Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/1998
06/23/1998US5770496 Method of making a resistor
06/23/1998US5770495 Refractory silicide film
06/23/1998US5770494 Transistors opposite in channel conductivity, tungsten silicide layer, arsenic and boron difluoride dopants, simplified process, large scale integration
06/23/1998US5770493 Forming gate material over first and second active region in semiconductor substrate, forming photoresists over gate, irradiating, developing, etching gate material forming sorce and drain in first and second active region
06/23/1998US5770492 Self-aligned twin well process
06/23/1998US5770491 Manufacturing process of a MOS semiconductor device
06/23/1998US5770490 Method for producing dual work function CMOS device
06/23/1998US5770489 Method of making a compound semiconductor field-effect transistor
06/23/1998US5770487 Method of manufacturing a device, by which method a substrate with semiconductor element and conductor tracks is glued to a support body with metallization
06/23/1998US5770486 Method of forming a transistor with an LDD structure
06/23/1998US5770485 MOSFET device with an amorphized source and fabrication method thereof
06/23/1998US5770484 Method of making silicon on insulator buried plate trench capacitor
06/23/1998US5770483 Stacking transistors of doped polysilicon material separated by dielectric, interconnecting with conductors formed by etching short apertures between layers and filling with metal
06/23/1998US5770482 Multi-level transistor fabrication method with a patterned upper transistor substrate and interconnection thereto
06/23/1998US5770481 Wiring designing apparatus for automatically designing layout of integrated circuit and wiring designing method therefor
06/23/1998US5770478 Integral mesh flat plate cooling method
06/23/1998US5770477 Flip chip-on-flip chip multi-chip module
06/23/1998US5770475 Crystal growth method for compound semiconductor
06/23/1998US5770469 Alternately vapor depositing heavily doped and lightly doped glass layers over wafer substrate while reflowing layers in heated chemical reactor
06/23/1998US5770468 Chemically reducing oxide layer found on uniformly electrodeposited solder film prior to positioning and soldering chip onto carrier without chip deformation
06/23/1998US5770467 Adhesion
06/23/1998US5770464 Method for fabricating semiconductor devices having lightly doped drain
06/23/1998US5770350 Method for forming pattern using multilayer resist
06/23/1998US5770346 Photoresist and compounds for composing the photoresist
06/23/1998US5770345 Polymer matrix, photosensitive acid generator, specified dye
06/23/1998US5770343 Acid generating compound; resinous compound with increased solubility; solvent; n,n-dimethyl formamide or n,n-dimethyl acetamide
06/23/1998US5770338 Phase shifting overlay mark that measures exposure energy and focus
06/23/1998US5770336 Lithography mask and fabrication method thereof
06/23/1998US5770335 Mask and exposure apparatus using the same
06/23/1998US5770324 Loading closed pore, high density, noncontaminating silicon carbide wafer into second slot of wafer processing boat having first slot loaded with silicon wafer, exposing to heated vapor deposition environment
06/23/1998US5770263 Method for in situ removal of particulate residues resulting from hydrofluoric acid cleaning treatments
06/23/1998US5770260 Coating silicon substrate with polysilazane and phenolic compound, heating, oxidation, used for insulation and flattening in semiconductor applications
06/23/1998US5770103 Composition and method for polishing a composite comprising titanium
06/23/1998US5770100 Method of treating samples
06/23/1998US5770099 Maintaining high temperature of plasma chamber interior walls to prevent deposition of carbon-silicon-fluorine material after plasma shutoff
06/23/1998US5770098 Fluorocarbon gas, magnetron rie
06/23/1998US5770097 Control of etch selectivity
06/23/1998US5770096 Forming a plating film on a substrate, a photosensitive film covering the plating film, patternig the resists film by exposure of the film to light using a pattern of photo mask, developing, patterning plating film, etching the substrate
06/23/1998US5770095 Preferentially abrading and etching protrusions of excess metal at high rate while preventing loss of desired metal filled into pattern recesses by chelation with chemical agent in polish mixture
06/23/1998US5770076 Micromachined capsules having porous membranes and bulk supports
06/23/1998US5770026 Semiconductor fabrication apparatus having improved sputtering collimator and wiring method for a semiconductor device using such apparatus
06/23/1998US5770000 Plasma chamber having cathode and anode spaced apart from impurity-containing material (i.e., semiconductor) so that emission of ion impurities from the material is induced by applied electrical potential
06/23/1998US5769996 Forming patterned array by magnetic alignment of electroconductive non-magnetic particles dispersed within magnetic ferrofluid carrier
06/23/1998US5769991 Setting a pressure of gas between two wafers before starting sticking, filling the space before sticking by hydrogen gas, moving second wafer to face first wafer, releasing second wafer from second chuck and pressurizing
06/23/1998US5769989 Integrated circuit device adhesively attached to solder layer on carrier board having solder filled via(s) passing through board beneath mounting site so that solder can be melted from reverse for device detachment
06/23/1998US5769987 Post-firing method for integrating passive devices into ceramic electronic packages
06/23/1998US5769985 Firing green sheet composed of ceramic layer covered with patterned thin film of first metal and thicker film of second metal whereby photoresist burns away and first metal diffuses into ceramic layer as dielectric oxide
06/23/1998US5769984 Fluoropolymer with cyclic ether monomer
06/23/1998US5769952 Reduced pressure and normal pressure treatment apparatus
06/23/1998US5769951 Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
06/23/1998US5769948 Semiconductor fabricating apparatus having vacuum control and detection system
06/23/1998US5769946 Coating nozzle and coating device having coating nozzle
06/23/1998US5769945 Spin coating bowl exhaust system
06/23/1998US5769942 Method for epitaxial growth
06/23/1998US5769696 Chemical-mechanical polishing of thin materials using non-baked carrier film
06/23/1998US5769695 Chamfer grinding system for wafer
06/23/1998US5769692 On the use of non-spherical carriers for substrate chemi-mechanical polishing
06/23/1998US5769691 Methods and apparatus for the chemical mechanical planarization of electronic devices
06/23/1998US5769588 Dual cassette load lock
06/23/1998US5769389 Apparatus for controlling a flow of a fluid
06/23/1998US5769297 Apparatus and method for dicing semiconductor wafers
06/23/1998US5769184 Coaxial drive elevator
06/23/1998US5768775 Mounting apparatus of conductive balls and mounting method thereof
06/23/1998US5768774 For a solid state electronic component
06/23/1998US5768770 Electronic packaging shaped beam lead fabrication
06/23/1998CA2224925A1 Moving interferometer wafer stage
06/18/1998WO1998026459A1 Semiconductor having large volume fraction of intermediate range order material
06/18/1998WO1998026458A1 Insulated gate semiconductor device
06/18/1998WO1998026457A1 Silicon-germanium hetero-bipolar transistor, and method for making its various epitactiv layers
06/18/1998WO1998026456A1 Mos transistor, and production of layers for that type of transistor
06/18/1998WO1998026453A1 Chip module and manufacture of same
06/18/1998WO1998026451A1 Bicmos device and method for producing the same
06/18/1998WO1998026450A1 Method of manufacturing semiconductor device
06/18/1998WO1998026449A2 A method for purification of acids for use in semiconductor processing
06/18/1998WO1998026444A1 Vacuum compatible linear motion device
06/18/1998WO1998026300A1 Probe card for high speed testing
06/18/1998WO1998026025A1 Chemical mechanical polishing copper substrates
06/18/1998WO1998025749A1 Injection molding encapsulation for an electronic device directly onto a substrate
06/18/1998WO1998012754A3 Electronic devices including electrodes comprising chromium nitride and a method of manufacturing such devices
06/18/1998EP0862793A3 Electronic devices including electrodes comprising chromium nitride and a method of manufacturing such devices
06/18/1998DE19755716A1 Device for determining the quantity of material removed e.g. from a semiconductor wafer
06/18/1998DE19749909A1 Multiple connection laser welding apparatus
06/18/1998DE19731944A1 Charge-carrier lifetimes determining circuit for semiconductor wafer
06/18/1998DE19718167C1 MOS transistor with shallow source-drain regions
06/18/1998DE19702121C1 Vertical chip interconnection production
06/18/1998DE19652547A1 Speicherzellenanordnung und Verfahren zu deren Herstellung Memory cell arrangement, and processes for their preparation
06/18/1998DE19652471A1 Damage-free compound semiconductor passivation
06/18/1998DE19651832A1 Verfahren zur Herstellung eines Halbleiterbauelements A process for producing a semiconductor device
06/18/1998DE19651831A1 Halbleiter-Bauelement Semiconductor component
06/18/1998DE19651811A1 Large area thin film deposition apparatus
06/18/1998DE19651566A1 Chip-Modul sowie Verfahren zu dessen Herstellung -Chip module and method of producing the
06/18/1998CA2244994A1 Vacuum compatible linear motion device
06/17/1998EP0848575A1 Heating device, assembly and method
06/17/1998EP0848484A2 Circuit for generating a boosted output voltage
06/17/1998EP0848434A2 Method of forming semiconductor thin film
06/17/1998EP0848431A2 Electrode structure, process for production thereof and photoelectricity generating device including the electrode
06/17/1998EP0848429A1 Bipolar transistor with pocket isolation
06/17/1998EP0848428A1 Method for assessing the effects of plasma treatments on wafers of semicondutor material
06/17/1998EP0848427A2 Semiconductor integrated citcuit and method for producing the same
06/17/1998EP0848426A1 Integrated circuit device and method of manufacturing same