| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/30/2002 | US6426175 Forming a gate stack layer on a substrate, patterning the stack to define a gate and two spacers, one of the spacer and gate have specific width and gate has width that is twice the width of one space, forming source and drain regions |
| 07/30/2002 | US6426174 Detecting focus position variation and sensitivity variation separately without previous calculation of correction magnitude which is optimal for exposure of interconnection pattern with target-sized wiring width of semiconductor device |
| 07/30/2002 | US6426171 Photoresist monomer, polymer thereof and photoresist composition containing it |
| 07/30/2002 | US6426138 Adhesive film for electronic parts |
| 07/30/2002 | US6426133 Graphite material coated with silicon carbide |
| 07/30/2002 | US6426127 Dielectric coating on surface |
| 07/30/2002 | US6426117 Method for forming a three-component nitride film containing metal and silicon |
| 07/30/2002 | US6426021 Anisotropically electroconductive adhesive material and connecting method |
| 07/30/2002 | US6426016 Method for etching passivation layers and antireflective layer on a substrate |
| 07/30/2002 | US6426015 Covering substrate with boron-phosphorus-silicon glass; etching |
| 07/30/2002 | US6425994 Process chamber including stage having improved base and substrate mounting member |
| 07/30/2002 | US6425991 Plating system with secondary ring anode for a semiconductor wafer |
| 07/30/2002 | US6425956 Process for removing chemical mechanical polishing residual slurry |
| 07/30/2002 | US6425953 Heating, injecting cleaning gas |
| 07/30/2002 | US6425810 Polishing apparatus |
| 07/30/2002 | US6425806 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device |
| 07/30/2002 | US6425801 Polishing process monitoring method and apparatus, its endpoint detection method, and polishing machine using same |
| 07/30/2002 | US6425772 Conductive adhesive having a palladium matrix interface between two metal surfaces |
| 07/30/2002 | US6425722 Substrate treatment system, substrate transfer system, and substrate transfer method |
| 07/30/2002 | US6425516 Semiconductor device and method of production of the same |
| 07/30/2002 | US6425497 Method and apparatus for dispensing resist solution |
| 07/30/2002 | US6425477 Substrate conveyance system |
| 07/30/2002 | US6425281 Pressure insensitive gas control system |
| 07/30/2002 | US6425280 Wafer alignment jig for wafer-handling systems |
| 07/30/2002 | US6425191 Apparatus and method for reducing solvent residue in a solvent-type dryer for semiconductor wafers |
| 07/30/2002 | US6425179 Method for assembling tape ball grid arrays |
| 07/30/2002 | US6425168 Quartz glass jig for heat-treating semiconductor wafers and method for producing same |
| 07/30/2002 | US6425158 Apparatus for processing a wafer |
| 07/30/2002 | CA2187477C Self align leadframe |
| 07/26/2002 | CA2369204A1 Solar cell and method of manufacturing same |
| 07/25/2002 | WO2002058444A2 High-g mounting arrangement for electronic chip carrier |
| 07/25/2002 | WO2002058441A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058218A2 Three terminal noninverting transistor switch |
| 07/25/2002 | WO2002058167A1 Spin switch and magnaetic storage elemet using it |
| 07/25/2002 | WO2002058166A1 Magnetic storage element, production method and driving method therefor, and memory array |
| 07/25/2002 | WO2002058164A2 Gan layer on a substrate with an amorphous layer |
| 07/25/2002 | WO2002058163A2 Method for producing semiconductor components |
| 07/25/2002 | WO2002058162A2 Metamorphic long wavelength high-speed photodiode |
| 07/25/2002 | WO2002058161A2 Mos device having a trench gate electrode |
| 07/25/2002 | WO2002058159A2 Mos-gated power device with doped polysilicon body and process for forming same |
| 07/25/2002 | WO2002058158A2 Field effect transistor with redued gate delay and method of fabricating the same |
| 07/25/2002 | WO2002058156A1 Semiconductor integrated circuit |
| 07/25/2002 | WO2002058153A2 Back illuminated imager with enhanced uv to near ir sensitivity |
| 07/25/2002 | WO2002058152A2 Electronic circuit device and method for manufacturing the same |
| 07/25/2002 | WO2002058148A1 Apparatus and method for forming a battery in an integrated circuit |
| 07/25/2002 | WO2002058145A2 Layered dielectric nanoporous materials and methods of producing same |
| 07/25/2002 | WO2002058144A1 Electroless ni/pd/au metallization structure for copper interconnect substrate and method therefor |
| 07/25/2002 | WO2002058141A1 Carburetor, various types of devices using the carburetor, and method of vaporization |
| 07/25/2002 | WO2002058140A2 Integrated inductor |
| 07/25/2002 | WO2002058136A1 Nonvolatile semiconductor memory device and its manufacturing method |
| 07/25/2002 | WO2002058135A2 Interconnect structures and a method of electroless introduction of interconnect structures |
| 07/25/2002 | WO2002058134A1 Method for making interconnection networks |
| 07/25/2002 | WO2002058133A2 Semiconductor tiling structure and method of formation |
| 07/25/2002 | WO2002058132A1 A method of filling trenches |
| 07/25/2002 | WO2002058131A1 Method for making a semiconductor package and semiconductor package with integrated circuit chips |
| 07/25/2002 | WO2002058130A1 Method for producing material of electronic device |
| 07/25/2002 | WO2002058129A1 Ferroelectric thin film, metal thin film or oxide thin film, and method and apparatus for preparation thereof, and electric or electronic device using said thin film |
| 07/25/2002 | WO2002058128A1 Method and apparaturs for treating substrate |
| 07/25/2002 | WO2002058123A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058122A1 Method for manufacturing semiconductor device |
| 07/25/2002 | WO2002058121A1 Method and device for plasma cvd |
| 07/25/2002 | WO2002058120A1 Crystal film, crystal substrate, and semiconductor device |
| 07/25/2002 | WO2002058119A1 Electron beam deflection device, method of producing electron beam deflection device, and electron beam exposure device |
| 07/25/2002 | WO2002058118A1 Electron beam exposure device and electron beam deflection device |
| 07/25/2002 | WO2002058117A2 Metal-insulator-metal capacitor in copper |
| 07/25/2002 | WO2002058116A2 Integrated system for processing semiconductor wafers |
| 07/25/2002 | WO2002058114A1 Substrate processing apparatus |
| 07/25/2002 | WO2002058113A2 Electrochemical methods for polishing copper films on semiconductor substrates |
| 07/25/2002 | WO2002058112A2 Copper diffusion barriers |
| 07/25/2002 | WO2002058109A2 Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor dram device |
| 07/25/2002 | WO2002058108A2 Wafer applied fluxing and underfill material, and layered electronic assemblies manufactured therewith |
| 07/25/2002 | WO2002058107A2 Method for producing an optical semiconductor box and optical semiconductor box |
| 07/25/2002 | WO2002058105A2 Direct detection of low-energy charged particles using metal oxide semiconductor circuitry |
| 07/25/2002 | WO2002058102A2 Adjustable conductance limiting aperture for ion implanters |
| 07/25/2002 | WO2002057858A2 Method and device for motion control |
| 07/25/2002 | WO2002057852A1 Fused silica pellicle |
| 07/25/2002 | WO2002057830A1 Zoom optical system, aligner having the zoom optical system, and aligning method |
| 07/25/2002 | WO2002057802A1 Input/output continuity test mode circuit |
| 07/25/2002 | WO2002057514A2 Method and apparatus for electrodeposition or etching of uniform film with minimal edge exclusion on substrate |
| 07/25/2002 | WO2002057513A1 Semiconductor stripping composition containing 1,3-dicarbonyl compounds |
| 07/25/2002 | WO2002057506A2 Low contamination plasma chamber components and methods for making the same |
| 07/25/2002 | WO2002057382A2 A cmp polishing pad including a solid catalyst |
| 07/25/2002 | WO2002057179A2 Fabrication of silicon micro mechanical structures |
| 07/25/2002 | WO2002057071A2 Catalytic reactive pad for metal cmp |
| 07/25/2002 | WO2002057052A1 Abrasive free polishing in copper damascene applications |
| 07/25/2002 | WO2002057051A1 Dressing apparatus and polishing apparatus |
| 07/25/2002 | WO2002057046A1 Tray mask plate for laser-trimming apparatus |
| 07/25/2002 | WO2002057017A1 Inserting carriage for a measuring and/or analytical device |
| 07/25/2002 | WO2002056912A2 Pharmaceutical combination for the treatment of cancer containing a 4-quinazolineamine and another anti-neoplastic agent |
| 07/25/2002 | WO2002056669A2 Thin film dielectric composite materials |
| 07/25/2002 | WO2002050912A8 Production method for soi wafer and soi wafer |
| 07/25/2002 | WO2002045245A3 Xyz-axes table |
| 07/25/2002 | WO2002031880A3 Trench dmos transistor with embedded trench schottky rectifier |
| 07/25/2002 | WO2002031862A3 Device for fast and uniform heating of a substrate with infrared radiation |
| 07/25/2002 | WO2002030840A3 Glass member resistant to plasma corrosion |
| 07/25/2002 | WO2002023613A3 Metal cmp process with reduced dishing |
| 07/25/2002 | WO2002019411A3 Method of forming a pre-metal dielectric film on a semiconductor substrate |
| 07/25/2002 | WO2002019409A3 Method for selective etching of oxides |
| 07/25/2002 | WO2002007216B1 Fabrication of electronic circuit elements |
| 07/25/2002 | WO2001099164A3 Patterning method using a removable inorganic antireflection coating |