| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/22/1994 | US5297096 Nonvolatile semiconductor memory device and data erasing method thereof |
| 03/22/1994 | US5297095 Semiconductor non-volatile memory device improved in verifying operation for erased and write-in states |
| 03/22/1994 | US5297082 Shallow trench source eprom cell |
| 03/22/1994 | US5296916 Mask alignment system for components with extremely sensitive surfaces |
| 03/22/1994 | US5296892 Illuminating apparatus and projection exposure apparatus provided with such an illuminating apparatus |
| 03/22/1994 | US5296891 Illumination device |
| 03/22/1994 | US5296755 High speed BI CMOS logic circuit and a semiconductor integrated circuit device using same |
| 03/22/1994 | US5296745 Semiconductor device having a moisture barrier around periphery of device |
| 03/22/1994 | US5296743 Plastic encapsulated integrated circuit package and method of manufacturing the same |
| 03/22/1994 | US5296742 Multilayered integrated circuit chip wiring arrangement |
| 03/22/1994 | US5296741 Carrier for semiconductor element packages |
| 03/22/1994 | US5296740 Method and apparatus for a semiconductor device having a radiation part |
| 03/22/1994 | US5296738 Moisture relief for chip carrier |
| 03/22/1994 | US5296736 Leveled non-coplanar semiconductor die contacts |
| 03/22/1994 | US5296734 Semiconductor integrated circuit having silicon nitride provided as insulator of capacitor |
| 03/22/1994 | US5296733 Hetero junction bipolar transistor with improved electrode wiring contact region |
| 03/22/1994 | US5296732 Bipolar transistor |
| 03/22/1994 | US5296731 Semiconductor integrated circuit device with alpha rays resistance |
| 03/22/1994 | US5296730 Semiconductor pressure sensor for sensing pressure applied thereto |
| 03/22/1994 | US5296729 Semiconductor memory device having static random access memory |
| 03/22/1994 | US5296728 Compound semiconductor device with different gate-source and gate-drain spacings |
| 03/22/1994 | US5296727 Double gate FET and process for manufacturing same |
| 03/22/1994 | US5296719 Quantum device and fabrication method thereof |
| 03/22/1994 | US5296718 Zinc sulfide selenide and zinc cadmium selenide crystals in laminates |
| 03/22/1994 | US5296716 Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom |
| 03/22/1994 | US5296713 Ion source device |
| 03/22/1994 | US5296673 For ablation excimer laser image projection ablation of a target material |
| 03/22/1994 | US5296653 Device having a multi-layered conductor structure |
| 03/22/1994 | US5296412 Method of heat treating semiconductor wafers by varying the pressure and temperature |
| 03/22/1994 | US5296411 Method for achieving an ultra-reliable thin oxide using a nitrogen anneal |
| 03/22/1994 | US5296410 Method for separating fine patterns of a semiconductor device |
| 03/22/1994 | US5296409 Method of making n-channel and p-channel junction field-effect transistors and CMOS transistors using a CMOS or bipolar/CMOS process |
| 03/22/1994 | US5296408 Fabrication method for vacuum microelectronic devices |
| 03/22/1994 | US5296407 Multilayer insulation element |
| 03/22/1994 | US5296405 Method for photo annealing non-single crystalline semiconductor films |
| 03/22/1994 | US5296404 Treatment of titanium chloride with argon, hydrogen or nitrogen in a plasma with magnetism to form thin films |
| 03/22/1994 | US5296403 Method of manufacturing a static induction field-effect transistor |
| 03/22/1994 | US5296402 Method for manufacturing a DRAM having a second effective capacitor area |
| 03/22/1994 | US5296401 MIS device having p channel MOS device and n channel MOS device with LDD structure and manufacturing method thereof |
| 03/22/1994 | US5296400 Method of manufacturing a contact of a highly integrated semiconductor device |
| 03/22/1994 | US5296399 Method for manufacturing a narrowed sidewall spacer in a peripheral circuit of a ULSI semiconductor memory device |
| 03/22/1994 | US5296398 Forming a multilayer element with photoresists pattern films, removal of insulating films and doping |
| 03/22/1994 | US5296397 Method for manufacturing an EPROM cell |
| 03/22/1994 | US5296396 Matrix of EPROM memory cells with a tablecloth structure having an improved capacitative ratio and a process for its manufacture |
| 03/22/1994 | US5296394 Transistors formed with photoresists and annealing |
| 03/22/1994 | US5296393 Transistors with tank regions and gates |
| 03/22/1994 | US5296392 Method of forming trench isolated regions with sidewall doping |
| 03/22/1994 | US5296391 Method of manufacturing a bipolar transistor having thin base region |
| 03/22/1994 | US5296390 Method for fabricating a semiconductor device having a vertical channel of carriers |
| 03/22/1994 | US5296389 Semi-insulating substrate emitter, coating with layers either with or without indium, forming collector layer and patterns in coatings |
| 03/22/1994 | US5296388 Forming dopes in semiconductors and forming multilayers by epitaxial crystal growth |
| 03/22/1994 | US5296387 Diffusion of germanium atoms and multilayer elements |
| 03/22/1994 | US5296386 Method of providing lower contact resistance in MOS transistor structures |
| 03/22/1994 | US5296385 Integrated device to prevent infrared light transmission through wafers, forming a top layer of silicon nitride |
| 03/22/1994 | US5296384 Bake-stable HgCdTe photodetector and method for fabricating same |
| 03/22/1994 | US5296332 Crosslinkable aqueous developable photoresist compositions and method for use thereof |
| 03/22/1994 | US5296330 Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive |
| 03/22/1994 | US5296258 Method of forming silicon carbide |
| 03/22/1994 | US5296126 Method for processing the etched surface of a semiconductive or semi-insulating substrate |
| 03/22/1994 | US5296118 Having means for inserting processed disk into cassette, removing plug from central disk aperture on one side only |
| 03/22/1994 | US5296095 Silicon oxide or silicon dioxide etched with carbon fluorine compounds, carbon bromine compounds or sulfur hexafluoride |
| 03/22/1994 | US5296094 Using oxygen and halogen compound in two step etching |
| 03/22/1994 | US5296093 Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure |
| 03/22/1994 | US5296092 Planarization method for a semiconductor substrate |
| 03/22/1994 | US5296091 Plastics |
| 03/22/1994 | US5296089 Enhanced radiative zone-melting recrystallization method and apparatus |
| 03/22/1994 | US5296087 Crystal formation method |
| 03/22/1994 | US5296086 Forming oxide insulating layer on silicon substrate, forming opening, growing silicon carbide seeds therein, oxidizing substrate under opening, growing silicon carbide, forming semiconductor |
| 03/22/1994 | US5296074 Method for bonding small electronic components |
| 03/22/1994 | US5296072 Method of manufacturing and testing integrated optical components |
| 03/22/1994 | US5296063 Printed circuits formed from adhesives, adjustment and curing |
| 03/22/1994 | US5296047 Epitaxial silicon starting material |
| 03/22/1994 | US5296037 Plasma CVD system comprising plural upper electrodes |
| 03/22/1994 | US5295777 Wafer transport module with rotatable and horizontally extendable wafer holder |
| 03/22/1994 | US5295522 Gas purge system for isolation enclosure for contamination sensitive items |
| 03/22/1994 | US5295395 Diaphragm-based-sensors |
| 03/22/1994 | US5295331 Method of chamfering semiconductor wafer |
| 03/22/1994 | US5295298 Method of forming leads of semiconductor device to shape |
| 03/22/1994 | US5295297 Method of producing semiconductor memory |
| 03/22/1994 | US5295296 Method and apparatus for working a clad material |
| 03/22/1994 | CA1327974C Contrast enhancement layer compositions, alkylnitrones, and use |
| 03/22/1994 | CA1327935C Growth of beta-sic thin films and semiconductor devices fabricated thereon |
| 03/18/1994 | EP0591342A4 Basic cell architecture for mask programmable gate array. |
| 03/18/1994 | EP0462270A4 Thin, dielectrically isolated island resident transistor structure having low collector resistance. |
| 03/17/1994 | WO1994006182A1 System and method for selectively laser processing a target structure of materials of a multimaterial, multilayer device |
| 03/17/1994 | WO1994006153A1 Ohmic contact structure between platinum and silicon carbide |
| 03/17/1994 | WO1994006152A1 Process for selectively etching diamond |
| 03/17/1994 | WO1994006136A1 Coil molded into magnetic stator |
| 03/17/1994 | WO1994006057A1 Polyimide precursor and photosensitive composition containing the same |
| 03/17/1994 | WO1994006024A1 Acceleration sensor |
| 03/17/1994 | WO1994005827A2 Dry contact electroplating apparatus |
| 03/17/1994 | WO1994005516A1 Groove width trimming |
| 03/17/1994 | WO1994005459A1 Multi-station semiconductor lead frame processing apparatus and method |
| 03/17/1994 | WO1994005455A2 Modulated-structure of pzt/pt ferroelectric thin films for non-volatile random access memories |
| 03/17/1994 | WO1994002425A3 Silicon or silica substrate with a modified surface, process for producing the same, new orthoesters and process for producing the same |
| 03/17/1994 | DE4331937A1 Dopant diffusion into solid-state semiconductor body - by coating surface with medium containing dopant and applying voltage between electrodes connected to medium and semiconductor body |
| 03/17/1994 | DE4330266A1 Reaction chamber for chemical vapour deposition - comprises wafer heating appts., gas supply head, reaction chamber element, waste gas outlet |
| 03/17/1994 | DE4300808C1 Film capacitor prodn. from 2 types of conductive films and dielectric - using selective under-etching of one type of conductive film in each contact hole to increase capacity e.g. for passive device or IC |
| 03/17/1994 | DE4242565C1 Verfahren zur Justage von Halbleiterscheiben zueinander Method for the adjustment of semiconductor wafers to each other |
| 03/17/1994 | DE4230872A1 Multiple substrate holder e.g. for cathodic sputtering unit - provides identical masking and identical motion of substrates |