Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2004
03/02/2004US6699740 Method for manufacturing a lateral double-diffused MOS transistor having stable characteristics and equal drift length
03/02/2004US6699738 Semiconductor doping method and liquid crystal display device fabricating method using the same
03/02/2004US6699737 Method of manufacturing a semiconductor device
03/02/2004US6699736 Electrical coupling of a stiffener to a chip carrier
03/02/2004US6699735 Semiconductor device and method for manufacturing the semiconductor device
03/02/2004US6699732 Pitch compensation in flip-chip packaging
03/02/2004US6699731 Substrate of semiconductor package
03/02/2004US6699729 Method of forming planar color filters in an image sensor
03/02/2004US6699728 Patterning of electrodes in oled devices
03/02/2004US6699727 Method for prioritizing production lots based on grade estimates and output requirements
03/02/2004US6699726 Semiconductor device and method for the manufacture thereof
03/02/2004US6699725 Methods of fabricating ferroelectric memory devices having a ferroelectric planarization layer
03/02/2004US6699645 Using chemically amplified resist which comprises alkali insoluble base polymer and acid generator in which patternwise exposed film of resist is developed with organic alkaline developer in presence of surfactant; peel, crack resistance
03/02/2004US6699644 Process for forming a photoresist pattern comprising alkaline treatment
03/02/2004US6699641 Photosensitive bottom anti-reflective coating
03/02/2004US6699639 Projection-exposure methods and apparatus exhibiting increased throughput
03/02/2004US6699635 Positive photosensitive composition
03/02/2004US6699628 Synchronize movable stage, calibration plate, detectable label
03/02/2004US6699626 Mask set for use in phase shift photolithography technique which is suitable to form random patterns
03/02/2004US6699625 Absorber pattern that is configured to absorb extreme ultraviolet rays
03/02/2004US6699624 Precision optical measurement of the two process layers on a semiconductor wafer, set of diffraction grating test patterns that are used in combination with rigorous diffraction grating analysis
03/02/2004US6699552 Silicon wafer break pattern, silicon substrate
03/02/2004US6699531 Enhancing the thermostability of a fluorine containing carbon film capable of being used as, e.g., an interlayer dielectric by reacting fluorine within film with hydrogen plasma
03/02/2004US6699530 Method for constructing a film on a semiconductor wafer
03/02/2004US6699524 Method and apparatus for feeding gas phase reactant into a reaction chamber
03/02/2004US6699436 Apparatus for measuring contaminant mobile ions in dielectric materials
03/02/2004US6699402 Chemical mechanical polishing (cmp) slurry of abrasive polishing particles, a bromide compound, a bromate compound for providing free bromine oxidizing agent and an organic acid for mediating bromate decomposition; capacitors
03/02/2004US6699401 Kneading sic powder, compacting, calcining, purifying, impregnating with silicon in sealed vessel provided in heating furnace body
03/02/2004US6699400 Etch process and apparatus therefor
03/02/2004US6699399 Self-cleaning etch process
03/02/2004US6699396 Methods for electroplating large copper interconnects
03/02/2004US6699380 Robotic transferring between cells
03/02/2004US6699375 Method of extending process kit consumable recycling life
03/02/2004US6699373 Apparatus for processing the surface of a microelectronic workpiece
03/02/2004US6699371 Fabrication method of blue light emitting ZnO thin film phosphor
03/02/2004US6699356 Method and apparatus for chemical-mechanical jet etching of semiconductor structures
03/02/2004US6699330 Cleaning with aqueous acetic acid containing ozone
03/02/2004US6699329 Coating and curing system
03/02/2004US6699304 Palladium-containing particles, method and apparatus of manufacture, palladium-containing devices made therefrom
03/02/2004US6699299 Composition and method for polishing in metal CMP
03/02/2004US6699115 Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus
03/02/2004US6699022 Vacuum exhaust apparatuses and vacuum exhaust methods
03/02/2004US6699004 Wafer rotation in wafer handling devices
03/02/2004US6699003 Carrying device
03/02/2004US6698992 Elastically expandable positioning device
03/02/2004US6698991 Fabrication system with extensible equipment sets
03/02/2004US6698944 Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method
03/02/2004US6698735 Fluid bearings and vacuum chucks and methods for producing same
03/02/2004US6698728 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites
03/02/2004US6698646 Room temperature gold wire bonding
03/02/2004US6698488 Apparatus for sticking a tape onto a semiconductor wafer and method of sticking the tape
03/02/2004US6698486 Apparatus for removing wafer ring tape
03/02/2004US6698469 Cylinder cabinet and method of purging remaining gas in the pipe thereof
03/02/2004US6698439 Processing apparatus with sealing mechanism
03/02/2004US6698416 Film frame substrate fixture
03/02/2004US6698088 Universal clamping mechanism
03/02/2004US6698086 Method for the linear configuration of metallic fuse sections on wafers
03/02/2004US6698084 Method for manufacturing radio frequency module components with surface acoustic wave element
03/02/2004US6698082 Micro-electromechanical switch fabricated by simultaneous formation of a resistor and bottom electrode
03/02/2004CA2323255C Gas shower unit for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus
03/02/2004CA2154357C Microstructures and single-mask, single-crystal process for fabrication thereof
02/2004
02/26/2004WO2004017481A1 Sensor protection circuit
02/26/2004WO2004017432A1 Nitride semiconductor and fabrication method thereof
02/26/2004WO2004017431A1 Nitride semiconductor led and fabrication method thereof
02/26/2004WO2004017423A2 Sensor arrangement
02/26/2004WO2004017421A1 Micro t-shaped electrode fabricating method
02/26/2004WO2004017419A1 Vertical gate semiconductor device with a self-aligned structure
02/26/2004WO2004017418A1 Semiconductor integrated circuit device and method for fabricating the same
02/26/2004WO2004017417A1 Field effect transistor, associated use, and associated production method
02/26/2004WO2004017416A1 Insulated gate field-effect transistor and its manufacturing method, and imaging device and its manufacturing method
02/26/2004WO2004017415A1 Bipolar transistor for avoiding thermal runaway
02/26/2004WO2004017414A1 Method of making a vertical gate semiconductor device
02/26/2004WO2004017412A1 Semiconductor device and method for forming
02/26/2004WO2004017410A1 Ferroelectric memory and its manufacturing method
02/26/2004WO2004017409A1 Method for modifying the impedance of semiconductor devices using a focused heating source
02/26/2004WO2004017407A1 Surface-mounted semiconductor component and method for the production thereof
02/26/2004WO2004017404A1 Use of metal oxide masks for treating surfaces in the production of microchips
02/26/2004WO2004017403A1 Method for forming a dual gate oxide device using a metal oxide and resulting device
02/26/2004WO2004017402A1 Semiconductor device and method for manufacturing same
02/26/2004WO2004017401A1 Semiconductor component with trench insulation and corresponding production method
02/26/2004WO2004017400A1 Assembly comprising a semiconductor chip and support therefor, in addition to method for a bonded wiring connection
02/26/2004WO2004017398A2 Semiconductor-on-insulator device and method of its manufacture
02/26/2004WO2004017397A1 Method for manufacturing semiconductor device
02/26/2004WO2004017396A1 Method of forming insulation film on semiconductor substrate
02/26/2004WO2004017395A1 Isolated complementary mos devices in epi-less substrate
02/26/2004WO2004017394A1 Method for the vertical structuring of substrates in semiconductor process technology by means of non-conforming deposition
02/26/2004WO2004017393A2 Prevention of lateral oxidation in a transistor utilizing an ultra thin oxygen-diffusion barrier
02/26/2004WO2004017392A1 Laser application method
02/26/2004WO2004017391A1 Ferroelectric memory, semiconductor device, production method for ferroelectric memory, and production method for semiconductor device
02/26/2004WO2004017390A1 Method and compositions for hardening photoresist in etching processes
02/26/2004WO2004017389A2 Method for performing real time arcing detection
02/26/2004WO2004017387A2 Vision system
02/26/2004WO2004017385A2 Device for rapid heat treatment comprising inside the reaction chamber cold-walled halogen infrared lamps
02/26/2004WO2004017384A1 Device for etching semiconductors with a large surface area
02/26/2004WO2004017383A2 Low termperature deposition of silicon oxides and oxynitrides
02/26/2004WO2004017382A2 Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity within areas in such regions and edge areas thereof, and a structure of such film regions
02/26/2004WO2004017381A2 Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions
02/26/2004WO2004017380A2 A single-shot semiconductor processing system and method having various irradiation patterns
02/26/2004WO2004017379A2 Process and system for processing a thin film sample and thin film structure
02/26/2004WO2004017378A2 Atomic layer deposition of high k metal silicates