| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/28/2003 | US6511923 Deposition of stable dielectric films |
| 01/28/2003 | US6511922 Methods and apparatus for producing stable low k FSG film for HDP-CVD |
| 01/28/2003 | US6511921 Methods for reducing the reactivity of a semiconductor substrate surface and for evaluating electrical properties of a semiconductor substrate |
| 01/28/2003 | US6511920 Optical marker layer for etch endpoint determination |
| 01/28/2003 | US6511919 Contacts for a bit line and a storage node in a semiconductor device |
| 01/28/2003 | US6511918 Method of structuring a metal-containing layer |
| 01/28/2003 | US6511917 Plasma treatment apparatus and method |
| 01/28/2003 | US6511916 Method for removing the photoresist layer in the damascene process |
| 01/28/2003 | US6511915 Electrochemical etching process |
| 01/28/2003 | US6511914 Reactor for processing a workpiece using sonic energy |
| 01/28/2003 | US6511912 Method of forming a non-conformal layer over and exposing a trench |
| 01/28/2003 | US6511911 Metal gate stack with etch stop layer |
| 01/28/2003 | US6511910 Method for manufacturing semiconductor devices |
| 01/28/2003 | US6511909 Method of depositing a low K dielectric with organo silane |
| 01/28/2003 | US6511908 Method of manufacturing a dual damascene structure using boron nitride as trench etching stop film |
| 01/28/2003 | US6511907 Method for forming a low loss dielectric layer in the tungsten chemical mechanic grinding process |
| 01/28/2003 | US6511906 Selective CMP scheme |
| 01/28/2003 | US6511905 Semiconductor device with Si-Ge layer-containing low resistance, tunable contact |
| 01/28/2003 | US6511904 Reverse mask and nitride layer deposition for reduction of vertical capacitance variation in multi-layer metallization systems |
| 01/28/2003 | US6511903 Method of depositing a low k dielectric with organo silane |
| 01/28/2003 | US6511902 Fabrication method for forming rounded corner of contact window and via by two-step light etching technique |
| 01/28/2003 | US6511901 Metal redistribution layer having solderable pads and wire bondable pads |
| 01/28/2003 | US6511900 Boron incorporated diffusion barrier material |
| 01/28/2003 | US6511899 Controlled cleavage process using pressurized fluid |
| 01/28/2003 | US6511898 Method for controlling deposition parameters based on polysilicon grain size feedback |
| 01/28/2003 | US6511897 Method of manufacturing semiconductor device as well as reticle and wafer used therein |
| 01/28/2003 | US6511896 Method of etching a substantially amorphous TA2O5 comprising layer |
| 01/28/2003 | US6511895 Semiconductor wafer turning process |
| 01/28/2003 | US6511893 Radiation hardened semiconductor device |
| 01/28/2003 | US6511892 Diffusion-enhanced crystallization of amorphous materials to improve surface roughness |
| 01/28/2003 | US6511891 Method of preventing toppling of lower electrode through flush cleaning |
| 01/28/2003 | US6511890 Method of fabricating a semiconductor device |
| 01/28/2003 | US6511889 Reference voltage supply circuit having reduced dispersion of an output voltage |
| 01/28/2003 | US6511888 Method of fabricating a semiconductor device using trench isolation method including hydrogen annealing step |
| 01/28/2003 | US6511887 Method for making FET gate oxides with different thicknesses using a thin silicon nitride layer and a single oxidation step |
| 01/28/2003 | US6511886 Method for manufacturing trench-gate type power semiconductor device |
| 01/28/2003 | US6511885 Vertical MOS transistor and method of manufacturing the same |
| 01/28/2003 | US6511884 Method to form and/or isolate vertical transistors |
| 01/28/2003 | US6511882 Method for preventing the leakage path in embedded non-volatile memory |
| 01/28/2003 | US6511881 Method for fabricating split gate flash memory cell |
| 01/28/2003 | US6511880 Capacitor of a semiconductor device and method of manufacturing the same |
| 01/28/2003 | US6511879 Interconnect line selectively isolated from an underlying contact plug |
| 01/28/2003 | US6511878 Manufacturing method for semiconductor device with a larger contact hole opening |
| 01/28/2003 | US6511877 Semiconductor integrated circuit and method for manufacturing the same |
| 01/28/2003 | US6511876 High mobility FETS using A1203 as a gate oxide |
| 01/28/2003 | US6511875 Method for making high K dielectric gate for semiconductor device |
| 01/28/2003 | US6511874 Integrated circuit structure comprising capacitor element and corresponding manufacturing process |
| 01/28/2003 | US6511873 High-dielectric constant insulators for FEOL capacitors |
| 01/28/2003 | US6511872 Device having a high dielectric constant material and a method of manufacture thereof |
| 01/28/2003 | US6511871 Method of fabricating thin film transistor |
| 01/28/2003 | US6511870 Self-aligned LDD poly-Si thin-film transistor |
| 01/28/2003 | US6511867 Utilizing atomic layer deposition for programmable device |
| 01/28/2003 | US6511866 Use of diverse materials in air-cavity packaging of electronic devices |
| 01/28/2003 | US6511865 Method for forming a ball bond connection joint on a conductive trace and conductive pad in a semiconductor chip assembly |
| 01/28/2003 | US6511864 Method of fabricating semiconductor device |
| 01/28/2003 | US6511859 IC-compatible parylene MEMS technology and its application in integrated sensors |
| 01/28/2003 | US6511857 Process for manufacturing semiconductor device |
| 01/28/2003 | US6511856 Confinement of E-fields in high density ferroelectric memory device structures |
| 01/28/2003 | US6511794 Method of forming resist pattern, and exposure device |
| 01/28/2003 | US6511792 Organic solvent developer |
| 01/28/2003 | US6511786 Resist pattern is formed by using a chemically amplified resist material including a polyhydroxystyrene derivative and an acid generator as principal constituents |
| 01/28/2003 | US6511785 Chemically amplified positive resist composition and patterning method |
| 01/28/2003 | US6511783 Negative resist composition |
| 01/28/2003 | US6511781 Polyhydroxystyrene resin having a protective base which varies in polarity by acid catalyst and photoacid generator, admixed with a styrene derivative which increases contrast in dissolving rate between exposed and unexposed resist |
| 01/28/2003 | US6511759 Means and method for producing multi-element laminar structures |
| 01/28/2003 | US6511718 Method and apparatus for fabrication of thin films by chemical vapor deposition |
| 01/28/2003 | US6511620 Method of producing semiconductor devices having easy separability from a metal mold after molding |
| 01/28/2003 | US6511609 Replacing a polysilicon, amorphous silicon or tantalum silicide layer in metallization |
| 01/28/2003 | US6511608 Plasma processing method |
| 01/28/2003 | US6511607 Method of making an electrical connecting member |
| 01/28/2003 | US6511588 Semiconductors, additive which hinders growth of plating metal film to a plating solution |
| 01/28/2003 | US6511585 Enhanced macroparticle filter and cathode arc source |
| 01/28/2003 | US6511584 Configuration for coating a substrate by means of a sputtering device |
| 01/28/2003 | US6511577 Reduced impedance chamber |
| 01/28/2003 | US6511576 System for planarizing microelectronic substrates having apertures |
| 01/28/2003 | US6511575 Treatment apparatus and method utilizing negative hydrogen ion |
| 01/28/2003 | US6511544 Control system for use when growing thin-films on semiconductor-based materials |
| 01/28/2003 | US6511543 Holding device |
| 01/28/2003 | US6511539 Apparatus and method for growth of a thin film |
| 01/28/2003 | US6511538 Film deposition method and apparatus for semiconductor devices |
| 01/28/2003 | US6511524 Method and device for producing ball-shaped metallic particles at least almost equal in diameter |
| 01/28/2003 | US6511368 Spherical drive assembly for chemical mechanical planarization |
| 01/28/2003 | US6511367 Carrier head with local pressure control for a chemical mechanical polishing apparatus |
| 01/28/2003 | US6511363 Polishing end point detecting device for wafer polishing apparatus |
| 01/28/2003 | US6511362 Polishing apparatus and polishing method |
| 01/28/2003 | US6511315 Multizonal layouts for coaters, developers, heaters and robots arround conveyors used for working semiconductors or liquid crystal displays |
| 01/28/2003 | US6511187 Method of fabricating a matrix display system |
| 01/28/2003 | US6511038 Apparatus for dampening vibrations of an automatic guided vehicle |
| 01/28/2003 | US6510976 Method for forming a flip chip semiconductor package |
| 01/28/2003 | US6510888 Substrate support and method of fabricating the same |
| 01/28/2003 | US6510859 Apparatus and method for cleaning and drying object |
| 01/28/2003 | US6510755 Slide apparatus and its stage mechanism for use in vacuum |
| 01/28/2003 | US6510688 Safety device for a moving system |
| 01/28/2003 | CA2150408C Azeotrope and azeotrope-like compositions of octamethyltrisiloxane |
| 01/23/2003 | WO2003007673A1 Method and apparatus for processing a strip with electronic components, and belt with electronic components |
| 01/23/2003 | WO2003007661A1 Ceramic heater and ceramic joined article |
| 01/23/2003 | WO2003007451A1 Voltage limiting protection for high frequency power device |
| 01/23/2003 | WO2003007440A2 Integrated light source for frequency adjustment |
| 01/23/2003 | WO2003007430A1 Feed-through manufacturing method and feed-through |
| 01/23/2003 | WO2003007399A2 Low melting point polymer alignment |