Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/1998
10/21/1998CN1196288A Polishing apparatus
10/21/1998CN1040385C Mass simultaneous sealing and electrical connection of electronic devices
10/21/1998CN1040381C Double-channel thin-film transistor and making method thereof
10/21/1998CN1040380C Integrated circuit with energy storage passive circuit component
10/21/1998CN1040377C Semiconductor integral circuit unit
10/20/1998US5826129 Substrate processing system
10/20/1998US5826004 Input/output device with self-test capability in an integrated circuit
10/20/1998US5825914 Component detection method
10/20/1998US5825844 Optical arrangement and illumination method
10/20/1998US5825783 Semiconductor integrated circuit device with large-scale memory and controller embedded on one semiconductor chip and method of testing the device
10/20/1998US5825714 Semiconductor memory device having noise killer circuit
10/20/1998US5825712 Semiconductor integrated circuit
10/20/1998US5825707 Semiconductor device and SRAM having plural power supply voltages
10/20/1998US5825696 Semiconductor memory device including an SOI substrate
10/20/1998US5825689 Nonvolatile semiconductor memory device having data detecting circuit for memory cells block
10/20/1998US5825688 Non-volatile semiconductor storage apparatus
10/20/1998US5825684 Sram cell structure
10/20/1998US5825673 Device, method, and software products for extracting circuit-simulation parameters
10/20/1998US5825668 Monitoring method and apparatus of surface area of semiconductor wafer
10/20/1998US5825653 Method for overall regulation of a former of a paper machine or equivalent
10/20/1998US5825647 Correction method and correction apparatus of mask pattern
10/20/1998US5825632 Oxides of silicon, boron and alkali metal
10/20/1998US5825629 Print circuit board product with stencil controlled fine pitch solder formation for fine and coarse pitch component attachment
10/20/1998US5825623 Packaging assemblies for encapsulated integrated circuit devices
10/20/1998US5825609 Compound electrode stack capacitor
10/20/1998US5825607 Apparatus for supporting a workpiece
10/20/1998US5825500 Unit for transferring to-be-inspected object to inspection position
10/20/1998US5825499 Method for checking wafers having a lacquer layer for faults
10/20/1998US5825483 Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
10/20/1998US5825468 For a semiconductor device
10/20/1998US5825449 Liquid crystal display device and method of manufacturing the same
10/20/1998US5825437 Controlling the number of hillock defects
10/20/1998US5825249 Multistage source follower amplifier having a wide bandwidth and low power consumption
10/20/1998US5825205 Level-shift circuit for driving word lines of negative gate erasable type flash memory
10/20/1998US5825203 Variable logic integrated circuit device having connections through switch matrix and top layers for inter-cell connections
10/20/1998US5825194 Method of testing an integrated circuit
10/20/1998US5825193 Semiconductor integrated circuit device
10/20/1998US5825191 IC fault location tracing apparatus and method
10/20/1998US5825171 Universal burn-in board
10/20/1998US5825105 Magnetic levitation and systems for the support and conveyance of useful payloads
10/20/1998US5825093 Attachment system and method therefor
10/20/1998US5825092 Integrated circuit with an air bridge having a lid
10/20/1998US5825090 High power semiconductor device and method of making same
10/20/1998US5825087 Integral mesh flat plate cooling module
10/20/1998US5825083 Semiconductor device
10/20/1998US5825081 Tape carrier and assembly structure thereof
10/20/1998US5825079 Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage
10/20/1998US5825078 Hermetic protection for integrated circuits
10/20/1998US5825077 Interconnect decoupling scheme
10/20/1998US5825076 Integrated circuit non-etch technique for forming vias in a semiconductor wafer and a semiconductor wafer having vias formed therein using non-etch technique
10/20/1998US5825074 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry
10/20/1998US5825073 Electronic component for an integrated circuit
10/20/1998US5825070 Structure for transistor devices in an SRAM cell
10/20/1998US5825069 High-density semiconductor read-only memory device
10/20/1998US5825068 Integrated circuits that include a barrier layer reducing hydrogen diffusion into a polysilicon resistor
10/20/1998US5825067 Dielectrically isolated IC merged with surge protection circuit and method for manufacturing the same
10/20/1998US5825066 Control of juction depth and channel length using generated interstitial gradients to oppose dopant diffusion
10/20/1998US5825065 Low voltage DMOS transistor
10/20/1998US5825064 Semiconductor volatile/nonvolatile memory
10/20/1998US5825062 Semiconductor device including a nonvolatile memory
10/20/1998US5825060 Polycrystalline silicon resistors for intergrated circuits
10/20/1998US5825059 Semiconductor device and an interconnection structure of same
10/20/1998US5825058 Semiconductor IC with FET and capacitor having side wall spacers
10/20/1998US5825057 Process for fabricating layered superlattice materials and making electronic devices including same
10/20/1998US5825055 Fabricating high-dielectric constant oxides on semiconductors using a GE buffer layer
10/20/1998US5825053 Heterostructure III-V nitride semiconductor device including InP substrate
10/20/1998US5825050 Thin film transistor having tapered active layer formed by controlling defect density and process of fabrication thereof
10/20/1998US5825049 Resonant tunneling device with two-dimensional quantum well emitter and base layers
10/20/1998US5825048 Semiconductor functional device and electronic circuit provided with the same
10/20/1998US5825043 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
10/20/1998US5825034 Method of compensation for electron beam dose
10/20/1998US5824607 Plasma confinement for an inductively coupled plasma reactor
10/20/1998US5824604 Hydrocarbon-enhanced dry stripping of photoresist
10/20/1998US5824603 Method of forming a low-K layer in an integrated circuit
10/20/1998US5824602 Helicon wave excitation to produce energetic electrons for manufacturing semiconductors
10/20/1998US5824601 Hydrogen fluoride, sacrificial oxide
10/20/1998US5824600 Method for forming a silicide layer in a semiconductor device
10/20/1998US5824599 Protected encapsulation of catalytic layer for electroless copper interconnect
10/20/1998US5824598 Correcting defects
10/20/1998US5824597 Method of forming contact hole plug
10/20/1998US5824596 POCl3 process flow for doping polysilicon without forming oxide pillars or gate oxide shorts
10/20/1998US5824595 Method of separating electronic elements
10/20/1998US5824594 Integrated circuit device isolating methods including silicon spacers and oxidation barrier films
10/20/1998US5824593 Method for making a capacitor on a semiconductor device
10/20/1998US5824592 Method for forming a stacked capacitor of a DRAM cell
10/20/1998US5824591 Method for manufacturing a stacked capacitor
10/20/1998US5824590 Method for oxidation and crystallization of ferroelectric material
10/20/1998US5824589 Method for forming bipolar transistor having a reduced base transit time
10/20/1998US5824588 Double spacer salicide MOS process and device
10/20/1998US5824587 No photolithography
10/20/1998US5824586 Method of manufacturing a raised source/drain MOSFET
10/20/1998US5824585 Semiconductor read-only memory device and method of fabricating the same
10/20/1998US5824584 Method of making and accessing split gate memory device
10/20/1998US5824583 Non-volatile semiconductor memory and method of manufacturing the same
10/20/1998US5824582 Stack DRAM cell manufacturing process with high capacitance capacitor
10/20/1998US5824581 Method for forming a DRAM capacitor with rounded horizontal fins
10/20/1998US5824580 Method of manufacturing an insulated gate field effect transistor
10/20/1998US5824579 Method of forming shared contact structure
10/20/1998US5824578 Fewer masking steps
10/20/1998US5824577 MOSFET with reduced leakage current