| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 02/15/2007 | WO2007018678A2 Damage-free ashing process and system for post low-k etch |
| 02/15/2007 | WO2007018567A1 Thermal flux laser annealing for ion implantation of semiconductor p-n junctions |
| 02/15/2007 | WO2007018495A2 Method for controlling dislocation positions in silicon germanium buffer layers |
| 02/15/2007 | WO2007018391A1 Chemical mechanical polishing apparatus |
| 02/15/2007 | WO2007018367A1 Cantilever-type probe and method of fabricating the same |
| 02/15/2007 | WO2007018299A1 Semiconductor device and process for producing the same |
| 02/15/2007 | WO2007018268A1 Material for insulating film, method of film formation therefrom and insulating film |
| 02/15/2007 | WO2007018235A1 Method for forming w-based film, method for forming gate electrode, and method for manufacturing semiconductor device |
| 02/15/2007 | WO2007018186A1 Apparatus and method for inspecting fine structure and inspection program |
| 02/15/2007 | WO2007018167A1 Laser projection device |
| 02/15/2007 | WO2007018163A1 Film thickness measuring method and substrate processing apparatus |
| 02/15/2007 | WO2007018157A1 Substrate processing apparatus and substrate stage used therein |
| 02/15/2007 | WO2007018142A1 Substrate processing apparatus, method for processing substrate, and method for manufacturing semiconductor device |
| 02/15/2007 | WO2007018139A1 Method of manufacturing semiconductor device and substrate treating device |
| 02/15/2007 | WO2007018127A1 Stage apparatus and exposure apparatus |
| 02/15/2007 | WO2007018121A1 Method for forming film of group iii nitride such as gallium nitride |
| 02/15/2007 | WO2007018052A1 Planar electronic display device and process for producing the same |
| 02/15/2007 | WO2007018041A1 Sheet application device and application method |
| 02/15/2007 | WO2007018040A1 Sheet cutting device and cutting method |
| 02/15/2007 | WO2007018029A1 Exposure device and object to be exposed |
| 02/15/2007 | WO2007018016A1 Substrate processing equipment, cooling gas supply nozzle and method for fabricating semiconductor device |
| 02/15/2007 | WO2007018003A1 Method of forming metallic film and program-storing recording medium |
| 02/15/2007 | WO2007017982A1 Circuit board, electronic device, and process for producing circuit board |
| 02/15/2007 | WO2007017981A1 Wafer level burn-in method and wafer level burn-in system |
| 02/15/2007 | WO2007017963A1 Receiving container for pellicle |
| 02/15/2007 | WO2007017956A1 Probe assembly |
| 02/15/2007 | WO2007017947A1 Exposure mask, method for producing same, and method for transferring pattern |
| 02/15/2007 | WO2007017942A1 Apparatus for assisting selection of measuring position |
| 02/15/2007 | WO2007017939A1 Process for producing semiconductor device |
| 02/15/2007 | WO2007017763A2 Method of production of a film |
| 02/15/2007 | WO2007017672A1 Method of integrating an element |
| 02/15/2007 | WO2007017613A1 Method of producing a transistor comprising parallel semiconductor nanofingers |
| 02/15/2007 | WO2007017400A1 Dry etchback of interconnect contacts |
| 02/15/2007 | WO2007017341A1 Fluxing encapsulants casting resins for dca applications, based on cationically curable epoxy resins |
| 02/15/2007 | WO2007017328A1 Sensor device provided with a sensor component and a support and a method for producing said sensor device |
| 02/15/2007 | WO2007016969A1 Power semiconductor device and method of manufacturing a power semiconductor device |
| 02/15/2007 | WO2007016968A1 Pore sealing and cleaning porous low dielectric constant structures |
| 02/15/2007 | WO2007016966A1 Field-effect semiconductor device and method of forming the same |
| 02/15/2007 | WO2007016924A1 Semiconductor substrate and methods for the production thereof |
| 02/15/2007 | WO2007016720A1 Method suitable for etching hydrophilic trenches in a substrate |
| 02/15/2007 | WO2007008767A3 Chemical mixing apparatus, system and method |
| 02/15/2007 | WO2007008561A3 Ozone system for multi-chamber tools |
| 02/15/2007 | WO2006137932A9 Homogeneous analyte detection |
| 02/15/2007 | WO2006135464B1 Linear vacuum deposition system |
| 02/15/2007 | WO2006130309A3 Sidewall spacers on a memory device |
| 02/15/2007 | WO2006122252A3 Silicon carbide junction barrier schottky diodes with suppressed minority carrier injection |
| 02/15/2007 | WO2006121580A3 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist |
| 02/15/2007 | WO2006109208A3 Method of fabricating a heterojunction bipolar transistor |
| 02/15/2007 | WO2006101638B1 Printed circuit patterned embedded capacitance layer |
| 02/15/2007 | WO2006029414A3 Method of making a microelectronic and/or optoelectronic circuitry sheet |
| 02/15/2007 | WO2005109458A3 Method of laminating low temperature co-fired ceramic (ltcc) material and product formed thereby |
| 02/15/2007 | US20070038969 Electronic ultimate defects analyzer detecting all defects in pcb/mcm |
| 02/15/2007 | US20070037493 Pad conditioner for conditioning a cmp pad and method of making such a pad conditioner |
| 02/15/2007 | US20070037486 Polishing pad, method of manufacturing the polishing pad, and chemical mechanical polishing apparatus comprising the polishing pad |
| 02/15/2007 | US20070037453 Multilayer wiring structure of semiconductor device, method of producing said multilayer wiring structure and semiconductor device to be used for reliability evaluation |
| 02/15/2007 | US20070037418 Process of forming socket contacts |
| 02/15/2007 | US20070037415 Lanthanum hafnium oxide dielectrics |
| 02/15/2007 | US20070037414 Switch element, memory element and magnetoresistive effect element |
| 02/15/2007 | US20070037413 Surface treatment method, manufacturing method of semiconductor device, and manufacturing method of capacitive element |
| 02/15/2007 | US20070037412 In-situ atomic layer deposition |
| 02/15/2007 | US20070037411 Method of manufacturing an electronic device |
| 02/15/2007 | US20070037410 Method for forming a lithography pattern |
| 02/15/2007 | US20070037409 Composite dielectric forming methods and composite dielectrics |
| 02/15/2007 | US20070037408 Method and apparatus for plasma processing |
| 02/15/2007 | US20070037407 Method of cleaning semiconductor device fabrication apparatus |
| 02/15/2007 | US20070037406 Methods of fabricating a semiconductor device using a photosensitive polyimide layer and semiconductor devices fabricated thereby |
| 02/15/2007 | US20070037405 Methods of forming metal-insulator-metal (MIM) capacitors with passivation layers on dielectric layers and devices so formed |
| 02/15/2007 | US20070037404 SiOx:Si composite articles and methods of making same |
| 02/15/2007 | US20070037403 Via bottom contact and method of manufacturing same |
| 02/15/2007 | US20070037402 Method for manufacturing semi-transparent semi-reflective electrode substrate, reflective element substrate, method for manufacturing same, etching composition used for the method for manufacturing the reflective electrode substrate |
| 02/15/2007 | US20070037401 Method of forming trench isolation |
| 02/15/2007 | US20070037400 Composition and methods removing polysilicon |
| 02/15/2007 | US20070037399 High-pressure device for closing a container in a clean room |
| 02/15/2007 | US20070037398 Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-metal dielectric Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-metal dielectric Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-metal dielectric Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing p |
| 02/15/2007 | US20070037397 Two-piece dome with separate RF coils for inductively coupled plasma reactors |
| 02/15/2007 | US20070037396 Semiconductor processing using energized hydrogen gas and in combination with wet cleaning |
| 02/15/2007 | US20070037395 Stringer elimination in a BiCMOS process |
| 02/15/2007 | US20070037394 A method for using a cu beol process to fabricate an integrated circuit (ic) originally having an al design |
| 02/15/2007 | US20070037393 Process of physical vapor depositing mirror layer with improved reflectivity |
| 02/15/2007 | US20070037392 Atomic layer deposition of ruthenium-containing films using surface-activating agents and novel ruthenium complexes |
| 02/15/2007 | US20070037391 Atomic layer deposition of metal-containing films using surface-activating agents |
| 02/15/2007 | US20070037390 Plasma CVD apparatus for forming uniform film |
| 02/15/2007 | US20070037389 Method for electroless plating metal cap barrier on copper |
| 02/15/2007 | US20070037388 Method of forming an insulating capping layer for a copper metallization layer |
| 02/15/2007 | US20070037387 Method to form an interconnect |
| 02/15/2007 | US20070037386 Sloped thin film substrate edges |
| 02/15/2007 | US20070037385 Metal interconnect structure and method |
| 02/15/2007 | US20070037384 A method for processing ic designs for different metal beol processes |
| 02/15/2007 | US20070037383 Method for damascene process |
| 02/15/2007 | US20070037382 Semiconductor device having a multilayer interconnection structure, fabrication method thereof, and designing method thereof |
| 02/15/2007 | US20070037381 Method for fabricating Al metal line |
| 02/15/2007 | US20070037380 Controlling lateral distribution of air gaps in interconnects |
| 02/15/2007 | US20070037379 3D IC method and device |
| 02/15/2007 | US20070037378 Method for forming metal pad in semiconductor device |
| 02/15/2007 | US20070037377 Tin-silver solder bumping in electronics manufacture |
| 02/15/2007 | US20070037376 Method and apparatus for fine pitch solder joint |
| 02/15/2007 | US20070037375 Semiconductor memory devices having contact pads with silicide caps thereon |
| 02/15/2007 | US20070037374 Semiconductor device and its manufacturing method |
| 02/15/2007 | US20070037373 Salicide process utilizing a cluster ion implantation process |
| 02/15/2007 | US20070037372 Planarizing a semiconductor structure to form replacement metal gates |