| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/08/2013 | CN103094146A Cleaning apparatus, measurement method and calibration method |
| 05/08/2013 | CN103094145A End point detection in grinding |
| 05/08/2013 | CN103094144A Method used for forecasting threshold voltage of metal oxide semiconductor (MOS) tube |
| 05/08/2013 | CN103094143A Ion implantation monitoring method |
| 05/08/2013 | CN103094142A Special wafer layout configuration method used for detecting probe card and manufacture of wafer |
| 05/08/2013 | CN103094141A Judgment method of punchthrough of PN junction device |
| 05/08/2013 | CN103094140A Semiconductor device assembly method and semiconductor device assembly jig |
| 05/08/2013 | CN103094139A Flip chip bonding method |
| 05/08/2013 | CN103094138A Three-dimensional (3d) integrated circuit with enhanced copper-to-copper bonding and forming method thereof |
| 05/08/2013 | CN103094137A Methods of and semiconductor device with ball strength improvement |
| 05/08/2013 | CN103094136A Forming method for semiconductor device |
| 05/08/2013 | CN103094135A Encapsulation method for flip chip |
| 05/08/2013 | CN103094134A Method and chip of increasing thickness of metal layer of chip bonding block area |
| 05/08/2013 | CN103094133A Semiconductor device mounting substrate |
| 05/08/2013 | CN103094132A Manufacture process using widened mould fake cavity to optimize secondary plastic package part |
| 05/08/2013 | CN103094131A Stacked packages using laser direct structuring |
| 05/08/2013 | CN103094130A Apparatus and methods for molded underfills in flip chip packaging |
| 05/08/2013 | CN103094129A Packaging technology of semiconductor device |
| 05/08/2013 | CN103094128A Fan-out Panel Level ball grid array (BGA) package part manufacture process |
| 05/08/2013 | CN103094127A Pasting-mounted clamp of direct bonding copper base plate used for packing insulated gate bipolar transistor (IGBT) module |
| 05/08/2013 | CN103094126A Preparation method of subtle stereoscopic conducting circuit of ceramic element |
| 05/08/2013 | CN103094125A Integrated method of carbon nano tube heat dissipation structure and electronic device |
| 05/08/2013 | CN103094124A Structure and manufacturing method of high pressure technotron |
| 05/08/2013 | CN103094123A Thin film transistor manufacturing method |
| 05/08/2013 | CN103094122A Preparation technology of low-pressure ZnO thin film transistor of bottom-gate structure |
| 05/08/2013 | CN103094121A Method For Forming A Semiconductor Device |
| 05/08/2013 | CN103094120A Manufacturing method of semiconductor structure |
| 05/08/2013 | CN103094119A Manufacturing method of semiconductor device |
| 05/08/2013 | CN103094118A Technique method of manufacturing double-layer gate groove metal oxide semiconductor (MOS) |
| 05/08/2013 | CN103094117A Technique method of manufacturing bottom thick grate oxide layer groove metal oxide semiconductor (MOS) |
| 05/08/2013 | CN103094116A Technique method of manufacturing groove metal oxide semiconductor (MOS) |
| 05/08/2013 | CN103094115A Technique method of manufacturing double-layer gate groove metal oxide semiconductor (MOS) |
| 05/08/2013 | CN103094114A Manufacturing method of transistor |
| 05/08/2013 | CN103094113A Formation method of n-channel metal oxide semiconductor (NMOS) and formation method of complementary metal oxide semiconductor (CMOS) |
| 05/08/2013 | CN103094112A Formation method of fin parts of fin type transistor |
| 05/08/2013 | CN103094111A Double diffusion metal oxide semi-conductor (DMOS) device and manufacturing method thereof |
| 05/08/2013 | CN103094110A Method of manufacturing semiconductor device |
| 05/08/2013 | CN103094109A Method of manufacturing semiconductor device |
| 05/08/2013 | CN103094108A Manufacturing method for semiconductor device |
| 05/08/2013 | CN103094107A Filling method of silicon epitaxy for deep trench |
| 05/08/2013 | CN103094106A Preparation method for alternant P-typed and N-typed thin semiconductor layer |
| 05/08/2013 | CN103094105A A face normally closed type high electron mobility transistor (HEMT) manufacturing method through adoption of GaN self-imaging template |
| 05/08/2013 | CN103094104A Bipolar horizontal plug and play (PNP) tube manufacture process using phosphorus buried layer and concentrated phosphorus buried technique |
| 05/08/2013 | CN103094103A Preparation method of audion and prepared audion using method |
| 05/08/2013 | CN103094102A Method of eliminating etching residue of emitting electrode polycrystalline silicon in duotriode type transistor technology |
| 05/08/2013 | CN103094101A Manufacturing method of semiconductor device for ESD protection |
| 05/08/2013 | CN103094100A Method of forming schottky diode |
| 05/08/2013 | CN103094099A Method of wafer annealing after bonding |
| 05/08/2013 | CN103094098A Method for solving problem of wafer breaking |
| 05/08/2013 | CN103094097A Manufacturing method for semiconductor device |
| 05/08/2013 | CN103094096A Peeling craft method used for forming semiconductor component metal graph |
| 05/08/2013 | CN103094095A Method to manufacture semi-conductor device |
| 05/08/2013 | CN103094094A Prepared method of ultrathin semiconductor chip |
| 05/08/2013 | CN103094093A Method and device for photoresist coating |
| 05/08/2013 | CN103094092A Method of solving residues after protection ring is etched |
| 05/08/2013 | CN103094091A Etching method of semi-conductor device |
| 05/08/2013 | CN103094090A Method making back of wafer flat |
| 05/08/2013 | CN103094089A Fin field effect transistor gate oxide |
| 05/08/2013 | CN103094088A Technique for improving radio frequency (RF) lateral double-diffused metal-oxide semiconductor (LDMOS) grid electrode metal silicide forming |
| 05/08/2013 | CN103094087A Method of etching groove polycrystalline silicon gate |
| 05/08/2013 | CN103094086A Formation method of complementary metal oxide semi-conductor transistor (CMOS) |
| 05/08/2013 | CN103094085A Formation method of complementary metal oxide semi-conductor transistor (CMOS) |
| 05/08/2013 | CN103094084A Method of eliminating silicon nitride side wall, formation transistor and semi-conductor device |
| 05/08/2013 | CN103094083A Method of eliminating silicon nitride side wall, formation transistor and semi-conductor device |
| 05/08/2013 | CN103094082A Method to manufacture semi-conductor device |
| 05/08/2013 | CN103094081A Crystallization apparatus, crystallization method, organic light emitting display apparatus and method of manufacturing organic light emitting display apparatus |
| 05/08/2013 | CN103094080A Ion layer preparation method and device of graphene semiconductor |
| 05/08/2013 | CN103094079A Method for improving power metal oxide semiconductor (MOS) device unclamped inductive switching (UIS) performance |
| 05/08/2013 | CN103094078A Gallium nitride extension preparation method for semiconductor device |
| 05/08/2013 | CN103094077A Method of forming silicon oxide film |
| 05/08/2013 | CN103094076A Method for improving 0.18mu m technology metal injection molding (MIM) capacitive performance |
| 05/08/2013 | CN103094075A Method for forming long seamless filling amorphous silicon groove |
| 05/08/2013 | CN103094074A Technique method of manufacturing bottom thick gate oxide layer groove Metal Oxide Semiconductor (MOS) through selective epitaxy |
| 05/08/2013 | CN103094073A Preparation method of semi-insulating silicon carbide substrate titanium ohmic contact electrode |
| 05/08/2013 | CN103094072A Method of improving uniformity of photoetching critical size of wafer upper gate electrode |
| 05/08/2013 | CN103094071A Method for producing zinc oxide on gallium nitride and application thereof |
| 05/08/2013 | CN103094070A Semiconductor device comprising pair of matched capacitors, method for form capacitors, and method for forming resistor |
| 05/08/2013 | CN103094069A Pixel structure and manufacturing method thereof |
| 05/08/2013 | CN103094068A High-density and embedded-type capacitor and manufacturing method of the same |
| 05/08/2013 | CN103094067A Manufacture method of semi-conductor device |
| 05/08/2013 | CN103094066A Cleaning method of wafer in production |
| 05/08/2013 | CN103094037A Holding device and plasma processing device using the same |
| 05/08/2013 | CN103094035A Method and device of broadband bundle uniformity controlling |
| 05/08/2013 | CN103092009A Removing method of photoresist used as masking layer of plasma injection |
| 05/08/2013 | CN103091998A Lithographic apparatus and substrate handling method |
| 05/08/2013 | CN103091995A Method for reducing chip edge photoresistance slope region |
| 05/08/2013 | CN103091987A Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device |
| 05/08/2013 | CN103091981A Method for manufacturing metal grid template for photolithography by utilizing self-assembling ball |
| 05/08/2013 | CN103091971A Mask plate and manufacturing method thereof, and method for monitoring fog pollutions of mask plate |
| 05/08/2013 | CN103091921A Array substrate, preparation method of array substrate and display device of array substrate |
| 05/08/2013 | CN103091919A Array substrate, preparation method of array substrate and display device of array substrate |
| 05/08/2013 | CN103091914A Fringe Field Switching Liquid Crystal Display Device And Method Of Fabricating The Same |
| 05/08/2013 | CN103091912A Array Substrate, Liquid Crystal Display For The Same And Manufacturing Method Thereof |
| 05/08/2013 | CN103091878A Repairing method of glass substrate |
| 05/08/2013 | CN103091515A Jig For Use In Semiconductor Test And Method Of Measuring Breakdown Voltage By Using The Jig |
| 05/08/2013 | CN103091326A Method for identifying defect type |
| 05/08/2013 | CN103090931A System for monitoring needle cylinder remaining amount and chip mounting machine comprising same |
| 05/08/2013 | CN103088431A Device for eliminating phosphorus oxychloride in phosphorus diffusion furnace |
| 05/08/2013 | CN103088430A Improved structure of device for eliminating phosphorus oxychloride in phosphorus diffusion furnace |
| 05/08/2013 | CN103088429A Method for eliminating phosphorus oxychloride in phosphorus diffusion furnace |