Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2007
02/21/2007CN1918217A Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
02/21/2007CN1917285A Antenna structure on IC and manufacturing method
02/21/2007CN1917248A Method for manufacturing a small pin on integrated circuits or other devices
02/21/2007CN1917235A Lead contact structure for emr elements
02/21/2007CN1917234A Low-k spacer structure for flash memory
02/21/2007CN1917232A Semiconductor device and method for fabricating the same
02/21/2007CN1917231A Ohmic electrode, method of manufacturing ohmic electrode, field effect transistor, method of manufacturing field effect transistor, and semiconductor device
02/21/2007CN1917228A Organic electroluminescent device and fabrication method thereof
02/21/2007CN1917227A Organic electroluminescent display, and prepartion method
02/21/2007CN1917226A Organic thin film transistor array panel and method for manufacturing the same
02/21/2007CN1917224A Coated wafer level camera modules and associated methods
02/21/2007CN1917223A Image sensor and method of fabricating the same
02/21/2007CN1917222A Image sensor from CMOS transistors, and manufacturing method
02/21/2007CN1917221A Display substrate, method of manufacturing the same and display device having the same
02/21/2007CN1917220A Method of manufacturing a semiconductor device
02/21/2007CN1917219A Source/drain electrodes, transistor substrates and manufacture methods, thereof, and display devices
02/21/2007CN1917218A Source/drain electrodes, transistor substrates and manufacture methods, thereof, and display devices
02/21/2007CN1917217A Dense non-volatile memory array and method of fabrication
02/21/2007CN1917216A Memory structure and its production method
02/21/2007CN1917215A Operation method for memory in P type channel
02/21/2007CN1917212A Semiconductor memory cell array having mos transistors and method for forming the same
02/21/2007CN1917211A Dynamic random access memory, and manufacturing method
02/21/2007CN1917209A Programmable and eraseable digital switch component, manufacturing method, and operation method
02/21/2007CN1917208A Display face palte, and manufacturing method
02/21/2007CN1917207A Display device and method for manufacturing display device
02/21/2007CN1917202A Wire structure, a method for fabricating a wire, a thin film transistor substrate, and a method for fabricating the thin film transistor substrate
02/21/2007CN1917201A Semiconductor device and open structure of semiconductor device
02/21/2007CN1917199A Semiconductor component and method of manufacture
02/21/2007CN1917198A Semiconductor device and manufacturing method of the same
02/21/2007CN1917197A Bonded structure and bonding method
02/21/2007CN1917196A Packaging structure of pillar grid array, and electronic device
02/21/2007CN1917195A Flexible base palte in use for packing semiconductor, and onload packaging structure
02/21/2007CN1917187A Method for making semiconductor device
02/21/2007CN1917186A Method of manufacturing a non-volatile memory device
02/21/2007CN1917185A Frash memory, and manufacturing method
02/21/2007CN1917184A Nonvolatile memory unit, manufacturing method, and opertion method
02/21/2007CN1917183A Nonvolatile memory unit, manufacturing method, and opertion method
02/21/2007CN1917182A Nonvolatile memory unit, manufacturing method, and opertion method
02/21/2007CN1917181A Method of manufacturing nonvolatile memory
02/21/2007CN1917180A Nonvolatile memory and manufacturing method
02/21/2007CN1917179A Method of manufacturing nonvolatile memory
02/21/2007CN1917178A Nonvolatile memory unit, manufacturing method, and opertion method
02/21/2007CN1917177A Frash memory in separate grids, and manufacturing method
02/21/2007CN1917176A Nonvolatile memory, and manufacturing method
02/21/2007CN1917175A Cmos图像传感器及其制造方法 Cmos image sensor and its manufacturing method
02/21/2007CN1917174A Method of manufacturing semiconductor components, and nonvolatile memory
02/21/2007CN1917173A Method of manufacturing dielectric layer of grid
02/21/2007CN1917172A Method of manufacturing semiconductor components
02/21/2007CN1917171A Method of manufacturing semiconductor components
02/21/2007CN1917170A Semiconductor component of preventing breakdown, and manufacturing method
02/21/2007CN1917169A Method for forming barrier layer on copper metal without use of electrodeposition
02/21/2007CN1917168A Method of manufacturing inner interconnection wires
02/21/2007CN1917167A Method of fabricating metal plug, and contact window
02/21/2007CN1917166A Method of manufacturing semiconductor component, and connecting wire with metal silicides
02/21/2007CN1917165A Method of manufacturing isolation structure of shallow groove
02/21/2007CN1917164A Electrostatically clamped edge ring for plasma processing
02/21/2007CN1917163A System and method for semiconductor manufacturing
02/21/2007CN1917162A Method for detecting bugs of semiconductor parts
02/21/2007CN1917161A Method for determining charge density of semiconductor quanta point through photo capacitance method
02/21/2007CN1917160A Method and system for detecting bugs on wafer
02/21/2007CN1917159A Checking-out clamp for wafers
02/21/2007CN1917158A Power semiconductor packaging method and structure
02/21/2007CN1917157A Structure for packing chip with crystal cavity downward, and manufacturing method
02/21/2007CN1917156A Encapsulated chip scale package having flip-chip on lead frame structure and method
02/21/2007CN1917155A Thin film transistor substrate and fabrication thereof
02/21/2007CN1917154A Mis semiconductor device production method
02/21/2007CN1917153A Method for reducing change of starting voltage following to variation of grid length
02/21/2007CN1917152A Method for preparing good ohmic contact on thin film of cubic boron nitride
02/21/2007CN1917151A Process for producing silicon wafer
02/21/2007CN1917150A Method and apparatus to prevent lateral oxidation in a transistor utilizing an ultra thin oxygen-diffusion barrier
02/21/2007CN1917149A Manufacturing method for semiconductor device, semiconductor device, and electronic apparatus
02/21/2007CN1917148A Semiconductor device and manufacturing method thereof, and thin film device
02/21/2007CN1917147A Method for fabricating openings of self aligned contact window, and semiconductor component
02/21/2007CN1917146A Method of forming polycrystalline silicon thin film and method of manufacturing thin film transistor using the method
02/21/2007CN1917145A Method for manufacturing silicone crystal grain in hemisphere form, and method for manufacturing electrode in large area
02/21/2007CN1917144A Method for forming doping region in embedding type
02/21/2007CN1917143A 衬底处理设备和衬底处理方法 The substrate processing apparatus and a substrate processing method
02/21/2007CN1917142A Semiconductor device manufacturing apparatus
02/21/2007CN1916922A Semiconductor integrated circuit and method for designing same
02/21/2007CN1916921A Semiconductor integrated circuit and method for designing same
02/21/2007CN1916796A System and method for controlling batches in layers of reaction chamber
02/21/2007CN1916771A Liquid processing method and device thereof
02/21/2007CN1916770A Method of selecting a grid model for correcting a process recipe and lithographic assembly using the same
02/21/2007CN1916769A Method for manufacturing semiconductor device using immersion lithography process
02/21/2007CN1916767A Method for forming a lithography pattern
02/21/2007CN1916766A Immersion lithography method and its disposal method
02/21/2007CN1916765A Optimized modules' proximity correction
02/21/2007CN1916764A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
02/21/2007CN1916763A Positive resist composition and method of forming resist pattern
02/21/2007CN1916745A Base plate of thin film transistor, and repairing method
02/21/2007CN1916740A Method for fabricating thin film transistor and structure of pixel
02/21/2007CN1916719A Substrate assembling device and method
02/21/2007CN1916718A Substrate alignment apparatus, substrate processing apparatus, and substrate transfer apparatus
02/21/2007CN1916649A Device and method for electrically inspecting printed circuit board
02/21/2007CN1916641A Test system for electric components
02/21/2007CN1916603A Method and apparatus for angular-resolved spectroscopic lithography characterisation
02/21/2007CN1916561A Interferometer for measuring perpendicular translations
02/21/2007CN1916245A Quality estimating method for cropping a single crystal ingot
02/21/2007CN1916240A Corrosion liquid for InGaP/ AIGaInP crystal material
02/21/2007CN1916235A Method for preparing composite film of silver Nano granule / titanium dioxide
1 ... 3107 3108 3109 3110 3111 3112 3113 3114 3115 3116 3117 3118 3119 3120 3121 3122 3123 3124 3125 3126 3127 ... 6590