Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2003
04/10/2003US20030067084 Semiconductor device and manufacturing method thereof
04/10/2003US20030067083 Packaged stacked semiconductor die and method of preparing same
04/10/2003US20030067079 Semiconductor integrated circuit device and a method of manufacturing the same
04/10/2003US20030067078 Semiconductor device and method of manufacturing the same
04/10/2003US20030067077 Organic copper diffusion barrier layer
04/10/2003US20030067076 Semiconductor device
04/10/2003US20030067075 Semiconductor device having a multiple layer wiring structure, wiring method, wiring device, and recording medium
04/10/2003US20030067073 Multilayer; connecting using solder
04/10/2003US20030067072 Semiconductor device and manufacturing method and testing method of the same
04/10/2003US20030067067 Semiconductor integrated circuit device and method of manufacturing the same
04/10/2003US20030067066 Semiconductor device
04/10/2003US20030067062 Electronic component with at least one semiconductor chip and method for producing the electronic component
04/10/2003US20030067061 Leadframe and method for reducing mold compound adhesion problems
04/10/2003US20030067058 Lead frame and method of manufacturing the same
04/10/2003US20030067054 Surface mountable device
04/10/2003US20030067053 Semiconductor device with capacitor and method of manufacturing thereof
04/10/2003US20030067052 Integrated circuit device and method of manufacturing the same
04/10/2003US20030067051 Reducing interior stresses
04/10/2003US20030067050 Fabrication of semiconductor devices having high-voltage MOS transistors and low-voltage MOS transistors
04/10/2003US20030067049 Etching process for micromachining crystalline materials and devices fabricated thereby
04/10/2003US20030067046 Semiconductor device
04/10/2003US20030067045 Semiconductor device and method of manufacturing the same
04/10/2003US20030067042 Stacked NMOS device biasing on MOS integrated circuits and methods therefor
04/10/2003US20030067041 Method for textured surfaces in floating gate tunneling oxide devices
04/10/2003US20030067038 ITO film contact structure, TFT substrate and manufacture thereof
04/10/2003US20030067037 Melting surface layer of semiconductor; exposure laser beam to dopes
04/10/2003US20030067035 Gate processing method with reduced gate oxide corner and edge thinning
04/10/2003US20030067033 High withstand voltage semiconductor device
04/10/2003US20030067032 Process for manufacturing a dual charge storage location memory cell
04/10/2003US20030067031 Nonvolatile memory structures and fabrication methods
04/10/2003US20030067030 Non-volatile semiconductor memory and its driving method
04/10/2003US20030067029 Method of forming inside rough and outside smooth HSG electrodes and capacitor structure
04/10/2003US20030067028 Method of forming inside rough and outside smooth HSG electrodes and capacitor structure
04/10/2003US20030067027 Charge pump or other charge storage capacitor including PZT layer for combined use as encapsulation layer and dielectric layer of ferroelectric capacitor and a method for manufacturing the same
04/10/2003US20030067025 Method for manufacturing a semiconductor device
04/10/2003US20030067023 Metal-insulator-metal (MIM) capacitor structure and methods of fabricating same
04/10/2003US20030067022 Semiconductor nonvolatile storage element and method of fabricating the same
04/10/2003US20030067021 Semiconductor device and manufacturing method of the same
04/10/2003US20030067020 Semiconductor device
04/10/2003US20030067018 System with meshed power and signal buses on cell array
04/10/2003US20030067017 Variable threshold voltage double gated transistors and method of fabrication
04/10/2003US20030067014 Semiconductor substrate for a one-chip electronic device and related manufacturing method
04/10/2003US20030067012 Vertical bipolar transistor formed using CMOS processes
04/10/2003US20030067005 Composition, method and electronic device
04/10/2003US20030067004 Crystalline semiconductor film, method of manufacturing the same, and semiconductor device
04/10/2003US20030067001 Apparatus and method for packaging circuits
04/10/2003US20030066998 Quantum dots of Group IV semiconductor materials
04/10/2003US20030066997 Photosemiconductor device and method for fabricating the same
04/10/2003US20030066975 Photocatalytic layer; decomposing impurities by exposure toradiation
04/10/2003US20030066967 Infrared detecting element, infrared two-dimensional image sensor, and method of manufacturing the same
04/10/2003US20030066950 Method of preparing photoresponsive devices, and devices made thereby
04/10/2003US20030066826 Apparatus for processing a substrate including a heating apparatus
04/10/2003US20030066817 Dry etching method and apparatus
04/10/2003US20030066816 Uniform patterning for deep reactive ion etching
04/10/2003US20030066810 Frame cassette
04/10/2003US20030066797 Substrate processing apparatus for removing organic matter by removal liquid
04/10/2003US20030066780 System for cushioning wafer in wafer carrier
04/10/2003US20030066760 Controlling current density
04/10/2003US20030066749 Exposure surface to flux; controlling concentration
04/10/2003US20030066747 Pressure modulation method to obtain improved step coverage of seed layer
04/10/2003US20030066679 Electrical circuit and method of formation
04/10/2003US20030066621 Aluminum or alloy substrate coupled to acrylic acid-ethylene layer filled with flux material
04/10/2003US20030066608 Semiconductor processing apparatus and electrode member therefor
04/10/2003US20030066607 Flexibly suspended gas distribution manifold for plasma chamber
04/10/2003US20030066606 Dual wafer position loadlock chamber
04/10/2003US20030066605 Air exhaust system of a chamber for manufacturing semiconductor device
04/10/2003US20030066587 Susceptor for semiconductor manufacturing equipment and process for producing the same
04/10/2003US20030066549 Substrate processing method, and apparatus therefor
04/10/2003US20030066548 Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning
04/10/2003US20030066546 Removal residues from exteriors; applying vacuum
04/10/2003US20030066545 Controlled heating; heat exchanging; vaporization of acidicresidues
04/10/2003US20030066542 Process for removing dopant ions from a substrate
04/10/2003US20030066541 Etching; cleaning gas mixture containing fluoropolymer
04/10/2003US20030066540 Semi-aqueous solvent cleaning of paste processing residue from substrates
04/10/2003US20030066487 Plasma processing system and surface processing method
04/10/2003US20030066486 Microwave heat shield for plasma chamber
04/10/2003US20030066485 Plasma CVD apparatus
04/10/2003US20030066484 Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode
04/10/2003US20030066483 Atomic layer deposition apparatus and method for operating the same
04/10/2003US20030066482 Lid cooling mechanism and method for optimized deposition of low-K dielectric using TRI methylsilane-ozone based processes
04/10/2003US20030066477 Preparation of 157nm transmitting barium fluoride crystals with permeable graphite
04/10/2003US20030066351 Tuning fork gyroscope
04/10/2003US20030066188 Method and apparatus for connecting at least one chip to an external wiring configuration
04/10/2003US20030066184 Inductance and its manufacturing method
04/10/2003DE10146888C1 Verfahren zum Ätzen einer Schicht in einem Graben und Verfahren zur Herstellung eines Grabenkondensators A method for etching a layer in a trench, and method for manufacturing a capacitor grave
04/10/2003DE10146479C1 Production of deep trench capacitor used for DRAM comprises forming structured mask layer on the substrate, forming deep trench in the substrate using the mask layer as mask, forming doped region in the substrate, and further processing
04/10/2003DE10141354C1 Gehäuse für elektrische Bauelemente, insbesondere Kondensatoren Housing for electrical components, especially capacitors
04/10/2003CA2462766A1 Nanoscaling ordering of hybrid materials using genetically engineered mesoscale virus
04/10/2003CA2462429A1 High pressure processing chamber for multiple semiconductor substrates
04/10/2003CA2462102A1 Apparatus for inverted cvd
04/10/2003CA2460674A1 Method of semiconductor nanoparticle synthesis
04/09/2003EP1300888A1 Process for manufacturing a dual charge storage location memory cell
04/09/2003EP1300887A1 Semiconductor device and method for manufacture thereof
04/09/2003EP1300886A2 High-voltage semiconductor devices
04/09/2003EP1300882A2 Semiconductor integrated circuit and method of manufacture thereof
04/09/2003EP1300881A2 Method of manufacturing semiconductor packaging
04/09/2003EP1300880A2 Method for the photolithographic definition of a substrate area
04/09/2003EP1300879A2 Ideal oxygen precipating silicon wafers and oxygen out-diffusion-less process therefor
04/09/2003EP1300878A1 Device and method for plasma processing, and slow-wave plate
04/09/2003EP1300877A1 Plasma processing device
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