Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/1998
07/22/1998EP0528995B1 Semiconductor processor apparatus with dynamic wafer vapor treatment and particle volatilization
07/22/1998CN1188563A Semiconductor device and its manufacturing method
07/22/1998CN1188451A Semiconductor device
07/22/1998CN1188331A Semiconductor memory device having novel layout pattern
07/22/1998CN1188329A Bipolar integrated circuit with VR-tube and manufacturing method thereof
07/22/1998CN1188328A Process for manufacturing optical shade of zero level of integrated circuit
07/22/1998CN1188327A Method for forming contact window
07/22/1998CN1188326A Cleaning apparatus and cleaning method
07/22/1998CN1188243A 有源矩阵显示器件及其制作方法 Active matrix display device and manufacturing method thereof
07/21/1998USRE35854 Programmable protection circuit and its monolithic manufacturing
07/21/1998US5784327 Electrically programmable/electrically readable semiconductor memory device
07/21/1998US5784325 Semiconductor nonvolatile memory device
07/21/1998US5784310 Low imprint ferroelectric material for long retention memory and method of making the same
07/21/1998US5784302 For simulating interstitial concentration of a semiconductor device
07/21/1998US5784292 Merging integrated circuit mask databases formed by different design rules through global mask database edits
07/21/1998US5784261 Microchip module assemblies
07/21/1998US5784260 Structure for constraining the flow of encapsulant applied to an I/C chip on a substrate
07/21/1998US5784258 Wiring board for supporting an array of imaging chips
07/21/1998US5784248 Method of mounting solid electrolytic capacitor onto printed circuit board, and assembly of the capacitor and the board
07/21/1998US5784187 Wafer level integration of an optical modulator and III-V photodetector
07/21/1998US5784183 Semiconductor optical device and method for fabricating the same
07/21/1998US5784150 Electron-beam cell projection lithography system
07/21/1998US5784135 Display device in which display regions have non-linear boundaries and transmit light differently for the same applied voltage
07/21/1998US5783966 Reducing junction capacitance and increasing current gain in collector-up bipolar transistors
07/21/1998US5783949 Precharged bit decoder and sense amplifier with integrated latch usable in pipelined memories
07/21/1998US5783947 Semiconductor integrated circuit
07/21/1998US5783938 Method and apparatus for the quantitative measurement of the corrosivity effect of residues present on the surface of electronic circuit assemblies
07/21/1998US5783867 Repairable flip-chip undercoating assembly and method and material for same
07/21/1998US5783866 Low cost ball grid array device and method of manufacture thereof
07/21/1998US5783865 Wiring substrate and semiconductor device
07/21/1998US5783864 Multilevel interconnect structure of an integrated circuit having air gaps and pillars separating levels of interconnect
07/21/1998US5783860 Plastic molded package of an integrated circuit
07/21/1998US5783856 Method for fabricating self-assembling microstructures
07/21/1998US5783855 Lateral transistor
07/21/1998US5783851 Semiconductor device
07/21/1998US5783849 Semiconductor device
07/21/1998US5783848 Memory cell
07/21/1998US5783847 Dual-mode micrometer/millimeter wave integrated circuit package
07/21/1998US5783846 Digital circuit with transistor geometry and channel stops providing camouflage against reverse engineering
07/21/1998US5783845 Semiconductor device and its manufacture utilizing crystal orientation dependence of impurity concentration
07/21/1998US5783843 Method of fabricating polycrystalline silicon thin-film transistor having symmetrical lateral resistors
07/21/1998US5783842 Semiconductor device having an insulating layer having a concave section formed by oxidizing a semiconductor layer
07/21/1998US5783834 Method and process for automatic training of precise spatial locations to a robot
07/21/1998US5783804 Reflectance method for accurate process calibration in semiconductor substrate heat treatment
07/21/1998US5783790 Wet treatment method
07/21/1998US5783716 Liquid solution of organoplatinum compound and solvent
07/21/1998US5783713 Flexibility, low chlorine content
07/21/1998US5783641 Process for modifying surfaces of polymers, and polymers having surfaces modified by such process
07/21/1998US5783621 Method of decreasing bleed fom organic-based formulations and anti-bleed compositions
07/21/1998US5783499 Method for the fabrication of a semiconductor device
07/21/1998US5783498 Method of forming silicon dioxide film containing germanium nanocrystals
07/21/1998US5783497 Forced-flow wafer polisher
07/21/1998US5783496 Methods and apparatus for etching self-aligned contacts
07/21/1998US5783495 Treating with hydrofluoric acid and alkylammonium hydroxide
07/21/1998US5783494 Using a gas including a freon-14 gas and either hydrogen chloride or chlorine-excluding carbontetrachloride and hydrogen bromide; uniform etch rate and easily controlled
07/21/1998US5783493 Method for reducing precipitate defects using a plasma treatment post BPSG etchback
07/21/1998US5783492 Plasma processing method, plasma processing apparatus, and plasma generating apparatus
07/21/1998US5783491 Method of forming a truck MOS gate or a power semiconductor device
07/21/1998US5783488 Optimized underlayer structures for maintaining chemical mechanical polishing removal rates
07/21/1998US5783487 Method of coupling titanium to a semiconductor substrate and semiconductor device thereof
07/21/1998US5783486 Bridge-free self aligned silicide process
07/21/1998US5783485 Process for fabricating a metallized interconnect
07/21/1998US5783484 Forming base insulating layer having step coverage, forming first insulating layer, selectively etching, forming second insulating layer
07/21/1998US5783482 Method to prevent oxide peeling induced by sog etchback on the wafer edge
07/21/1998US5783481 Semiconductor interlevel dielectric having a polymide for producing air gaps
07/21/1998US5783480 Layout method for semiconductor memory device obtaining high bandwidth and signal line
07/21/1998US5783479 Structure and method for manufacturing improved FETs having T-shaped gates
07/21/1998US5783478 Forming a composite gate electrode on a gate insulating layer on a silicon substrate; forming source/drain regions in the substrate that are self-aligned to the outside edges of the composite gate electrode
07/21/1998US5783477 Method for bonding compounds semiconductor wafers to create an ohmic interface
07/21/1998US5783476 Integrated circuit devices including shallow trench isolation
07/21/1998US5783475 Method of forming a spacer
07/21/1998US5783474 Forming masking layer, patterning, doping, etching. growing insulation layer over surface, depositing polysilicon layer on top of insulation layer, masking, patterning, doping; fewer masking steps
07/21/1998US5783473 An oxidation masking layer on first conductive layer is formed before performing thermal oxidation so that the asperity structure is reduced
07/21/1998US5783472 Method of making an SOI transistor
07/21/1998US5783471 Structure and method for improved memory arrays and improved electrical contacts in semiconductor devices
07/21/1998US5783470 Forming integrated circuit including p-type and n-type wells in a substrate; wells are fabricated using a self-alignment process; multiple memory cells having a field effect transistor and a capacitor; planarizing
07/21/1998US5783469 Method for making nitrogenated gate structure for improved transistor performance
07/21/1998US5783468 Forming an amorphous silicon film on the substrate, introducing metal in contact with all the silicon film for promoting crystallization, selectively irridation first portion of the film, annealing to crystallize second portion
07/21/1998US5783467 Method of making antifuse structures using implantation of both neutral and dopant species
07/21/1998US5783465 Forming bonding pad on first element, depositing a layer of photodefinable polymer on the surface of second element, masking the polymer, exposing, developing the photodefinable layer to produce bumps, encasing with copper metal layer
07/21/1998US5783464 Method of forming a hermetically sealed circuit lead-on package
07/21/1998US5783463 Semiconductor device and method of producing said semiconductor device
07/21/1998US5783459 Ashing cured resist pattern by down flow ashing with oxygen gas; curing by ultraviolet radiation reduces the amount of decomposed polymer on pattern resist
07/21/1998US5783458 Providing silicon substrate, doping with p-type dopant, exposing drain, source to nitrogen, oxygen, growing oxides
07/21/1998US5783457 Method of making a flash memory cell having an asymmetric source and drain pocket structure
07/21/1998US5783426 Semiconductor device having semiconductor chip mounted in package having cavity and method for fabricating the same
07/21/1998US5783368 Method of forming conductive paths on a substrate containing depressions
07/21/1998US5783365 Manufacturing method of semiconductor device
07/21/1998US5783361 When applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction
07/21/1998US5783359 Composite comprising photosensitive agent, cyclized rubber, mixture of xylene and decalin having specified boiling range as solvent
07/21/1998US5783355 Mixture of a 1,2-quinonediazide compound, alkali solubleand an aromatic polyhydroyl compound
07/21/1998US5783354 Quaternary ammonium compounds
07/21/1998US5783342 Method and system for measurement of resist pattern
07/21/1998US5783341 Alignment for layer formation through determination of target values for translation, rotation and magnification
07/21/1998US5783282 Resputtering to achieve better step coverage of contact holes
07/21/1998US5783257 Method for forming doped polysilicon films
07/21/1998US5783253 Two barium strontium titanate layers, each with different composition, one serves as nucleation layer
07/21/1998US5783220 Resin sealing and molding apparatus for sealing electronic parts
07/21/1998US5783134 Method of resin-sealing semiconductor device
07/21/1998US5783102 Negative ion deductive source for etching high aspect ratio structures