Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2007
02/15/2007US20070037371 Method of forming gate electrode structures
02/15/2007US20070037370 Method and apparatus for high-efficiency synthesis of carbon nanostructure, and carbon nanostructure
02/15/2007US20070037369 Method of manufacturing silicon carbide semiconductor device
02/15/2007US20070037368 Method of fabricating a semiconductor device
02/15/2007US20070037367 Apparatus for plasma doping
02/15/2007US20070037366 Method of crystallizing amorphous semiconductor film
02/15/2007US20070037365 Semiconductor nanostructures and fabricating the same
02/15/2007US20070037364 Method for manufacturing semiconductor chip
02/15/2007US20070037363 Method for forming a brittle zone in a substrate by co-implantation
02/15/2007US20070037362 Method and apparatus for integrating III-V semiconductor devices into silicon processes
02/15/2007US20070037361 Method for forming void-free trench isolation layer
02/15/2007US20070037360 Semiconductor device using EPI-layer and method of forming the same
02/15/2007US20070037359 Method of forming align key in well structure formation process and method of forming element isolation structure using the align key
02/15/2007US20070037358 Apparatus for etching a glass substrate
02/15/2007US20070037357 Method for removing photoresist using a thermal bake in the presence of hydrogen and a semiconductor device manufactured using the same
02/15/2007US20070037356 Method of manufacture of raised source drain MOSFET with top notched gate structure filled with dielectric plug
02/15/2007US20070037355 ESD protection device for high voltage
02/15/2007US20070037354 Semiconductor device having a structure to improve contact processing margin, and method of fabricating the same
02/15/2007US20070037353 Efficient transistor structure
02/15/2007US20070037352 Display device and manufacturing method of display device
02/15/2007US20070037351 Method of fabricating a resistance based memory device and the memory device
02/15/2007US20070037350 Flash memory cell having reduced floating gate to floating gate coupling
02/15/2007US20070037349 Method of forming electrodes
02/15/2007US20070037348 Method of fabricating trench isolation of semiconductor device
02/15/2007US20070037347 Capacitor of semiconductor device and method of fabricating the same
02/15/2007US20070037346 Rapid thermal annealing of targeted thin film layers
02/15/2007US20070037345 Memory cell array and memory cell
02/15/2007US20070037344 Semiconductor device and method for fabricating the same
02/15/2007US20070037343 Process for manufacturing dual work function metal gates in a microelectronics device
02/15/2007US20070037342 Method to obtain fully silicided poly gate
02/15/2007US20070037341 Method and structure for shallow trench isolation during integrated circuit device manufacture
02/15/2007US20070037340 Fabrication method for fabricating a semiconductor structure and semiconductor structure
02/15/2007US20070037339 Semiconductor circuit arrangement with trench isolation and fabrication method
02/15/2007US20070037338 CMOS image sensor and manufacturing method thereof
02/15/2007US20070037337 Manufacturing method of semiconductor device
02/15/2007US20070037336 Semiconductor device with improved gate resistance and method of its manufacture
02/15/2007US20070037335 Dual work function CMOS devices utilizing carbide based electrodes
02/15/2007US20070037334 Memory device and method of manufacturing a memory device
02/15/2007US20070037333 Work function separation for fully silicided gates
02/15/2007US20070037332 Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
02/15/2007US20070037331 Laser irradiation method, laser irradiation apparatus, and semiconductor device
02/15/2007US20070037330 Evaluation method of semiconductor device, manufacturing method of the semiconductor device, design management system of device comprising the semiconductor device, dose amount control program for the semiconductor device, computer-readable recording medium recording the program, and dose amount control apparatus
02/15/2007US20070037329 Growing [110] silicon on [001] oriented substrate with rare-earth oxide buffer film
02/15/2007US20070037328 Method of manufacturing a non-volatile memory device
02/15/2007US20070037327 Structure and method for forming inter-poly dielectric in a shielded gate field effect transistor
02/15/2007US20070037326 Shallow source/drain regions for CMOS transistors
02/15/2007US20070037325 After deposition method of thinning film to reduce pinhole defects
02/15/2007US20070037324 Process for producing an MOS transistor and corresponding integrated circuit
02/15/2007US20070037323 Manufacturing strained silicon substrates using a backing material
02/15/2007US20070037322 End electrode structure of a surface-mounted resettable over-current protection device
02/15/2007US20070037321 Semiconductor device and a manufacturing method of the same
02/15/2007US20070037320 Multichip packages with exposed dice
02/15/2007US20070037319 Semiconductor package with contact support layer and method to produce the package
02/15/2007US20070037318 Method and apparatus for flip-chip bonding
02/15/2007US20070037317 Method and device for attaching a chip in a housing
02/15/2007US20070037316 Memory cell contact using spacers
02/15/2007US20070037315 Silicone Metalization
02/15/2007US20070037314 Method for fabricating image sensor without LTO-based passivation layer
02/15/2007US20070037313 CMOS image sensor and manufacturing method thereof
02/15/2007US20070037312 Image sensor and fabrication method thereof
02/15/2007US20070037311 Manufacturing method of microelectromechanical system
02/15/2007US20070037310 Semiconductor sensor production method and semiconductor sensor
02/15/2007US20070037309 Semiconductor device and method for manufacturing the same
02/15/2007US20070037308 METHOD FOR MANUFACTURING GaN SEMICONDUCTOR LIGHT-EMITTING ELEMENT
02/15/2007US20070037307 Method of Forming Three-Dimensional Features on Light Emitting Diodes for Improved Light Extraction
02/15/2007US20070037306 Method for manufacturing a semiconductor device
02/15/2007US20070037305 Method of manufacturing semiconductor light- emitting device and semiconductor light-emitting device
02/15/2007US20070037304 Method for manufacturing semiconductor device and semiconductor device
02/15/2007US20070037303 Apparatus and method of illuminating the surface of a wafer in a wafer inspection system
02/15/2007US20070037302 Method of preparing electrode
02/15/2007US20070037301 Method and apparatus for monitoring precision of wafer placement alignment
02/15/2007US20070037300 Systems and methods for plasma processing of microfeature workpieces
02/15/2007US20070037299 Low power magnetoresistive random access memory elements
02/15/2007US20070037298 Semiconductor device with ferroelectric capacitor and fabrication method thereof
02/15/2007US20070037099 Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
02/15/2007US20070037091 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
02/15/2007US20070037087 salt of hydrofluoric acid with a non-metal base, a water-soluble organic solvent, a mercapto group containing corrosion inhibitor, and water; protects aluminum and copper wiring from corrosion while stripping photoresist films and post-ashing residues; nonprecipitating corrosion inhibitor
02/15/2007US20070037073 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate
02/15/2007US20070037072 Levenson type phase shift mask and manufacturing method thereof
02/15/2007US20070037068 Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same
02/15/2007US20070036994 Multiple zone structure capable of light radiation annealing and method using said structure
02/15/2007US20070036944 Assembly of an electrical component comprising an electrical insulation film on a substrate and method for producing said assembly
02/15/2007US20070036914 Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer
02/15/2007US20070036895 Deposition methods utilizing microwave excitation
02/15/2007US20070036425 Bonding apparatus
02/15/2007US20070036424 Bonding pattern discrimination device
02/15/2007US20070036423 Bonding pattern discrimination program
02/15/2007US20070036196 Method of forming mirrors by surface transformation of empty spaces in solid state materials
02/15/2007US20070035816 Method of manufacturing a semiconductor device having a porous dielectric layer and air gaps
02/15/2007US20070035677 Semiconductor device and manufacturing method thereof
02/15/2007US20070035673 Method of making a reflection type liquid crystal display device
02/15/2007US20070035532 Backplanes for display applications, and components for use therein
02/15/2007US20070035267 Stage device
02/15/2007US20070035041 Methods of forming and using memory cell structures
02/15/2007US20070035038 Novel bonding pad structure to minimize IMD cracking
02/15/2007US20070035034 System and Method for Improved Auto-Boating
02/15/2007US20070035031 Sub-resolution assist feature to improve symmetry for contact hole lithography
02/15/2007US20070035027 Method for forming conductors in semiconductor devices
02/15/2007US20070035025 Damascene processing using dielectric barrier films
02/15/2007US20070035022 Semiconductor device and method of manufacturing the same