Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2013
04/30/2013US8431438 Forming in-situ micro-feature structures with coreless packages
04/30/2013US8431437 Packaging method involving rearrangement of dice
04/30/2013US8431435 Edge connect wafer level stacking
04/30/2013US8431431 Structures with through vias passing through a substrate comprising a planar insulating layer between semiconductor layers
04/30/2013US8431430 Method for forming a compound semi-conductor thin-film
04/30/2013US8431428 Optical device wafer processing method and laser processing apparatus
04/30/2013US8431427 Photovoltaic module manufacture
04/30/2013US8431426 Coating method for liquid crystal alignment film of TFT-LCD
04/30/2013US8431425 Method for fabricating image sensor with uniform photosensitizing sensitivity
04/30/2013US8431424 Liquid crystal display panel and fabrication method thereof
04/30/2013US8431421 Test patterns for detecting misalignment of through-wafer vias
04/30/2013US8431420 Manufacturing method of ultrasonic probe and ultrasonic probe
04/30/2013US8431419 UV absorption based monitor and control of chloride gas stream
04/30/2013US8431418 Method of manufacturing magnetic tunnel junction device and apparatus for manufacturing the same
04/30/2013US8431417 Methods for increasing carbon nano-tube (CNT) yield in memory devices
04/30/2013US8431344 Micro and nano scale fabrication and manufacture by spatially selective deposition
04/30/2013US8431281 Methods of operating fuel cells
04/30/2013US8431240 Metal plating using seed film
04/30/2013US8431035 Plasma processing apparatus and method
04/30/2013US8430992 Protective self-aligned buffer layers for damascene interconnects
04/30/2013US8430966 Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate
04/30/2013US8430962 Gas supply device, substrate processing apparatus and substrate processing method
04/30/2013US8430961 Source gas flow path control in PECVD system to control a by-product film deposition on inside chamber
04/30/2013US8430960 Deposition systems and susceptor assemblies for depositing a film on a substrate
04/30/2013US8430716 Polishing method and polishing apparatus
04/30/2013US8430620 Dedicated hot and cold end effectors for improved throughput
04/30/2013US8430326 Semiconductor device
04/30/2013US8429813 Process to allow electrical and mechanical connection of an electrical device with a face equipped with contact pads
04/29/2013DE202013003394U1 Vorrichtung zur optimalen Justierung der Linsenplatte in einem CPV-Modul Apparatus for optimal adjustment of the lens plate in a CPV module
04/25/2013WO2013059806A1 Novel Passivation Composition and Process
04/25/2013WO2013059757A1 Techniques for tiling arrays of pixel elements
04/25/2013WO2013059705A1 Systems and methods of wafer grinding
04/25/2013WO2013059670A2 Octahedral and pyramid-on-post tips for microscopy and lithography
04/25/2013WO2013059591A1 Apparatus and method for providing uniform flow of gas
04/25/2013WO2013059457A1 Direct formation of graphene on semiconductor substrates
04/25/2013WO2013059453A1 Temperature control system and method for a chamber or platform
04/25/2013WO2013059297A1 Microelectronic package with stacked microelectronic units and method for manufacture thereof
04/25/2013WO2013059181A1 Package-on-package assembly with wire bond vias
04/25/2013WO2013059132A1 Switched electron beam plasma source array for uniform plasma production
04/25/2013WO2013059130A1 Electron beam plasma source with profiled conductive fins for uniform plasma generation
04/25/2013WO2013059129A1 Electron beam plasma source with profiled magnet shield for uniform plasma generation
04/25/2013WO2013059126A1 Electron beam plasma source with segmented beam dump for uniform plasma generation
04/25/2013WO2013059102A1 Multiple complementary gas distribution assemblies
04/25/2013WO2013059101A1 Electron beam plasma source with profiled chamber wall for uniform plasma generation
04/25/2013WO2013059097A1 Overhead electron beam source for plasma ion generation in a workpiece processing region
04/25/2013WO2013059094A1 Electron beam plasma source with arrayed plasma sources for uniform plasma generation
04/25/2013WO2013059093A1 E-beam plasma source with profiled e-beam extraction grid for uniform plasma generation
04/25/2013WO2013059010A1 Replacement gate multigate transistor for embedded dram
04/25/2013WO2013059009A1 Semiconductor substrate cleaning apparatus, systems, and methods
04/25/2013WO2013058970A1 Substrate support bushing
04/25/2013WO2013058917A1 Memory cells and memory cell arrays
04/25/2013WO2013058909A1 Finfet structure and method to adjust threshold voltage in a finfet structure
04/25/2013WO2013058872A1 Mechanical suppression of parasitic plasma in substrate processing chamber
04/25/2013WO2013058770A1 Non-amine post-cmp composition and method of use
04/25/2013WO2013058760A1 Memristive element based on hetero-junction oxide
04/25/2013WO2013058746A1 Antifuse element utilizing non-planar topology
04/25/2013WO2013058610A1 Hot plate and method of manufacturing the same
04/25/2013WO2013058557A2 Substrate alignment device
04/25/2013WO2013058471A1 Apparatus and method for manufacturing fine pattern using interferogram of optical axis direction
04/25/2013WO2013058454A1 Substrate processing apparatus
04/25/2013WO2013058380A1 Adhesive composition, connection structure and method for producing same
04/25/2013WO2013058379A1 Microwave heating device and microwave heating method
04/25/2013WO2013058317A1 Radiographic image capturing apparatus
04/25/2013WO2013058300A1 Curable composition for imprint and method for storing same
04/25/2013WO2013058299A1 Solder bump formation method and device
04/25/2013WO2013058292A1 Method for producing transparent soi wafers
04/25/2013WO2013058290A1 Adhesive tape for semiconductor device dicing
04/25/2013WO2013058250A1 Radiation-sensitive resin composition
04/25/2013WO2013058234A1 Semiconductor device fabrication method and semiconductor device
04/25/2013WO2013058226A1 Semiconductor device and method for producing same
04/25/2013WO2013058222A1 Solid-phase bonded wafer support substrate detachment method and semiconductor device fabrication method
04/25/2013WO2013058191A1 Semiconductor device and manufacturing method therefor
04/25/2013WO2013058183A1 Polishing pad and method for producing same
04/25/2013WO2013058129A1 Separation device, separation system and separation method
04/25/2013WO2013058094A1 Workpiece holding device
04/25/2013WO2013058070A1 Method for etching semiconductor substrate
04/25/2013WO2013058064A1 Piezoelectric element and method for manufacturing same
04/25/2013WO2013058053A1 Bonding device and bonding position adjustment method using said bonding device
04/25/2013WO2013058052A1 Bonding device and bonding method
04/25/2013WO2013058037A1 Silicon carbide semiconductor device and method for manufacturing same
04/25/2013WO2013058023A1 Cleaning device and cleaning method
04/25/2013WO2013058020A1 Semiconductor device and semiconductor device manufacturing method
04/25/2013WO2013058004A1 Waste working fluid recirculation apparatus
04/25/2013WO2013057992A1 Waste working fluid recirculation apparatus
04/25/2013WO2013057949A2 Manufacturing method for semiconductor package, semiconductor package, and semiconductor device
04/25/2013WO2013057920A1 Non-volatile storage element and method for manufacturing same
04/25/2013WO2013057887A1 Epitaxial wafer and method for manufacturing same
04/25/2013WO2013057865A1 Method for reclaiming peeled-off wafer
04/25/2013WO2013057835A1 Thin film forming apparatus
04/25/2013WO2013057785A1 Semiconductor device
04/25/2013WO2013057771A1 Method for manufacturing thin-film transistor
04/25/2013WO2013057766A1 Thin-film transistor device and method for producing same
04/25/2013WO2013057642A1 Through-wafer via device and method of manufacturing the same
04/25/2013WO2013057638A1 Method and apparatus for processing wafer-shaped articles
04/25/2013WO2013057617A1 Low warpage wafer bonding through use of slotted substrates
04/25/2013WO2013057465A2 Solder ball placement method and apparatus
04/25/2013WO2013057456A2 Method for producing an organised network of semiconductor nanowires, in particular made of zno
04/25/2013WO2013057448A1 Process for the thickness growth of colloidal nanosheets and materials composed of said nanosheets
04/25/2013WO2013057446A1 Method of increasing the thickness of colloidal nanosheets and materials consisting of said nanosheets
04/25/2013WO2013057390A1 Method of controlling an ion implanter in plasma immersion mode