Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/1998
09/29/1998US5814423 Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask
09/29/1998US5814401 Selectively filled adhesive film containing a fluxing agent
09/29/1998US5814377 Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films
09/29/1998US5814366 Capacitor interposed between green insulator layers; lamination; firing; removing release green sheets
09/29/1998US5814365 Vacuum deposition on surface in reactor and photon detectors
09/29/1998US5814267 Ceramic material on substrate; liquid crystal display device
09/29/1998US5814240 Method for polishing a semiconductor wafer
09/29/1998US5814239 Gas-phase etching and regrowth method for Group III-nitride crystals
09/29/1998US5814238 Method for dry etching of transition metals
09/29/1998US5814196 Apparatus and method for high throughput sputtering
09/29/1998US5814186 SOG etchant gas and method for using same
09/29/1998US5814180 Bonding an electrically conductive pressure sensitive adhesive material to a substrate
09/29/1998US5814174 Method for repair of metallization on circuit board substrates
09/29/1998US5814159 Using a multicompartment cleaning kit having the absorbent applicator separate from the cleaning solution until the time of use when the inner compartment is punctured
09/29/1998US5814158 Dipping probe tips in cleaning solution so only ends touch solution
09/29/1998US5814157 Contacting solid state material with a chlorine containing cleaning material,acting as an oxidant, to remove organic and metallic contaminants
09/29/1998US5814156 Photoreactive surface cleaning
09/29/1998US5814155 Plasma ashing enhancement
09/29/1998US5814153 Semiconductor device manufacturing apparatus
09/29/1998US5814151 Apparatus for spraying photoresist
09/29/1998US5814150 Method of and apparatus for forming single-crystalline thin film, beam irradiator, beam irradiating method and beam reflecting device
09/29/1998US5813881 Programmable cable and cable adapter using fuses and antifuses
09/29/1998US5813870 Selectively filled adhesives for semiconductor chip interconnection and encapsulation
09/29/1998US5813851 Heat treatment method
09/29/1998US5813823 Articulated arm transfer device
09/29/1998US5813819 Substrate transfer apparatus, and method of transferring substrates
09/29/1998US5813590 Extended travel wire bonding machine
09/29/1998US5813115 Method of mounting a semiconductor chip on a wiring substrate
09/29/1998US5813113 Fixture for making laminated integrated circuit devices
09/29/1998US5813082 Pad and roller assembly for cleaning semiconductor wafers
09/29/1998CA2052734C Ringfield lithography
09/29/1998CA2052733C Ringfield lithography
09/24/1998WO1998042027A1 High performance display pixel for electronic displays
09/24/1998WO1998042026A1 Vertical mos transistor and method of producing the same
09/24/1998WO1998042025A1 Contact arrangement for a planar, integrable semiconductor arrangement and method for producing said contact arrangement
09/24/1998WO1998042024A1 Iii-nitride superlattice structures
09/24/1998WO1998042023A1 Method for cmos latch-up improvement by mev billi (buried implanted layer for lateral isolation) plus buried layer implantation
09/24/1998WO1998042020A1 Method for etching a conductive layer
09/24/1998WO1998042019A1 Trench-isolated bipolar devices
09/24/1998WO1998042018A1 Transmitting photoelectric sensor array
09/24/1998WO1998042017A1 Floating apparatus of substrate
09/24/1998WO1998042016A1 Method for producing a vertical mos-transistor
09/24/1998WO1998042015A1 Method of producing a vertical mos transistor
09/24/1998WO1998042014A1 Improved methods and apparatus for controlled partial ashing in a variable-gap plasma processing chamber
09/24/1998WO1998042013A1 A process for photoresist removal
09/24/1998WO1998042012A1 Method and device for plasma treatment
09/24/1998WO1998042011A1 Uv/halogen metals removal process
09/24/1998WO1998042010A1 Bonded soi wafers using high energy implant
09/24/1998WO1998042008A2 Wafer pod loader and mass transfer system
09/24/1998WO1998041806A1 Method for cooling a furnace, and furnace provided with a cooling device
09/24/1998WO1998041671A1 Composition and method for polishing a composite comprising titanium
09/24/1998WO1998041667A1 Method and apparatus for manufacturing thin film, thin-film laminate, and electronic parts
09/24/1998DE4427313C2 Verfahren zum Herstellen einer teilweise unterätzten anorganischen Nutzschicht auf einem Substrat A method for producing a partially undercut inorganic wear layer on a substrate
09/24/1998DE19811873A1 Variation of substrate velocity during sputtering
09/24/1998DE19811579A1 cutting crystal blank with wire saw of roller type
09/24/1998DE19811571A1 Semiconductor device especially FET production
09/24/1998DE19811568A1 High voltage power semiconductor component with high voltage power element
09/24/1998DE19811078A1 Semiconductor device with fixed potential isolated island region
09/24/1998DE19810632A1 Susceptor for fast thermo-processing of semiconductor substrate
09/24/1998DE19754372A1 Chipanordnung und Verfahren zur Herstellung einer Chipanordnung Chip arrangement and method for producing a chip arrangement
09/24/1998DE19752434A1 DRAM with gate electrode with floating potential
09/24/1998DE19746920A1 High speed high power semiconductor device especially FET
09/24/1998DE19741928C1 Semiconductor component e.g. silicon carbide MOS transistor for smart power integrated circuit
09/24/1998DE19741891A1 Simultaneous metal salicide and local connection structure production
09/24/1998DE19736416A1 SRAM with base layer of P conductivity
09/24/1998DE19711554A1 Low damage ion etching of compound semiconductor
09/24/1998DE19711550A1 Edge zone-free polycrystalline silicon article production
09/24/1998DE19711482A1 Verfahren zur Herstellung eines vertikalen MOS-Transistors Process for the preparation of a vertical MOS transistor
09/24/1998DE19711438A1 Thyristor with short turn-off time
09/24/1998DE19711165A1 Kontaktanordnung einer planaren, integrierbaren Halbleiteranordnung und Verfahren zur Herstellung dieser Kontaktanordnung Contact arrangement of a planar integrable semiconductor device and method for producing these contact arrangement
09/24/1998DE19710961A1 Poly:silicon CMP processing high density DRAM memory cell structure
09/24/1998DE19709724A1 Transistor especially MOS transistor production
09/24/1998DE19709002A1 Bridged doped zone manufacturing method e.g. for DMOS transistor
09/24/1998DE19701855C1 Resin encapsulation of opto-electronic devices
09/24/1998CA2283775A1 Trench-isolated bipolar devices
09/23/1998EP0866499A2 Silicon-doped titanium wetting layer for aluminum plug
09/23/1998EP0866498A2 Semiconductor device having aluminum contacts or vias and method of manufacture therefor
09/23/1998EP0866497A2 Method and system for controlling manufacturing steps in the manufacture of monocrystalline semiconductor silicon wafers
09/23/1998EP0866496A1 Fabrication of etched features
09/23/1998EP0866495A2 A method for cleaning wafer surface and a method for forming thin oxide layers
09/23/1998EP0866494A1 Method for processing semiconductor wafer, method for manufacturing ic card, and carrier
09/23/1998EP0866493A2 Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate
09/23/1998EP0866466A2 Biasing scheme for reducing stress and improving reliability in EEPROM cells
09/23/1998EP0866372A1 Membrane mask for short wavelength radiaton exposure process
09/23/1998EP0866151A1 Crystal holding apparatus
09/23/1998EP0866150A1 Apparatus and process for pulling a single crystal
09/23/1998EP0866146A1 Heated and cooled vacuum chamber shield
09/23/1998EP0865875A2 Precise polishing apparatus and method
09/23/1998EP0865874A2 Polishing apparatus and method
09/23/1998EP0865716A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced
09/23/1998EP0865715A1 Process depending on plasma discharges sustained by inductive coupling
09/23/1998EP0865670A1 Semiconductor device with special emitter connection
09/23/1998EP0865669A2 Cmos device
09/23/1998EP0865668A2 Flip-chip process for producing a multi-chip module
09/23/1998EP0865667A2 Read-only storage cell arrangement and method for producing the same
09/23/1998EP0865666A1 A system for monitoring and analyzing manufacturing processes using statistical simulation with single step feedback
09/23/1998EP0865665A1 Pressurized underfill encapsulation of integrated circuits
09/23/1998EP0865664A1 Process for anisotropic plasma etching of different substrates
09/23/1998EP0865342A1 Improvements in and relating to grinding machines
09/23/1998EP0826237A4 METHOD OF FORMING A Ta2 05 DIELECTRIC LAYER
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