| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/02/2013 | WO2013060949A1 Process for smoothing a surface via heat treatment |
| 05/02/2013 | WO2013060729A1 Method for treating and directly bonding a layer of material |
| 05/02/2013 | WO2013060726A1 Method for the direct bonding of a silicon oxide layer |
| 05/02/2013 | WO2013060045A1 Tft array substrate and liquid crystal panel |
| 05/02/2013 | WO2013059973A1 Mos device and manufacturing method thereof |
| 05/02/2013 | WO2013059972A1 Cmos device having dual metal gates and manufacturing method thereof |
| 05/02/2013 | WO2013059948A1 Solution-processable tungsten oxide buffer layers and organic electronics comprising same |
| 05/02/2013 | WO2013059934A1 Displacement devices and methods for fabrication, use and control of same |
| 05/02/2013 | WO2013040127A3 Gas delivery and distribution for uniform process in linear-type large-area plasma reactor |
| 05/02/2013 | WO2013039881A3 Carbosilane precursors for low temperature film deposition |
| 05/02/2013 | WO2013036953A3 Multiple frequency sputtering for enhancement in deposition rate and growth kinetics dielectric materials |
| 05/02/2013 | WO2013036806A3 Methods for manufacturing integrated circuit devices having features with reduced edge curvature |
| 05/02/2013 | WO2013036667A3 Flowable silicon-carbon-nitrogen layers for semiconductor processing |
| 05/02/2013 | WO2013036660A3 Passive position compensation of a spindle, stage, or component exposed to a heat load |
| 05/02/2013 | WO2013036619A3 Method and apparatus for gas distribution and plasma application in a linear deposition chamber |
| 05/02/2013 | WO2013036561A3 Broad -area lighting systems and methods of its fabrication |
| 05/02/2013 | WO2013036376A3 Methods for the epitaxial growth of silicon carbide |
| 05/02/2013 | WO2013036018A3 Substrate processing apparatus |
| 05/02/2013 | WO2013036016A3 Vacuum drying apparatus |
| 05/02/2013 | WO2013032151A3 Apparatus for oxidation and annealing processes and method for the same |
| 05/02/2013 | WO2013028693A3 Capacitors, apparatus including a capacitor and methods for forming a capacitor |
| 05/02/2013 | WO2013028542A3 System and method for detecting air in a fluid |
| 05/02/2013 | WO2013025719A3 Apparatuses and methods comprising a channel region having different minority carrier lifetimes |
| 05/02/2013 | WO2013023094A3 Vertical gate ldmos device |
| 05/02/2013 | WO2013023029A3 Aion coated substrate with optional yttria overlayer |
| 05/02/2013 | WO2013019329A4 Iii-nitride metal insulator semiconductor field effect transistor |
| 05/02/2013 | WO2013016069A3 Method of atomic layer deposition using metal precursors |
| 05/02/2013 | WO2013015631A3 Apparatus and method for fabricating wafer |
| 05/02/2013 | WO2013006447A3 Use of repellent material to protect fabrication regions in semiconductor assembly |
| 05/02/2013 | WO2013006248A3 Measurement of critical dimension |
| 05/02/2013 | WO2013003282A3 Use of a shadow mask and a soft mask for aligned implants in solar cells |
| 05/02/2013 | WO2012167195A3 Chamber exhaust in-situ cleaning for processing apparatuses |
| 05/02/2013 | WO2012142126A3 Method of making radiation-sensitive sol-gel materials |
| 05/02/2013 | US20130109798 Resin composition and semiconductor device produced by using the same |
| 05/02/2013 | US20130109200 Method for manufacturing semiconductor device |
| 05/02/2013 | US20130109199 Method for fabricating oxides/semiconductor interfaces |
| 05/02/2013 | US20130109198 High carbon content molecules for amorphous carbon deposition |
| 05/02/2013 | US20130109197 Method of forming silicon oxide film |
| 05/02/2013 | US20130109196 Film forming apparatus and method of operating the same |
| 05/02/2013 | US20130109195 Film forming apparatus and method of operating the same |
| 05/02/2013 | US20130109194 Polishing liquid composition |
| 05/02/2013 | US20130109193 Substrate processing apparatus and semiconductor device manufacturing method |
| 05/02/2013 | US20130109192 Susceptor with ring to limit backside deposition |
| 05/02/2013 | US20130109191 Method to prepare semi-conductor device comprising a selective etching of a silicium-germanium layer |
| 05/02/2013 | US20130109190 Pulsed plasma with low wafer temperature for ultra thin layer etches |
| 05/02/2013 | US20130109189 System architecture for plasma processing solar wafers |
| 05/02/2013 | US20130109188 Plasma etch processes for boron-doped carbonaceous mask layers |
| 05/02/2013 | US20130109187 Post etch treatment (pet) of a low-k dielectric film |
| 05/02/2013 | US20130109186 Method of forming semiconductor devices using smt |
| 05/02/2013 | US20130109185 Method of fabricating miniaturized semiconductor or other device |
| 05/02/2013 | US20130109184 Plasma etching method |
| 05/02/2013 | US20130109183 Multilayer Construction |
| 05/02/2013 | US20130109182 Method Of Polishing Using Tunable Polishing Formulation |
| 05/02/2013 | US20130109181 Method Of Polishing A Substrate |
| 05/02/2013 | US20130109180 Method for polishing silicon wafer, and polishing solution for use in the method |
| 05/02/2013 | US20130109179 Semiconductor process, semiconductor element and package having semiconductor element |
| 05/02/2013 | US20130109178 Semiconductor Element Having a Conductive Via and Method for Making the Same and Package Having a Semiconductor Element with a Conductive Via |
| 05/02/2013 | US20130109177 Semiconductor device manufacturing method |
| 05/02/2013 | US20130109176 Method for forming deep silicon via for grounding of circuits and devices, emitter ballasting and isolation |
| 05/02/2013 | US20130109175 Method of fabricating semiconductor devices |
| 05/02/2013 | US20130109174 Methods of Forming Conductive Structures Using a Spacer Erosion Technique |
| 05/02/2013 | US20130109173 Methods for removing silicon nitride spacer, forming transistor and forming semiconductor devices |
| 05/02/2013 | US20130109172 High temperature tungsten metallization process |
| 05/02/2013 | US20130109171 Method for etching substrate |
| 05/02/2013 | US20130109170 Deposition method and a deposition apparatus of fine particles, a forming method and a forming apparatus of carbon nanotubes, and a semiconductor device and a manufacturing method of the same |
| 05/02/2013 | US20130109169 Methods of manufacturing stress buffer structures in a mounting structure of a semiconductor device |
| 05/02/2013 | US20130109168 Method for manufacturing semiconductor device |
| 05/02/2013 | US20130109167 Nanowire efuses |
| 05/02/2013 | US20130109166 Methods for fabricating integrated circuits with controlled p-channel threshold voltage |
| 05/02/2013 | US20130109165 Method for manufacturing semiconductor device with vertical gate transistor |
| 05/02/2013 | US20130109164 Remote plasma radical treatment of silicon oxide |
| 05/02/2013 | US20130109163 Fabricating method of semiconductor element |
| 05/02/2013 | US20130109162 Surface stabilization process to reduce dopant diffusion |
| 05/02/2013 | US20130109161 Metal organic chemical vapor deposition apparatus and method |
| 05/02/2013 | US20130109160 Methods for depositing thin films comprising indium nitride by atomic layer deposition |
| 05/02/2013 | US20130109159 Gas dispersion apparatus |
| 05/02/2013 | US20130109158 Methods of Fabricating Semiconductor Devices Using Mask Shrinking |
| 05/02/2013 | US20130109156 Indium Phosphide Substrate Manufacturing Method and Epitaxial Wafer Manufacturing Method |
| 05/02/2013 | US20130109155 Method of forming seed layer and method of forming silicon-containing thin film |
| 05/02/2013 | US20130109154 Method and apparatus for producing silicon nitride film |
| 05/02/2013 | US20130109153 Multiple seal ring structure |
| 05/02/2013 | US20130109152 Method of making lower parasitic capacitance finfet |
| 05/02/2013 | US20130109151 Method for forming void-free dielectric layer |
| 05/02/2013 | US20130109148 Methods of forming a pattern and methods of manufacturing semiconductor devices using the same |
| 05/02/2013 | US20130109147 Methods of Forming Metal Oxide and Memory Cells |
| 05/02/2013 | US20130109144 Semiconductor devices and methods of fabricating the same |
| 05/02/2013 | US20130109142 Strained-Induced Mobility Enhancement Nano-Device Structure and Integrated Process Architecture for CMOS Technologies |
| 05/02/2013 | US20130109141 Transistors with different threshold voltages |
| 05/02/2013 | US20130109140 Semiconductor Device and Method of Manufacture |
| 05/02/2013 | US20130109138 Manufacturing method of semiconductor device |
| 05/02/2013 | US20130109137 Large panel leadframe |
| 05/02/2013 | US20130109136 Methods of fabricating electronics assemblies |
| 05/02/2013 | US20130109134 Method of manufacturing semiconductor device |
| 05/02/2013 | US20130109113 Method of manufacturing an ink-jet printhead |
| 05/02/2013 | US20130109112 Etch rate detection for photomask etching |
| 05/02/2013 | US20130109111 Method to perform electrical testing and assembly of electronic devices |
| 05/02/2013 | US20130109110 Method for manufacturing silicon carbide substrate and method for manufacturing semiconductor device |
| 05/02/2013 | US20130109109 Substrate heat treating apparatus, temperature control method of substrate heat treating apparatus, manufacturing method of semiconductor device, temperature control program of substrate heat treating apparatus, and recording medium |
| 05/02/2013 | US20130109108 Method for producing zinc oxide on gallium nitride and application thereof |
| 05/02/2013 | US20130108847 Dicing tape-integrated film for semiconductor back surface |