| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 05/07/1997 | EP0772229A2 Vertical wafer compact flip chip feeder |
| 05/07/1997 | EP0772228A2 Transport container for disc-like substrates |
| 05/07/1997 | EP0772222A1 Microwave plasma process apparatus and microwave plasma process method |
| 05/07/1997 | EP0772221A1 Electron source for multibeam electron lithography sytem |
| 05/07/1997 | EP0772036A2 Apparatus for testing bonds between an (electric) element and a support provided with conducting tracks |
| 05/07/1997 | EP0772032A2 In-situ temperature measurement using X-ray diffraction |
| 05/07/1997 | EP0771891A1 Solid material delivery system for a furnace |
| 05/07/1997 | EP0771887A1 Gas recovery unit |
| 05/07/1997 | EP0771886A1 Method for depositing amorphous SiNC coatings |
| 05/07/1997 | EP0771772A2 Aluminium nitride sintered bodies and their manufacture |
| 05/07/1997 | EP0771638A2 Mold cleaning mechanism for resin sealing/molding apparatus |
| 05/07/1997 | EP0771636A2 Resin sealing/molding apparatus for electronic parts |
| 05/07/1997 | EP0771628A2 A fixture and method for laser fabrication by in-situ cleaving of semiconductor bars |
| 05/07/1997 | EP0771519A1 Integrally bumped electronic package components |
| 05/07/1997 | EP0771472A1 Process for connecting an electric connection of an unpacked ic component to a conductive track on a substrate |
| 05/07/1997 | EP0771469A1 Method of and apparatus for microwave-plasma production |
| 05/07/1997 | EP0699346A4 Scr electrostatic discharge protection for integrated circuits |
| 05/07/1997 | EP0680584A4 Environmental control system. |
| 05/07/1997 | EP0672298A4 Substrates for the growth of 3c-silicon carbide. |
| 05/07/1997 | EP0648373A4 Microwave energized deposition process with substrate temperature control. |
| 05/07/1997 | EP0485461B1 Enhanced vertical thermal reactor system |
| 05/07/1997 | DE19645434A1 Verfahren zum Bilden einer Metallverdrahtung einer Halbleitervorrichtung A method of forming a metal wiring of a semiconductor device |
| 05/07/1997 | DE19645033A1 Verfahren zur Bildung eines Metalldrahtes A method of forming a metal wire |
| 05/07/1997 | DE19644797A1 Oximsulfonsäureester und deren Verwendung als latente Sulfonsäuren Oximsulfonsäureester and the use thereof as latent sulfonic acids |
| 05/07/1997 | DE19644121A1 Bonding together connection leads in a printed circuit board |
| 05/07/1997 | DE19643898A1 Verfahren zur Herstellung einer Halbleitereinrichtung A process for producing a semiconductor device |
| 05/07/1997 | DE19641730A1 Bondable semiconductor device manufacture |
| 05/07/1997 | DE19618976A1 Resin encapsulated semiconductor device |
| 05/07/1997 | DE19614522A1 Semiconductor device providing preset output voltage |
| 05/07/1997 | DE19600427A1 Semiconductor wafer aligner with marker |
| 05/07/1997 | DE19541039A1 Chip module e.g. for chip card |
| 05/07/1997 | DE19541030A1 Coating circuit boards, electric modules, hybrid circuits etc |
| 05/07/1997 | DE19540771A1 Gaseinlaßvorrichtung für eine Beschichtungsanlage Gas inlet device for a coating system |
| 05/07/1997 | DE19540543A1 Apparatus for coating a substrate by means of a chemical vapour deposition process |
| 05/07/1997 | CN1149279A Reinforced semiconductor wafer holder |
| 05/07/1997 | CN1149204A Production line of inter-connecting, super-thin, non-crystal silicon photocell working in weak brightness |
| 05/07/1997 | CN1149200A Method for manufacturing MOS transistor IC with 10,000 gates |
| 05/07/1997 | CN1149199A Method for manufacturing nano-width organic conductive wires |
| 05/07/1997 | CN1149198A Method for manufacturing MOS transistor with low dosed drain and upside-down T shape grid and its structure |
| 05/07/1997 | CN1149187A Semiconductor memory device for achieving high bandwidth and method for arranging signal lines therefor |
| 05/06/1997 | US5627912 Inspection method of inclination of an IC |
| 05/06/1997 | US5627792 Loc type semiconductor memory device |
| 05/06/1997 | US5627779 Non-volatile semiconductor memory having an array of non-volatile memory cells and method for driving the same |
| 05/06/1997 | US5627772 By a computer |
| 05/06/1997 | US5627715 Circuit construction for protective biasing |
| 05/06/1997 | US5627711 Self-protected semiconductor protection component |
| 05/06/1997 | US5627627 Exposure control apparatus and method |
| 05/06/1997 | US5627625 Pattern projecting method |
| 05/06/1997 | US5627435 Hollow cathode array and method of cleaning sheet stock therewith |
| 05/06/1997 | US5627408 Wire bonding structure for semiconductor devices |
| 05/06/1997 | US5627406 Inverted chip bonded module with high packaging efficiency |
| 05/06/1997 | US5627405 Integrated circuit assembly incorporating an anisotropic elecctrically conductive layer |
| 05/06/1997 | US5627403 Adhesion between dielectric layers in an integrated circuit |
| 05/06/1997 | US5627402 Variable-capacitance device and semiconductor integrated circuit device having such variable-capacitance device |
| 05/06/1997 | US5627400 Semiconductor memory device |
| 05/06/1997 | US5627395 Vertical transistor structure |
| 05/06/1997 | US5627394 LD-MOS transistor |
| 05/06/1997 | US5627393 Vertical channel device having buried source |
| 05/06/1997 | US5627391 Semiconductor device and method of manufacturing the same |
| 05/06/1997 | US5627390 Semiconductor device with columns |
| 05/06/1997 | US5627384 Semiconductor device and method of fabricating the same |
| 05/06/1997 | US5627382 Light emitting semiconductor |
| 05/06/1997 | US5627112 Method of making suspended microstructures |
| 05/06/1997 | US5627110 Method for eliminating window mask process in the fabrication of a semiconductor wafer when chemical-mechanical polish planarization is used |
| 05/06/1997 | US5627109 Method of manufacturing a semiconductor device that uses a sapphire substrate |
| 05/06/1997 | US5627106 Trench method for three dimensional chip connecting during IC fabrication |
| 05/06/1997 | US5627105 Plasma etch process and TiSix layers made using the process |
| 05/06/1997 | US5627104 Method to improve interlevel dielectric planarization using SOG |
| 05/06/1997 | US5627103 Method of thin film transistor formation with split polysilicon deposition |
| 05/06/1997 | US5627102 Undercoating with a high melting metal or compound |
| 05/06/1997 | US5627099 Method of manufacturing semiconductor device |
| 05/06/1997 | US5627097 Method for making CMOS device having reduced parasitic capacitance |
| 05/06/1997 | US5627096 Manufacturing method of electric charge transferring devices |
| 05/06/1997 | US5627095 Method for fabricating semiconductor devices having bit lines and storage node contacts |
| 05/06/1997 | US5627094 Stacked container capacitor using chemical mechanical polishing |
| 05/06/1997 | US5627093 Method of manufacturing a wiring layer for use in a semiconductor device having a plurality of conductive layers |
| 05/06/1997 | US5627092 Deep trench dram process on SOI for low leakage DRAM cell |
| 05/06/1997 | US5627091 Memory cells formed in doped substrate |
| 05/06/1997 | US5627089 Atmosphere pressure chemical vapor deposition; forming gate electrode having sloped sides |
| 05/06/1997 | US5627087 Process for fabricating metal-oxide semiconductor (MOS) transistors based on lightly doped drain (LDD) structure |
| 05/06/1997 | US5627086 Method of forming thin-film single crystal for semiconductor |
| 05/06/1997 | US5627085 Method for hydrogenating a polycrystal silicon layer of a thin film transistor |
| 05/06/1997 | US5627084 Method for fabricating MIS semiconductor device |
| 05/06/1997 | US5627083 Method of fabricating semiconductor device including step of forming superposition error measuring patterns |
| 05/06/1997 | US5627013 Method of forming a fine pattern of ferroelectric film |
| 05/06/1997 | US5627011 High resolution i-line photoresist of high sensitivity |
| 05/06/1997 | US5626967 Structure and method for exposing photoresist |
| 05/06/1997 | US5626924 Method of forming oxide film |
| 05/06/1997 | US5626921 Method for forming photoluminescence layer on a semiconductor layer by ion irradiation |
| 05/06/1997 | US5626914 Ceramic body with copper metal infiltration |
| 05/06/1997 | US5626782 Postexposure baking apparatus for forming fine resist pattern |
| 05/06/1997 | US5626775 Plasma etch with trifluoroacetic acid and derivatives |
| 05/06/1997 | US5626773 Structure and method including dry etching techniques for forming an array of thermal sensitive elements |
| 05/06/1997 | US5626771 Multilayer electronic circuit packages |
| 05/06/1997 | US5626727 Thin films on substrate, magnets and incline targets |
| 05/06/1997 | US5626716 Plasma etching of semiconductors |
| 05/06/1997 | US5626715 Methods of polishing semiconductor substrates |
| 05/06/1997 | US5626714 Method for detecting etching endpoint and etching apparatus and etching system using the method thereof |
| 05/06/1997 | US5626681 Using aqueous hydrofluoric acid solution; rinsing with ozonated water; brush-scrubbing |
| 05/06/1997 | US5626680 Thermal processing apparatus and process |