011216A1 Field effect transistor, circuit arrangement and method for production of a field effect transistor
02/07/2002WO2002011212A1 W/wc/tac ohmic and rectifying contacts on sic
02/07/2002WO2002011211A2 An optical device and a method of making an optical device
02/07/2002WO2002011210A1 Inverter
02/07/2002WO2002011145A2 Method for producing a multi-bit memory cell