Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2007
09/27/2007WO2007108401A1 Semiconductor device manufacturing method and substrate processing apparatus
09/27/2007WO2007108400A1 Testing apparatus, memory device and testing method
09/27/2007WO2007108383A1 Semiconductor device capable of suppressing power supply noise
09/27/2007WO2007108370A1 Substrate processor and method of manufacturing semiconductor device
09/27/2007WO2007108366A1 Plasma processing apparatus
09/27/2007WO2007108352A1 Electronic part mounting device and electronic part mounting method
09/27/2007WO2007108349A1 Transfer/alignment method in vacuum processing apparatus, vacuum processing apparatus and computer storage medium
09/27/2007WO2007108315A1 Substrate processing apparatus and substrate processing method
09/27/2007WO2007108290A1 Bump forming method and bump forming apparatus
09/27/2007WO2007108253A1 Positive resist composition for formation of thick resist film, thick resist laminate, and method for formation of resist pattern
09/27/2007WO2007108228A1 Resin sealing/molding apparatus
09/27/2007WO2007108223A1 Method for forming thick resist film and method for forming resist pattern
09/27/2007WO2007108215A1 Polishing composition
09/27/2007WO2007108192A1 Electrostatic attraction apparatus for glass substrate and method for attracting and releasing such glass substrate
09/27/2007WO2007108181A1 Active matrix substrate, display device and television receiver
09/27/2007WO2007108157A1 Process for producing thin-film transistor, laser crystallization apparatus and semiconductor device
09/27/2007WO2007108153A1 Polishing composition for silicon wafer, composition kit for silicon wafer polishing, and methods of polishing silicon wafer
09/27/2007WO2007108122A1 Carbon nanotube device and process for producing the same
09/27/2007WO2007108107A1 Passive element design program, designing device, and designing method
09/27/2007WO2007108106A1 Semiconductor device and process for producing the same
09/27/2007WO2007108104A1 Semiconductor device and its fabrication process
09/27/2007WO2007108102A1 Semiconductor device and semiconductor element selecting method
09/27/2007WO2007108094A1 Method of manufacturing optical semiconductor device
09/27/2007WO2007108047A1 Semiconductor device enabling power supply noise to be suppressed
09/27/2007WO2007108017A1 Semiconductor field-effect transistor, memory cell and memory device
09/27/2007WO2007107964A1 Electrically enhanced wirebond package
09/27/2007WO2007107920A1 Method of cleaning a semiconductor wafer
09/27/2007WO2007107757A2 Growth method using nanostructure compliant layers and hvpe for producing high quality compound semiconductor materials
09/27/2007WO2007107461A1 Method for fabricating a semiconductor structure, and corresponding semiconductor structure
09/27/2007WO2007107339A1 Method for fabricating a semiconductor component with a specifically doped surface region using out-diffusion, and corresponding semiconductor component
09/27/2007WO2007107299A1 Method for producing an active or passive electronic component, and electronic component
09/27/2007WO2007107176A1 Method of reducing risk of delamination of a layer of a semiconductor device
09/27/2007WO2007107106A1 Multipole linerar ion trap system and method of manufacturing the same with electrodes all-in-one
09/27/2007WO2007107053A1 An acid corrosion soluton for preparing polysilicon suede and the applied method of it
09/27/2007WO2007107048A1 A METHOD OF MANUFACTURING HIGH QUALITY ZnO MONOCRYSTAL FILM ON SILICON(111) SUBSTRATE
09/27/2007WO2007107009A1 Method of producing luminous components
09/27/2007WO2007092130A3 Dry etch and epitaxial deposition process and apparatus
09/27/2007WO2007082373A8 A tunable semiconductor component provided with a current barrier
09/27/2007WO2007079500A9 Passivating layer for photovoltaic cells
09/27/2007WO2007073482A3 Method and apparatus for processing multiphoton curable photoreactive compositions
09/27/2007WO2007054858A3 Integrated capacitor arrangement for ultrahigh capacitance values
09/27/2007WO2007048387A3 Semiconductor component comprising a p-n junction, and method for the production thereof
09/27/2007WO2007036861A3 Semiconductor device with a bipolar transistor and method of manufacturing such a device
09/27/2007WO2007033362A3 Systems, masks, and methods for photolithography
09/27/2007WO2007024470A3 Method for forming a capping layer on a semiconductor device
09/27/2007WO2006124967A3 Low temperature plasma deposition process for carbon layer deposition
09/27/2007WO2006116511A3 O-ringless tandem throttle valve for a plasma reactor chamber
09/27/2007WO2006023914A3 Thermal fatigue resistant tin-lead-silver solder
09/27/2007US20070226677 Performance in model-based opc engine utilizing efficient polygon pinning method
09/27/2007US20070226676 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method
09/27/2007US20070226675 Method of forming pattern writing data by using charged particle beam
09/27/2007US20070225854 Method, system, and apparatus for use in locating a structure in an integrated circuit
09/27/2007US20070225853 Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus
09/27/2007US20070225438 Resin Paste for Die Bonding
09/27/2007US20070224923 Polishing pad, chemical mechanical polishing apparatus and method for manufacturing polishing pad
09/27/2007US20070224918 Planarization apparatus
09/27/2007US20070224840 Method of Plasma Processing with In-Situ Monitoring and Process Parameter Tuning
09/27/2007US20070224839 Heat treating apparatus, heat treating method and storage medium
09/27/2007US20070224838 Method of straining a silicon island for mobility improvement
09/27/2007US20070224837 Method for producing material of electronic device
09/27/2007US20070224836 Method for Manufacturing Semiconductor Device and Plasma Oxidation Method
09/27/2007US20070224835 Semiconductor device and method of manufacturing semiconductor device
09/27/2007US20070224834 Dielectric material having carborane derivatives
09/27/2007US20070224833 Method of forming carbon polymer film using plasma CVD
09/27/2007US20070224832 Method for forming and sealing a cavity for an integrated MEMS device
09/27/2007US20070224831 Post structure, semiconductor device and light emitting device using the structure, and method for forming the same
09/27/2007US20070224830 Low temperature etchant for treatment of silicon-containing surfaces
09/27/2007US20070224829 Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas
09/27/2007US20070224828 Plasma etching method
09/27/2007US20070224827 Methods for etching a bottom anti-reflective coating layer in dual damascene application
09/27/2007US20070224826 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
09/27/2007US20070224825 Methods for etching a bottom anti-reflective coating layer in dual damascene application
09/27/2007US20070224824 Method of repairing process induced dielectric damage by the use of gcib surface treatment using gas clusters of organic molecular species
09/27/2007US20070224823 Topography directed patterning
09/27/2007US20070224822 Halide anions for metal removal rate control
09/27/2007US20070224820 Facility with Multi-Storied Process Chamber for Cleaning Substrates and Method for Cleaning Substrates Using the Facility
09/27/2007US20070224819 Topography directed patterning
09/27/2007US20070224818 Substrate processing method and storage medium
09/27/2007US20070224817 Plasma processing apparatus, plasma processing method, and storage medium
09/27/2007US20070224816 Organosilane hardmask compositions and methods of producing semiconductor devices using the same
09/27/2007US20070224815 Substrate patterning for multi-gate transistors
09/27/2007US20070224814 Integrated multi-wavelength fabry-perot filter and method of fabrication
09/27/2007US20070224813 Device and method for etching flash memory gate stacks comprising high-k dielectric
09/27/2007US20070224812 Pattern film forming method and pattern film forming apparatus
09/27/2007US20070224811 Substrate processing method and substrate processing apparatus
09/27/2007US20070224810 Manufacturing method for an integrated semiconductor structure
09/27/2007US20070224809 Method of forming wiring
09/27/2007US20070224808 Silicided gates for CMOS devices
09/27/2007US20070224807 Methods for etching a dielectric barrier layer with high selectivity
09/27/2007US20070224806 Metal polishing slurry
09/27/2007US20070224805 Semiconductor device and manufacturing method therefor
09/27/2007US20070224804 Carbon nanotube-based electronic devices made by electrolytic deposition and applications thereof
09/27/2007US20070224803 Methods for etching a dielectric barrier layer with high selectivity
09/27/2007US20070224802 Semiconductor device and a manufacturing method of the same
09/27/2007US20070224801 Dielectric interconnect structures and methods for forming the same
09/27/2007US20070224800 Production method for semiconductor device
09/27/2007US20070224799 System for making a semiconductor device using bump material including liquid
09/27/2007US20070224798 Semiconductor device and medium of fabricating the same
09/27/2007US20070224797 Method for manufacturing semiconductor device, method for forming alignment mark, and semiconductor device
09/27/2007US20070224796 Method of forming a phase changeable structure
1 ... 2859 2860 2861 2862 2863 2864 2865 2866 2867 2868 2869 2870 2871 2872 2873 2874 2875 2876 2877 2878 2879 ... 6590