Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2013
05/14/2013US8440571 Methods for deposition of silicon carbide and silicon carbonitride films
05/14/2013US8440570 Method for manufacturing semiconductor device
05/14/2013US8440569 Method of eliminating a lithography operation
05/14/2013US8440568 Substrate etching method and system
05/14/2013US8440567 Semiconductor processing methods
05/14/2013US8440566 Method for forming an aluminum nitride thin film
05/14/2013US8440565 Semiconductor apparatus manufacturing method and semiconductor apparatus
05/14/2013US8440564 Schemes for forming barrier layers for copper in interconnect structures
05/14/2013US8440563 Film forming method and processing system
05/14/2013US8440562 Germanium-containing dielectric barrier for low-K process
05/14/2013US8440560 Method for fabricating tungsten line and method for fabricating gate of semiconductor device using the same
05/14/2013US8440559 Work function adjustment in high-K metal gate electrode structures by selectively removing a barrier layer
05/14/2013US8440557 Method for fabricating a semiconductor device by considering the extinction coefficient during etching of an interlayer insulating film
05/14/2013US8440556 Forming conformal metallic platinum zinc films for semiconductor devices
05/14/2013US8440555 Method for analyzing electrolytic copper plating solution
05/14/2013US8440553 Method of producing a vertically inhomogeneous platinum or gold distribution in a semiconductor substrate and in a semiconductor device
05/14/2013US8440552 Method to form low series resistance transistor devices on silicon on insulator layer
05/14/2013US8440551 Plasma doping method and manufacturing method of semiconductor device
05/14/2013US8440550 Method for forming strained layer with high Ge content on substrate and semiconductor structure
05/14/2013US8440549 Compound semiconductor device including aln layer of controlled skewness
05/14/2013US8440548 Manufacturing method of microcrystalline silicon film and manufacturing method of thin film transistor
05/14/2013US8440547 Method and structure for PMOS devices with high K metal gate integration and SiGe channel engineering
05/14/2013US8440546 Methods and devices for fabricating and assembling printable semiconductor elements
05/14/2013US8440545 Method of manufacturing semiconductor device with spraying fluid
05/14/2013US8440544 CMOS structure and method of manufacture
05/14/2013US8440543 Hybrid circuit structure and partial backfill method for improving thermal cycling reliability of same
05/14/2013US8440542 Semiconductor device and structure
05/14/2013US8440541 Methods for reducing the width of the unbonded region in SOI structures
05/14/2013US8440540 Method for doping a selected portion of a device
05/14/2013US8440539 Isolation trench processing for strain control
05/14/2013US8440538 Method of manufacturing airbridge
05/14/2013US8440537 Adsorption site blocking method for co-doping ALD films
05/14/2013US8440535 Forming a phase change memory with an ovonic threshold switch
05/14/2013US8440534 Threshold adjustment for MOS devices by adapting a spacer width prior to implantation
05/14/2013US8440533 Self-aligned contact for replacement metal gate and silicide last processes
05/14/2013US8440532 Structure and method for making metal semiconductor field effect transistor (MOSFET) with isolation last process
05/14/2013US8440531 Methods of forming semiconductor memory devices having vertically stacked memory cells therein
05/14/2013US8440530 Methods of forming highly scaled semiconductor devices using a disposable spacer technique
05/14/2013US8440529 Method of manufacturing superjunction structure
05/14/2013US8440528 Method for manufacturing a vertical nonvolatile semiconductor memory device including forming floating gates within the recesses created on the interlayer insulating films
05/14/2013US8440527 Memory device and method of fabricating the same
05/14/2013US8440526 Method of fabricating memory
05/14/2013US8440525 Method for obtaining extreme selectivity of metal nitrides and metal oxides
05/14/2013US8440524 Semiconductor device manufacturing method
05/14/2013US8440523 Micromechanical device and methods to fabricate same using hard mask resistant to structure release etch
05/14/2013US8440522 Increasing an electrical resistance of a resistor by oxidation
05/14/2013US8440521 Method of manufacturing a semiconductor device
05/14/2013US8440520 Diffused cap layers for modifying high-k gate dielectrics and interface layers
05/14/2013US8440519 Semiconductor structures using replacement gate and methods of manufacture
05/14/2013US8440518 Method for manufacturing a pattern formed body, method for manufacturing a functional element, and method for manufacturing a semiconductor element
05/14/2013US8440517 FinFET and method of fabricating the same
05/14/2013US8440516 Method of forming a field effect transistor
05/14/2013US8440515 Method of forming a field effect transistor
05/14/2013US8440514 Semiconductor device and method for manufacturing the same
05/14/2013US8440513 Method of semiconductor processing
05/14/2013US8440512 Circuits and methods for improved FET matching
05/14/2013US8440511 Method for manufacturing multi-gate transistor device
05/14/2013US8440510 Method for manufacturing semiconductor device
05/14/2013US8440509 Method for producing a semiconductor device by etch back process
05/14/2013US8440508 Hydrogen barrier for ferroelectric capacitors
05/14/2013US8440507 Lead frame sulfur removal
05/14/2013US8440506 Microelectronic package and method for a compression-based mid-level interconnect
05/14/2013US8440505 Semiconductor chips including passivation layer trench structure
05/14/2013US8440504 Method for aligning and bonding elements and a device comprising aligned and bonded elements
05/14/2013US8440503 Methods for performing reflow in bonding processes
05/14/2013US8440502 Semiconductor device and method for manufacturing the semiconductor device
05/14/2013US8440500 Light emitting device
05/14/2013US8440499 Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device
05/14/2013US8440498 Thin-film devices formed from solid particles
05/14/2013US8440497 Fabricating kesterite solar cells and parts thereof
05/14/2013US8440496 Solar cell with conductive material embedded substrate
05/14/2013US8440495 Method for reducing crosstalk in image sensors using implant technology
05/14/2013US8440494 Single-crystalline silicon alkaline texturing with glycerol or ethylene glycol additives
05/14/2013US8440492 Assembly techniques for solar cell arrays and solar cells formed therefrom
05/14/2013US8440489 Method of manufacturing solar cell
05/14/2013US8440488 Manufacturing method and structure for wafer level image sensor module with fixed focal length
05/14/2013US8440487 Methods for manufacturing radio frequency (RF) powder
05/14/2013US8440486 Electrophoretic display device and method of fabricating the same
05/14/2013US8440484 Semiconductor device and fabrication method thereof
05/14/2013US8440481 Manufacturing method of the electronic component
05/14/2013US8440479 Method for forming an organic light emitting diode device
05/14/2013US8440477 Method for manufacturing LED
05/14/2013US8440476 Method for producing zinc oxide-based semiconductor light-emitting device and zinc oxide-based semiconductor light-emitting device
05/14/2013US8440475 Alignment calculation
05/14/2013US8440474 Chip quality determination method and marking mechanism using same
05/14/2013US8440473 Use of spectrum to synchronize RF switching with gas switching during etch
05/14/2013US8440472 Stacking apparatus and method for stacking integrated circuit elements
05/14/2013US8440471 Low-cost non-volatile flash-RAM memory
05/14/2013US8440388 Method to restore hydrophobicity in dielectric films and materials
05/14/2013US8440272 Method for forming post passivation Au layer with clean surface
05/14/2013US8440137 Au bonding wire for semiconductor device
05/14/2013US8440051 Plasma processing chamber for bevel edge processing
05/14/2013US8440050 Plasma processing apparatus and method, and storage medium
05/14/2013US8440049 Apparatus for etching high aspect ratio features
05/14/2013US8440048 Load lock having secondary isolation chamber
05/14/2013US8440020 Apparatus and method for the production of flexible semiconductor devices
05/14/2013US8440019 Lower liner with integrated flow equalizer and improved conductance
05/14/2013US8439995 Abrasive compounds for semiconductor planarization
05/14/2013US8439623 Linear semiconductor processing facilities
05/14/2013US8439249 Device and method for making a semiconductor device including bonding two bonding partners