Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2004
02/24/2004US6696338 Method for forming ruthenium storage node of semiconductor device
02/24/2004US6696337 Multilayer connecting conductor in edge circuit zones
02/24/2004US6696336 Double sided container process used during the manufacture of a semiconductor device
02/24/2004US6696335 Method for forming a diffusion region
02/24/2004US6696334 Method for formation of a differential offset spacer
02/24/2004US6696333 Method of making integrated circuit with MOSFETs having bi-layer metal gate electrodes
02/24/2004US6696332 Bilayer deposition to avoid unwanted interfacial reactions during high K gate dielectric processing
02/24/2004US6696331 Method of protecting a stacked gate structure during fabrication
02/24/2004US6696329 Method of manufacturing semiconductor device
02/24/2004US6696328 CMOS gate electrode using selective growth and a fabrication method thereof
02/24/2004US6696327 Method for making a semiconductor device having a high-k gate dielectric
02/24/2004US6696326 Cleaning method to prevent watermarks
02/24/2004US6696325 Method of transferring a thin film device onto a plastic sheet and method of forming a flexible liquid crystal display
02/24/2004US6696324 Contact structures of wirings and methods for manufacturing the same, and thin film transistor array panels including the same and methods for manufacturing the same
02/24/2004US6696323 Method of manufacturing semiconductor device having trench filled up with gate electrode
02/24/2004US6696319 Providing a semiconductor device; providing a switching device; forming the electrical contact devices; applying attachment element to surfaces; pressing flexible contact elements onto the contact areas, and securely connecting
02/24/2004US6696318 Methods for forming a die package
02/24/2004US6696317 Method of manufacturing a flip-chip semiconductor device with a stress-absorbing layer made of thermosetting resin
02/24/2004US6696315 Semiconductor device configuration with cavities of submicrometer dimensions and method of fabricating structured cavities
02/24/2004US6696313 Preparing substrate; growing a superlattice strained layer by alternately depositing two semiconductor materials having different lattice constant by a predetermined cycle; forming a quantum-dot active layer including quantum dots
02/24/2004US6696312 Robust electrode patterning in OLED devices
02/24/2004US6696309 Methods for making electrooptical device and driving substrate therefor
02/24/2004US6696306 Methods of fabricating layered structure and semiconductor device
02/24/2004US6696305 Metal post manufacturing method
02/24/2004US6696228 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films
02/24/2004US6696224 Forming layer to be etched over semiconductor substrate, forming imaging layer over layer to be etched, removing selected regions of imaging layer to leave pattern of openings extending partially into imaging layer, etching
02/24/2004US6696222 Having a conductive structure and a low-k dielectric layer covering the conductive structure.
02/24/2004US6696220 Template for room temperature, low pressure micro-and nano-imprint lithography
02/24/2004US6696219 Positive resist laminate
02/24/2004US6696218 Resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and a dialkanesulfonate of isopropylidenedicyclohexanol
02/24/2004US6696217 Acrylated ester polymer
02/24/2004US6696216 Thiophene-containing photo acid generators for photolithography
02/24/2004US6696139 Green sheet and manufacturing method thereof, manufacturing method of multi-layer wiring board and manufacturing method of double-sided wiring board
02/24/2004US6696108 Placing article to be processed in reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high frequency electrode to generate plasma in reaction container
02/24/2004US6696103 Aluminium nitride ceramics and method for preparing the same
02/24/2004US6696034 Method for producing hydrophobic silica fine powder
02/24/2004US6696006 Mold for flashless injection molding to encapsulate an integrated circuit chip
02/24/2004US6695962 Used to deposit, polish, or electro-polish metal films on a substrate, or to remove such metal films from such a substrate
02/24/2004US6695957 Simultaneous electrical and fluid connection for anode
02/24/2004US6695955 Method of forming polycrystalline silicon for liquid crystal display device
02/24/2004US6695954 If a film consisting of only the sputtered material is to be formed on a substrate, then the gas within the chamber is nonreactive, on the other hand, a nitride or oxide film formed by chemical reaction of target and reactive gas
02/24/2004US6695947 Device for manufacturing semiconductor device and method of manufacturing the same
02/24/2004US6695946 Cooling system
02/24/2004US6695926 Treatment method of semiconductor wafers and the like and treatment system for the same
02/24/2004US6695925 Immersion in aqueous solution containing 12% hydrogen peroxide (h2o2), sodium and potassium ions; immersing in water tank; immersing in isopropyl alcohol; drying with heated nitrogen gas
02/24/2004US6695922 Film forming unit
02/24/2004US6695921 Hoop support for semiconductor wafer
02/24/2004US6695914 System for processing a workpiece
02/24/2004US6695903 Screen-printable masking paste comprising: one or more silanes, solvents, an acid and water, and one or more additives
02/24/2004US6695886 Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool
02/24/2004US6695687 Semiconductor substrate holder for chemical-mechanical polishing containing a movable plate
02/24/2004US6695684 Chemical mechanical polishing apparatus having a cleaner for cleaning a conditioning disc and method of conditioning a polishing pad of the apparatus
02/24/2004US6695683 Semiconductor device washing apparatus and a method of washing a semiconductor device
02/24/2004US6695682 Polishing method and polishing apparatus
02/24/2004US6695681 Endpoint detection system for wafer polishing
02/24/2004US6695680 Polishing pad conditioner for semiconductor polishing apparatus and method of monitoring the same
02/24/2004US6695572 Method and apparatus for minimizing semiconductor wafer contamination
02/24/2004US6695546 Single drive aligner elevation apparatus for an integrated circuit handler
02/24/2004US6695200 Bumps made with adhesive film instead of gold plating
02/24/2004US6695042 Adjustable pedestal thermal interface
02/24/2004US6695032 Method and apparatus for forming cover tape of tape feeder
02/24/2004US6695030 Apparatus for permitting transfer of organic material from a donor web to form a layer in an OLED device
02/24/2004US6695003 Gas isolation box
02/24/2004US6694809 Flow controller
02/24/2004US6694792 Substrate treatment process
02/24/2004US6694707 Apparatus and method for populating transport tapes
02/24/2004US6694613 Method for producing a printed-circuit board having projection electrodes
02/24/2004US6694608 Part mounter
02/24/2004CA2314922C Device for producing excited/ionized particles in a plasma
02/19/2004WO2004016063A1 Transfer carrier for flexible printed circuit board and electronic parts mounting method to flexible printed circuit board
02/19/2004WO2004016055A1 An electronic product, a body and a method of manufacturing
02/19/2004WO2004015854A2 Monolithic, software-definable circuit including a power amplifier
02/19/2004WO2004015791A2 Magnetoresistant device and magnetic memory device further comme nts
02/19/2004WO2004015782A1 Insulated gate field effect transistor having passivated schottky barriers to the channel
02/19/2004WO2004015781A1 Method for manufacturing compound semiconductor wafer and compound semiconductor device
02/19/2004WO2004015780A1 Field effect transistor
02/19/2004WO2004015776A2 Electrostatic discharge protection circuitry and method of operation
02/19/2004WO2004015771A2 Semiconductor device and method of manufacturing the same
02/19/2004WO2004015770A1 Multi-layer circuit carrier and production thereof
02/19/2004WO2004015766A1 Method of fabricating a heat exchanger for regulating the temperature of multiple integrated circuit modules
02/19/2004WO2004015764A2 Vertical system integration
02/19/2004WO2004015763A1 Wafer rotation device and edge flaw inspection apparatus having the device
02/19/2004WO2004015760A1 Anisotropic conductivity connector, conductive paste composition, probe member, wafer inspecting device, and wafer inspecting method
02/19/2004WO2004015759A2 A method of preparing a thin layer, the method including a step of correcting thickness by sacrificial oxidation, and an associated machine
02/19/2004WO2004015758A1 Semiconductor device and method for manufacturing the same
02/19/2004WO2004015757A1 Method and apparatus for completely or partly covering at least one electronic component with a compound
02/19/2004WO2004015756A1 Submount and semiconductor device
02/19/2004WO2004015755A1 Method for fabricating a self-aligned bipolar transistor and related structure
02/19/2004WO2004015754A2 Method for oxidation of a layer and corresponding holder device for a substrate
02/19/2004WO2004015753A1 Laser machinining
02/19/2004WO2004015752A1 Method and apparatus for polishing wafer
02/19/2004WO2004015750A1 Heat treatment method and heat treatment apparatus
02/19/2004WO2004015749A1 Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures
02/19/2004WO2004015747A1 Processing device for wafers and method for processing thereof
02/19/2004WO2004015745A2 A dmos device with a programmable threshold voltage
02/19/2004WO2004015742A2 High rate deposition in a batch reactor
02/19/2004WO2004015741A2 Notch-free etching of high aspect soi structures using alternating deposition and etching and pulsed plasma
02/19/2004WO2004015737A1 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam
02/19/2004WO2004015736A2 Low loss rf bias electrode for a plasma reactor with enhanced wafer edge rf coupling and highly efficient wafer cooling
02/19/2004WO2004015732A1 Method and apparatus for bootstrapping a programmable antifuse circuit