Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2008
08/28/2008US20080203381 Forming arsenide-based complementary logic on a single substrate
08/28/2008US20080203379 Array of vertical bipolar junction transistors, in particular selectors in a phase change memory device
08/28/2008US20080203378 Semiconductor memory device and method of manufacturing the same
08/28/2008US20080203375 Memory Cell with Memory Element Contacting Ring-Shaped Upper End of Bottom Electrode
08/28/2008US20080203361 Thermal barrier separates crystal growth area from synthesizing melt area of vessel; semiconductors
08/28/2008US20080203354 Polishing liquid
08/28/2008US20080203317 Multi-beam deflector array device for maskless particle-beam processing
08/28/2008US20080203302 Sample transfer unit and sample transferring method
08/28/2008US20080203182 Fluid supply nozzle, substrate processing apparatus and substrate processing method
08/28/2008US20080203173 Rfid tag and rfid tag manufacturing method
08/28/2008US20080203058 Substrate developing method and developing apparatus
08/28/2008US20080203055 Method of forming one or more nanopores for aligning molecules for molecular electronics
08/28/2008US20080202917 Method for Manufacturing a Magnetoresistive Multilayer Film
08/28/2008US20080202892 Stacked process chambers for substrate vacuum processing tool
08/28/2008US20080202801 Circuit Board Structure and Method for Manufacturing a Circuit Board Structure
08/28/2008US20080202792 Interconnections for flip-chip using lead-free solders and having reaction barrier layers
08/28/2008US20080202689 Plasma processing apparatus
08/28/2008US20080202688 Silicon Carbide Gas Distribution Plate and RF Electrode for Plasma Etch Chamber
08/28/2008US20080202687 Stacked process chambers for flat-panel display processing tool
08/28/2008US20080202686 Self-contained process modules for magnetic media processing tool
08/28/2008US20080202685 High yield plasma etch process for interlayer dielectrics
08/28/2008US20080202677 Chip bonding tool and related apparatus and method
08/28/2008US20080202587 System and method to supply chemical during semiconductor device fabrication
08/28/2008US20080202582 Process for Producing Monocrystal Thin Film and Monocrystal Thin Film Device
08/28/2008US20080202581 Photovoltaic cell with reduced hot-carrier cooling
08/28/2008US20080202577 Dynamic design of solar cell structures, photovoltaic modules and corresponding processes
08/28/2008US20080202576 Solar cell structures, photovoltaic panels and corresponding processes
08/28/2008US20080202559 Wafer cleaning method and equipment
08/28/2008US20080202550 Transmission of Ultrasonic Energy into Pressurized Fluids
08/28/2008US20080202421 Mask and substrate alignment for solder bump process
08/28/2008US20080202419 Gas manifold directly attached to substrate processing chamber
08/28/2008US20080202417 Self-contained process modules for vacuum processing tool
08/28/2008US20080202409 Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
08/28/2008US20080202209 Sensor
08/28/2008US20080201944 Multilayer printed circuit board and multilayer printed circuit board manufacturing method
08/28/2008US20080201925 Ultracapacitor electrode with controlled sulfur content
08/28/2008DE202008008582U1 Gaszusammensetzung zum Plasmaätzen von siliziumhaltigen Schichten Gas composition for plasma etching of silicon-containing layers
08/28/2008DE20023985U1 Barrierenschichten für ferroelektrische Speichervorrichtungen Barrier layers for ferroelectric memory devices
08/28/2008DE19964480B4 Verfahren zum Herstellen einer nichtflüchtigen ferroelektrischen Speicherzelle vom NAND-Typ A method of manufacturing a non-volatile ferroelectric memory cell of the NAND type
08/28/2008DE112006002726T5 Isolierung von selbstausgerichteten Gates Isolation of self-aligned gates
08/28/2008DE112006002626T5 Halbleitersubstrat und Verfahren zu dessen Herstellung Semiconductor substrate and process for its preparation
08/28/2008DE112006001735T5 Blockkontaktarchitekturen für Transistoren mit Kanälen in einer Nano-Größenordnung Contact block architectures for transistors with channels in a nano-scale
08/28/2008DE112004001155T5 Positivresist - Zusammensetzung und Methode zur Bildung von Resistmustern unter Verwendung derselben Positive resist - Composition and method of forming resist patterns using the same
08/28/2008DE10350684B4 Verfahren zur Herstellung einer Leistungstransistoranordnung und mit diesem Verfahren hergestellte Leistungstransistoranordnung A method of manufacturing a power transistor device and produced by this method power transistor device
08/28/2008DE102008011265A1 Lötschicht und Substrat zum Bonden von Vorrichtungen, das diese verwendet, und Verfahren zum Herstellen eines solchen Substrats Solder layer and the substrate for bonding devices that uses these, and methods for making such a substrate
08/28/2008DE102008010934A1 Laserstrahl-Bestrahlungseinrichtung und Laserstrahl-Bearbeitungseinrichtung Laser beam irradiation apparatus and laser processing equipment
08/28/2008DE102008010321A1 Integrierte Schaltung mit Superjunctionhalbleiterelement Integrated circuit with Super Junction semiconductor element
08/28/2008DE102008010110A1 Feldeffekttransistor-Anordnung und Verfahren zum Herstellen einer Feldeffekttransistor-Anordnung Field effect transistor arrangement and method of fabricating a field effect transistor arrangement
08/28/2008DE102008010098A1 Halbleiterpackage mit einer ein Die aufnehmenden durchgehenden Ausnehmung und einer Verbindungsbohrung und ein Verfahren zu deren Herstellung A semiconductor package having a die receiving a continuous recess, and a connecting bore and a method for their preparation
08/28/2008DE102008008752A1 Halbleitervorrichtung und Herstellungsverfahren dafür A semiconductor device and manufacturing method thereof
08/28/2008DE102008008166A1 Kondensatorstruktur eines Halbleiterbauelements und Verfahren zur Herstellung derselben The capacitor structure of a semiconductor device and method of manufacturing the same
08/28/2008DE102008008077A1 Chuck-Aufbau und Plasmaanlage für hohe Dichte mit demselben Chuck structure and plasma system for high density with the same
08/28/2008DE102008008076A1 Verfahren zur Herstellung eines nicht-flüchtigen Speicherbauelements A process for producing a non-volatile memory device
08/28/2008DE102008008068A1 Semiconductor package for e.g. integrated circuit card in e.g. mobile phone, has external contact terminal provided within through-hole, which electrically connects conductive pattern to semiconductor chip
08/28/2008DE102008005866A1 Stapelpackung, Verfahren zur Herstellung derselben und Speicherkarte Stack pack, method for producing the same and the memory card
08/28/2008DE102008004289A1 Gap formation prevention structure for use in wafer processing unit, has holder for holding wafer and gap prevention unit with ring, which is positioned on outer side of holder
08/28/2008DE102008000217A1 Halbleiterbauelement-Teststrukturen und -verfahren Semiconductor device test structures and procedures
08/28/2008DE102007060313A1 Wafer Level Package (WLP) mit guter CTE-Eigenschaft und Verfahren zu deren Herstellung Wafer Level Package (WLP) with good CTE property, and processes for their preparation
08/28/2008DE102007057950A1 Work-piece e.g. optical lens surface, holding device for e.g. ion radiating processing device, has support carrier for holding work-piece carrier in position at stop unit using elastic unit
08/28/2008DE102007045377A1 Optische Bearbeitung in selektiver Tiefe Optical processing in selective depth
08/28/2008DE102007043341A1 Halbleitervorrichtung und Verfahren zu ihrer Herstellung Semiconductor device and process for their preparation
08/28/2008DE102007035251B3 Isolation ditches with different side panel doping production method for use in dig-insulating smart-power-technology for leading connection of buried endowed layers, comprises drilling narrow and broad ditch by photolithographic process
08/28/2008DE102007010563A1 Selektives Wachstum von polykristallinem siliziumhaltigen Halbleitermaterial auf siliziumhaltiger Halbleiteroberfläche Selective growth of polycrystalline silicon-containing semiconductor material of silicon semiconductor surface
08/28/2008DE102007009371A1 Semiconductor chip mounting method, involves partially or completely soaking capillary meshing on substrate e.g. printed circuit board, using thin liquid adhesive, and fitting chips to capillary meshing
08/28/2008DE102007009281A1 Procedure for the production of material deposition for semiconductor material wafer, comprises creating damage in a semiconductor material and subsequently treating the semiconductor material by heat for ten hours
08/28/2008DE102007009255A1 Device for scanning surface of semiconductor, comprises scanning device for scanning surface, which has lighting device that withdraws light rays and glass fiber element
08/28/2008DE102007009145A1 Vorrichtung zum Abscheiden kristalliner Schichten wahlweise mittels MOCVD oder HVPE Apparatus for depositing crystalline layers either by MOCVD or HVPE
08/28/2008DE102007008934A1 Vorrichtung und Speichervorrichtung, Verfahren zur Herstellung von Strukturen in einem Werkstück und Verfahren zur Herstellung einer Speichervorrichtung Apparatus and storage device, process for the preparation of structures in a workpiece and methods of making a memory device
08/28/2008DE102007008777A1 Halbleiterbauelement mit Zellenstruktur und Verfahren zur Herstellung desselben Of the same semiconductor device with cell structure and methods for preparing
08/28/2008DE102007008540A1 Verfahren zum Laser-gestützten Bonden, derart gebondete Substrate und deren Verwendung Method for laser-assisted bonding, such bonded substrates and their use
08/28/2008DE102007008530A1 Isolationsanordnung und Verfahren zur Herstellung derselben An insulation assembly and method of manufacturing the same
08/28/2008DE102007000981A1 Vorrichtung und Verfahren zum Vermessen von Strukturen auf einer Maske und zur Berechnung der aus den Strukturen resultierenden Strukturen in einem Photoresist Apparatus and method for measuring structures on a mask and the calculation of results from the structures structures in a photoresist
08/28/2008DE102006030264B4 Verfahren zur Herstellung von Transistoren mit einem Kanal mit biaxialer Verformung, die durch Silizium/Germanium in der Gateelektrode hervorgerufen wird A process for the fabrication of transistors with a channel having biaxial deformation is caused by silicon / germanium in the gate electrode
08/28/2008DE102006017115B4 Halbleiterbauteil mit einem Kunststoffgehäuse und Verfahren zu seiner Herstellung A semiconductor device comprising a plastic housing and method for its preparation
08/28/2008DE102005054431B4 Verfahren zum Herstellen eines Flaschengrabens und eines Flaschengrabenkondensators A method of manufacturing a bottle and a bottle trench capacitor grave
08/28/2008DE102005039394B4 Verfahren zum Suchen potentieller Fehler eines Layouts einer integrierten Schaltung Method for searching potential failure of a layout of an integrated circuit
08/28/2008DE102005030670B4 Vorrichtung zum Schneiden eines Substrats und Verfahren unter Verwendung derselben A device for cutting a substrate, and method using the same
08/28/2008DE102005015036B4 Verfahren zur Montage eines Chips auf einer Unterlage A method of mounting a chip on a base
08/28/2008DE102004049249B4 Elektronikmodul, Waferprodukt und Herstellungsverfahren Electronics module, wafer product and manufacturing process
08/27/2008EP1962349A2 Nanowires-based transparent conductors
08/27/2008EP1962347A1 Schottky barrier diode and method for using the same
08/27/2008EP1962341A2 SRAM device integrated with a resistor and fabrication process thereof
08/27/2008EP1962340A2 Method for manufacturing compound material wafers
08/27/2008EP1962339A1 Method for evaluating semiconductor substrate
08/27/2008EP1962338A1 Field effect transistor
08/27/2008EP1962337A2 Method of preparing a dielectric material with oriented porosity on a substrate by electromagnetic and/or photonic treatment
08/27/2008EP1962336A2 Insulating film material , multilayer interconnection structure, method for manufacturing the same and method for manufacturing semiconductor device
08/27/2008EP1962335A1 Method of processing chamfered portion of semiconductor wafer and method of correcting groove shape of grindstone
08/27/2008EP1962334A1 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, and kit for preparing aqueous dispersion for chemical mechanical polishing
08/27/2008EP1962333A1 Semiconductor device manufacturing method
08/27/2008EP1962332A2 Semiconductor device and method for manufacturing the same
08/27/2008EP1962331A2 Thin-film solar cell and method of manufacturing the same
08/27/2008EP1962330A2 Method for manufacturing SIC semiconductor device
08/27/2008EP1962329A1 Substrate holding device, exposure device, exposure method, and device fabrication method
08/27/2008EP1962328A1 Liquid recovery member, exposure apparatus, exposure method, and device production method
08/27/2008EP1962327A1 Washing liquid for photolithography, and method for washing exposure device using the same
08/27/2008EP1962326A1 Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank
08/27/2008EP1962325A1 Method for manufacturing bonded substrate
08/27/2008EP1962324A2 Adhesive tape joining apparatus
08/27/2008EP1962323A1 Filament lamp and light irradiation type heat treatment apparatus