Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2003
01/23/2003WO2003007398A1 Progressive aligned deposition
01/23/2003WO2003007397A2 Solution influenced alignment
01/23/2003WO2003007396A2 Lamellar polymer architecture
01/23/2003WO2003007393A2 Semiconductor structures comprising a piezoelectric material and corresponding processes and systems
01/23/2003WO2003007383A2 Algan/gan hemts having a gate contact on a gan based cap segment and methods of fabricating same
01/23/2003WO2003007382A1 Method for producing semiconductor substrate and semiconductor substrate
01/23/2003WO2003007381A2 Low voltage threshold dynamic biasing
01/23/2003WO2003007380A1 Semiconductor apparatus with improved esd withstanding voltage
01/23/2003WO2003007373A1 Lead frame and its manufacturing method
01/23/2003WO2003007370A1 Wiring glass substrate and method of manufacturing the wiring glass substrate, conductive paste and semiconductor module used for wiring glass substrate, and method of forming wiring substrate and conductor
01/23/2003WO2003007368A2 Method of forming nitride capped cu lines with reduced electromigration along the cu/nitride interface
01/23/2003WO2003007367A1 Locally increasing sidewall density by ion implantation
01/23/2003WO2003007366A1 Method of forming via metal layer and via metal layer- formed substrate
01/23/2003WO2003007365A2 Semiconductor processing module with integrated feedback/feed forward metrology
01/23/2003WO2003007364A2 Method for producing a packing for semiconductor chips
01/23/2003WO2003007363A1 Method and apparatus for removing a carrier part from a carrier with a single operation, and a product removed from a carrier
01/23/2003WO2003007362A1 Use of diverse materials in air-cavity packaging of electronic devices
01/23/2003WO2003007361A2 Method for producing a bipolar transistor comprising a polysilicon emitter
01/23/2003WO2003007360A1 Method for chemical mechanical polishing (cmp) with altering the concentration of oxidizing agent in slurry
01/23/2003WO2003007359A1 Method of improving gate activation by employing atomic oxygen oxidation
01/23/2003WO2003007358A1 Plasma reactor for manufacturing electronic components
01/23/2003WO2003007357A1 Dry etching method
01/23/2003WO2003007356A1 Manufacturing of a low-noise mos device
01/23/2003WO2003007355A2 Method for the production of contacts for integrated circuits and semiconductor component with said contacts
01/23/2003WO2003007354A1 Double-sided semiconductor structure
01/23/2003WO2003007353A1 Semiconductor structures comprising an oxygen-doped compound semiconductor layer
01/23/2003WO2003007352A1 Apparatus for pellicle remove
01/23/2003WO2003007351A1 Wafer processing apparatus and transfer device adjustment system
01/23/2003WO2003007350A2 Wafer jar loader method, system and apparatus
01/23/2003WO2003007349A2 High temperature substrate transfer robot
01/23/2003WO2003007348A2 Apparatus and method for controlling galvanic corrosion effects on a single-wafer cleaning system
01/23/2003WO2003007347A2 Smif load port interface including smart port door
01/23/2003WO2003007346A2 Clean method and apparatus for vacuum holding of substrates
01/23/2003WO2003007345A1 Article holders with sensors detecting a type of article held by the holder
01/23/2003WO2003007344A2 Etch pattern definition using a cvd organic layer as an anti-reflection coating and hardmask
01/23/2003WO2003007343A2 Device for performing surface treatment on semiconductor wafers
01/23/2003WO2003007342A2 Alignment of semiconductor wafers and other articles
01/23/2003WO2003007341A2 Tunable radiation source providing a planar irradiation pattern for processing semiconductor wafers
01/23/2003WO2003007340A2 Wafer transport apparatus
01/23/2003WO2003007338A2 Method for attaching an electronic component to a substrate
01/23/2003WO2003007337A2 Low dielectric constant organic dielectrics based on cage-like structures
01/23/2003WO2003007336A2 Wafer boat with arcuate wafer support arms
01/23/2003WO2003007335A2 Single cast vertical wafer boat with a y shaped column rack
01/23/2003WO2003007334A2 Semiconductor structures and devices for detecting chemical reactant
01/23/2003WO2003007327A2 Shallow-angle interference process and apparatus for determining real-time etching rate
01/23/2003WO2003007326A2 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
01/23/2003WO2003007305A1 Semiconductor storage, mobile electronic device, and detachable storage
01/23/2003WO2003007304A2 Magnetic memory unit and magnetic memory array
01/23/2003WO2003007129A2 Trajectory planning and motion control strategies for a planar three-degree-of-freedom robotic arm
01/23/2003WO2003007095A1 Method for determining a position of a robot
01/23/2003WO2003007085A1 Sulfoxide pyrolid(in)one alkanolamine stripping and cleaning composition
01/23/2003WO2003007081A1 Methods using topcoat for photoresist
01/23/2003WO2003007080A1 Method for forming fine pattern
01/23/2003WO2003007061A2 A method of forming a reflective electrode and a liquid crystal display device
01/23/2003WO2003007007A1 Electronic parts handling device, and electronic parts temperature control method
01/23/2003WO2003007006A1 Heater-equipped pusher, electronic parts handling device, and electronic parts temperature control method
01/23/2003WO2003007003A1 Method of manufacturing a probe card
01/23/2003WO2003006933A2 System and method for detecting occlusions in a semiconductor manufacturing device
01/23/2003WO2003006719A1 METHOD FOR ACHIEVING LOW DEFECT DENSITY AIGaN SINGLE CRYSTAL BOULES
01/23/2003WO2003006718A1 Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process
01/23/2003WO2003006707A1 Method for bst deposition by cvd
01/23/2003WO2003006705A2 Wafer fabrication buffer station
01/23/2003WO2003006703A1 A method for reactive sputtering deposition
01/23/2003WO2003006702A1 Hafnium silicide target for gate oxide film formation and its production method
01/23/2003WO2003006599A1 Microelectronic cleaning compositions containing ammonia-free fluoride salts
01/23/2003WO2003006598A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
01/23/2003WO2003006597A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
01/23/2003WO2003006396A1 Bonding method and product
01/23/2003WO2003006374A1 Production and use of tetrafluorosilane
01/23/2003WO2003006344A1 Thin wafer carrier
01/23/2003WO2003006343A1 Horizontal cassette
01/23/2003WO2003006230A1 Method and apparatus for underfilling electronic components using vacuum assist
01/23/2003WO2003006216A1 Substrate transport apparatus with multiple independent end effectors
01/23/2003WO2003006206A1 Substrate polishing machine
01/23/2003WO2003006205A2 Barrier removal at low polish pressure
01/23/2003WO2003006183A2 Method and apparatus for cleaning semiconductor wafers and other flat media
01/23/2003WO2002095805A3 Laser parrering of devices
01/23/2003WO2002089200A3 Method of manufacturing interconnections in a semiconductor device
01/23/2003WO2002063665A3 RELAXED InXGa1-xAs LAYERS INTEGRATED WITH Si
01/23/2003WO2002058158A3 Field effect transistor with redued gate delay and method of fabricating the same
01/23/2003WO2002056364A3 Conductor reservoir volume for integrated circuit interconnects
01/23/2003WO2002049395A3 Rapid thermal processing lamp and method for manufacturing the same
01/23/2003WO2002049035A3 Memory device and method for the operation of the same
01/23/2003WO2002048796A3 Projection system for euv lithography
01/23/2003WO2002045156A3 Cmos fabrication process utilizing special transistor orientation
01/23/2003WO2002041365A3 Single crystalline oxide on a semiconductor substrate
01/23/2003WO2002041362A3 Laser separated die with tapered sidewalls for improved light extraction
01/23/2003WO2002035597A3 Multilayer devices having frequency agile materials
01/23/2003WO2002029878A3 Chemical mechanical polishing of dielectric materials
01/23/2003WO2002029862A3 Integrated semiconductor substrate bevel cleaning apparatus and method
01/23/2003WO2002029861A3 System architecture of semiconductor manufacturing equipment
01/23/2003WO2002019386A3 High density mram cell array
01/23/2003WO2002018101A3 Chemical mechanical polishing (cmp) head, apparatus, and method and planarized semiconductor wafer produced thereby
01/23/2003WO2002017367A3 Semiconductor device having passive elements and method of making same
01/23/2003WO2002011202A3 Method and device for producing connection substrates for electronic components
01/23/2003WO2002008835A3 High-resolution overlay alignment methods and systems for imprint lithography
01/23/2003WO2002007211A3 Multi-layer registration control for photolithography processes
01/23/2003WO2001097270A3 Substrate cleaning apparatus and method
01/23/2003WO2001081976A3 Apparatus, system, and method for active compensation of aberrations in an optical system
01/23/2003WO2001054203A3 Direct printing of thin-film conductors using metal-chelate inks