Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2007
01/25/2007WO2007011789A1 Semiconductor device including a strained superlattice between at least one pair of spaced apart stress regions and associated methods
01/25/2007WO2007011751A2 Method and apparatus for producing controlled stresses and stress gradients in sputtered films
01/25/2007WO2007011666A2 Method and apparatus for semiconductor processing
01/25/2007WO2007011628A1 Semiconductor device including a strained superlattice and overlying stress layer and related methods
01/25/2007WO2007011627A1 Semiconductor device including a strained superlattice layer above a stress layer and associated methods
01/25/2007WO2007011604A1 Method of suppressing distortion of a working laser beam of a laser link processing system
01/25/2007WO2007011582A2 High density nand non-volatile memory device
01/25/2007WO2007011568A2 Contact clean by remote plasma and repair of silicide surface
01/25/2007WO2007011566A1 Semiconductor constructions, memory arrays, electronic systems, and methods of forming semiconductor constructions
01/25/2007WO2007011523A2 Rapid thermal annealing of targeted thin film layers
01/25/2007WO2007011496A2 High performance capacitors in planar back gates cmos
01/25/2007WO2007011468A1 Method of controlling the critical dimension of structures formed on a substrate
01/25/2007WO2007011451A2 Aqueous microfabrication of functional bioelectronic architectures
01/25/2007WO2007011413A2 Carbon nanotube alignment method, apparatus and applicantions
01/25/2007WO2007011380A2 Substrate processing using molecular self-assembly
01/25/2007WO2007011294A1 Semiconductor device and a method for production thereof
01/25/2007WO2007011193A1 Method for manufacturing compliant substrate, compliant substrate manufactured thereby, gallium nitride based compound semiconductor device having the compliant substrate and manufacturing method thereof
01/25/2007WO2007011155A1 Lng bog reliquefaction apparatus
01/25/2007WO2007011061A1 Semiconductor device
01/25/2007WO2007010971A1 Stage device
01/25/2007WO2007010935A1 Photo mask blank, photo mask, and their fabrication method
01/25/2007WO2007010921A1 Method for oxide film formation, semiconductor device comprising the oxide film, and process for producing the semiconductor device
01/25/2007WO2007010902A1 Thermoplastic resin composition for semiconductor, adhesive film, lead frame or semiconductor device compirisng the same, and method for manufacture of semiconductor device using the same
01/25/2007WO2007010887A1 Gas treatment apparatus
01/25/2007WO2007010881A1 Removing solution for photosensitive composition
01/25/2007WO2007010854A1 Semiconductor device, module and electronic device
01/25/2007WO2007010837A1 Variable delay circuit and delay adjustment method of variable delay circuit
01/25/2007WO2007010794A1 Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition
01/25/2007WO2007010766A1 Layered sheets and processes for producing the same
01/25/2007WO2007010736A1 Protection film manufacturing method and inorganic film manufacturing method
01/25/2007WO2007010734A1 Semiconductor apparatus and method of testing semiconductor apparatus
01/25/2007WO2007010732A1 Semiconductor device manufacturing method
01/25/2007WO2007010725A1 Wafer position teaching method and teaching tool
01/25/2007WO2007010717A1 Double side polishing method for wafer
01/25/2007WO2007010681A1 Thin film capacitor and method for manufacturing thin film capacitor
01/25/2007WO2007010679A1 Remover compositions
01/25/2007WO2007010667A1 Process for producing positive-working resist composition, positive-working resist composition, and method for resist pattern formation
01/25/2007WO2007010666A1 Resist composition and method of resist pattern formation
01/25/2007WO2007010660A1 Wiring board
01/25/2007WO2007010645A1 Gallium nitride wafer
01/25/2007WO2007010621A1 Method of preparing photomask pattern data, photomask produced by using that photomask pattern data, and method of producing semiconductor device using that photomask
01/25/2007WO2007010619A1 Method for manufacturing simox wafer and simox wafer manufactured by such method
01/25/2007WO2007010600A1 Semiconductor device and its manufacturing method
01/25/2007WO2007010595A1 Semiconductor device and method for manufacturing same
01/25/2007WO2007010568A1 System for supporting and rotating a susceptor inside a treatment chamber of a water treating apparatus
01/25/2007WO2007010315A2 Leadframe strip and mold apparatus for an electronic component and method of encapsulating an electronic component
01/25/2007WO2007010149A1 Uniform chemical etching method
01/25/2007WO2007010135A2 Method for making a heterojunction bipolar transistor
01/25/2007WO2007010029A1 Microelectronic device provided with transistors coated with a piezoelectric layer
01/25/2007WO2007009934A1 Device for transferring flat components by packets from a loading to unloding station
01/25/2007WO2007009846A1 Cmos transistors with dual high-k gate dielectric and methods of manufacture thereof
01/25/2007WO2007009326A1 A self-assembled and bistable quantum wire array of nano-medicine and its preparation process
01/25/2007WO2006127462A3 Method to increase the compressive stress of pecvd silicon nitride films
01/25/2007WO2006114535A8 Method of producing a multilayer electronic device that is free of parasitic interface resistances
01/25/2007WO2006090201A3 Thermal oxidation of a sige layer and applications thereof
01/25/2007WO2006085614A3 Cushioning material for polishing pad
01/25/2007WO2006076392A3 Polishing slurries and methods for chemical mechanical polishing
01/25/2007WO2006073477A3 Method of fabricating a tunneling nanotube field effect transistor
01/25/2007WO2006068741A3 Flexible electronic circuit articles and methods of making thereof
01/25/2007WO2006064840A3 Cleaning device, cleaning system using the cleaning device, and method of cleaning substrate to be cleaned
01/25/2007WO2006063170A3 Methodology for recovery of hot carrier induced degradation in bipolar devices
01/25/2007WO2006060339A3 Selective epitaxy process with alternating gas supply
01/25/2007WO2006036753A3 Methods and apparatus for tuning a set of plasma processing steps
01/25/2007WO2006000669A3 Method for producing a multilayer structure comprising a separating layer
01/25/2007WO2005117144A3 Gate driver output stage with bias circuit for high and wide operating voltage range
01/25/2007WO2005116304A3 In situ doped epitaxial films
01/25/2007WO2005004195A3 Method and apparatus for packaging integrated circuit devices
01/25/2007US20070022398 Via/BSM pattern optimization to reduce DC gradients and pin current density on single and multi-chip modules
01/25/2007US20070021855 Test data analyzing system and test data analyzing program
01/25/2007US20070021669 Apparatus and methods of cortical surface registration and deformation tracking for patient-to-image alignment in relation to image-guided surgery
01/25/2007US20070021580 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
01/25/2007US20070021043 Chemical mechanical polishing apparatus with rotating belt
01/25/2007US20070021038 Cmp apparatus and process sequence method
01/25/2007US20070021037 Polishing Assembly With A Window
01/25/2007US20070021025 Organic light emitting display with circuit measuring pad and method of fabricating the same
01/25/2007US20070020958 Plasma processing method and apparatus
01/25/2007US20070020957 Method of forming an insulating film, method of manufacturing a semiconductor device, and semiconductor device
01/25/2007US20070020956 Semiconductor device and method for manufacturing the same
01/25/2007US20070020955 Fabrication method of composite metal oxide dielectric film, and composite metal oxide dielectric film fabricated thereby
01/25/2007US20070020954 Method for manufacturing semiconductor optical device using inductive coupled plasma-enhance CVD
01/25/2007US20070020953 Method for forming a high density dielectric film by chemical vapor deposition
01/25/2007US20070020952 Repairing method for low-k dielectric materials
01/25/2007US20070020951 Fluorocarbon film and method for forming same
01/25/2007US20070020950 Silicon nano wires, semiconductor device including the same, and method of manufacturing the silicon nano wires
01/25/2007US20070020949 Method for manufacturing SIMOX wafer and SIMOX wafer
01/25/2007US20070020948 Self-packaged optical interference display device having anti-stiction bumps, integral micro-lens, and reflection-absorbing layers
01/25/2007US20070020947 Method of reducing roughness of a thick insulating layer
01/25/2007US20070020946 Method for modifying surface of substrate and method for manufacturing semiconductor device
01/25/2007US20070020945 Semiconductor processing system and method
01/25/2007US20070020944 Selective etch process of a sacrificial light absorbing material (slam) over a dielectric material
01/25/2007US20070020943 Apparatus and method for removing a photoresist structure from a substrate
01/25/2007US20070020942 Method and system for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts, and a mask for facilitating such artifact reduction/elimination
01/25/2007US20070020941 Plasma etching apparatus and particle removal method
01/25/2007US20070020940 Method of forming fluorinated carbon film
01/25/2007US20070020939 Controlled geometry hardmask including subresolution elements
01/25/2007US20070020938 Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having the semiconductor probe
01/25/2007US20070020937 Etch chamber with dual frequency biasing sources and a single frequency plasma generating source
01/25/2007US20070020936 Methods of etching features into substrates
01/25/2007US20070020935 Process for enhancing solubility and reaction rates in supercritical fluids
01/25/2007US20070020934 Hard mask structure for patterning of materials