| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 09/26/2007 | CN101043053A Power semiconductor device having improved performance and method |
| 09/26/2007 | CN101043052A Semiconductor devices and methods of manufacture thereof |
| 09/26/2007 | CN101043051A Semiconductor memory device and manufacturing method for the same |
| 09/26/2007 | CN101043050A Semiconductor device with increased channel area and decreased leakage current |
| 09/26/2007 | CN101043049A Layer-stacked wiring and semiconductor device using same and method for manufacturing semiconductor device |
| 09/26/2007 | CN101043048A System for displaying images including electroluminescent device and method for fabricating the same |
| 09/26/2007 | CN101043047A Display apparatus and method of manufacturing thereof |
| 09/26/2007 | CN101043044A Semi-conductor package structure with optical assembly and manufacturing method thereof |
| 09/26/2007 | CN101043043A CMOSImage sensor and manufacturing method therefor |
| 09/26/2007 | CN101043041A Active matrix substrate, liquid crystal display device, and method of manufacturing liquid crystal display device |
| 09/26/2007 | CN101043037A Semiconductor device and a method of manufacturing the same |
| 09/26/2007 | CN101043036A Semiconductor structure and its producing method |
| 09/26/2007 | CN101043035A Semiconductor memory device and related fabrication method |
| 09/26/2007 | CN101043034A Capacitance structure |
| 09/26/2007 | CN101043032A Semiconductor device and a method of manufacturing the same |
| 09/26/2007 | CN101043031A Semiconductor device with substantial driving current and decreased junction leakage current |
| 09/26/2007 | CN101043028A Semiconductor device and method of manufacturing the same |
| 09/26/2007 | CN101043026A Crystalline semiconductor film, semiconductor device and method for manufacturing thereof |
| 09/26/2007 | CN101043025A Method for manufacturing thin-film transistor substrates |
| 09/26/2007 | CN101043024A Method for manufacturing semiconductor device |
| 09/26/2007 | CN101043023A Method for forming a 3d integrated circuit |
| 09/26/2007 | CN101043022A Method for producing semiconductor component and its semiconductor component |
| 09/26/2007 | CN101043021A Semiconductor device having wirings formed by damascene and its manufacture method |
| 09/26/2007 | CN101043020A Method for fabricating semiconductor and method for fabricating magnetic head |
| 09/26/2007 | CN101043019A Chip retaining cushion |
| 09/26/2007 | CN101043018A Substrate support structure, heat treatment apparatus using same, first sheet-like object for use in the substrate support structure, method of manufacturing the substrate support structure, heat trea |
| 09/26/2007 | CN101043017A 静电吸盘 Electrostatic chuck |
| 09/26/2007 | CN101043016A 静电卡盘及其制造方法 The electrostatic chuck and the manufacturing method |
| 09/26/2007 | CN101043015A Chip retaining cushion |
| 09/26/2007 | CN101043014A Supporting member for substrate |
| 09/26/2007 | CN101043013A Substrates carrier for bearing substrates and manufacturing method thereof |
| 09/26/2007 | CN101043012A Semiconductor device and a method of manufacturing the same |
| 09/26/2007 | CN101043011A Wafer stacking method for preventing layering between wafers |
| 09/26/2007 | CN101043010A Non adhesive tape adhesive crystal type integrated circuit packaging method |
| 09/26/2007 | CN101043009A Method of packaging semiconductor die |
| 09/26/2007 | CN101043008A Method for manufacturing a flip-chip package, substrate for manufacturing and flip-chip assembly |
| 09/26/2007 | CN101043007A Preparing technique for metallic oxide silicon field-effect transistor |
| 09/26/2007 | CN101043006A Method for manufacturing thin film electric crystal |
| 09/26/2007 | CN101043005A Method for reducing metal, multilayer interconnection structure and manufacturing method for the same, and semiconductor device and manufacturing method for the same |
| 09/26/2007 | CN101043004A 等离子体蚀刻方法 The plasma etching method |
| 09/26/2007 | CN101043003A Process for fabricating a semiconductor device with metallic gate and semiconductor device |
| 09/26/2007 | CN101043002A Method for forming semiconductor device |
| 09/26/2007 | CN101043001A Vapor-phase epitaxial growth method and vapor-phase epitaxy apparatus |
| 09/26/2007 | CN101043000A Method for producing semiconductor structure |
| 09/26/2007 | CN101042999A Hard mask layer stack and a method of patterning |
| 09/26/2007 | CN101042998A Substrate structure and method for manufacturing thin film pattern layer |
| 09/26/2007 | CN101042997A Method and system for recessing a trench to target depth using feed forward data |
| 09/26/2007 | CN101042996A Plasma treating apparatus and plasma treating method |
| 09/26/2007 | CN101042995A Vertical heat treating apparatus and control method for transfer mechanism of vertical heat treating apparatus |
| 09/26/2007 | CN101042994A Vertical heat treating apparatus and control method for transfer mechanism of vertical heat treating apparatus |
| 09/26/2007 | CN101042993A 氧化铝烧结体 Alumina sintered body |
| 09/26/2007 | CN101042992A Vertical plasma processing apparatus for semiconductor process |
| 09/26/2007 | CN101042991A Plasma processing apparatus |
| 09/26/2007 | CN101042990A Plasma processing apparatus and method |
| 09/26/2007 | CN101042989A Plasma processing apparatus |
| 09/26/2007 | CN101042988A Substrate processing method and storage medium |
| 09/26/2007 | CN101042987A Method of processing substrate |
| 09/26/2007 | CN101042986A Visual inspection apparatus |
| 09/26/2007 | CN101042985A Substrate processing apparatus and substrate processing method |
| 09/26/2007 | CN101042984A Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, semiconductor device, and light modulation element |
| 09/26/2007 | CN101042983A Substrate processing method and substrate processing apparatus |
| 09/26/2007 | CN101042978A Apparatus for shielding process chamber port having dual zone and optical access features |
| 09/26/2007 | CN101042950A Method for manufacturing transparent conductive film cling matrix |
| 09/26/2007 | CN101042927A Semiconductor memory device |
| 09/26/2007 | CN101042690A Method and system for recognizing common characteristics in data |
| 09/26/2007 | CN101042542A Displacement measurement systems lithographic apparatus and device manufacturing method |
| 09/26/2007 | CN101042541A Lithographic apparatus and device manufacturing method |
| 09/26/2007 | CN101042540A 衬底处理系统和衬底处理方法 A substrate processing system and a substrate processing method |
| 09/26/2007 | CN101042539A Hanger bearing image-forming system and light scribing device |
| 09/26/2007 | CN101042537A Detecting method for position of photomask graphics |
| 09/26/2007 | CN101042536A Method for reducing critical dimension of photoresist contact hole pattern |
| 09/26/2007 | CN101042533A Organosilane hardmask compositions and methods of producing semiconductor devices using the same |
| 09/26/2007 | CN101042531A Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
| 09/26/2007 | CN101042528A Pattern dividing method for correcting optical near-field effect |
| 09/26/2007 | CN101042527A Compensation process for critical dimension homogeneity |
| 09/26/2007 | CN101042526A Mask data correction method, photomask and optical image prediction method |
| 09/26/2007 | CN101042511A Display component using laser mask crystal |
| 09/26/2007 | CN101042498A LED backlight unit without printed circuit board and method of manufacturing the same |
| 09/26/2007 | CN101042423A Method for detecting the defect on chip |
| 09/26/2007 | CN101042421A Circuit for protecting dut, method for protecting dut, testing apparatus and testing method |
| 09/26/2007 | CN101041898A Electron attachment assisted formation of electrical conductors |
| 09/26/2007 | CN101041893A Apparatus for depositing atomic layer using gas separation type showerhead |
| 09/26/2007 | CN101041892A Graphite washing unit |
| 09/26/2007 | CN101041890A Mask film cradle and deposition system |
| 09/26/2007 | CN101041769A Metal polishing slurry |
| 09/26/2007 | CN101041398A Transferring system |
| 09/26/2007 | CN101041231A 表面处理方法 The surface treatment method |
| 09/26/2007 | CN100340063C 半导体集成电路 The semiconductor integrated circuit |
| 09/26/2007 | CN100340010C Memory cell with an asymmetrical area |
| 09/26/2007 | CN100340006C Method for forming semiconductor device and transistor having a plurality of silicided polysilicon structures |
| 09/26/2007 | CN100340005C Semiconductor assembly ,cumulative mode multiple gate transistor and its manufacturing method |
| 09/26/2007 | CN100340004C 半导体装置 Semiconductor device |
| 09/26/2007 | CN100340001C Deep wordline trench to shield cross coupling between adjacent cells for scaled NAND |
| 09/26/2007 | CN100339999C Static memory cell configured using partially-depleted and fully-depleted transistors |
| 09/26/2007 | CN100339998C Semiconductor device possessing connection bonding pad and manufacturing method thereof |
| 09/26/2007 | CN100339997C Semiconductor device including nonvolatile memory and method for fabricating the same |
| 09/26/2007 | CN100339996C Ferroelectric material, ferroelectric film and method of manufacturing the same, ferroelectric capacitor and method of manufacturing the same, ferroelectric memory, |
| 09/26/2007 | CN100339995C Method of fabricating a semiconductor device |
| 09/26/2007 | CN100339994C 半导体器件 Semiconductor devices |
| 09/26/2007 | CN100339993C Semiconductor device having metal silicide layer on source/drain region and gate electrode and method of manufacturing the same |