Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2007
02/20/2007US7180164 Semiconductor device
02/20/2007US7180163 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
02/20/2007US7180157 Bipolar transistor with a very narrow emitter feature
02/20/2007US7180156 Thin-film devices and method for fabricating the same on same substrate
02/20/2007US7180155 Method for manufacturing thin-film multilayer electronic component and thin-film multilayer electronic component
02/20/2007US7180154 Integrated circuit devices having corrosion resistant fuse regions and methods of fabricating the same
02/20/2007US7180153 Capture of residual refractory metal within semiconductor device
02/20/2007US7180148 Optical system with a high germanium concentration silicon germanium alloy including a graded buffer layer
02/20/2007US7180147 Microelectronic structure with a high germanium concentration silicon germanium alloy including a graded buffer layer
02/20/2007US7180145 Micro-electro-mechanical system (MEMS) variable capacitor apparatuses, systems and related methods
02/20/2007US7180143 Semiconductor device having a gate insulating layer being mainly made of silicon oxynitride (SiON) having a compression strain state as its strain state
02/20/2007US7180141 Ferroelectric capacitor with parallel resistance for ferroelectric memory
02/20/2007US7180138 SOI structure having a SiGe layer interposed between the silicon and the insulator
02/20/2007US7180137 Semiconductor device
02/20/2007US7180136 Biased, triple-well fully depleted SOI structure
02/20/2007US7180134 Methods and structures for planar and multiple-gate transistors formed on SOI
02/20/2007US7180131 Semiconductor device having a stacked gate insulation film and a gate electrode and manufacturing method thereof
02/20/2007US7180130 Method of fabricating semiconductor device
02/20/2007US7180129 Semiconductor device including insulating layer
02/20/2007US7180128 Non-volatile memory, non-volatile memory array and manufacturing method thereof
02/20/2007US7180127 Semiconductor memory array of floating gate memory cells with buried floating gate, pointed floating gate and pointed channel region
02/20/2007US7180126 Multi-level memory cell array with lateral floating spacers
02/20/2007US7180124 Nonvolatile memory cells having split gate structure and methods of fabricating the same
02/20/2007US7180122 Semiconductor device and method for fabricating the same
02/20/2007US7180121 Semiconductor device and method of manufacturing the same
02/20/2007US7180120 Semiconductor device having dual stacked MIM capacitor and method of fabricating the same
02/20/2007US7180119 Capacitor and method for fabricating the same, and semiconductor device and method for fabricating the same
02/20/2007US7180118 Semiconductor device including storage node and method of manufacturing the same
02/20/2007US7180117 Flat-type capacitor for integrated circuit and method of manufacturing the same
02/20/2007US7180116 Self-aligned metal electrode to eliminate native oxide effect for metal insulator semiconductor (MIS) capacitor
02/20/2007US7180115 DRAM cell structure with tunnel barrier
02/20/2007US7180114 Semiconductor device
02/20/2007US7180112 Solid-state imaging apparatus having an upwardly convex color filter layer and method of manufacturing the same
02/20/2007US7180109 Field effect transistor and method of fabrication
02/20/2007US7180108 Transistor, circuit board, display and electronic equipment
02/20/2007US7180104 Micromechanical structure, device including the structure, and methods of forming and using same
02/20/2007US7180102 Method and apparatus for using cobalt silicided polycrystalline silicon for a one time programmable non-volatile semiconductor memory
02/20/2007US7180098 Optical isolator device, and method of making same
02/20/2007US7180095 Display device and manufacturing method thereof
02/20/2007US7180093 Semiconductor device and manufacturing method thereof
02/20/2007US7180092 Semiconductor device
02/20/2007US7180091 Semiconductor device and manufacturing method thereof
02/20/2007US7180090 Method of forming thin-film transistor devices with electro-static discharge protection
02/20/2007US7180088 Nitride based semiconductor light-emitting device
02/20/2007US7180087 Spin filter and a memory using such a spin filter
02/20/2007US7180051 Polarization state detecting system, light source, and exposure apparatus
02/20/2007US7180049 Image sensor with optical guard rings and method for forming the same
02/20/2007US7180036 Semiconductor processing temperature control
02/20/2007US7180035 Substrate processing device
02/20/2007US7180007 Electronic circuit device and its manufacturing method
02/20/2007US7180006 Tape substrate and method for fabricating the same
02/20/2007US7179988 Dye sensitized solar cells having foil electrodes
02/20/2007US7179987 Solar cell and method for making
02/20/2007US7179879 Units of 9,9-bis(hydroxyphenyl)fluorene and heteroaromatic rings such as pyridine and thiophene moieties as low k dielectric material with good thermal stability, for forming a metal interconnect; traps copper or copper ions to prevent undesirable diffusion from conductive layer
02/20/2007US7179760 Bilayer cap structure including HDP/bHDP films for conductive metallization and method of making same
02/20/2007US7179759 Barrier layer and fabrication method thereof
02/20/2007US7179758 Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics
02/20/2007US7179757 Replenishment of surface carbon and surface passivation of low-k porous silicon-based dielectric materials
02/20/2007US7179756 Spraying colloidal solutions using nozzle; aggregation
02/20/2007US7179755 Forming a porous dielectric layer and structures formed thereby
02/20/2007US7179754 Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy
02/20/2007US7179753 Process for planarizing substrates of semiconductor technology
02/20/2007US7179752 Dry etching method
02/20/2007US7179751 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
02/20/2007US7179750 Method for manufacturing multi-thickness gate dielectric layer of semiconductor device
02/20/2007US7179749 Method for fabricating semiconductor device capable of decreasing critical dimension in peripheral region
02/20/2007US7179748 Method for forming recesses
02/20/2007US7179747 Use of supercritical fluid for low effective dielectric constant metallization
02/20/2007US7179746 Method of surface treatment for manufacturing semiconductor device
02/20/2007US7179745 Method for offsetting a silicide process from a gate electrode of a semiconductor device
02/20/2007US7179744 Method for fabricating semiconductor device
02/20/2007US7179743 Titanium underlayer for lines in semiconductor devices
02/20/2007US7179742 Interconnect circuitry, multichip module, and methods for making them
02/20/2007US7179741 Electroless plating method and semiconductor wafer on which metal plating layer is formed
02/20/2007US7179740 Integrated circuit with improved interconnect structure and process for making same
02/20/2007US7179739 Methods of forming a semiconductor device including a metal silicide layer between a conductive plug and a bottom electrode of a capacitor
02/20/2007US7179738 Semiconductor assembly having substrate with electroplated contact pads
02/20/2007US7179737 Semiconductor device and a method of manufacturing the same
02/20/2007US7179736 Method for fabricating planar semiconductor wafers
02/20/2007US7179735 Method of manufacturing semiconductor device
02/20/2007US7179734 Method for forming dual damascene pattern
02/20/2007US7179733 Method of forming contact holes and electronic device formed thereby
02/20/2007US7179732 Interconnection structure and fabrication method thereof
02/20/2007US7179731 Hypercontacting
02/20/2007US7179730 Semiconductor damascene trench and methods thereof
02/20/2007US7179729 Heat treatment apparatus and method of manufacturing a semiconductor device
02/20/2007US7179728 Optical component and manufacturing method thereof, microlens substrate and manufacturing method thereof, display device, and imaging device
02/20/2007US7179727 Formation of lattice-tuning semiconductor substrates
02/20/2007US7179726 Laser processing apparatus and laser processing process
02/20/2007US7179725 Method of fabricating a polycrystalline film by crystallizing an amorphous film with laser light
02/20/2007US7179724 Wafer processing method
02/20/2007US7179723 Wafer processing method
02/20/2007US7179722 Wafer dividing method
02/20/2007US7179721 Method of dividing a non-metal substrate
02/20/2007US7179720 Pre-fabrication scribing
02/20/2007US7179719 System and method for hydrogen exfoliation
02/20/2007US7179718 Structure and method of manufacturing the same
02/20/2007US7179717 Methods of forming integrated circuit devices
02/20/2007US7179716 Method of forming a metal-containing layer over selected regions of a semiconductor substrate
02/20/2007US7179715 Method for controlling spacer oxide loss