Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2002
12/05/2002US20020179918 Light emitting diode having an insulating substrate
12/05/2002US20020179913 Semiconductor apparatus and process for producing the same, and process for making via hole
12/05/2002US20020179911 Pendeoepitaxial gallium nitride semiconductor layers on silicon carbide substrates
12/05/2002US20020179910 Low temperature formation of backside ohmic contacts for vertical devices
12/05/2002US20020179909 Semiconductor device and method for manufacturing the same
12/05/2002US20020179908 Semiconductor device and method of manufacturing the same
12/05/2002US20020179907 CMOS type solid imaging device
12/05/2002US20020179906 Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device
12/05/2002US20020179905 Semiconductor device with junction isolation
12/05/2002US20020179904 Contact structure production method
12/05/2002US20020179903 Semiconductor device
12/05/2002US20020179902 Method of forming an integrated circuit device using dummy features and structure thereof
12/05/2002US20020179901 Organic semiconductor device and process of manufacturing the same
12/05/2002US20020179896 Method and apparatus for forming an integrated circuit electrode having a reduced contact area
12/05/2002US20020179892 Apparatus for detaching/attaching wafer carrier lid
12/05/2002US20020179867 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen
12/05/2002US20020179864 Methods and systems for determining a thin film characteristic and an electrical property of a specimen
12/05/2002US20020179863 Method and apparatus for accessing microelectronic workpiece containers
12/05/2002US20020179857 Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus
12/05/2002US20020179856 Charged particle beam lithography apparatus for forming pattern on semi-conductor
12/05/2002US20020179855 Charged particle beam exposure apparatus and method
12/05/2002US20020179854 Ion implantation apparatus capable of increasing beam current
12/05/2002US20020179845 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same
12/05/2002US20020179841 Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof
12/05/2002US20020179833 SPM physical characteristic measuring method, measurement program, and SPM device
12/05/2002US20020179732 Substrate cleaning apparatus
12/05/2002US20020179708 Automated method of and system for dimensioning objects over a conveyor belt structure by applying contouring tracing, vertice detection, corner point detection, and corner point reduction methods to two-dimensional range data maps of the space above the conveyor belt captured by an amplitude modulated laser scanning beam
12/05/2002US20020179692 Pin attachment by a surface mounting method for fabricating organic pin grid array packages
12/05/2002US20020179691 Device and method for clamping and wire-bonding the leads of a lead frame one set at a time
12/05/2002US20020179687 Bondhead lead clamp apparatus and method
12/05/2002US20020179685 Lead bonding method for SMD package
12/05/2002US20020179678 Wire bonding method and apparatus therefor
12/05/2002US20020179675 Device and method for clamping and wire-bonding the leads of a lead frame one set at a time
12/05/2002US20020179592 Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater
12/05/2002US20020179589 Lamp annealing device and substrate for a display element
12/05/2002US20020179586 Process chamber with rectangular temperature compensation ring
12/05/2002US20020179585 Temperature-controlled chuck and method for controlling the temperature of a substantially flat object
12/05/2002US20020179577 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
12/05/2002US20020179576 Glass substrate and leveling thereof
12/05/2002US20020179570 Method of etching high aspect ratio openings
12/05/2002US20020179569 Etching a boron trichloride plasma
12/05/2002US20020179566 Method for manufacturing a capacitor
12/05/2002US20020179460 Surface package type semiconductor package and method of producing semiconductor memory
12/05/2002US20020179436 Distributed power supplies for microelectronic workpiece processing tools
12/05/2002US20020179412 Magnetic latch transport loader
12/05/2002US20020179409 Overhead conveyance device and overhead conveyance vehicle
12/05/2002US20020179408 Tray-positioning device
12/05/2002US20020179335 Method for filling high aspect ratio via holes in electronic substrates and the resulting holes
12/05/2002US20020179333 Circuit board and manufacturing method therefor
12/05/2002US20020179330 Compliant semiconductor package with anisotropic conductive material interconnects and methods therefor
12/05/2002US20020179327 Semiconductor chip soldering land pattern
12/05/2002US20020179293 Thermal treatment equipment and method for heat-treating
12/05/2002US20020179290 Heatsink assembly and method of manufacturing the same
12/05/2002US20020179287 Heat sink and process and molding tool for production of same
12/05/2002US20020179285 Folded-fin heat sink assembly and method of manufacturing same
12/05/2002US20020179283 Device and method for manufacturing semiconductor
12/05/2002US20020179251 Substrate retainer
12/05/2002US20020179250 Inductive plasma processor including current sensor for plasma excitation coil
12/05/2002US20020179249 Apparatus for and method of processing an object to be processed
12/05/2002US20020179248 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow
12/05/2002US20020179246 Removable shield arrangement for ICP-RIE reactors
12/05/2002US20020179245 Plasma processing apparatus and maintenance method therefor
12/05/2002US20020179243 Method and apparatus for separating composite member using fluid
12/05/2002US20020179201 Method of forming extruded structures from polycrystalline materials and devices formed thereby
12/05/2002US20020179195 Reacting silicide; forming oxide
12/05/2002US20020179192 Overcoating with protective coating of aluminum halide
12/05/2002US20020179156 Gas containment system
12/05/2002US20020179155 Apparatus and method for increasing throughput in fluid processing
12/05/2002US20020179127 Substrate cleaning system
12/05/2002US20020179126 Remove water, entrained solvents and solid particles using high density carbon dioxide
12/05/2002US20020179122 Dual cassette centrifugal processor
12/05/2002US20020179120 Single wafer type cleaning method and apparatus
12/05/2002US20020179114 Agitation, rotation
12/05/2002US20020179112 Method of cleaning electronic device
12/05/2002US20020179079 Cutting machine
12/05/2002US20020179015 Plasma etching system
12/05/2002US20020179013 Successive vapour deposition system, vapour deposition system, and vapour deposition process
12/05/2002US20020179011 Gas port sealing for CVD/CVI furnace hearth plates
12/05/2002US20020179006 Method for the preparation of a semiconductor substrate with a non-uniform distribution of stabilized oxygen precipitates
12/05/2002US20020179005 Method for manufacturing group III nitride compound semiconductor and a light-emitting device using group III nitride compound semiconductor
12/05/2002US20020179004 Silicon crystallization method
12/05/2002US20020179003 Silicon wafer, silicon epitaxial wafer, anneal wafer and method for producing them
12/05/2002US20020179001 Method of crystallizing amorphous silicon using a mask
12/05/2002US20020178883 Semiconductor wafer cutting method
12/05/2002US20020178800 Apparatus for evaluating electrical characteristics
12/05/2002US20020178603 Wafer drying apparatus using isopropanol
12/05/2002US20020178600 Method of manufacturing alignment mark
12/05/2002US20020178568 Transportation container and method for opening and closing lid thereof
12/05/2002US20020178567 Apparatus and method for removing carrier film from a singulated die
12/05/2002US20020178562 Method of manufacturing a vacuum chamber
12/05/2002DE10223822A1 Halbleiterbauteil und Verfahren zu seiner Herstellung Semiconductor device and process for its preparation
12/05/2002DE10223818A1 Lateraler Graben-MOSFET Lateral trench MOSFET
12/05/2002DE10222134A1 Schaltplattentisch für ein Ausrichtgerät Circuit board table for an aligner
12/05/2002DE10220639A1 Method for controlling rotation of a semiconductor disk during high temperature treatment measures the temperature of the disk with a pyrometer as a function of time
12/05/2002DE10220542A1 Kompakte Grabenkondensatorspeicherzelle mit Körperkontakt Compact grave capacitor memory cell having physical contact
12/05/2002DE10218331A1 Halbleiterspeichereinrichtung A semiconductor memory device
12/05/2002DE10215764A1 Verdrahtungsschicht-Trockenätzverfahren und Halbleitervorrichtung-Herstellungsverfahren Wiring layer dry etching method and semiconductor device manufacturing method
12/05/2002DE10201657A1 Halbleiterbauelement Semiconductor device
12/05/2002DE10159369A1 Lasermarkierer und Lasermarkierungsverfahren Laser marking and laser marking process
12/05/2002DE10156442A1 Halbleitervorrichtung Semiconductor device
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