Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/1998
06/30/1998US5773896 Semiconductor device having offsetchips
06/30/1998US5773892 Multi-port semiconductor memory device with reduced coupling noise
06/30/1998US5773891 Integrated circuit method for and structure with narrow line widths
06/30/1998US5773889 Wire interconnect structures for connecting an integrated circuit to a substrate
06/30/1998US5773888 Semiconductor device having a bump electrode connected to an inner lead
06/30/1998US5773886 For semiconductor devices
06/30/1998US5773882 Seminconductor package
06/30/1998US5773880 Non-contact IC card having insulated exposed leads
06/30/1998US5773878 For a semiconductor die
06/30/1998US5773875 High performance, low thermal loss, bi-temperature superconductive device
06/30/1998US5773874 Semiconductor device having a mesa structure for surface voltage breakdown
06/30/1998US5773872 Semiconductor device having an integrated differential circuit with an improved common-mode rejection ratio (CMRR)
06/30/1998US5773871 Integrated circuit structure and method of fabrication thereof
06/30/1998US5773870 Membrane type integrated inductor and the process thereof
06/30/1998US5773869 Double density fuse bank for the laser break-link programming of an integrated circuit
06/30/1998US5773868 Semiconductor device and method of manufacturing the same
06/30/1998US5773867 Programmable hex-ROM with isolation transistor structure
06/30/1998US5773865 Semiconductor memory and semiconductor device having SOI structure
06/30/1998US5773862 Floating gate FGPA cell with separated select device
06/30/1998US5773861 Semiconductor device
06/30/1998US5773860 Semiconductor device including MOS capacitance
06/30/1998US5773857 Semiconductor device having dummy wiring conductors for suppressing heat-treatment-induced shifting
06/30/1998US5773856 Structure for connecting to integrated circuitry
06/30/1998US5773853 Compound semiconductor device
06/30/1998US5773851 Semiconductor device and manufacturing method thereof
06/30/1998US5773849 Field of the invention
06/30/1998US5773848 Thin film transistor with light antireflection layer
06/30/1998US5773847 Semiconductor device having an active layer with separate layers where one of the layers acts as crystal nuclei for the other
06/30/1998US5773846 Transistor and process for fabricating the same
06/30/1998US5773844 Method of forming a polycrystalline silicon layer, a thin film transistor having the polycrystalline silicon layer, method of manufacturing the same, and a liquid crystal display device having the thin film transistor
06/30/1998US5773841 Self aligning vacuum seal assembly
06/30/1998US5773780 Method of severing bond wires and forming balls at their ends
06/30/1998US5773639 Layer forming material and wiring forming method
06/30/1998US5773561 Polymer sealants/adhesives and use thereof in electronic package assembly
06/30/1998US5773369 Photoelectrochemical wet etching of group III nitrides
06/30/1998US5773367 High throughput planarization etch process for interlayer oxide films between metals and pre-metals
06/30/1998US5773366 Forming a metal chloride thin film and using it as a mask for etching the metal wiring layer
06/30/1998US5773365 Fabrication process of semiconductor device
06/30/1998US5773364 Method for using ammonium salt slurries for chemical mechanical polishing (CMP)
06/30/1998US5773363 Semiconductor processing method of making electrical contact to a node
06/30/1998US5773362 Method of manufacturing an integrated ULSI heatsink
06/30/1998US5773361 Process of making a microcavity structure and applications thereof
06/30/1998US5773360 Cmp = chemical-mechanical polishing
06/30/1998US5773359 Interconnect system and method of fabrication
06/30/1998US5773358 Method of forming a field effect transistor and method of forming CMOS integrated circuitry
06/30/1998US5773357 Method for producing silicon film to bury contact hole
06/30/1998US5773356 Gettering regions and methods of forming gettering regions within a semiconductor wafer
06/30/1998US5773355 Method for manufacturing semiconductor substrate
06/30/1998US5773354 Soi = silicon on insulator
06/30/1998US5773353 For monolithic microwave integrated circuits, silicon oxide, high frequence
06/30/1998US5773352 Forming groove in single crystal silicon; then silicon oxide
06/30/1998US5773351 Isolation layer of semiconductor device and method for fabricating the same
06/30/1998US5773350 Method for forming a self-aligned bipolar junction transistor with silicide extrinsic base contacts and selective epitaxial grown intrinsic base
06/30/1998US5773349 Method for making ultrahigh speed bipolar transistor
06/30/1998US5773348 Method of fabricating a short-channel MOS device
06/30/1998US5773347 Method of maufacturing field effect transistor
06/30/1998US5773346 Semiconductor processing method of forming a buried contact
06/30/1998US5773344 Forming tungsten silicide
06/30/1998US5773343 Semiconductor device having a recessed channel structure and method for fabricating the same
06/30/1998US5773342 Method for forming a storage node in a semiconductor memory using ion implantation to form a smooth amorphous polycrystalline film
06/30/1998US5773341 Method of making capacitor and conductive line constructions
06/30/1998US5773340 Method of manufacturing a BIMIS
06/30/1998US5773339 Method of making diffused layer resistors for semiconductor devices
06/30/1998US5773337 Method for forming ultra-shallow junction of semiconductor device
06/30/1998US5773336 Methods of forming semiconductor active regions having channel-stop isolation regions therein
06/30/1998US5773335 Masking; patterning; implanting ions
06/30/1998US5773334 Method of manufacturing a semiconductor device
06/30/1998US5773333 Field effect transistors
06/30/1998US5773331 Method for making single and double gate field effect transistors with sidewall source-drain contacts
06/30/1998US5773330 Semiconductor device and method for fabricating the same
06/30/1998US5773329 Polysilicon grown by pulsed rapid thermal annealing
06/30/1998US5773328 Method of making a fully-dielectric-isolated fet
06/30/1998US5773327 Semiconductor device and method of fabricating the same
06/30/1998US5773326 Method of making an SOI integrated circuit with ESD protection
06/30/1998US5773325 Method of making a variable concentration SiON gate insulating film
06/30/1998US5773324 Bidirectional horizontal charge transfer device and method
06/30/1998US5773322 Molded encapsulated electronic component
06/30/1998US5773320 Method for producing a power semiconductor module
06/30/1998US5773318 Heating the cleaving tool therby causing thermostic elementt to deflect the bearing surface against crystal body and fracture the body
06/30/1998US5773316 Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength
06/30/1998US5773315 Product wafer yield prediction method employing a unit cell approach
06/30/1998US5773314 Plug protection process for use in the manufacture of embedded dynamic random access memory (DRAM) cells
06/30/1998US5773313 Semiconductor device and method of producing the same
06/30/1998US5773311 Method for providing a test connection and a permanent connection site on an unpackaged semiconductor die
06/30/1998US5773310 Method for fabricating a MOS transistor
06/30/1998US5773309 Through the fabrication of polycrystalline silicon
06/30/1998US5773201 Water vapor is added to an oxygen plasma gas generated by microwaves; lowered operating temperature prevents contamination
06/30/1998US5773199 Method for controlling linewidth by etching bottom anti-reflective coating
06/30/1998US5773197 Positioning a substrate with dielectric layer on organic polysilane, heating, reacting and forming a lithographic patterned layer, coating with metal film and planarizing
06/30/1998US5773196 Prevention of anti-reflection coating damage
06/30/1998US5773195 Printed circuits for electronic structures and circuit boards
06/30/1998US5773191 Radiation-sensitive composition
06/30/1998US5773180 Semiconductor wafers
06/30/1998US5773171 Masking for forming contact apertures, substrates, shift and windows
06/30/1998US5773152 SOI substrate having a high heavy metal gettering effect for semiconductor device
06/30/1998US5773151 Intergrated circuits that operate at microwave frequencies
06/30/1998US5773085 Method of manufacturing ternary compound thin films
06/30/1998US5773083 Method for coating a substrate with a coating solution
06/30/1998US5772925 Organic solvent-soluble polyimide, solvent
06/30/1998US5772907 Lactic acid treatment of InP materials
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