| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/24/2007 | EP1745513A2 Integrated getter for vacuum or inert gas packaged leds |
| 01/24/2007 | EP1745512A1 Nrom device |
| 01/24/2007 | EP1745511A1 Bitline implant utilizing dual poly |
| 01/24/2007 | EP1745506A2 Semiconductor die attachment for high vaccum tubes |
| 01/24/2007 | EP1745505A1 Process for the singulation of integrated devices in thin semiconductor chips |
| 01/24/2007 | EP1745504A1 An improved method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made |
| 01/24/2007 | EP1745503A2 Methods to fabricate mosfet devices using selective deposition processes |
| 01/24/2007 | EP1745502A1 Method for growth of group iii-v semiconductor material on a dielectric |
| 01/24/2007 | EP1745165A1 Method for producing virtual ge substrates for iii/v-integration on si(001) |
| 01/24/2007 | EP1525611B1 Method for filling trench and relief geometries in semiconductor structures |
| 01/24/2007 | EP1485946B1 Substrate support |
| 01/24/2007 | EP1476900B1 Method for forming an oxide layer on a gaas-based semiconductor structure |
| 01/24/2007 | EP1461816B1 Mems device having contact and standoff bumps and related methods |
| 01/24/2007 | EP1451861A4 Apparatus and method for reactive atom plasma processing for material deposition |
| 01/24/2007 | EP1449268A4 Radial power megasonic transducer |
| 01/24/2007 | EP1444724B1 Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is produced by means of a plasma-enhanced deposition method |
| 01/24/2007 | EP1403228B1 Ceramic component and production method therefor |
| 01/24/2007 | EP1384205B1 Wafer mapping apparatus and method |
| 01/24/2007 | EP1344246B1 Method for making a substrate in particular for optics, electronics or optoelectronics and resulting substrate |
| 01/24/2007 | EP1269522B1 Wafer preparation apparatus |
| 01/24/2007 | EP1222679B1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 01/24/2007 | EP1212782B1 Method for the production of an integrated circuit arrangement with at least a capacitor |
| 01/24/2007 | EP1183725B1 Semiconductor device and method of manufacturing same |
| 01/24/2007 | EP1181712B1 Low-resistance vdmos semiconductor component |
| 01/24/2007 | EP1099244B1 Method for anisotropic etching |
| 01/24/2007 | EP1079429B1 Alignment processing mechanism and semiconductor processing device using it |
| 01/24/2007 | EP1061570B1 Semiconductor device with bumped contacts and manufacturing method thereof |
| 01/24/2007 | EP1040521B1 Method of operating a silicon oxide insulator (soi) semiconductor having selectively linked body |
| 01/24/2007 | EP0931332B1 Method for separating two material layers |
| 01/24/2007 | EP0864537B1 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same |
| 01/24/2007 | CN2862331Y Substrate support means for the preparation of flexible solar battery |
| 01/24/2007 | CN2862324Y Ball grid array plant table |
| 01/24/2007 | CN2862323Y Pre-heating machine for triode sheet |
| 01/24/2007 | CN2862120Y Producing device for thin film transistor and light shield employed |
| 01/24/2007 | CN1902766A Light emitting devices with self aligned ohmic contact and methods of fabricating same |
| 01/24/2007 | CN1902762A Transistor with quantum dots in its tunnelling layer |
| 01/24/2007 | CN1902761A 有机薄膜晶体管 The organic thin film transistor |
| 01/24/2007 | CN1902760A Silicon carbide semiconductor device and its manufacturing method |
| 01/24/2007 | CN1902759A Bipolar transistor, semiconductor device comprising the bipolar transistor |
| 01/24/2007 | CN1902758A Transistor with silicon and carbon layer in the channel region |
| 01/24/2007 | CN1902750A Methods for integrating replacement metal gate structures |
| 01/24/2007 | CN1902749A CMOS device with metal and silicide gate electrodes and a method for making it |
| 01/24/2007 | CN1902748A Shallow trench isolation process and structure |
| 01/24/2007 | CN1902747A Substrate with determinate thermal expansion coefficient |
| 01/24/2007 | CN1902746A Apparatuses and methods for suppressing thermally induced motion of a workpiece |
| 01/24/2007 | CN1902745A Line edge roughness reduction for trench etch |
| 01/24/2007 | CN1902744A Method of fabricating integrated circuit channel region |
| 01/24/2007 | CN1902743A Low stress sidewall spacer in integrated circuit technology |
| 01/24/2007 | CN1902742A Damascene tri-gate FinFET |
| 01/24/2007 | CN1902741A Narrow-body damascene tri-gate finfet having thinned body |
| 01/24/2007 | CN1902740A Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films |
| 01/24/2007 | CN1902739A Method of varying etch selectivities of a film |
| 01/24/2007 | CN1902738A Atomic layer deposition of high k metal silicates |
| 01/24/2007 | CN1902737A Substrate processing apparatus |
| 01/24/2007 | CN1902736A Amorphous etch stop for the anisotropic etching of substrates |
| 01/24/2007 | CN1902735A Method for making a semiconductor device having a metal gate electrode |
| 01/24/2007 | CN1902734A Method for producing semiconductor device |
| 01/24/2007 | CN1902733A Exposure method and apparatus, and device producing method |
| 01/24/2007 | CN1902732A Edge flow faceplate for improvement of cvd film properties |
| 01/24/2007 | CN1902550A Composition for forming nitride coating film for hard mask |
| 01/24/2007 | CN1902548A Photosensitive polymer composition, process for producing pattern, and electronic part |
| 01/24/2007 | CN1902515A Optical waveguides and methods thereof |
| 01/24/2007 | CN1902482A Surface acoustic wave sensor assemblies |
| 01/24/2007 | CN1902337A CVD tantalum compounds for FET gate electrodes |
| 01/24/2007 | CN1902297A Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
| 01/24/2007 | CN1902292A 抛光组合物和抛光方法 Polishing composition and polishing method |
| 01/24/2007 | CN1902291A 抛光组合物和抛光方法 Polishing composition and polishing method |
| 01/24/2007 | CN1902139A Aluminum silicophosphate glasses |
| 01/24/2007 | CN1902138A High strain point glasses |
| 01/24/2007 | CN1902024A Laser processing method and device |
| 01/24/2007 | CN1902023A Laser processing method and device |
| 01/24/2007 | CN1901774A Inductively coupled plasma processing apparatus |
| 01/24/2007 | CN1901772A Apparatus to treat a substrate |
| 01/24/2007 | CN1901369A 半导体集成电路器件 The semiconductor integrated circuit device |
| 01/24/2007 | CN1901296A Connecting element and circuit connecting device using the connecting element |
| 01/24/2007 | CN1901240A Method for making LED heat radiator |
| 01/24/2007 | CN1901235A Surface mount type photo-interrupter and method for manufacturing the same |
| 01/24/2007 | CN1901232A Non-volatile memory cells and methods for fabricating non-volatile memory cells |
| 01/24/2007 | CN1901231A Thin film transistor, method for manufacturing thin-film transistor, and display using thin-film transistor |
| 01/24/2007 | CN1901230A Thin film transistor, method for manufacturing thin-film transistor, and display using thin-film transistor |
| 01/24/2007 | CN1901229A Semiconductor device and a method of manufacturing the same |
| 01/24/2007 | CN1901228A Semiconductor device and semiconductor device manufacturing method |
| 01/24/2007 | CN1901227A Film transistor and its forming method |
| 01/24/2007 | CN1901225A Semiconductor device and method of fabricating the same |
| 01/24/2007 | CN1901223A Semiconductor element and its producing method |
| 01/24/2007 | CN1901222A Method and apparatus for epitaxially coating semiconductor wafer, and coated semiconductor wafer |
| 01/24/2007 | CN1901220A Display device |
| 01/24/2007 | CN1901219A El display device |
| 01/24/2007 | CN1901218A Double side luminous OLED display screen and its producing method |
| 01/24/2007 | CN1901215A Solid-state image sensing device and method for fabricating the same |
| 01/24/2007 | CN1901214A Method and apparatus for reducing optical crosstalk in CMOS image sensors |
| 01/24/2007 | CN1901213A Optimized image sensor process and structure to improve blooming |
| 01/24/2007 | CN1901212A Optical device, optical device apparatus, camera module, and optical device manufacturing method |
| 01/24/2007 | CN1901211A Semiconductor device and method of manufacturing the same |
| 01/24/2007 | CN1901210A Method for producing image sensor |
| 01/24/2007 | CN1901209A 薄膜晶体管阵列面板及其制造方法 The thin film transistor array panel and manufacturing method thereof |
| 01/24/2007 | CN1901208A Array substrate for display device |
| 01/24/2007 | CN1901207A Semiconductor substrate, semiconductor device, manufacturing method thereof, and method for designing semiconductor substrate |
| 01/24/2007 | CN1901205A 半导体装置及其制造方法 Semiconductor device and manufacturing method thereof |
| 01/24/2007 | CN1901204A Thin film transistor substrate, display device, and method of fabricating the same |