Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2003
04/10/2003US20030068894 Liner with poor step coverage to improve contact resistance in W contacts
04/10/2003US20030068893 Fused alumina and metal oxide abrasive particles bonded together via vitrified bonding material, comprising silica, alumina, and boria
04/10/2003US20030068891 Method of manufacturing a wafer
04/10/2003US20030068890 Argon/ammonia rapid thermal annealing for silicon wafers
04/10/2003US20030068889 Polishing method, polishing system and process-managing system
04/10/2003US20030068888 Method of manufacturing a semiconductor device
04/10/2003US20030068887 Electroless plating process, and embedded wire and forming process thereof
04/10/2003US20030068886 Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates
04/10/2003US20030068885 Method of forming a contact plug for a semiconductor device
04/10/2003US20030068884 Inductance and via forming in a monolithic circuit
04/10/2003US20030068883 Self-aligned silicide (salicide) process for strained silicon MOSFET on SiGe and structure formed thereby
04/10/2003US20030068882 Method of manufacturing a contact plug for a semiconductor device
04/10/2003US20030068881 Method of depositing low k barrier layers
04/10/2003US20030068880 Method of manufacturing semiconductor device and semiconductor device
04/10/2003US20030068879 Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry
04/10/2003US20030068878 Arrangements to reduce charging damage in structures of integrated circuits
04/10/2003US20030068876 Etch stop layer in poly-metal structures
04/10/2003US20030068875 Semiconductor device having groove and method of fabricating the same
04/10/2003US20030068874 Semiconductor device and method of fabricating the same
04/10/2003US20030068873 Method for fabricating an integrated semiconductor configuration with the aid of thermal oxidation, related semiconductor configuration, and related memory unit
04/10/2003US20030068872 Laser annealing method and laser annealing device
04/10/2003US20030068871 Three dimensional integrated circuits
04/10/2003US20030068870 Method of manufacturing semiconductor element
04/10/2003US20030068869 Dopant precursors and processes
04/10/2003US20030068868 Method of making IC capacitor
04/10/2003US20030068867 Method for fabricating a trench capacitor for a semiconductor memory
04/10/2003US20030068866 Method for forming a self-aligned silicide of a metal oxide semiconductor
04/10/2003US20030068865 Methods of forming a field effect transistors
04/10/2003US20030068864 Method for fabricating power semiconductor device having trench gate structure
04/10/2003US20030068863 Method for fabricating a power semiconductor device having a floating island voltage sustaining layer
04/10/2003US20030068860 Non-volatile memory cells with selectively formed floating gate
04/10/2003US20030068859 Nonvolatile memory structures and fabrication methods
04/10/2003US20030068858 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow
04/10/2003US20030068857 Semiconductor integrated circuit device and method of manufacturing the same
04/10/2003US20030068856 Structures and method with bitline self-aligned to vertical connection
04/10/2003US20030068855 Method for forming protective films and spacers
04/10/2003US20030068854 Method for fabricating a power semiconductor device having a voltage sustaining layer with a terraced trench facilitating formation of floating Islands
04/10/2003US20030068853 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications
04/10/2003US20030068852 Protective film for the fabrication of direct build-up layers on an encapsulated die package
04/10/2003US20030068851 Dopant precursors and processes
04/10/2003US20030068850 Semiconductor device, method of manufacturing semiconductor device, resin molding die, and semiconductor manufacturing system
04/10/2003US20030068849 Novel CMOS circuit of GaAs/Ge on Si substrate
04/10/2003US20030068848 MFOS memory transistor
04/10/2003US20030068847 Semiconductor device and manufacturing method
04/10/2003US20030068846 Integrated circuit and method
04/10/2003US20030068845 Flash device having trench source line
04/10/2003US20030068844 Method of making high-voltage bipolar/CMOS/DMOS (BCD) devices
04/10/2003US20030068843 Method of manufacturing semiconductor packaging
04/10/2003US20030068842 Method of manufacturing a semiconductor device
04/10/2003US20030068839 Forming solder walls and interconnects on a substrate
04/10/2003US20030068836 Laser annealing apparatus, TFT device and annealing method of the same
04/10/2003US20030068834 System and method for determining and controlling contamination
04/10/2003US20030068582 Method of manufacturing semiconductor device having silicon carbide film
04/10/2003US20030068580 Ceramic shadow-mask in IC process flow
04/10/2003US20030068579 Dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
04/10/2003US20030068566 Full phase shifting mask in damascene process
04/10/2003US20030068565 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
04/10/2003US20030068563 Portions of light blocking layers are selectively removed to modify the transmittance of various regions of the mask and suppress undesired patterns, such as ghost images and side lobe effects; increased integration levels
04/10/2003US20030068531 Comprises evaporating film, ionizing the film with radio frequency power, then depositing on substrate as bias voltage incorporates halogen ions into the film
04/10/2003US20030068522 Hillock-free aluminum wiring layer and method of forming the same
04/10/2003US20030068519 Method for assembly of complementary-shaped receptacle site and device microstructures
04/10/2003US20030068502 A surface treatment to form a quality, ultra-thin silicon wafer, first by smoothing the surface, setting annealing; high speed pulling a silicon ingot or rapidly cooling a pulled single crystal, slicing a silicon wafer off from ingot
04/10/2003US20030068501 Single crystalline silicon wafer, ingot, and producing method thereof
04/10/2003US20030068480 Method for forming patterns for semiconductor devices
04/10/2003US20030068437 Method and apparatus for forming insulating film containing silicon oxy-nitride
04/10/2003US20030068431 Electrode sandwich separation
04/10/2003US20030068430 Nozzle arm movement for resist development
04/10/2003US20030068219 Earthquake protection for semiconductor processing equipment
04/10/2003US20030068215 Substrate transfer device
04/10/2003US20030068052 Dual use of an integrated circuit pin and the switching of signals at said pin
04/10/2003US20030068012 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge
04/10/2003US20030067953 Semiconductor laser diode and method for fabricating the same
04/10/2003US20030067822 Semiconductor device with improved latch arrangement
04/10/2003US20030067819 Semiconductor memory device
04/10/2003US20030067813 Semiconductor memory device
04/10/2003US20030067802 Method for modifying switching field characteristics of magnetic tunnel junctions
04/10/2003US20030067800 Magnetoresistive element and nonvolatile solid-state memory using the same
04/10/2003US20030067755 Electronic component with flexible contacting pads and method for producing the electronic component
04/10/2003US20030067737 On chip capacitor
04/10/2003US20030067734 Methods for electrostatically chucking an object to an electrostatic chuck that reduce uncorrectable placement error of the object
04/10/2003US20030067732 Low voltage modular room ionization system
04/10/2003US20030067679 Preferred crystal orientation optical elements from cubic materials
04/10/2003US20030067611 Point-diffraction interferometer
04/10/2003US20030067604 Scan exposure apparatus and method, and device manufacturing method
04/10/2003US20030067603 Using spectroscope for measuring reflected light from substrate; calibration
04/10/2003US20030067598 Method and apparatus for inspecting multilayer masks for defects
04/10/2003US20030067591 Illumination optical system, exposure apparatus, and microdevice manufacturing method
04/10/2003US20030067458 Active matrix type display device
04/10/2003US20030067362 Component having an integrated radiofrequency circuit
04/10/2003US20030067344 Semiconductor device with temperature compensation circuit
04/10/2003US20030067341 Voltage switching circuit
04/10/2003US20030067340 Semiconductor integrated circuit
04/10/2003US20030067326 Integrated logic circuit and hierarchical design method thereof
04/10/2003US20030067321 Apparatus and methods for silicon-on-insulator transistors in programmable logic devices
04/10/2003US20030067315 Probe device
04/10/2003US20030067313 Electronic device and coupler
04/10/2003US20030067310 Apparatus monitoring the deposition of a liquid-to-pasty medium on a substrate
04/10/2003US20030067298 Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium
04/10/2003US20030067253 Anti-ESD movable rack system for storing reticles
04/10/2003US20030067180 End effector assembly
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