Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2008
08/26/2008US7416954 Enhanced on-chip decoupling capacitors and method of making same
08/26/2008US7416953 Vertical MIM capacitors and method of fabricating the same
08/26/2008US7416952 Method for producing a dielectric interlayer and storage capacitor with such a dielectric interlayer
08/26/2008US7416951 Thin film resistors integrated at two different metal interconnect levels of single die
08/26/2008US7416950 MOS transistor forming method
08/26/2008US7416949 Fabrication of transistors with a fully silicided gate electrode and channel strain
08/26/2008US7416948 Trench FET with improved body to gate alignment
08/26/2008US7416947 Method of fabricating trench MIS device with thick oxide layer in bottom of trench
08/26/2008US7416946 Semiconductor device and method of manufacturing the semiconductor device
08/26/2008US7416945 Method for forming a split gate memory device
08/26/2008US7416944 Flash EEPROM device and method for fabricating the same
08/26/2008US7416943 Peripheral gate stacks and recessed array gates
08/26/2008US7416942 Method for manufacturing semiconductor device
08/26/2008US7416941 Four-bit finfet NVRAM memory device
08/26/2008US7416940 Methods for fabricating flash memory devices
08/26/2008US7416939 Conductive spacers extended floating gates
08/26/2008US7416938 Inkjet patterning for thin-film capacitor fabrication, thin-film capacitors fabricated thereby, and systems containing same
08/26/2008US7416937 Semiconductor device and method for fabricating the same
08/26/2008US7416936 Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same
08/26/2008US7416935 Method of manufacturing nonvolatile semiconductor memory device having adjacent selection transistors connected together
08/26/2008US7416934 Semiconductor device
08/26/2008US7416933 Methods of enabling polysilicon gate electrodes for high-k gate dielectrics
08/26/2008US7416931 Methods for fabricating a stress enhanced MOS circuit
08/26/2008US7416930 Method for producing an oxide confined semiconductor laser
08/26/2008US7416929 Monolithic vertical junction field effect transistor and schottky barrier diode fabricated from silicon carbide and method for fabricating the same
08/26/2008US7416928 Manufacturing method of semiconductor device
08/26/2008US7416927 Method for producing an SOI field effect transistor
08/26/2008US7416926 Liquid crystal display device and method for fabricating the same
08/26/2008US7416925 Doped structure for finfet devices
08/26/2008US7416924 Organic light emitting display with single crystalline silicon TFT and method of fabricating the same
08/26/2008US7416923 Underfill film having thermally conductive sheet
08/26/2008US7416922 Heat sink with preattached thermal interface material and method of making same
08/26/2008US7416921 Method for flip-chip mounting utilizing a delay curing-type adhesive with two-part hardening resin
08/26/2008US7416920 Semiconductor device protective structure and method for fabricating the same
08/26/2008US7416919 Method for wafer level stack die placement
08/26/2008US7416918 Direct build-up layer on an encapsulated die package having a moisture barrier structure
08/26/2008US7416917 Method of fabricating electroluminescent display
08/26/2008US7416916 Solid-state image sensing device driving method and solid-state image sensing apparatus
08/26/2008US7416914 Method of fabricating CMOS image sensor
08/26/2008US7416913 Methods of manufacturing microelectronic imaging units with discrete standoffs
08/26/2008US7416912 Method of fabricating CMOS image sensor
08/26/2008US7416911 Electrochemical method for attaching molecular and biomolecular structures to semiconductor microstructures and nanostructures
08/26/2008US7416910 Pyramid socket suspension
08/26/2008US7416909 Methods for preserving strained semiconductor substrate layers during CMOS processing
08/26/2008US7416908 Method for fabricating a micro structure
08/26/2008US7416907 Semiconductor device and method for forming the same
08/26/2008US7416906 Soldering method for semiconductor optical device, and semiconductor optical device
08/26/2008US7416905 Method of fabricating a magnetic shift register
08/26/2008US7416904 Method for forming dielectric layer of capacitor
08/26/2008US7416837 A curable protective coatings for reducing an edge roughness during forming a small and fine pattern
08/26/2008US7416832 A silicone resin is used as a base resin it is used in combination with a specific acid generator; mask linearity; capable of forming a resist pattern having good shape
08/26/2008US7416793 Dielectric ceramic layer of an alumina sintered body and an electrode formed on one surface; volume resistivity equal to or greater than 1x1017 Omega cm at room temperature
08/26/2008US7416681 Etching solution for multiple layer of copper and molybdenum and etching method using the same
08/26/2008US7416680 a mixture of carrier fluids, colloidal particles, etchants and surfactants comprising sodium octyl sulfate, used for cleaning or polishing glass or ceramic disks used in data storage devices
08/26/2008US7416647 Plating processing device
08/26/2008US7416635 Gas supply member and plasma processing apparatus
08/26/2008US7416634 Method and apparatus for processing nanoscopic structures
08/26/2008US7416633 Plasma processing apparatus
08/26/2008US7416632 Substrate processing apparatus and substrate processing method
08/26/2008US7416630 Fabrication of LTCC T/R modules with multiple cavities and an integrated ceramic ring frame
08/26/2008US7416611 Process and apparatus for treating a workpiece with gases
08/26/2008US7416606 Method of forming a layer of silicon carbide on a silicon wafer
08/26/2008US7416604 Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
08/26/2008US7416474 Planarization apparatus
08/26/2008US7416463 Panel substrate, display panel, organic EL panel, and method of manufacturing the same
08/26/2008US7416330 Method and apparatus for measuring temperature of substrate
08/26/2008US7416107 Concave face wire bond capillary and method
08/26/2008US7415940 Plasma processor
08/26/2008US7415780 Method and apparatus for removing liquid from substrate surfaces using suction
08/26/2008CA2432701C Electrically conductive connection between a chip and a coupling element, and security element, security paper and document of value with such a connection
08/26/2008CA2412999C Nitride semiconductor substrate and method for manufacturing the same, and nitride semiconductor device using nitride semiconductor substrate
08/21/2008WO2008101144A1 A method and system for removing impurities from low-grade crystalline silicon wafers
08/21/2008WO2008101102A1 Plated pillar package formation
08/21/2008WO2008101099A1 Bowed wafer hybridization compensation
08/21/2008WO2008101093A1 Post-seed deposition process
08/21/2008WO2008100923A2 Undercut-free blm process for pb-free and pb-reduced c4
08/21/2008WO2008100917A1 Epitaxial growth system for fast heating and cooling
08/21/2008WO2008100873A2 A low cost multi-state magnetic memory
08/21/2008WO2008100872A2 An improved high capacity low cost multi-state magnetic memory
08/21/2008WO2008100871A2 Non-volatile magnetic memory element with graded layer
08/21/2008WO2008100869A2 Non-volatile magnetic memory with low switching current and high thermal stablity
08/21/2008WO2008100868A2 Non-uniform switching based non-volatile magnetic based memory
08/21/2008WO2008100824A1 Multi-step plasma doping with improved dose control
08/21/2008WO2008100751A1 Stressed soi fet having tensile and compressive device regions
08/21/2008WO2008100705A2 Integrated hydrogen anneal and gate oxidation for improved gate oxide integrity
08/21/2008WO2008100691A2 Vapor deposition methods for forming a metal- containing layer on a substrate
08/21/2008WO2008100687A1 Multi-layer source/drain stressor
08/21/2008WO2008100616A2 Atomic layer deposition of strontium oxide via n-propyltetramethyl cyclopentadienyl precursor
08/21/2008WO2008100505A1 Optimization of laser bar orientation for nonpolar and semipolar (ga,ai,in,b)n diode lasers
08/21/2008WO2008100504A1 Cleaved facet (ga,al,in)n edge-emitting laser diodes grown on semipolar {11-2n} bulk gallium nitride substrates
08/21/2008WO2008100502A1 Al(x)ga(1-x)n-cladding-free nonpolar iii-nitride based laser diodes and light emitting diodes
08/21/2008WO2008100400A1 Cmp system utilizing halogen adduct
08/21/2008WO2008100314A1 System and method for chemical vapor deposition process control
08/21/2008WO2008100312A1 Method to reduce collector resistance of a bipolar transistor and integration into a cmos flow
08/21/2008WO2008100146A2 Method and device for encapsulating electronic components using underpressure
08/21/2008WO2008100111A1 Picker for transfer tool and transfer tool having the same
08/21/2008WO2008100101A1 Probe card including a plurality of connectors and method of bonding the connectors to a substrate of the probe card
08/21/2008WO2008100081A1 Tray transferring device
08/21/2008WO2008100039A1 Oxide semiconductor target, method of forming the same, method of forming oxide semiconductor layer using the same and method of manufacturing semiconductor device using the same
08/21/2008WO2008099955A1 Base body, and system for confirming base body existing position and frequency response characteristic
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