Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2013
11/05/2013US8574961 Method of marking a low profile packaged semiconductor device
11/05/2013US8574960 Semiconductor device and method of forming cavity adjacent to sensitive region of semiconductor die using wafer-level underfill material
11/05/2013US8574959 Semiconductor device and method of forming bump-on-lead interconnection
11/05/2013US8574958 Method for manufacturing a gate-control diode semiconductor memory device
11/05/2013US8574957 Method for manufacturing nonvolatile semiconductor memory element
11/05/2013US8574956 Method of forming non-volatile resistive-switching memories
11/05/2013US8574955 Method for producing light-emitting film and light-emitting device
11/05/2013US8574954 Phase change memory structures and methods
11/05/2013US8574953 Low temperature melt-processing of organic-inorganic hybrid
11/05/2013US8574951 Process of manufacturing an interdigitated back-contact solar cell
11/05/2013US8574950 Electrically contactable grids manufacture
11/05/2013US8574949 Methods of building crystalline silicon solar cells for use in combinatorial screening
11/05/2013US8574948 Method of improving power conversion efficiencies in dye-sensitized solar cells by facile surface treatment
11/05/2013US8574945 Array of mutually insulated Geiger-mode avalanche photodiodes, and corresponding manufacturing process
11/05/2013US8574944 System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby
11/05/2013US8574943 Method for manufacturing solar cells
11/05/2013US8574942 Method of forming silicon nanowires and method of fabricating lithium secondary battery using the same
11/05/2013US8574938 Using isolated epitaxial structures in glue bonding for multiple group-III nitride LEDS on a single substrate
11/05/2013US8574937 High efficiency electroluminescent devices and methods for producing the same
11/05/2013US8574934 OVJP patterning of electronic devices
11/05/2013US8574933 Fabrication method of semiconductor device
11/05/2013US8574932 PCB-mounted integrated circuits
11/05/2013US8574931 Singulation and strip testing of no-lead integrated circuit packages without tape frame
11/05/2013US8574930 Tool cutting method for workpiece having a plurality of LED chips sealed by sealing member
11/05/2013US8574929 Method to form a 3D semiconductor device and structure
11/05/2013US8574928 MRAM fabrication method with sidewall cleaning
11/05/2013US8574927 Magnetic tunnel junction device and its fabricating method
11/05/2013US8574926 Magnetic memory and manufacturing method thereof
11/05/2013US8574685 Electric field tuning of PbS quantum dots for high efficiency solar cell application
11/05/2013US8574675 Method and composition for depositing ruthenium with assistive metal species
11/05/2013US8574528 Methods of growing a silicon carbide epitaxial layer on a substrate to increase and control carrier lifetime
11/05/2013US8574448 Plasma generation method, cleaning method, and substrate processing method
11/05/2013US8574446 Apparatus and method for plasma processing
11/05/2013US8574418 Electroplating method for coating a substrate surface with a metal
11/05/2013US8574409 Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
11/05/2013US8574397 Bevel edge plasma chamber with top and bottom edge electrodes
11/05/2013US8574366 Vacuum processing apparatus
11/05/2013US8574364 GaN-crystal free-standing substrate and method for producing the same
11/05/2013US8574361 Group-III element nitride crystal producing method and group-III element nitride crystal
11/05/2013US8574330 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device
11/05/2013US8573919 Substrate transport apparatus
11/05/2013US8573836 Apparatus and method for evaluating a substrate mounting device
11/05/2013US8573154 Plasma film forming apparatus
11/05/2013US8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
11/05/2013US8573152 Showerhead electrode
11/05/2013US8573151 Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window
11/05/2013US8573030 Gas sensors, methods of preparation thereof, methods of selecting gas sensor materials, and methods of use of gas sensors
10/2013
10/31/2013WO2013163352A1 Hyperbaric cnx for post-wafer-saw integrated clean, de-glue, and dry apparatus & process
10/31/2013WO2013163343A1 Methods of fabricating dielectric films from metal amidinate precursors
10/31/2013WO2013163323A1 Pvd buffer layers for led fabrication
10/31/2013WO2013163308A1 Power transistor module
10/31/2013WO2013163220A1 Electrostatic chuck with advanced rf and temperature uniformity
10/31/2013WO2013163193A1 Laser submounts formed using etching process
10/31/2013WO2013163192A1 Gas reclamation and abatement system for high volume epitaxial silicon deposition system
10/31/2013WO2013163137A1 Passivation technique for wide bandgap semiconductor devices
10/31/2013WO2013163082A1 Methods and apparatus for implanting a dopant material
10/31/2013WO2013163081A1 Methods for filling high aspect ratio features on substrates
10/31/2013WO2013163080A1 Substrate processing system with lamphead having temperature management
10/31/2013WO2013163079A1 Faceplate having regions of differing emissivity
10/31/2013WO2013163056A1 Direct current lamp driver for substrate processing
10/31/2013WO2013163040A1 Localized atmospheric laser chemical vapor deposition
10/31/2013WO2013163021A1 Methods for manufacturing metal gates
10/31/2013WO2013163004A1 Pvd aln film with oxygen doping for a low etch rate hardmask film
10/31/2013WO2013162972A1 Process chamber having separate process gas and purge gas regions
10/31/2013WO2013162950A1 Methods and apparatus for pre-chemical mechanical planarization of buffing module
10/31/2013WO2013162938A1 Esc cooling base for large diameter substrates
10/31/2013WO2013162937A1 Esc with cooling base
10/31/2013WO2013162936A1 Laser and plasma etch wafer dicing using uv-curable adhesive film
10/31/2013WO2013162932A1 Apparatus for treating an exhaust gas in a foreline
10/31/2013WO2013162930A1 Method of epitaxial germanium tin alloy surface preparation
10/31/2013WO2013162916A1 System and method for aligning substrates for multiple implants
10/31/2013WO2013162910A1 Methods and apparatus for marangoni substrate drying using a vapor knife manifold
10/31/2013WO2013162891A1 Methods and apparatus for active substrate precession during chemical mechanical polishing
10/31/2013WO2013162864A1 High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods
10/31/2013WO2013162863A1 Anti-slip scrubber brush, assembly, and assembly methods
10/31/2013WO2013162857A1 Linear prediction for filtering of data during in-situ monitoring of polishing
10/31/2013WO2013162856A1 Printed chemical mechanical polishing pad
10/31/2013WO2013162855A1 Fitting of optical model with diffraction effects to measured spectrum
10/31/2013WO2013162851A1 Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus
10/31/2013WO2013162848A1 Method for uv based silylation chamber clean
10/31/2013WO2013162842A1 Wafer edge measurement and control
10/31/2013WO2013162838A1 Methods and apparatus for controlling substrate uniformity
10/31/2013WO2013162834A1 Method of forming a permanently supported lamina
10/31/2013WO2013162833A1 Feed-forward and feed-back techniques for in-situ process control
10/31/2013WO2013162832A1 User-input functions for data sequences in polishing endpoint detection
10/31/2013WO2013162824A1 Measurment of film thickness using fourier transform
10/31/2013WO2013162820A1 High temperature electrostatic chuck with real-time heat zone regulating capability
10/31/2013WO2013162797A1 Cooled reflective adapter plate for a deposition chamber
10/31/2013WO2013162792A1 Electrostatic chuck having reduced power loss
10/31/2013WO2013162774A1 Method and apparatus for independent wafer handling
10/31/2013WO2013162717A1 Gas distribution module for insertion in lateral flow chambers
10/31/2013WO2013162712A1 Optics for controlling light transmitted through a conical quartz dome
10/31/2013WO2013162697A1 Method and apparatus for substrate support with multi-zone heating
10/31/2013WO2013162644A1 Capacitively coupled plasma source with rf coupled grounded electrode
10/31/2013WO2013162643A1 Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface
10/31/2013WO2013162641A1 Methods and apparatus toward preventing esc bonding adhesive erosion
10/31/2013WO2013162638A1 Vapor dryer module with reduced particle generation
10/31/2013WO2013162553A1 Nonlinear memristors
10/31/2013WO2013162530A1 Cavity enhanced spectroscopy
10/31/2013WO2013162498A1 Lift-off layer for separation and disposal of energy conversion devices
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