H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2004
11/11/2004	US20040222473 Semiconductor device
11/11/2004	US20040222472 Thin film transistor and use of same
11/11/2004	US20040222471 Semiconductor device having a plurality of gate electrodes and manufacturing method thereof
11/11/2004	US20040222470 Semiconductor device and fabrication method thereof
11/11/2004	US20040222469 Semiconductor device
11/11/2004	US20040222467 Semiconductor device and fabrication method thereof
11/11/2004	US20040222466 Implanted asymmetric doped polysilicon gate FinFet
11/11/2004	US20040222465 Semiconductor device and method of manufacturing same
11/11/2004	US20040222464 Semiconductor device and manufacturing method thereof
11/11/2004	US20040222463 SOI chip with mesa isolation and recess resistant regions
11/11/2004	US20040222462 Shallow doped junctions with a variable profile gradation of dopants
11/11/2004	US20040222461 Lateral semiconductor device with low on-resistance and method of making the same
11/11/2004	US20040222460 [non-volatile memory device structure]
11/11/2004	US20040222458 Termination structure for trench DMOS device and method of making the same
11/11/2004	US20040222457 Buried channel type transistor having a trench gate and method of manufacturing the same
11/11/2004	US20040222456 Computer system, memory structure and structure for providing storage of data
11/11/2004	US20040222455 Seft-aligned dual-bit nvm cell and method for forming the same
11/11/2004	US20040222454 Semiconductor device and method for manufacturing the same
11/11/2004	US20040222453 Memory cell capacitors having an over/under configuration
11/11/2004	US20040222452 Semiconductor memory device, method for driving the same and portable electronic appararus
11/11/2004	US20040222451 Semiconductor memory device with static memory cells
11/11/2004	US20040222450 MRAM architecture with a bit line located underneath the magnetic tunneling junction device
11/11/2004	US20040222448 Solid state imaging device and method of fabricating the same
11/11/2004	US20040222447 Semiconductor device, and method for manufacturing the same
11/11/2004	US20040222446 Ion sensitive field effect transistor and fabrication
11/11/2004	US20040222443 Use of indium to define work function of p-type doped polysilicon
11/11/2004	US20040222442 Fundamental cell, semiconductor integrated circuit device, wiring method and wiring apparatus
11/11/2004	US20040222441 Global column select structure for accessing a memory
11/11/2004	US20040222440 Chip scale package with flip chip interconnect
11/11/2004	US20040222438 Semiconductor memory device and manufacturing process for the same
11/11/2004	US20040222437 Programming and erasing methods for an NROM array
11/11/2004	US20040222436 Bicmos technology on soi substrates
11/11/2004	US20040222429 Light emitting device
11/11/2004	US20040222425 Semiconductor device and method of manufacturing the same
11/11/2004	US20040222424 Nonvolatile memory and manufacturing method thereof
11/11/2004	US20040222422 CMOS inverter layout
11/11/2004	US20040222421 Thin film transistor array substrate and method of fabricating the same
11/11/2004	US20040222417 Complemetray metal oxide semiconductor image sensor and method of manufacturing the same
11/11/2004	US20040222416 Polished semiconductor wafer and process for producing it
11/11/2004	US20040222415 Organic device including semiconducting layer aligned according to microgrooves of photoresist layer
11/11/2004	US20040222412 Organic polymers, electronic devices, and methods
11/11/2004	US20040222408 Circuit-connecting material and circuit terminal connected structure and connecting method
11/11/2004	US20040222388 Surface processing apparatus
11/11/2004	US20040222385 Substrate testing device and substrate testing method
11/11/2004	US20040222383 Processing method and system
11/11/2004	US20040222377 Patterned wafer inspection method and apparatus therefor
11/11/2004	US20040222375 Method of determining the concavity and convexity on sample surface, and charged particle beam apparatus
11/11/2004	US20040222367 Beam source and beam processing apparatus
11/11/2004	US20040222361 Dryer lid/robot collision prevention system
11/11/2004	US20040222358 Thin wafer detectors with improved radiation damage and crosstalk characteristics
11/11/2004	US20040222357 Optical excitation/detection device and method for making same using fluidic self-assembly techniques
11/11/2004	US20040222354 System and method for lithography process monitoring and control
11/11/2004	US20040222323 Nozzle device and substrate treating apparatus having using the device
11/11/2004	US20040222273 Method and apparatus for increasing bulk conductivity of a ferroelectric material
11/11/2004	US20040222272 Solder printing mask, wiring board and production method thereof, electrooptical apparatus and production method thereof and electronic device and production method thereof
11/11/2004	US20040222211 Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device
11/11/2004	US20040222210 Multi-zone ceramic heating system and method of manufacture thereof
11/11/2004	US20040222199 Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof
11/11/2004	US20040222191 Method and apparatus for wet etching using hot etchant
11/11/2004	US20040222190 Plasma processing method
11/11/2004	US20040222189 Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor
11/11/2004	US20040222188 Method of cleaning a deposition chamber and apparatus for depositing a metal on a substrate
11/11/2004	US20040222187 Photoetching; adjustment mask; radiation
11/11/2004	US20040222185 a combination of a gas containing a carbonyl group, a gas with a halogen element, and an electron donating gas is used as an etching gas; better etching rate and anisotropy
11/11/2004	US20040222182 Method for multiple spacer width control
11/11/2004	US20040222126 Apparatus for carrying substrates
11/11/2004	US20040222104 Electroplating composition
11/11/2004	US20040222102 A template is provided having at least two conductive regions separated by a non-conductive region
11/11/2004	US20040222100 Process and system for providing electrochemical processing solution with reduced oxygen and gas content
11/11/2004	US20040222086 Electroplating reactor including back-side electrical contact apparatus
11/11/2004	US20040222082 sputter etching of only selected portions of material deposited in and around high aspect-ratio holes; new tool at controlling the sputtering profile into challenging geometries; Ion sources may be specially designed for semiconductor processing to provide superior performance and fabricational results
11/11/2004	US20040221963 Separating apparatus and processing method for plate member
11/11/2004	US20040221959 Anodized substrate support
11/11/2004	US20040221957 Method system and computer readable medium for monitoring the status of a chamber process
11/11/2004	US20040221956 Semiconductor processing methods of removing conductive material
11/11/2004	US20040221955 Chemical mechanical polishing apparatus
11/11/2004	US20040221954 Coating apparatus and coating method
11/11/2004	US20040221880 Substrate treating apparatus
11/11/2004	US20040221877 Process and apparatus for treating a workpiece with gases
11/11/2004	US20040221876 using water-free, gaseous sulfur trioxide as an agent to remove various organic coatings, films, layers and residues from the surface of a substrate such as semiconductor and non-semiconductor devices and displays so that it is completely removed by subsequent chemical or physical treatment
11/11/2004	US20040221875 Cleaning method
11/11/2004	US20040221874 Cleaning method and polishing apparatus employing such cleaning method
11/11/2004	US20040221871 Semiconductor wafer processing apparatus and method therefor
11/11/2004	US20040221816 Plasma processing apparatus
11/11/2004	US20040221815 Beam source and beam processing apparatus
11/11/2004	US20040221811 Method and apparatus for processing wafers
11/11/2004	US20040221810 Process boat and shell for wafer processing
11/11/2004	US20040221808 Thin-film deposition apparatus
11/11/2004	US20040221799 Nitride semiconductor wafer and method of processing nitride semiconductor wafer
11/11/2004	US20040221797 Method of etching high aspect ratio features
11/11/2004	US20040221795 Single crystal diamond prepared by CVD
11/11/2004	US20040221792 Strained Si/SiGe structures by ion implantation
11/11/2004	US20040221658 Movement actuator/sensor systems
11/11/2004	US20040221653 Method and apparatus for the production and quality testing of a bonded wire connection
11/11/2004	US20040221616 Continuous-treatment apparatus and continuous-treatment method
11/11/2004	US20040221516 Abrasive slurry of metal oxide colloid with stability using metal oxides such as cerium oxide on silica
11/11/2004	US20040221473 Megasonic cleaner and dryer
11/11/2004	US20040221451 Method for packaging circuits and packaged circuits
11/11/2004	US20040221450 Filling plugs through chemical mechanical polish
11/11/2004	DE4423558B4 Halbleiterbauelement mit einer leitfähigen Schicht, MOS-Feldeffekttransistor mit einer leitfähigen Schicht und Verfahren zu deren Herstellung A semiconductor device with a conductive layer, the MOS field effect transistor with a conductive layer and processes for their preparation

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