Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2003
12/16/2003US6662661 Method of measuring oscillatory semiconductor membranes and shielding for external excitations in the measurement
12/16/2003US6662466 Method for two dimensional adaptive process control of critical dimensions during spin coating process
12/16/2003US6662465 Vacuum processing apparatus
12/16/2003US6662442 Forming insulator layer having through-hole; conductive passageway formed by electroplating metal; flat conductive layer for good adhesion; accuracy
12/16/2003US6662440 Z-axis electrical contact for microelectric devices
12/11/2003WO2003103350A1 Conductive sheet
12/11/2003WO2003103145A1 Output stage resistant against high voltage swings
12/11/2003WO2003103058A1 Ic card
12/11/2003WO2003103057A1 Diffusion barrier layer in semiconductor substrates to reduce copper contamination from the back side
12/11/2003WO2003103056A2 Trench-gate semiconductor device,corresponding module and apparatus ,and method of operating the device
12/11/2003WO2003103052A1 Partially depleted soi mosfet with self-aligned body tie
12/11/2003WO2003103051A1 Dense array structure for non-volatile semiconductor memories
12/11/2003WO2003103050A2 Variable capacitances for memory cells within a cell group
12/11/2003WO2003103048A1 Die connected with integrated circuit component
12/11/2003WO2003103046A1 Buried digit line stack and process for making same
12/11/2003WO2003103042A2 Electronic component comprising external surface contacts and a method for producing the same
12/11/2003WO2003103041A2 Semiconductor device and method of manufacturing same
12/11/2003WO2003103040A2 Method of making an soi semiconductor device having enhanced, self-aligned dielectric regions in the bulk silicon substrate
12/11/2003WO2003103039A1 Method for manufacturing semiconductor device
12/11/2003WO2003103038A1 Partially patterned lead frames and methods of making and using the same in semiconductor packaging
12/11/2003WO2003103037A1 Semiconductor device
12/11/2003WO2003103036A1 Trench-gate semiconductor device and method of manufacturing
12/11/2003WO2003103035A1 Method for the production of a double-gate transistor
12/11/2003WO2003103034A1 Method for forming inorganic porous film
12/11/2003WO2003103033A1 Polishing fluid and method of polishing
12/11/2003WO2003103032A2 A method for making a semiconductor device having a high-k gate dielectric
12/11/2003WO2003103031A2 Formation of lattice-tuning semiconductor substrates
12/11/2003WO2003103030A1 Substrate processing device, substrate processing method, and nozzle
12/11/2003WO2003103029A1 A capacitor device formed on a substrate, integrated circuit com prising such a device and method for manufacturing a capacitor device
12/11/2003WO2003103028A1 Local cleaning device
12/11/2003WO2003103027A1 Process for forming a contact for a capacitor
12/11/2003WO2003103026A1 Methods for transferring a layer onto a substrate
12/11/2003WO2003103025A2 Method and apparatus of sealing wafer backside for full-face electrochemical plating
12/11/2003WO2003103024A2 Method and apparatus for monitoring tool performance
12/11/2003WO2003103023A1 Wafer heating devices for use in ion implantation systems
12/11/2003WO2003103022A1 Integrated driver process flow
12/11/2003WO2003103021A1 Method and apparatus for monitoring film deposition in a process chamber
12/11/2003WO2003103020A2 Layered components, materials, methods of production and uses thereof
12/11/2003WO2003103019A2 Fin fet devices from bulk semiconductor and method for forming
12/11/2003WO2003103017A2 Method and system of determining chamber seasoning condition by optical emission
12/11/2003WO2003103016A2 Mosfet device having geometry that permits frequent body contact
12/11/2003WO2003103015A2 Reconfigurable integrated circuit
12/11/2003WO2003103004A2 A cathode pedestal for a plasma etch reactor
12/11/2003WO2003102993A2 Beam stop for use in an ion implantation system
12/11/2003WO2003102962A2 Method and apparatus for erasing flash memory
12/11/2003WO2003102957A1 Ferroelectric memory integrated circuit with improved reliabilityand density
12/11/2003WO2003102853A1 Selection of wavelengths for integrated circuit optical metrology
12/11/2003WO2003102771A2 Specialization of active software agents in an automated manufacturing environment
12/11/2003WO2003102724A2 Method and system for data handling, storage and manipulation
12/11/2003WO2003102707A1 Method for supplying gas while dividing to chamber from gas supply facility equipped with flow controller
12/11/2003WO2003102694A1 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask
12/11/2003WO2003102690A2 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
12/11/2003WO2003102682A1 Thin film transistor array panel for a liquid crystal display
12/11/2003WO2003102561A1 Substrate holding device and substrate inspection device
12/11/2003WO2003102557A1 Method of measuring electric characteristics of flat substrate using terahertz light
12/11/2003WO2003102476A1 Sheet-like electronic component clean transfer device and sheet-like electronic product manufacturing system
12/11/2003WO2003102266A1 Deposition of copper films
12/11/2003WO2003102265A1 Ald formation of titanium tantalum nitride silicon (tixtaynz(si)) layer
12/11/2003WO2003102264A2 Method for depositing silicon nitride or silicon oxynitride, and corresponding product
12/11/2003WO2003102261A1 Cooling mechanisms for shaft coupled to a rotary seal
12/11/2003WO2003102049A1 Adhesive resin and film adhesives made by using the same
12/11/2003WO2003101879A1 Dual arm substrate transport apparatus
12/11/2003WO2003101695A2 Machining apparatus and methods
12/11/2003WO2003101677A1 Automatic reference position teaching method, automatic positioning method, and automatic carrying method for disk-like object, automatic reference position teaching device, automatic positioning device, and automatic carrying device for disk-like object using these methods, and automatic semiconductor manufacturing equipme
12/11/2003WO2003101676A1 Multi-joint robot and control device thereof
12/11/2003WO2003101671A1 Suction device
12/11/2003WO2003101665A1 High selectivity cmp slurry
12/11/2003WO2003101621A2 Application of a coating forming material onto at least one substrate
12/11/2003WO2003101590A1 Integrated photochemical treatment of gases
12/11/2003WO2003092050A3 Substrate transfer apparatus
12/11/2003WO2003077305A3 Method for making a semiconductor device by variable chemical mechanical polish downforce
12/11/2003WO2003075321A3 An apparatus and method for measuring a property of a layer in a multilayered structure
12/11/2003WO2003071353A3 An image forming method and apparatus
12/11/2003WO2003067668A3 Memory cell
12/11/2003WO2003065119A3 Overlay measurements using periodic gratings
12/11/2003WO2003060989A8 Device and system for recording the motion of a wafer and a method therefore
12/11/2003WO2003052802A3 Dual robot processing system
12/11/2003WO2003049147A3 Integrated circuits including metal oxide and hydrogen barrier layers and their method of fabrication
12/11/2003WO2003046952A3 Semiconductor component handling device having an electrostatic dissipating film
12/11/2003WO2003043017A3 Magnetic device with magnetic tunnel junction, memory array and read/write methods using same
12/11/2003WO2003038879A3 Methods and apparatus for plasma doping and ion implantation in an integrated processing system
12/11/2003WO2003036685A3 Method and apparatus for applying conductive ink onto semiconductor substrates
12/11/2003WO2003034472A3 Precision bond head for mounting semiconductor chips
12/11/2003WO2003032085A3 Determination of center of focus by cross-section analysis
12/11/2003WO2003030249A3 Method of characterising an implantation step in a substrate of material
12/11/2003WO2003025971A3 Plasma processing apparatus with coil magnet system
12/11/2003WO2003023855A3 Semiconductor device with compliant electrical terminals, apparatus including the semiconductor device, and methods for forming same
12/11/2003WO2003023829A3 Sealing system and pressure chamber assembly including the same
12/11/2003WO2003023093A3 Susceptor with epitaxial growth control devices and epitaxial reactor using the same
12/11/2003WO2003021667A3 Package with integrated inductor and/or capacitor
12/11/2003WO2003011518A9 Cmp system and method for efficiently processing semiconductor wafers
12/11/2003WO2003007326A3 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
12/11/2003WO2002103778A3 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
12/11/2003WO2002101464A3 Optical proximity correction for phase shifting photolithographic masks
12/11/2003WO2002099854A3 Semiconductor wafer handling robot for linear transfer chamber
12/11/2003WO2002093581A3 Magnetic memory arrangement
12/11/2003WO2002075792A3 Method of sealing wafer backside for full-face electronchemical plating
12/11/2003WO2002073329A3 Valve control system for atomic layer deposition chamber
12/11/2003WO2002073309A3 Packaged radiation sensitive coated workpiece process for making and method of storing same
12/11/2003WO2002061854A3 Method for structuring an oxide layer applied to a substrate material